专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20120062866A1 MICROCHANNEL-COOLED COILS OF ELECTROMAGNETIC ACTUATORS EXHIBITING REDUCED EDDY-CURRENT DRAG 审中-公开
标题翻译：电磁致动器的微通道冷却线圈展示减少的EDDY-CURRENT DRAG
公开(公告)号：US20120062866A1
公开(公告)日：2012-03-15
申请号：US13225235
申请日：2011-09-02
申请人： Michael B. Binnard , Scott Coakley , Alex Ka Tim Poon , Masahiro Totsu , Derek Coon , Leonard Wai Fung Kho , Gaurav Keswani , Alexander Cooper , Michel Pharand , Matt Bjork
发明人： Michael B. Binnard , Scott Coakley , Alex Ka Tim Poon , Masahiro Totsu , Derek Coon , Leonard Wai Fung Kho , Gaurav Keswani , Alexander Cooper , Michel Pharand , Matt Bjork
IPC分类号： G03B27/58 , H02K41/02
CPC分类号： H02K9/22 , G03F7/70758 , G03F7/70875 , H02K9/19 , H02K41/031 , H02K2201/18
摘要： Electromagnetic actuators are disclosed having at least one actively cooled coil assembly. Exemplary actuators are linear and planar motors of which the cooled coil assembly has a coil having first and second main surfaces. A respective thermally conductive cooling plate is in thermal contact with at least one main surface of the coil. Defined in or on each cooling plate is a coolant passageway that conducts a liquid coolant. A primary pattern of the coolant passageway is coextensive with at least part of the main surface of the coil. The primary pattern can have a secondary pattern through which coolant flows in a manner reducing eddy-current losses. An exemplary secondary pattern is serpentine. An exemplary primary pattern is radial or has a radial aspect, such as an X-shaped pattern. The devices exhibit reduced eddy-current drag.
摘要翻译：公开了具有至少一个主动冷却的线圈组件的电磁致动器。示例性致动器是线性和平面电动机，其中冷却的线圈组件具有具有第一和第二主表面的线圈。相应的导热冷却板与线圈的至少一个主表面热接触。在每个冷却板中或每个冷却板上定义的是冷却剂通道，其导通液体冷却剂。冷却剂通道的主要图案与线圈的主表面的至少一部分共同延伸。初级图案可以具有二次图案，冷却剂通过该图案以减少涡流损耗的方式流动。示例性的次要图案是蛇纹石。示例性的主要图案是径向的或具有径向方面，例如X形图案。该装置表现出减小的涡流阻力。

2. 发明申请

US20100271159A1 Electromagnetic Coil Design for Improved Thermal Performance 审中-公开
标题翻译：用于提高热性能的电磁线圈设计
公开(公告)号：US20100271159A1
公开(公告)日：2010-10-28
申请号：US12718600
申请日：2010-03-05
申请人： Alex Ka Tim Poon , Masahiro Totsu , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani
发明人： Alex Ka Tim Poon , Masahiro Totsu , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani
IPC分类号： H01F5/00
CPC分类号： H01F7/08 , G03F7/70858 , G03F7/709 , H01F5/00 , H01F27/2876
摘要： Methods and apparatus for improving the thermal performance of electromagnetic coils are disclosed. According to one aspect of the present invention, an electromagnetic actuator includes a core and a coil. The coil is formed form a conductor wire that includes a plurality of windings. The windings are arranged around the core, and include at least a first set of windings and a second set of windings. The first set of windings has a different geometry from the second set of windings.
摘要翻译：公开了用于改善电磁线圈的热性能的方法和装置。根据本发明的一个方面，电磁致动器包括芯和线圈。线圈形成为包括多个绕组的导线。绕组围绕芯布置，并且包括至少第一组绕组和第二组绕组。第一组绕组具有与第二组绕组不同的几何形状。

3. 发明申请

US20080073563A1 Exposure apparatus that includes a phase change circulation system for movers 审中-公开
标题翻译：包括移动器的相变循环系统的曝光装置
公开(公告)号：US20080073563A1
公开(公告)日：2008-03-27
申请号：US11479628
申请日：2006-07-01
申请人： W. Thomas Novak , Michael Binnard , Alex Ka Tim Poon , Masahiro Totsu , Leonard Wai Fung Kho , Gaurav Keswani
发明人： W. Thomas Novak , Michael Binnard , Alex Ka Tim Poon , Masahiro Totsu , Leonard Wai Fung Kho , Gaurav Keswani
IPC分类号： G01F23/00
CPC分类号： G03F7/70875 , G03F7/70758 , H01L21/67248 , H01L21/68 , H02K9/20 , H02K41/02
摘要： A mover combination (226) for moving and positioning a device (34) includes a mover (328) that defines a fluid passageway (370) and a circulation system (330) having a passageway inlet (374) and a passageway outlet (376). The circulation system (330) directs a circulation fluid (378) into the fluid passageway (370). The circulation system (330) can include a liquid/gas separator (384) that is in fluid communication with the fluid passageway (370). With this design, the plumbing for the liquid (378A) and the gas (378B) can each be optimized. Additionally, the circulation system (330) can include a pressure control device (388) that controls the pressure of the circulation fluid (378) in at least a portion of the fluid passageway (370). With this design, the pressure control device (388) controls the pressure of the circulation fluid (378) near the fluid passageway (370) so that the temperature of the circulation fluid (378) at the passageway outlet (376) is approximately equal to the temperature of the circulation fluid (378) at the passageway inlet (374). Moreover, the circulation system (930) can include a pump assembly (980) that directs the circulation fluid (978) into the passageway inlet (974), and a pressure control device (996) that precisely controls a state of the circulation fluid (978) near the passageway inlet (974). With this design, the phase of the circulation fluid (978) at the passageway inlet (974) can be precisely controlled without restricting the flow of the circulation fluid (978).
摘要翻译：用于移动和定位装置（34）的移动器组合（226）包括限定流体通道（370）的移动器（328）和具有通道入口（374）和通道出口（376）的循环系统（330）。循环系统（330）将循环流体（378）引导到流体通道（370）中。循环系统（330）可以包括与流体通道（370）流体连通的液体/气体分离器（384）。通过这种设计，可以优化液体（378A）和气体（378B）的管道。另外，循环系统（330）可以包括控制流体通道（370）的至少一部分中的循环流体（378）的压力的压力控制装置（388）。通过该设计，压力控制装置（388）控制流体通道（370）附近的循环流体（378）的压力，使得通道出口（376）处的循环流体（378）的温度近似等于通道入口处的循环流体（378）的温度（374）。此外，循环系统（930）可以包括引导循环流体（978）进入通道入口（974）的泵组件（980）和精确地控制循环流体的状态的压力控制装置（996） 978）在通道入口附近（974）。通过这种设计，可以精确地控制在通道入口（974）处的循环流体（978）的相位，而不限制循环流体（978）的流动。

4. 发明授权

US08934080B2 Apparatus and methods for recovering fluid in immersion lithography 有权
公开(公告)号：US08934080B2
公开(公告)日：2015-01-13
申请号：US13617251
申请日：2012-09-14
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.

5. 发明申请

US20090237631A1 Apparatus and methods for recovering fluid in immersion lithography 有权
标题翻译：用于在浸没式光刻中回收流体的装置和方法
公开(公告)号：US20090237631A1
公开(公告)日：2009-09-24
申请号：US12379419
申请日：2009-02-20
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.
摘要翻译：浸没式光刻设备包括具有最终光学元件的投影系统，在投影系统下方可移动的可移动平台，使得在最终光学元件与台面的表面之间存在间隙，浸没液体填充在间隙中，液体限制构件和液体分配器。液体限制部件将浸没液体保持在间隙中，并且包括面向台面的液体回收部，并从间隙回收液体。液体回收部分包括施加第一吸力的第一多孔部分和施加小于第一吸力的第二吸力的第二多孔部分，第二部分位于第一部分的外侧。液体转向器位于台架和至少第一多孔部分之间。

6. 发明申请

US20090231560A1 Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate 有权
标题翻译：浸没式光刻设备和方法，在浸没液体限制构件和衬底之间具有可移动的液体转向器
公开(公告)号：US20090231560A1
公开(公告)日：2009-09-17
申请号：US12382100
申请日：2009-03-09
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani , Daishi Tanaka
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani , Daishi Tanaka
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/52
摘要： An immersion lithography apparatus includes a projection system having a final optical element and a stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage. An immersion liquid fills the gap between the surface and the final optical element. A liquid confinement member maintains the immersion liquid in the gap. The immersion liquid has a meniscus where the liquid contacts ambient gas, the meniscus defining a footprint of an immersion area. A movable liquid diverter is positioned between the liquid confinement member and the stage. The movable liquid diverter moves relative to the liquid confinement member in a direction parallel to the surface of the stage, and includes an opening that surrounds the immersion area, the opening contacting or being slightly spaced from the immersion area when the stage is stationary.
摘要翻译：浸没光刻设备包括具有最终光学元件的投影系统和可移动到投影系统下方的位置的台架，使得在最终光学元件与台面的表面之间存在间隙。浸没液体填充表面和最终光学元件之间的间隙。液体限制构件将浸没液体保持在间隙中。浸没液体具有弯液面，其中液体接触环境气体，弯月面限定了浸没区域的覆盖区域。可移动的液体转向器位于液体限制构件和载物台之间。可移动液体分配器在平行于载物台表面的方向上相对于液体限制构件移动，并且包括围绕浸没区域的开口，当平台静止时，开口接触或与浸没区域稍微间隔开。

7. 发明授权

US07532309B2 Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid 有权
标题翻译：浸渍光刻系统和方法具有浸没流体限制板，用于将待成像的基板浸没在浸没流体中
公开(公告)号：US07532309B2
公开(公告)日：2009-05-12
申请号：US11523595
申请日：2006-09-20
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
IPC分类号： G03B27/54
CPC分类号： G03F7/70341
摘要： A lithography apparatus includes a fluid confinement plate which can completely submerge the imaging surface of a substrate. A gap, filled with immersion fluid, is provided between the imaging surface of the substrate and the last optical element of a projection optical system. The fluid confinement plate, which is positioned within the gap between the last optical element and the substrate, is sufficiently sized so that the imaging surface is completely submerged in the immersion fluid. The fluid confinement plate includes a first surface facing the gap and opposing the imaging surface of the substrate. The first surface includes a droplet control element to control the formation of droplets forming on the first surface.
摘要翻译：光刻设备包括可以完全浸没衬底的成像表面的流体限制板。在基板的成像表面和投影光学系统的最后一个光学元件之间提供填充有浸没流体的间隙。定位在最后一个光学元件和基底之间的间隙内的流体限制板的尺寸足够大，使得成像表面完全浸没在浸没流体中。流体限制板包括面对间隙的第一表面并与基底的成像表面相对。第一表面包括用于控制形成在第一表面上的液滴的液滴控制元件。

8. 发明申请

US20080231822A1 Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool 有权
标题翻译：喷嘴有助于减少浸没式光刻工具浸没液体的逸出
公开(公告)号：US20080231822A1
公开(公告)日：2008-09-25
申请号：US12073783
申请日：2008-03-10
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
IPC分类号： G03B27/52 , G03F7/00
CPC分类号： G03F7/70341
摘要： An immersion lithography tool with a diverter element, positioned between the immersion element and the substrate, for altering the “footprint” or shape of the meniscus of the body of immersion liquid between the last optical element and an immersion element on one side, and the substrate on the other side when the substrate is moved. The apparatus includes a substrate holder to hold the substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through the immersion liquid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. The diverter element is positioned between the immersion element and the substrate. The diverter element alters the footprint shape of the meniscus of the body of immersion liquid, thereby preventing or reducing the amount of leakage from a space between the substrate and the immersion element.
摘要翻译：浸没式光刻工具，其具有位于浸没元件和基底之间的转向元件，用于改变在最后的光学元件与一侧的浸没元件之间的浸没液体的弯液面的“占地面积”或形状，以及当基板移动时在另一侧的基板。该装置包括用于保持具有成像表面的基板和具有最后光学元件的投影光学系统的基板保持器。投影光学系统通过填充在基板的成像表面和最后一个光学元件之间的间隙中的浸渍液体将图像投影到基板上的目标成像区域上。浸没元件将浸没液保持在间隙中。分流器元件位于浸没元件和基底之间。分流器元件改变浸没液体的弯液面的足迹形状，从而防止或减少从基板和浸没元件之间的空间的泄漏量。

9. 发明申请

US20080212050A1 Apparatus and methods for removing immersion liquid from substrates using temperature gradient 审中-公开
标题翻译：使用温度梯度从底物中去除浸渍液体的设备和方法
公开(公告)号：US20080212050A1
公开(公告)日：2008-09-04
申请号：US12068077
申请日：2008-02-01
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon , Soichi Owa
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon , Soichi Owa
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/70341
摘要： Apparatus and methods assist in the removal of immersion liquid from a surface of a substrate. In particular, the apparatus/method removes immersion liquid from a surface of a substrate that has been subjected to immersion lithographic exposure. A temperature control unit controls a temperature of the substrate to create a temperature gradient across at least a portion of the surface of the substrate such that a first portion of the surface of the substrate has a first temperature that is higher than a second temperature of a second portion of the surface of the substrate. The temperature gradient induces the immersion liquid remaining on the substrate to move from the higher temperature portion(s) toward the lower temperature portion(s).
摘要翻译：装置和方法有助于从衬底的表面去除浸没液体。特别地，该装置/方法从浸没式光刻曝光的基板表面去除浸没液。温度控制单元控制衬底的温度以在衬底的表面的至少一部分上产生温度梯度，使得衬底的表面的第一部分具有高于第一温度的第一温度衬底表面的第二部分。温度梯度引起残留在基板上的浸渍液体从较高温度部分向下温度部分移动。

10. 发明申请

US20080100812A1 Immersion lithography system and method having a wafer chuck made of a porous material 审中-公开
标题翻译：浸渍光刻系统和方法具有由多孔材料制成的晶片卡盘
公开(公告)号：US20080100812A1
公开(公告)日：2008-05-01
申请号：US11907218
申请日：2007-10-10
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
IPC分类号： G03B27/52 , G03C5/00
CPC分类号： G03F7/70341 , G03F7/707
摘要： An immersion lithography apparatus having a substrate chuck made of a porous material. The porous substrate chuck is provided to contact and support the back surface of the substrate and hold the substrate in place. The porous substrate chuck facilitates in the removal of any immersion liquid under the substrate.
摘要翻译：一种浸没式光刻设备，具有由多孔材料制成的基板卡盘。提供多孔基材卡盘以接触和支撑基底的背面并将基底保持在适当的位置。多孔基材卡盘有助于去除底物下的任何浸没液体。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式