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1. 发明授权

US06531260B2 Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition 有权
标题翻译：聚硅氧烷，其制造方法，含硅脂环化合物和辐射敏感性树脂组合物
公开(公告)号：US06531260B2
公开(公告)日：2003-03-11
申请号：US09824224
申请日：2001-04-03
申请人： Haruo Iwasawa , Tsutomu Shimokawa , Akihiro Hayashi , Satoru Nishiyama
发明人： Haruo Iwasawa , Tsutomu Shimokawa , Akihiro Hayashi , Satoru Nishiyama
IPC分类号： G03C172
CPC分类号： C08L83/08 , C07F7/0838 , C08G77/14 , C08G77/24 , C08L83/06 , G03F7/0045 , G03F7/0757
摘要： A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), wherein A1 and A2 are an acid-dissociable monovalent organic group, R1 is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R2 is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.
摘要翻译：一种具有以下结构单元（I）和/或（II）和结构单元（III）的新型聚硅氧烷，其中A1和A2是酸解离的一价有机基团，R 1是氢，一价（卤代）烃，卤素，或氨基，R 2为单价（卤代）烃基或卤素。还提供了制备这种聚硅氧烷的方法，提供该聚硅氧烷的含硅脂环族化合物和包含该聚硅氧烷的辐射敏感性树脂组合物。聚硅氧烷可用作抗蚀剂材料的树脂组分，有效地感测短波长的辐射，对辐射具有高透明度和优异的干蚀刻性能，并且抗蚀剂材料如高灵敏度，分辨率，显影性所需的基本抗蚀剂性能优异等等

2. 发明授权

US06846895B2 Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition 有权
标题翻译：聚硅氧烷，其制造方法，含硅脂环化合物和辐射敏感性树脂组合物
公开(公告)号：US06846895B2
公开(公告)日：2005-01-25
申请号：US10364351
申请日：2003-02-12
申请人： Haruo Iwasawa , Tsutomu Shimokawa , Akihiro Hayashi , Satoru Nishiyama
发明人： Haruo Iwasawa , Tsutomu Shimokawa , Akihiro Hayashi , Satoru Nishiyama
IPC分类号： C08G77/42 , C07F7/08 , C08G77/14 , C08G77/24 , C08L83/06 , C08L83/08 , G03F7/004 , G03F7/075 , C08G77/12
CPC分类号： C08L83/08 , C07F7/0838 , C08G77/14 , C08G77/24 , C08L83/06 , G03F7/0045 , G03F7/0757
摘要： A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), wherein A1 and A2 are an acid-dissociable monovalent organic group, R1 is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R2 is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.
摘要翻译：具有以下结构单元（I）和/或（II）和结构单元（III）的新型聚硅氧烷，其中A 1和A 2是酸解离的一价有机基团，R 1是氢，一价（卤代）烃，卤素或氨基，R 2是一价（卤代）烃基或卤素。还提供了制备这种聚硅氧烷的方法，提供该聚硅氧烷的含硅脂环族化合物和包含该聚硅氧烷的辐射敏感性树脂组合物。聚硅氧烷可用作抗蚀剂材料的树脂组分，有效地感测短波长的辐射，对辐射具有高透明度和优异的干蚀刻性能，并且抗蚀剂材料如高灵敏度，分辨率，显影性所需的基本抗蚀剂性能优异等等

3. 发明授权

US07244549B2 Pattern forming method and bilayer film 有权
标题翻译：图案形成方法和双层膜
公开(公告)号：US07244549B2
公开(公告)日：2007-07-17
申请号：US10226321
申请日：2002-08-23
申请人： Haruo Iwasawa , Akihiro Hayashi , Tsutomu Shimokawa , Kazuo Kawaguchi , Masato Tanaka
发明人： Haruo Iwasawa , Akihiro Hayashi , Tsutomu Shimokawa , Kazuo Kawaguchi , Masato Tanaka
IPC分类号： G03C1/825 , G03F7/039 , G03F7/20
CPC分类号： G03F7/091 , G03F7/0045 , G03F7/0757 , Y10S430/106
摘要： A pattern forming method comprising forming a coating of a radiation-sensitive resin composition, which contains an acid-dissociable group-containing polysiloxane, alkali-insoluble or scarcely alkali-soluble but becoming alkali-soluble when the acid-dissociable group dissociates, on a film containing a polymer with a carbon content of 80 wt % or more and a polystyrene-reduced weight average molecular weight of 500–100,000, an applying radiation to the coating is provided. The method can form minute patterns with a high aspect ratio by suitably selecting a specific etching gas in the dry etching process, without being affected by standing waves.
摘要翻译：一种图案形成方法，包括形成辐射敏感性树脂组合物的涂层，其包含含酸解离基团的聚硅氧烷，碱解不溶性或几乎不碱溶性，当酸解离基解离时变成碱溶性含有碳含量为80重量％以上且聚苯乙烯换算的重均分子量为500〜10000的聚合物的薄膜，提供了对涂层的涂布辐射。该方法可以通过在干蚀刻工艺中适当地选择特定的蚀刻气体而不受驻波的影响而形成具有高纵横比的微小图案。

4. 发明授权

US07288359B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US07288359B2
公开(公告)日：2007-10-30
申请号：US10309017
申请日：2002-12-04
申请人： Haruo Iwasawa , Akihiro Hayashi , Tsutomu Shimokawa
发明人： Haruo Iwasawa , Akihiro Hayashi , Tsutomu Shimokawa
IPC分类号： G03C1/73 , G03F7/039
CPC分类号： G03F7/0045 , C07C309/17 , C07C309/19 , C07C309/23 , C07C381/12 , C07C2602/42 , C07C2603/86 , C07D333/46 , C07D333/78 , C07D335/02 , C07D347/00 , G03F7/0392 , G03F7/0757 , Y10S430/106 , Y10S430/122 , Y10S430/126
摘要： A radiation-sensitive resin composition comprising (A) an acid-dissociable group-containing polysiloxane and (B) a photoacid generator containing trifluoromethane sulfonic acid or a compound which generates an acid of the following formula (I), wherein Rf individually represents a fluorine atom or a trifluoromethyl group, and Ra represents a hydrogen atom, a fluorine atom, a linear or branched alkyl group having 1-20 carbon atoms, or a linear or branched fluoroalkyl group having 1-20 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 3-20 carbon atoms, or a substituted or unsubstituted monovalent cyclic fluoro-hydrocarbon group having 3-20 carbon atoms. The radiation-sensitive resin composition of the present invention exhibits superior resolution, while maintaining high transparency to radiations and high dry etching resistance. The resin composition thus can greatly contribute to the lithography process that will become more and more minute in the future.
摘要翻译：一种辐射敏感性树脂组合物，其包含（A）含酸解离基的聚硅氧烷和（B）含有三氟甲磺酸的光酸产生剂或产生下式（I）的酸的化合物，其中Rf分别表示氟原子或三氟甲基，Ra表示氢原子，氟原子，具有1-20个碳原子的直链或支链烷基或具有1-20个碳原子的直链或支链氟代烷基，取代或未取代的一价环状具有3-20个碳原子的烃基，或具有3-20个碳原子的取代或未取代的一价环状氟代烃基。本发明的辐射敏感性树脂组合物表现出优异的分辨率，同时保持高的透光透明度和高耐干蚀刻性。因此，树脂组合物可以极大地有助于将来将变得越来越多的光刻工艺。

5. 发明申请

US20070248911A1 Pattern forming method and bilayer film 审中-公开
公开(公告)号：US20070248911A1
公开(公告)日：2007-10-25
申请号：US11808508
申请日：2007-06-11
申请人： Haruo Iwasawa , Akihiro Hayashi , Tsutomu Shimokawa , Kazuo Kawaguchi , Masato Tanaka
发明人： Haruo Iwasawa , Akihiro Hayashi , Tsutomu Shimokawa , Kazuo Kawaguchi , Masato Tanaka
IPC分类号： G03C1/72
CPC分类号： G03F7/091 , G03F7/0045 , G03F7/0757 , Y10S430/106
摘要： A pattern forming method comprising forming a coating of a radiation-sensitive resin composition, which contains an acid-dissociable group-containing polysiloxane, alkali-insoluble or scarcely alkali-soluble but becoming alkali-soluble when the acid-dissociable group dissociates, on a film containing a polymer with a carbon content of 80 wt % or more and a polystyrene-reduced weight average molecular weight of 500-100,000, an applying radiation to the coating is provided. The method can form minute patterns with a high aspect ratio by suitably selecting a specific etching gas in the dry etching process, without being affected by standing waves.

6. 发明授权

US07108955B2 Polysiloxane, process for production thereof and radiation-sensitive resin composition 有权
标题翻译：聚硅氧烷，其制造方法和辐射敏感性树脂组合物
公开(公告)号：US07108955B2
公开(公告)日：2006-09-19
申请号：US10476453
申请日：2002-04-30
申请人： Haruo Iwasawa , Akihiro Hayashi , Tsutomu Shimokawa , Masafumi Yamamoto
发明人： Haruo Iwasawa , Akihiro Hayashi , Tsutomu Shimokawa , Masafumi Yamamoto
IPC分类号： G03C1/73
CPC分类号： G03F7/0397 , C08G77/08 , C08G77/24 , G03F7/0045 , G03F7/0046 , G03F7/0757
摘要： A novel polysiloxane having high transparency to radiations with a wavelength of 193 nm or less, particularly 157 nm or less, and exhibiting superior dry etching resistance and a radiation-sensitive resin composition comprising the polysiloxane exhibiting superior sensitivity, resolution, and the like are provided. The polysiloxane is a resin having the structural unit (I) and/or structural unit (II) of the following formula (1), and having an acid-dissociable group, wherein R1 represents a monovalent aromatic group substituted with a fluorine atom or a fluoroalkyl group or a monovalent aliphatic group substituted with a fluorine atom or a fluoroalkyl group and R2 represents the above a monovalent aromatic group, the above monovalent aliphatic group, a hydrogen atom, a monovalent hydrocarbon group, haloalkyl group, or amino group. The radiation-sensitive resin composition (A) comprises the polysiloxane (A) and the photoacid generator (B)
摘要翻译：提供了具有193nm以下，特别是157nm以下的波长的高透明度，表现出优异的耐干蚀刻性的新颖的聚硅氧烷和包含显示出优异的灵敏度，分辨率等的聚硅氧烷的辐射敏感性树脂组合物。聚硅氧烷是具有下式（1）的结构单元（I）和/或结构单元（II），具有酸解离基团的树脂，其中R 1表示单价芳族被氟原子或氟代烷基取代的基团或被氟原子或氟代烷基取代的一价脂肪族基团，R 2表示上述一价芳族基团，上述一价脂肪族基团，氢原子，一价烃基，卤代烷基或氨基。辐射敏感性树脂组合物（A）含有聚硅氧烷（A）和光致酸产生剂（B）

7. 发明授权

US07473443B2 Composition for forming silicon film and method for forming silicon film 有权
标题翻译：用于形成硅膜的组合物和形成硅膜的方法
公开(公告)号：US07473443B2
公开(公告)日：2009-01-06
申请号：US10515728
申请日：2003-08-15
申请人： Yasuo Matsuki , Haruo Iwasawa , Hitoshi Kato
发明人： Yasuo Matsuki , Haruo Iwasawa , Hitoshi Kato
IPC分类号： B05D3/06 , B05D3/02
CPC分类号： C23C24/10 , C23C26/02 , C30B7/005 , H01L21/02422 , H01L21/02532 , H01L21/02601 , H01L21/02628 , H01L21/02667 , H01L21/02686
摘要： There are provided a silicon-film-forming composition containing silicon particles and a dispersion medium and a method for forming a silicon film by forming a coating film of the silicon-film-forming composition on a substrate and subjecting the coating film to instantaneous fusion, a heat treatment or a light treatment. According to the composition and the method, a polysilicon film with a desired thickness which may be used as a silicon film for a solar battery can be formed efficiently and easily.
摘要翻译：提供一种含有硅颗粒和分散介质的硅膜形成组合物，以及通过在基片上形成硅膜形成组合物的涂膜并对涂膜进行即时熔合而形成硅膜的方法，热处理或光处理。根据组成和方法，可以有效且容易地形成可用作太阳能电池的硅膜的具有期望厚度的多晶硅膜。

8. 发明申请

US20060159859A1 Silane polymer and method for forming silicon film 审中-公开
标题翻译：硅烷聚合物和形成硅膜的方法
公开(公告)号：US20060159859A1
公开(公告)日：2006-07-20
申请号：US10560527
申请日：2004-06-11
申请人： Haruo Iwasawa
发明人： Haruo Iwasawa
IPC分类号： B05D3/02 , B05D3/06 , C08G77/00 , B32B27/00
CPC分类号： C09D183/16 , C01B33/08 , C09D4/00 , H01L21/02422 , H01L21/02425 , H01L21/02532 , H01L21/02576 , H01L21/02579 , H01L21/02628 , C08G77/00
摘要： There are provided a silane polymer having a higher molecular weight from the viewpoints of wettability when applied to a substrate, a boiling point and safety, a composition which can form a high-quality silicon film easily, a silicon film forming composition which comprises a silane polymer obtained by irradiating a photopolymerizable silane compound with light of specific wavelength range to photopolymerize it, and a method for forming a silicon film which comprises applying the composition to a substrate and subjecting the coating film to a heat treatment and/or a light treatment.
摘要翻译：从涂布在基材上的润湿性，沸点和安全性的观点出发，提供了具有较高分子量的硅烷聚合物，可以容易地形成高质量硅膜的组合物，包含硅烷通过用特定波长范围的光照射光聚合性硅烷化合物而获得的聚合物进行光聚合;以及形成硅膜的方法，其包括将该组合物涂布在基材上，对该涂膜进行热处理和/或光处理。

9. 发明授权

US07718228B2 Composition for forming silicon-cobalt film, silicon-cobalt film and method for forming same 有权
标题翻译：用于形成硅 - 钴膜的组合物，硅 - 钴膜及其形成方法
公开(公告)号：US07718228B2
公开(公告)日：2010-05-18
申请号：US10575478
申请日：2004-10-06
申请人： Yasuo Matsuki , Daohai Wang , Tatsuya Sakai , Haruo Iwasawa
发明人： Yasuo Matsuki , Daohai Wang , Tatsuya Sakai , Haruo Iwasawa
IPC分类号： B05D3/02
CPC分类号： H01L21/28518 , C07F17/02 , C23C18/1204 , C23C18/14
摘要： There are provided a composition and method for forming a silicon-cobalt film at low production cost without expensive vacuum equipment and high-frequency generator. The composition is a silicon-cobalt film forming composition comprising a silicon compound and a cobalt compound. A silicon-cobalt film is formed by applying this composition on a substrate and subjecting the resulting substrate to a heat treatment and/or a light treatment.
摘要翻译：提供了一种低成本的用于形成硅 - 钴膜的组合物和方法，而不需要昂贵的真空设备和高频发生器。该组合物是包含硅化合物和钴化合物的硅 - 钴膜形成组合物。通过将该组合物涂布在基板上并使所得到的基板进行热处理和/或光处理而形成硅 - 钴膜。

10. 发明授权

US07223802B2 High order silane composition, and method of forming silicon film using the composition 有权
标题翻译：高级硅烷组合物，以及使用该组合物形成硅膜的方法
公开(公告)号：US07223802B2
公开(公告)日：2007-05-29
申请号：US10420521
申请日：2003-04-22
申请人： Takashi Aoki , Masahiro Furusawa , Yasuo Matsuki , Haruo Iwasawa , Yasumasa Kateuchi
发明人： Takashi Aoki , Masahiro Furusawa , Yasuo Matsuki , Haruo Iwasawa , Yasumasa Kateuchi
IPC分类号： C08F2/46 , H01L21/20
CPC分类号： C08G77/60 , C01B33/04 , C09D183/16 , H01L21/02422 , H01L21/02532 , H01L21/02628
摘要： It is an object of the present invention to provide a high order silane composition that contains a polysilane having a higher molecular weight than conventionally, this being from the viewpoints of wettability when applying onto a substrate, boiling point and safety, and hence in particular enables a high-quality silicon film to be formed easily, and also a method of forming an excellent silicon film using the composition. The present invention attains this object by providing a high order silane composition containing a polysilane obtained through photopolymerization by irradiating a solution of a photopolymerizable silane or a photopolymerizable like-liquid silane with ultraviolet light. Moreover, the present invention provides a method of forming a silicon film comprising the step of applying such a high order silane composition onto a substrate.
摘要翻译：本发明的目的是提供一种高分子量硅烷组合物，其含有比常规高的分子量的聚硅烷，这是从涂布在基材上的润湿性，沸点和安全性的观点出发的，因此特别地使能容易形成的高质量硅膜，以及使用该组合物形成优异的硅膜的方法。本发明通过提供通过光可聚合硅烷或可光聚合的类似液体硅烷的溶液用紫外光照射而通过光聚合获得的含有聚硅烷的高级硅烷组合物达到该目的。此外，本发明提供一种形成硅膜的方法，其包括将这种高级硅烷组合物施加到基底上的步骤。

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