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1. 发明授权

US06823124B1 Laser-guided manipulation of non-atomic particles 有权
标题翻译：激光引导操纵非原子粒子
公开(公告)号：US06823124B1
公开(公告)日：2004-11-23
申请号：US09574955
申请日：2000-05-19
申请人： Michael J. Renn , David J. Odde , Robert L. Pastel
发明人： Michael J. Renn , David J. Odde , Robert L. Pastel
IPC分类号： G02B620
CPC分类号： B82Y10/00 , G21K1/006 , H01L2924/01022 , H01L2924/01046 , H01L2924/01056 , H01L2924/19043
摘要： A method and device for using laser light to trap non-atomic particles optically within a hollow region of a hollow core optical fiber.
摘要翻译：一种使用激光在中空芯光纤的中空区域内光学捕获非原子粒子的方法和装置。

2. 发明授权

US07294366B2 Laser processing for heat-sensitive mesoscale deposition 有权
标题翻译：用于热敏中尺度沉积的激光加工
公开(公告)号：US07294366B2
公开(公告)日：2007-11-13
申请号：US10952108
申请日：2004-09-27
申请人： Michael J. Renn , Bruce H. King , Marcelino Essien , Manampathy G. Giridharan , Jyh-Cherng Sheu
发明人： Michael J. Renn , Bruce H. King , Marcelino Essien , Manampathy G. Giridharan , Jyh-Cherng Sheu
IPC分类号： B05D3/06
CPC分类号： H05K3/125 , B05D1/02 , B05D3/06 , C08F2/46 , C23C18/02 , C23C18/14 , H01L51/0009
摘要： A method of depositing various materials onto heat-sensitive targets. Heat-sensitive targets are generally defined as targets that have thermal damage thresholds that are lower than the temperature required to process a deposited material. The invention uses precursor solutions and/or particle or colloidal suspensions, along with optional pre-deposition treatment and/or post-deposition treatment to lower the laser power required to drive the deposit to its final state. The present invention uses Maskless Mesoscale Material Deposition (M3D™) to perform direct deposition of material onto the target in a precise, highly localized fashion. Features with linewidths as small as 4 microns may be deposited, with little or no material waste. A laser is preferably used to heat the material to process it to obtain the desired state, for example by chemical decomposition, sintering, polymerization, and the like. This laser processing may be performed in an ambient environment with laser powers of less than 100 milliwatts.
摘要翻译：将各种材料沉积在热敏靶上的方法。热敏靶标通常定义为具有低于处理沉积材料所需温度的热损伤阈值的靶。本发明使用前体溶液和/或颗粒或胶态悬浮液以及任选的预沉积处理和/或沉积后处理以降低将沉积物驱动到其最终状态所需的激光功率。本发明使用无掩模中尺度材料沉积（M 3 S D D TM）以精确，高度局部化的方式将材料直接沉积到靶上。具有小至4微米的线宽的特征可能被沉积，很少或没有材料浪费。优选使用激光加热材料以加工以获得期望的状态，例如通过化学分解，烧结，聚合等。该激光处理可以在具有小于100毫瓦的激光功率的周围环境中进行。

3. 发明授权

US07045015B2 Apparatuses and method for maskless mesoscale material deposition 有权
公开(公告)号：US07045015B2
公开(公告)日：2006-05-16
申请号：US10346935
申请日：2003-01-17
申请人： Michael J. Renn , Bruce H. King , Marcelino Essien , Lemna J. Hunter
发明人： Michael J. Renn , Bruce H. King , Marcelino Essien , Lemna J. Hunter
IPC分类号： B05C11/06
CPC分类号： B05D1/02 , B05D3/06 , B05D3/068 , B05D5/00 , B05D5/12 , C23C18/06 , C23C18/14 , H05K3/1241
摘要： Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.

4. 发明授权

US08796146B2 Aerodynamic jetting of blended aerosolized materials 有权
标题翻译：混合气雾化材料的气动喷射
公开(公告)号：US08796146B2
公开(公告)日：2014-08-05
申请号：US12720573
申请日：2010-03-09
申请人： Michael J. Renn , Bruce H. King , Jason A. Paulsen
发明人： Michael J. Renn , Bruce H. King , Jason A. Paulsen
IPC分类号： H01L21/311
CPC分类号： H01L21/76877 , B05D1/02 , H01B13/0026 , H01C17/06 , H01C17/08 , H01L21/76802 , H01L21/76804 , H01L21/76805 , H01L21/76879 , H01L41/314
摘要： Method and apparatus for direct writing of passive structures having a tolerance of 5% or less in one or more physical, electrical, chemical, or optical properties. The present apparatus is capable of extended deposition times. The apparatus may be configured for unassisted operation and uses sensors and feedback loops to detect physical characteristics of the system to identify and maintain optimum process parameters.
摘要翻译：用于在一种或多种物理，电学，化学或光学性质中直接写入具有5％或更小的公差的被动结构的方法和装置。本装置能够延长沉积时间。该装置可以被配置为无辅助操作，并且使用传感器和反馈回路来检测系统的物理特性以识别和维持最佳过程参数。

5. 发明授权

US07938079B2 Annular aerosol jet deposition using an extended nozzle 有权
标题翻译：使用延长喷嘴的环形气溶胶喷射沉积
公开(公告)号：US07938079B2
公开(公告)日：2011-05-10
申请号：US11011366
申请日：2004-12-13
申请人： Bruce H. King , Michael J. Renn , Marcelino Essien , Gregory J. Marquez , Manampathy G. Giridharan , Jyh-Cherng Sheu
发明人： Bruce H. King , Michael J. Renn , Marcelino Essien , Gregory J. Marquez , Manampathy G. Giridharan , Jyh-Cherng Sheu
IPC分类号： B05C5/00 , B05C19/00 , F23D11/10
CPC分类号： H05K3/125
摘要： Method and apparatus for improved maskless deposition of electronic and biological materials using an extended nozzle. The process is capable of direct deposition of features with linewidths varying from a few microns to a fraction of a millimeter, and can be used to deposit features on targets with damage thresholds near 100° C. or less. Deposition and subsequent processing may be performed under ambient conditions and produce linewidths as low as 1 micron, with sub-micron edge definition. The extended nozzle reduces particle overspray and has a large working distance; that is, the orifice to target distance may be several millimeters or more, enabling direct write onto non-planar surfaces. The nozzle allows for deposition of features with linewidths that are approximately as small as one-twentieth the size of the nozzle orifice diameter, and is preferably interchangeable, enabling rapid variance of deposited linewidth.
摘要翻译：使用扩展喷嘴改善电子和生物材料的无掩模沉积的方法和装置。该过程能够直线沉积具有从几微米变化到几分之一毫米的线宽的特征，并且可以用于在具有接近100℃或更低的损伤阈值的靶上沉积特征。沉积和后续处理可以在环境条件下进行，并产生低至1微米的线宽，具有亚微米边缘定义。扩展喷嘴可以减少颗粒过度喷涂，工作距离大; 也就是说，孔到目标距离可以是几毫米或更多，使得能够直接写在非平面表面上。喷嘴允许具有大约等于喷嘴孔直径的二十分之二的线宽的特征的沉积，并且优选地是可互换的，使得沉积线宽的快速变化。

6. 发明授权

US07059371B2 Security handbag system 失效
标题翻译：安全手提包系统
公开(公告)号：US07059371B2
公开(公告)日：2006-06-13
申请号：US10934708
申请日：2004-09-03
申请人： Michael J. Renn
发明人： Michael J. Renn
IPC分类号： A45C1/04 , A45C1/08 , A45C3/06 , A45C13/02
CPC分类号： A45C13/20 , A45C3/06 , A45F3/02 , A45F2003/025
摘要： A security handbag system comprising a purse with a detachable portion removably coupled to the side of the purse and attached to the waist of a user. The detachable portion has pockets to hold the users valuables including cash, credit cards, defensive chemical spray and cellular phone. Upon extraordinary pulling away of the purse, the detachable portion remains attached to the user and uncouples from the purse.
摘要翻译：一种安全手提包系统，其包括具有可拆卸部分的钱包，该可拆卸部分可拆卸地联接到钱包的侧面并且附接到使用者的腰部。可拆卸部分具有口袋以容纳用户的贵重物品，包括现金，信用卡，防化学喷雾和蜂窝电话。在非常拉出钱包时，可拆卸部分保持附接到使用者并从钱包中脱离。

7. 发明授权

US08132744B2 Miniature aerosol jet and aerosol jet array 有权
标题翻译：微型气溶胶喷射和气溶胶喷射阵列
公开(公告)号：US08132744B2
公开(公告)日：2012-03-13
申请号：US12761201
申请日：2010-04-15
申请人： Bruce H. King , Michael J. Renn , Jason A. Paulsen
发明人： Bruce H. King , Michael J. Renn , Jason A. Paulsen
IPC分类号： A62C31/00
CPC分类号： A62C31/00 , B05B7/0416 , B05B7/0884 , C23C18/06 , F23D11/16
摘要： A miniaturized aerosol jet, or an array of miniaturized aerosol jets for direct printing of various aerosolized materials. In the most commonly used embodiment, an aerosol stream is focused and deposited onto a planar or non-planar target, forming a pattern that is thermally or photochemically processed to achieve physical, optical, and/or electrical properties near that of the corresponding bulk material. The apparatus uses an aerosol jet deposition head to form an annularly propagating jet composed of an outer sheath flow and an inner aerosol-laden carrier flow. Miniaturization of the deposition head facilitates the fabrication and operation of arrayed deposition heads, enabling construction and operation of arrays of aerosol jets capable of independent motion and deposition. Arrayed aerosol jets provide an increased deposition rate, arrayed deposition, and multi-material deposition.
摘要翻译：小型化气溶胶喷射器或用于直接印刷各种气雾化材料的小型化气溶胶喷射器阵列。在最常用的实施例中，气溶胶流被聚焦并沉积到平面或非平面靶上，形成热或光化学处理的图案，以达到靠近相应散装材料的物理，光学和/或电特性。该装置使用气溶胶喷射沉积头来形成由外鞘流和内部气溶胶载体流组成的环形传播射流。沉积头的小型化有助于阵列沉积头的制造和操作，使得能够独立运动和沉积的气溶胶喷嘴阵列的构造和操作成为可能。阵列气溶胶喷射器提供增加的沉积速率，排列沉积和多材料沉积。

8. 发明授权

US07658163B2 Direct write# system 有权
标题翻译：直写＃系统
公开(公告)号：US07658163B2
公开(公告)日：2010-02-09
申请号：US11458966
申请日：2006-07-20
申请人： Michael J. Renn , Bruce H. King , Manampathy G. Giridharan , Jyh-Cherng Sheu
发明人： Michael J. Renn , Bruce H. King , Manampathy G. Giridharan , Jyh-Cherng Sheu
IPC分类号： B05C19/00 , B05B5/03 , B05B1/28 , B05B5/00
CPC分类号： C23C4/12 , B41J2/215 , B41J2/435 , C23C24/04 , H01L24/11 , H01L24/81 , H01L2224/13099 , H01L2224/24011 , H01L2224/76155 , H01L2224/81801 , H01L2224/82 , H01L2224/85 , H01L2224/86 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01015 , H01L2924/01018 , H01L2924/01022 , H01L2924/01023 , H01L2924/01025 , H01L2924/01027 , H01L2924/0103 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/01056 , H01L2924/01074 , H01L2924/01087 , H01L2924/09701 , H01L2924/12042 , H01L2924/14 , H01L2924/19041 , H01L2924/19042 , H01L2924/19043 , H01L2924/30107 , H01L2924/3025 , H05K3/102 , H01L2924/00
摘要： Methods and apparatus for the deposition of a source material (10) are disclosed. An atomizer (12) renders a supply of source material (10) into many discrete particles. A force applicator (14) propels the particles in continuous, parallel streams of discrete particles. A collimator (16) controls the direction of flight of the particles in the stream prior to their deposition on a substrate (18). In an alternative embodiment of the invention, the viscosity of the particles may be controlled to enable complex depositions of non-conformal or three-dimensional surfaces. The invention also includes a wide variety of substrate treatments which may occur before, during or after deposition. In yet another embodiment of the invention, a virtual or cascade impactor may be employed to remove selected particles from the deposition stream.
摘要翻译：公开了用于沉积源材料（10）的方法和装置。雾化器（12）将源材料（10）供应到许多离散的颗粒中。力施加器（14）推动颗粒处于连续的，平行的离散颗粒流中。准直器（16）在其沉积在基底（18）上之前控制颗粒在流中的飞行方向。在本发明的另一个实施方案中，可以控制颗粒的粘度以使复合物沉积非保形或三维表面。本发明还包括可以在沉积之前，期间或之后发生的各种各样的基底处理。在本发明的另一个实施例中，可以使用虚拟或级联冲击器来从沉积流中去除所选择的颗粒。

9. 发明授权

US07270844B2 Direct write™ system 有权
标题翻译：直接写（TM）系统
公开(公告)号：US07270844B2
公开(公告)日：2007-09-18
申请号：US10945416
申请日：2004-09-20
申请人： Michael J. Renn
发明人： Michael J. Renn
IPC分类号： B05D5/12 , B05D3/02 , C23C18/00
CPC分类号： C23C4/12 , B41J2/215 , B41J2/435 , C23C24/04 , H01L24/11 , H01L24/81 , H01L2224/13099 , H01L2224/24011 , H01L2224/76155 , H01L2224/81801 , H01L2224/82 , H01L2224/85 , H01L2224/86 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01015 , H01L2924/01018 , H01L2924/01022 , H01L2924/01023 , H01L2924/01025 , H01L2924/01027 , H01L2924/0103 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/01056 , H01L2924/01074 , H01L2924/01087 , H01L2924/09701 , H01L2924/12042 , H01L2924/14 , H01L2924/19041 , H01L2924/19042 , H01L2924/19043 , H01L2924/30107 , H01L2924/3025 , H05K3/102 , H01L2924/00
摘要： Methods and apparatus for the deposition of a source material (10) are disclosed. An atomizer (12) renders a supply of source material (10) into many discrete particles. A force applicator (14) propels the particles in continuous, parallel streams of discrete particles. A collimator (16) controls the direction of flight of the particles in the stream prior to their deposition on a substrate (18). In an alternative embodiment of the invention, the viscosity of the particles may be controlled to enable complex depositions of non-conformal or three-dimensional surfaces. The invention also includes a wide variety of substrate treatments which may occur before, during or after deposition. In yet another embodiment of the invention, a virtual or cascade impactor may be employed to remove selected particles from the deposition stream.
摘要翻译：公开了用于沉积源材料（10）的方法和装置。雾化器（12）将源材料（10）供应到许多离散的颗粒中。力施加器（14）推动颗粒处于连续的，平行的离散颗粒流中。准直器（16）在其沉积在基底（18）上之前控制颗粒在流中的飞行方向。在本发明的另一个实施方案中，可以控制颗粒的粘度以使复合物沉积非保形或三维表面。本发明还包括可以在沉积之前，期间或之后发生的各种各样的基底处理。在本发明的另一个实施例中，可以使用虚拟或级联冲击器来从沉积流中去除所选择的颗粒。

10. 发明授权

US5615558A Optical cooling of solids 失效
标题翻译：固体的光学冷却
公开(公告)号：US5615558A
公开(公告)日：1997-04-01
申请号：US533656
申请日：1995-09-25
申请人： Eric A. Cornell , Michael J. Renn
发明人： Eric A. Cornell , Michael J. Renn
IPC分类号： F25B23/00 , F25B21/00 , F25D23/00
CPC分类号： F25B23/003
摘要： A device and method for laser cooling of a solid to extremely low temperature is disclosed, the device including an active cooling structure having a high purity surface passivated direct band gap semiconductor crystal of less than about 3 microns thick and a transparent hemispherical body in optical contact with the crystal. The crystal is itself cooled when illuminated with a laser beam tuned to a frequency no greater than the band gap edge frequency of the crystal. Cooling is caused by emission of photons of higher energy than photons entering the crystal, the additional energy being accounted for by process of absorption of thermal phonons from the crystal lattice.
摘要翻译：公开了一种用于将固体激光冷却至极低温度的装置和方法，该装置包括具有小于约3微米厚的高纯度表面钝化直接带隙半导体晶体的主动冷却结构和光学接触中的透明半球体与水晶。当激光束被调谐到不大于晶体的带隙边缘频率的频率时，晶体本身被冷却。冷却是通过发射比进入晶体的光子更高能量的光子引起的，另外的能量是通过从晶格吸收热声子的过程来解释的。

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