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    • 7. 发明申请
    • DISTANCE MEASUREMENT DEVICE
    • 距离测量装置
    • US20140327903A1
    • 2014-11-06
    • US14357817
    • 2012-08-21
    • Mitsuhito MaseTakashi SuzukiJun Hiramitsu
    • Mitsuhito MaseTakashi SuzukiJun Hiramitsu
    • G01S7/486
    • G01S7/4861G01S7/4863G01S17/89
    • In a distance measurement device of an embodiment, a light source emits modulation light in a first charge transfer cycle, and emission of the modulation light of the light source is stopped in a second charge transfer cycle. In each of the first and second charge transfer cycles, the charges generated in a photosensitive region are distributed to a first accumulation region and a second accumulation region. A first value is obtained based on readout values corresponding to amounts of accumulated charges of the first accumulation region. A second value is obtained based on readout values corresponding to amounts of accumulated charges of the second accumulation region. A distance is calculated based on the first value and the second value.
    • 在实施例的距离测量装置中,光源在第一电荷转移周期中发射调制光,并且在第二电荷转移周期中停止光源的调制光的发射。 在第一和第二电荷转移循环中的每一个中,在感光区域中产生的电荷被分配到第一累积区域和第二累积区域。 基于与第一累积区域的累积电荷量对应的读出值获得第一值。 基于对应于第二累积区域的累积电荷量的读出值获得第二值。 基于第一值和第二值计算距离。
    • 8. 发明授权
    • Range sensor and range image sensor
    • 量程传感器和量程图像传感器
    • US08598674B2
    • 2013-12-03
    • US13498202
    • 2010-11-18
    • Mitsuhito MaseTakashi SuzukiTomohiro Yamazaki
    • Mitsuhito MaseTakashi SuzukiTomohiro Yamazaki
    • H01L27/146G01C3/08
    • H01L27/14643G01S7/4814G01S7/4816G01S7/4863G01S17/89H01L27/14603H01L27/1464
    • A range image sensor 1 is provided with a semiconductor substrate 1A having a light incident surface 1BK and a surface 1FT opposite to the light incident surface 1BK, a photogate electrode PG, first and second gate electrodes TX1, TX2, first and second semiconductor regions FD1, FD2, and a third semiconductor region SR1. The photogate electrode PG is provided on the surface 1FT. The first and second gate electrodes TX1, TX2 are provided next to the photogate electrode PG The first and second semiconductor regions FD1, FD2 accumulate respective charges flowing into regions immediately below the respective gate electrodes TX1, TX2. The third semiconductor region SR1 is located away from the first and second semiconductor regions FD1, FD2 and on the light incident surface 1BK side and has the conductivity type opposite to that of the first and second semiconductor regions FD1, FD2.
    • 范围图像传感器1设置有具有光入射表面1BK和与光入射表面1BK相对的表面1FT的半导体衬底1A,光栅电极PG,第一和第二栅电极TX1,TX2,第一和第二半导体区域FD1 ,FD2和第三半导体区域SR1。 光栅电极PG设置在表面1FT上。 第一和第二栅电极TX1,TX2设置在光栅电极PG的旁边。第一和第二半导体区域FD1,FD2累积流入各栅极电极TX1,TX2正下方的各个电荷。 第三半导体区域SR1远离第一和第二半导体区域FD1,FD2以及光入射面1BK侧,并且具有与第一和第二半导体区域FD1,FD2相反的导电类型。
    • 10. 发明授权
    • Range sensor and range image sensor
    • 量程传感器和量程图像传感器
    • US09134423B2
    • 2015-09-15
    • US13497350
    • 2010-10-26
    • Takashi SuzukiMitsuhito Mase
    • Takashi SuzukiMitsuhito Mase
    • H04N7/18G01S17/89G01B11/02G01B11/00G01S17/10G01S7/486G01S11/12H01L27/146
    • G01S17/89G01B11/002G01B11/022G01S7/4863G01S11/12G01S17/10H01L27/14603H04N7/18
    • A photogate electrode PG has first and second sides opposed to each other. First and second semiconductor regions FD1, FD2 are arranged as spatially separated from each other on the side where the first side of the photogate electrode PG exists and along the first side. Third and fourth semiconductor regions FD3, FD4 are arranged as spatially separated from each other on the side where the second side of the photogate electrode PG exists and along the second side. First gate electrodes TX1 are provided between the photogate electrode PG and the first and third semiconductor regions FD1, FD3. Second gate electrodes TX2 are provided between the photogate electrode PG and the second and fourth semiconductor regions FD2, FD4. The first to fourth semiconductor regions FD1-FD4 are formed so as to overlap with respective p-type well regions W1-W4 and so as to be surrounded by the respective well regions W1-W4.
    • 光栅电极PG具有彼此相对的第一和第二侧。 第一和第二半导体区域FD1,FD2被布置为在光栅电极PG的第一侧存在并且沿着第一侧在空间上彼此分离。 第三和第四半导体区域FD3,FD4被布置为在光栅电极PG的第二面存在并且沿着第二面在空间上彼此分离。 第一栅电极TX1设置在光栅电极PG与第一和第三半导体区域FD1,FD3之间。 第二栅极TX2设置在光栅电极PG与第二和第四半导体区域FD2,FD4之间。 第一至第四半导体区域FD1-FD4形成为与相应的p型阱区域W1-W4重叠并且被各个阱区域W1-W4包围。