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    • 1. 发明申请
    • DISTANCE MEASUREMENT DEVICE
    • 距离测量装置
    • US20140327903A1
    • 2014-11-06
    • US14357817
    • 2012-08-21
    • Mitsuhito MaseTakashi SuzukiJun Hiramitsu
    • Mitsuhito MaseTakashi SuzukiJun Hiramitsu
    • G01S7/486
    • G01S7/4861G01S7/4863G01S17/89
    • In a distance measurement device of an embodiment, a light source emits modulation light in a first charge transfer cycle, and emission of the modulation light of the light source is stopped in a second charge transfer cycle. In each of the first and second charge transfer cycles, the charges generated in a photosensitive region are distributed to a first accumulation region and a second accumulation region. A first value is obtained based on readout values corresponding to amounts of accumulated charges of the first accumulation region. A second value is obtained based on readout values corresponding to amounts of accumulated charges of the second accumulation region. A distance is calculated based on the first value and the second value.
    • 在实施例的距离测量装置中,光源在第一电荷转移周期中发射调制光,并且在第二电荷转移周期中停止光源的调制光的发射。 在第一和第二电荷转移循环中的每一个中,在感光区域中产生的电荷被分配到第一累积区域和第二累积区域。 基于与第一累积区域的累积电荷量对应的读出值获得第一值。 基于对应于第二累积区域的累积电荷量的读出值获得第二值。 基于第一值和第二值计算距离。
    • 4. 发明授权
    • Range sensor and range image sensor
    • 量程传感器和量程图像传感器
    • US08598674B2
    • 2013-12-03
    • US13498202
    • 2010-11-18
    • Mitsuhito MaseTakashi SuzukiTomohiro Yamazaki
    • Mitsuhito MaseTakashi SuzukiTomohiro Yamazaki
    • H01L27/146G01C3/08
    • H01L27/14643G01S7/4814G01S7/4816G01S7/4863G01S17/89H01L27/14603H01L27/1464
    • A range image sensor 1 is provided with a semiconductor substrate 1A having a light incident surface 1BK and a surface 1FT opposite to the light incident surface 1BK, a photogate electrode PG, first and second gate electrodes TX1, TX2, first and second semiconductor regions FD1, FD2, and a third semiconductor region SR1. The photogate electrode PG is provided on the surface 1FT. The first and second gate electrodes TX1, TX2 are provided next to the photogate electrode PG The first and second semiconductor regions FD1, FD2 accumulate respective charges flowing into regions immediately below the respective gate electrodes TX1, TX2. The third semiconductor region SR1 is located away from the first and second semiconductor regions FD1, FD2 and on the light incident surface 1BK side and has the conductivity type opposite to that of the first and second semiconductor regions FD1, FD2.
    • 范围图像传感器1设置有具有光入射表面1BK和与光入射表面1BK相对的表面1FT的半导体衬底1A,光栅电极PG,第一和第二栅电极TX1,TX2,第一和第二半导体区域FD1 ,FD2和第三半导体区域SR1。 光栅电极PG设置在表面1FT上。 第一和第二栅电极TX1,TX2设置在光栅电极PG的旁边。第一和第二半导体区域FD1,FD2累积流入各栅极电极TX1,TX2正下方的各个电荷。 第三半导体区域SR1远离第一和第二半导体区域FD1,FD2以及光入射面1BK侧,并且具有与第一和第二半导体区域FD1,FD2相反的导电类型。
    • 5. 发明授权
    • Range sensor and range image sensor
    • 量程传感器和量程图像传感器
    • US09494688B2
    • 2016-11-15
    • US13810519
    • 2011-06-16
    • Mitsuhito MaseTakashi Suzuki
    • Mitsuhito MaseTakashi Suzuki
    • G01C3/08G01S17/89G01S7/486
    • G01S17/89G01S7/4863
    • A light receiving region has a planar shape of a rectangular shape having a pair of long sides opposed to each other in a first direction and a pair of short sides opposed to each other in a second direction. First and second semiconductor regions are arranged as spatially separated from each other along the respective long sides. First and second gate electrodes are arranged each between the corresponding semiconductor region and the light receiving region. Third gate electrodes are arranged as spatially separated from each other between the first and second gate electrodes arranged along the long sides. Each of the third gate electrodes has a first electrode portion located between a third semiconductor region and the light receiving region, and a second electrode portion overlapping with the light receiving region and having a width in the second direction smaller than that of the first electrode portion.
    • 光接收区域具有矩形形状的平面形状,其具有在第一方向上彼此相对的一对长边和在第二方向上彼此相对的一对短边。 第一半导体区域和第二半导体区域沿着相应的长边方向彼此空间地布置。 第一和第二栅电极分别布置在对应的半导体区域和光接收区域之间。 在沿长边布置的第一和第二栅电极之间,第三栅极电极彼此空间上分开布置。 每个第三栅极具有位于第三半导体区域和光接收区域之间的第一电极部分和与光接收区域重叠并且具有比第一电极部分的宽度小的第二方向的第二电极部分 。
    • 6. 发明授权
    • Distance measurement device
    • 距离测量装置
    • US09151831B2
    • 2015-10-06
    • US14357817
    • 2012-08-21
    • Mitsuhito MaseTakashi SuzukiJun Hiramitsu
    • Mitsuhito MaseTakashi SuzukiJun Hiramitsu
    • G01S7/486G01S17/89
    • G01S7/4861G01S7/4863G01S17/89
    • In a distance measurement device of an embodiment, a light source emits modulation light in a first charge transfer cycle, and emission of the modulation light of the light source is stopped in a second charge transfer cycle. In each of the first and second charge transfer cycles, the charges generated in a photosensitive region are distributed to a first accumulation region and a second accumulation region. A first value is obtained based on readout values corresponding to amounts of accumulated charges of the first accumulation region. A second value is obtained based on readout values corresponding to amounts of accumulated charges of the second accumulation region. A distance is calculated based on the first value and the second value.
    • 在实施例的距离测量装置中,光源在第一电荷转移周期中发射调制光,并且在第二电荷转移周期中停止光源的调制光的发射。 在第一和第二电荷转移循环中的每一个中,在感光区域中产生的电荷被分配到第一累积区域和第二累积区域。 基于与第一累积区域的累积电荷量对应的读出值获得第一值。 基于对应于第二累积区域的累积电荷量的读出值获得第二值。 基于第一值和第二值计算距离。
    • 8. 发明授权
    • Range sensor and range image sensor
    • 量程传感器和量程图像传感器
    • US08653619B2
    • 2014-02-18
    • US13487514
    • 2012-06-04
    • Mitsuhito MaseTakashi SuzukiTomohiro Yamazaki
    • Mitsuhito MaseTakashi SuzukiTomohiro Yamazaki
    • H01L31/0224H01L27/146
    • H01L27/14643G01S7/4814G01S7/4816G01S7/4863G01S17/89H01L27/14603H01L27/1464
    • A range image sensor 1 is provided with a semiconductor substrate 1A having a light incident surface 1BK and a surface 1FT opposite to the light incident surface 1BK, a photogate electrode PG, first and second gate electrodes TX1, TX2, first and second semiconductor regions FD1, FD2, and a third semiconductor region SR1. The photogate electrode PG is provided on the surface 1FT. The first and second gate electrodes TX1, TX2 are provided next to the photogate electrode PG. The first and second semiconductor regions FD1, FD2 accumulate respective charges flowing into regions immediately below the respective gate electrodes TX1, TX2. The third semiconductor region SR1 is located away from the first and second semiconductor regions FD1, FD2 and on the light incident surface 1BK side and has the conductivity type opposite to that of the first and second semiconductor regions FD1, FD2.
    • 范围图像传感器1设置有具有光入射表面1BK和与光入射表面1BK相对的表面1FT的半导体衬底1A,光栅电极PG,第一和第二栅电极TX1,TX2,第一和第二半导体区域FD1 ,FD2和第三半导体区域SR1。 光栅电极PG设置在表面1FT上。 第一和第二栅电极TX1,TX2设置在光栅电极PG的旁边。 第一和第二半导体区域FD1,FD2累积流入各栅极电极TX1,TX2正下方的各个电荷。 第三半导体区域SR1远离第一和第二半导体区域FD1,FD2以及光入射面1BK侧,并且具有与第一和第二半导体区域FD1,FD2相反的导电类型。