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    • 1. 发明申请
    • Surface emitting type optical semiconductor device
    • 表面发射型光半导体器件
    • US20070047607A1
    • 2007-03-01
    • US11387315
    • 2006-03-23
    • Mitsuhiro KushibeMizunori EzakiRei HashimotoMichihiko Nishigaki
    • Mitsuhiro KushibeMizunori EzakiRei HashimotoMichihiko Nishigaki
    • H01S5/00
    • H01S5/18308H01S5/0425H01S5/18394H01S5/2063
    • It makes possible to inject a current into the current confinement region substantially uniformly. A surface emitting type optical semiconductor device includes a semiconductor active layer provided above a substrate; a first and second reflecting mirror layers sandwiching the semiconductor active layer to form an optical cavity in a direction perpendicular to the substrate; a plurality of current confinement regions provided in the second reflecting mirror layer so as to be separated by an impurity region having impurities; a semiconductor current diffusion layer provided on the second reflecting mirror layer so as to cover the current confinement regions; and an electrode portion which injects a current into the semiconductor active layer. The electrode portion comprising a first electrode provided on the semiconductor current diffusion layer so as to surround the current confinement regions and a second electrode provided on an opposite side of the substrate from the semiconductor active layer.
    • 可以将电流基本均匀地注入电流限制区域。 表面发射型光学半导体器件包括设置在衬底上的半导体有源层; 夹着所述半导体有源层以在垂直于所述基板的方向上形成光腔的第一和第二反射镜层; 多个电流限制区,设置在所述第二反射镜层中,以被具有杂质的杂质区分离; 半导体电流扩散层,设置在所述第二反射镜层上以覆盖所述电流限制区域; 以及向半导体活性层注入电流的电极部。 电极部分包括设置在半导体电流扩散层上以围绕电流限制区域的第一电极和设置在与半导体活性层相反的衬底相对侧上的第二电极。
    • 2. 发明授权
    • Surface emitting type optical semiconductor device
    • 表面发射型光半导体器件
    • US07830937B2
    • 2010-11-09
    • US12191181
    • 2008-08-13
    • Mitsuhiro KushibeMizunori EzakiRei HashimotoMichihiko Nishigaki
    • Mitsuhiro KushibeMizunori EzakiRei HashimotoMichihiko Nishigaki
    • H01S5/00
    • H01S5/18308H01S5/0425H01S5/18394H01S5/2063
    • It makes possible to inject a current into the current confinement region substantially uniformly. A surface emitting type optical semiconductor device includes a semiconductor active layer provided above a substrate; a first and second reflecting mirror layers sandwiching the semiconductor active layer to form an optical cavity in a direction perpendicular to the substrate; a plurality of current confinement regions provided in the second reflecting mirror layer so as to be separated by an impurity region having impurities; a semiconductor current diffusion layer provided on the second reflecting mirror layer so as to cover the current confinement regions; and an electrode portion which injects a current into the semiconductor active layer. The electrode portion comprising a first electrode provided on the semiconductor current diffusion layer so as to surround the current confinement regions and a second electrode provided on an opposite side of the substrate from the semiconductor active layer.
    • 可以将电流基本均匀地注入电流限制区域。 表面发射型光学半导体器件包括设置在衬底上的半导体有源层; 夹着所述半导体有源层以在垂直于所述基板的方向上形成光腔的第一和第二反射镜层; 多个电流限制区,设置在所述第二反射镜层中,以被具有杂质的杂质区分离; 半导体电流扩散层,设置在所述第二反射镜层上以覆盖所述电流限制区域; 以及向半导体活性层注入电流的电极部。 电极部分包括设置在半导体电流扩散层上以围绕电流限制区域的第一电极和设置在与半导体活性层相反的衬底相对侧上的第二电极。
    • 3. 发明申请
    • SURFACE EMITTING TYPE OPTICAL SEMICONDUCTOR DEVICE
    • 表面发射型光学半导体器件
    • US20080317081A1
    • 2008-12-25
    • US12191181
    • 2008-08-13
    • Mitsuhiro KushibeMizunori EzakiRei HashimotoMichihiko Nishigaki
    • Mitsuhiro KushibeMizunori EzakiRei HashimotoMichihiko Nishigaki
    • H01S5/18H01S5/00
    • H01S5/18308H01S5/0425H01S5/18394H01S5/2063
    • It makes possible to inject a current into the current confinement region substantially uniformly. A surface emitting type optical semiconductor device includes a semiconductor active layer provided above a substrate; a first and second reflecting mirror layers sandwiching the semiconductor active layer to form an optical cavity in a direction perpendicular to the substrate; a plurality of current confinement regions provided in the second reflecting mirror layer so as to be separated by an impurity region having impurities; a semiconductor current diffusion layer provided on the second reflecting mirror layer so as to cover the current confinement regions; and an electrode portion which injects a current into the semiconductor active layer. The electrode portion comprising a first electrode provided on the semiconductor current diffusion layer so as to surround the current confinement regions and a second electrode provided on an opposite side of the substrate from the semiconductor active layer.
    • 可以将电流基本均匀地注入电流限制区域。 表面发射型光学半导体器件包括设置在衬底上的半导体有源层; 夹着所述半导体有源层以在垂直于所述基板的方向上形成光腔的第一和第二反射镜层; 多个电流限制区,设置在所述第二反射镜层中,以被具有杂质的杂质区分离; 半导体电流扩散层,设置在所述第二反射镜层上以覆盖所述电流限制区域; 以及向半导体活性层注入电流的电极部。 电极部分包括设置在半导体电流扩散层上以围绕电流限制区域的第一电极和设置在与半导体活性层相反的衬底相对侧上的第二电极。
    • 4. 发明授权
    • Surface emitting type optical semiconductor device
    • 表面发射型光半导体器件
    • US07426228B2
    • 2008-09-16
    • US11387315
    • 2006-03-23
    • Mitsuhiro KushibeMizunori EzakiRei HashimotoMichihiko Nishigaki
    • Mitsuhiro KushibeMizunori EzakiRei HashimotoMichihiko Nishigaki
    • H01S5/00
    • H01S5/18308H01S5/0425H01S5/18394H01S5/2063
    • It makes possible to inject a current into the current confinement region substantially uniformly. A surface emitting type optical semiconductor device includes a semiconductor active layer provided above a substrate; a first and second reflecting mirror layers sandwiching the semiconductor active layer to form an optical cavity in a direction perpendicular to the substrate; a plurality of current confinement regions provided in the second reflecting mirror layer so as to be separated by an impurity region having impurities; a semiconductor current diffusion layer provided on the second reflecting mirror layer so as to cover the current confinement regions; and an electrode portion which injects a current into the semiconductor active layer. The electrode portion comprising a first electrode provided on the semiconductor current diffusion layer so as to surround the current confinement regions and a second electrode provided on an opposite side of the substrate from the semiconductor active layer.
    • 可以将电流基本均匀地注入电流限制区域。 表面发射型光学半导体器件包括设置在衬底上的半导体有源层; 夹着所述半导体有源层以在垂直于所述基板的方向上形成光腔的第一和第二反射镜层; 多个电流限制区,设置在所述第二反射镜层中,以被具有杂质的杂质区分离; 半导体电流扩散层,设置在所述第二反射镜层上以覆盖所述电流限制区域; 以及向半导体活性层注入电流的电极部。 电极部分包括设置在半导体电流扩散层上以围绕电流限制区域的第一电极和设置在与半导体活性层相反的衬底相对侧上的第二电极。
    • 7. 发明授权
    • Laminated semiconductor substrate and optical semiconductor element
    • 层压半导体衬底和光学半导体元件
    • US07276735B2
    • 2007-10-02
    • US10884141
    • 2004-07-02
    • Mitsuhiro KushibeYasuo OhbaRei HashimotoKeiji Takaoka
    • Mitsuhiro KushibeYasuo OhbaRei HashimotoKeiji Takaoka
    • H01L29/201
    • H01L33/32H01L33/06
    • A low-cost high-property optical semiconductor element for a long wavelength is provided, using a GaAs substrate. The optical semiconductor element comprises a substrate of GaAs having a first surface and a second surface opposite to each other, a buffer layer of InjGa1-jAs1-kNk (0≦j≦1, 0.002≦k≦0.05) formed on the first surface of the substrate, a first conductive type clad layer formed on the buffer layer, an active layer formed on the first conductive type clad layer and comprising a well layer of InzGa1-zAs (0≦z≦1), the well layer having a smaller bandgap than the first conductive type clad layer, the active layer having a thickness of more than its critical thickness for the substrate based upon equilibrium theories, and a second conductive type clad layer formed on the active layer and having a larger bandgap than the well layer.
    • 使用GaAs衬底提供了用于长波长的低成本高性能光学半导体元件。 该光学半导体元件包括具有彼此相对的第一表面和第二表面的GaAs衬底,具有第一表面和第二表面的第二表面, 形成在基板的第一表面上的1-k N N(0 <= j <= 1,0.002 <= k <= 0.05),形成在基板的第一表面上的第一导电型覆盖层 所述缓冲层,形成在所述第一导电型覆盖层上的有源层,并且包括阱层,所述阱层具有In(z) ),所述阱层具有比所述第一导电型覆盖层更小的带隙,所述有源层的厚度大于其基于平衡理论的基板的临界厚度,以及形成在所述有源层上的第二导电型覆盖层和 具有比阱层更大的带隙。
    • 9. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING SAME
    • 半导体发光器件及其制造方法
    • US20110049541A1
    • 2011-03-03
    • US12719464
    • 2010-03-08
    • Hiroshi KatsunoYasuo OhbaKei KanekoMitsuhiro Kushibe
    • Hiroshi KatsunoYasuo OhbaKei KanekoMitsuhiro Kushibe
    • H01L33/02H01L33/12H01L33/00
    • H01L33/405H01L33/0079
    • A semiconductor light emitting device, includes: a stacked structural unit including a first semiconductor layer of a first conductivity type, a second semiconductor layer of a second conductivity type, and a light emitting layer provided therebetween; and an electrode including a first and second metal layers, the first metal layer including silver or silver alloy and being provided on a side of the second semiconductor layer opposite to the light emitting layer, the second metal layer including at least one element selected from gold, platinum, palladium, rhodium, iridium, ruthenium, and osmium and being provided on a side of the first metal layer opposite to the second semiconductor layer. A concentration of the element in a region including an interface between the first and second semiconductor layers is higher than that of the element in a region of the first metal layer distal to the interface.
    • 一种半导体发光器件,包括:堆叠结构单元,包括第一导电类型的第一半导体层,第二导电类型的第二半导体层和设置在其间的发光层; 以及包括第一和第二金属层的电极,所述第一金属层包括银或银合金,并且设置在与所述发光层相对的所述第二半导体层的一侧,所述第二金属层包括选自金的至少一种元素 ,铂,钯,铑,铱,钌和锇,并且设置在与第二半导体层相对的第一金属层的一侧。 包括第一和第二半导体层之间的界面的区域中的元素的浓度高于在第一金属层远离界面的区域中的元素的浓度。
    • 10. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING DEVICE AND WAFER
    • 半导体发光器件和散热器
    • US20100059734A1
    • 2010-03-11
    • US12505053
    • 2009-07-17
    • Kei KANEKOYasuo OHBAHiroshi KATSUNOMitsuhiro Kushibe
    • Kei KANEKOYasuo OHBAHiroshi KATSUNOMitsuhiro Kushibe
    • H01L33/00
    • H01L33/0025H01L33/06H01L33/325
    • A semiconductor light emitting device includes a first layer made of at least one of n-type GaN and n-type AlGaN; a second layer made of Mg-containing p-type AlGaN; and a light emitting section provided between the first layer and the second layer. The light emitting section included a plurality of barrier layers made of Si-containing AlxGa1−x−yInyN (0≦x, 0≦y, x+y≦1), and a well layer provided between each pair of the plurality of barrier layers and made of GaInN or AlGaInN. The plurality of barrier layers have a nearest barrier layer and a far barrier layer. The nearest barrier layer is nearest to the second layer among the plurality of barrier layers. The nearest barrier layer includes a first portion and a second portion. The first portion is made of Si-containing AlxGa1−x−yInyN (0≦x, 0≦y, x+y≦1). The second portion is provided between the first portion and the second layer and is made of AlxGa1−x−yInyN (0≦x, 0≦y, x+y≦1). The Si concentration in the second portion is lower than a Si concentration in the first portion and lower than a Si concentration in the far barrier layer.
    • 半导体发光器件包括由n型GaN和n型AlGaN中的至少一种构成的第一层; 由含Mg的p型AlGaN制成的第二层; 以及设置在第一层和第二层之间的发光部。 发光部包括由含Si的Al x Ga 1-x-y In y N(0&nl; x,0&nl; y,x + y&nlE; 1)构成的多个阻挡层,以及设置在每对多个阻挡层 并由GaInN或AlGaInN制成。 多个阻挡层具有最近的阻挡层和远的阻挡层。 最近的阻挡层最接近多个阻挡层中的第二层。 最近的阻挡层包括第一部分和第二部分。 第一部分由含Si的Al x Ga 1-x-y In y N(0&nl; x,0&nl; y,x + y&nlE; 1)制成。 第二部分设置在第一部分和第二层之间,并由Al x Ga 1-x-y In y N(0&lt; n 1; x,0&n 1; y,x + y和n 1; 1)制成。 第二部分中的Si浓度低于第一部分中的Si浓度,并且低于远阻隔层中的Si浓度。