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    • 1. 发明授权
    • Combination load lock for handling workpieces
    • 用于处理工件的组合装载锁
    • US07828504B2
    • 2010-11-09
    • US11432923
    • 2006-05-12
    • Michel PharandKlaus BeckerKlaus PetryMarvin R. LaFontaineMichael R. Mitrano
    • Michel PharandKlaus BeckerKlaus PetryMarvin R. LaFontaineMichael R. Mitrano
    • H01L21/677
    • H01L21/67201H01L21/67265H01L21/67294H01L21/67748
    • A combination load lock apparatus is provided, wherein a chamber is coupled to two or more valves in selective fluid communication with two or more respective volumes. A support member for supporting a workpiece is disposed within an interior portion of the chamber, wherein a translation apparatus is operably coupled thereto. The translation apparatus is operable to rotate and/or translate the workpiece on the support member about and/or along a first axis, wherein a detection apparatus associated with the chamber is operable to detect one or more characteristics of the workpiece during the rotation and/or translation thereof. The workpiece may be further rotated in a predetermined manner based on the one or more detected characteristics. A recess is further defined in the interior portion of the chamber, wherein the translation apparatus is operable to translate the workpiece into and out of the recess to reduce particulate contamination thereon.
    • 提供一种组合式加载锁定装置,其中腔室与两个或更多个相应体积选择性流体连通的两个或更多个阀联接。 用于支撑工件的支撑构件设置在腔室的内部部分内,其中平移装置可操作地联接到其上。 翻译装置可操作以沿着第一轴线旋转和/或平移在支撑构件上的工件,其中与腔室相关联的检测装置可操作以在旋转期间检测工件的一个或多个特性,和/ 或其翻译。 可以基于一个或多个检测到的特性以预定方式进一步旋转工件。 在腔室的内部部分中进一步限定凹部,其中平移装置可操作以将工件平移到凹槽中并减少其中的颗粒污染物。
    • 2. 发明申请
    • Combination load lock for handling workpieces
    • 用于处理工件的组合装载锁
    • US20070264105A1
    • 2007-11-15
    • US11432923
    • 2006-05-12
    • Michel PharandKlaus BeckerKlaus PetryMarvin LaFontaineMichael Mitrano
    • Michel PharandKlaus BeckerKlaus PetryMarvin LaFontaineMichael Mitrano
    • H01L21/677
    • H01L21/67201H01L21/67265H01L21/67294H01L21/67748
    • A combination load lock apparatus is provided, wherein a chamber is coupled to two or more valves in selective fluid communication with two or more respective volumes. A support member for supporting a workpiece is disposed within an interior portion of the chamber, wherein a translation apparatus is operably coupled thereto. The translation apparatus is operable to rotate and/or translate the workpiece on the support member about and/or along a first axis, wherein a detection apparatus associated with the chamber is operable to detect one or more characteristics of the workpiece during the rotation and/or translation thereof. The workpiece may be further rotated in a predetermined manner based on the one or more detected characteristics. A recess is further defined in the interior portion of the chamber, wherein the translation apparatus is operable to translate the workpiece into and out of the recess to reduce particulate contamination thereon.
    • 提供一种组合式加载锁定装置,其中腔室与两个或更多个相应体积选择性流体连通的两个或更多个阀联接。 用于支撑工件的支撑构件设置在腔室的内部部分内,其中平移装置可操作地联接到其上。 翻译装置可操作以沿着第一轴线旋转和/或平移在支撑构件上的工件,其中与腔室相关联的检测装置可操作以在旋转期间检测工件的一个或多个特性,和/ 或其翻译。 可以基于一个或多个检测到的特性以预定方式进一步旋转工件。 在腔室的内部部分中进一步限定凹部,其中平移装置可操作以将工件平移到凹槽中并减少其中的颗粒污染物。
    • 3. 发明授权
    • Wafer pedestal tilt mechanism
    • 晶圆台座倾斜机构
    • US06727509B2
    • 2004-04-27
    • US10023516
    • 2001-12-17
    • Michel PharandAllan D. Weed
    • Michel PharandAllan D. Weed
    • A61N500
    • H01L21/68764G21K5/08H01J37/20H01J37/3171H01J2237/31701
    • The invention provides a wafer pad assembly and actuation system for use in an ion implanter, preferably a batch-type ion implanter. The wafer pad assembly includes a rotatable wafer support pad having an upper surface for mounting the wafer, and a lower surface rotationally mounted to a housing of the wafer pad assembly. The lower surface of the wafer support pad further comprises a flange connected to a rotatable shaft. The shaft is connected to an actuator for selectively indexing the shaft so that the wafer support pad is rotationally indexed about its geometric center. The lower surface of the wafer support pad is also connected to a frame having an outer curved surface rotatably mounted within a mating bearing surface of a housing. The curved frame is connected to a plurality of linkages for moving the wafer support pad within the curved frame so that the wafer is pivotable or tiltable about its geometric center.
    • 本发明提供了一种用于离子注入机,优选分批式离子注入机的晶圆垫组件和致动系统。 晶片垫组件包括可旋转晶片支撑垫,其具有用于安装晶片的上表面,以及可旋转地安装到晶片垫组件的壳体的下表面。 晶片支撑垫的下表面还包括连接到可旋转轴的凸缘。 轴连接到致动器以选择性地分度轴,使得晶片支撑垫围绕其几何中心旋转地分度。 晶片支撑垫的下表面还连接到具有可旋转地安装在壳体的配合支承表面内的外曲面的框架。 弯曲框架连接到多个联动装置,用于在晶片框架内移动晶片支撑垫,使得晶片围绕其几何中心可枢转或可倾斜。