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1. 发明授权

US08796146B2 Aerodynamic jetting of blended aerosolized materials 有权
标题翻译：混合气雾化材料的气动喷射
公开(公告)号：US08796146B2
公开(公告)日：2014-08-05
申请号：US12720573
申请日：2010-03-09
申请人： Michael J. Renn , Bruce H. King , Jason A. Paulsen
发明人： Michael J. Renn , Bruce H. King , Jason A. Paulsen
IPC分类号： H01L21/311
CPC分类号： H01L21/76877 , B05D1/02 , H01B13/0026 , H01C17/06 , H01C17/08 , H01L21/76802 , H01L21/76804 , H01L21/76805 , H01L21/76879 , H01L41/314
摘要： Method and apparatus for direct writing of passive structures having a tolerance of 5% or less in one or more physical, electrical, chemical, or optical properties. The present apparatus is capable of extended deposition times. The apparatus may be configured for unassisted operation and uses sensors and feedback loops to detect physical characteristics of the system to identify and maintain optimum process parameters.
摘要翻译：用于在一种或多种物理，电学，化学或光学性质中直接写入具有5％或更小的公差的被动结构的方法和装置。本装置能够延长沉积时间。该装置可以被配置为无辅助操作，并且使用传感器和反馈回路来检测系统的物理特性以识别和维持最佳过程参数。

2. 发明申请

US20100255209A1 Aerodynamic Jetting of Blended Aerosolized Materials 有权
标题翻译：混合气雾化材料的气动喷射
公开(公告)号：US20100255209A1
公开(公告)日：2010-10-07
申请号：US12720573
申请日：2010-03-09
申请人： Michael J. Renn , Bruce H. King , Jason A. Paulsen
发明人： Michael J. Renn , Bruce H. King , Jason A. Paulsen
IPC分类号： B05D1/02
CPC分类号： H01L21/76877 , B05D1/02 , H01B13/0026 , H01C17/06 , H01C17/08 , H01L21/76802 , H01L21/76804 , H01L21/76805 , H01L21/76879 , H01L41/314
摘要： Method and apparatus for direct writing of passive structures having a tolerance of 5% or less in one or more physical, electrical, chemical, or optical properties. The present apparatus is capable of extended deposition times. The apparatus may be configured for unassisted operation and uses sensors and feedback loops to detect physical characteristics of the system to identify and maintain optimum process parameters.
摘要翻译：用于在一种或多种物理，电学，化学或光学性质中直接写入具有5％或更小的公差的被动结构的方法和装置。本装置能够延长沉积时间。该装置可以被配置为无辅助操作，并且使用传感器和反馈回路来检测系统的物理特性以识别和维持最佳过程参数。

3. 发明申请

US20100192847A1 Miniature Aerosol Jet and Aerosol Jet Array 有权
标题翻译：微型气溶胶喷射和气溶胶喷射阵列
公开(公告)号：US20100192847A1
公开(公告)日：2010-08-05
申请号：US12761201
申请日：2010-04-15
申请人： Michael J. Renn , Bruce H. King , Jason A. Paulsen
发明人： Michael J. Renn , Bruce H. King , Jason A. Paulsen
IPC分类号： B05C5/00 , B05B1/28
CPC分类号： A62C31/00 , B05B7/0416 , B05B7/0884 , C23C18/06 , F23D11/16
摘要： A miniaturized aerosol jet, or an array of miniaturized aerosol jets for direct printing of various aerosolized materials. In the most commonly used embodiment, an aerosol stream is focused and deposited onto a planar or non-planar target, forming a pattern that is thermally or photochemically processed to achieve physical, optical, and/or electrical properties near that of the corresponding bulk material. The apparatus uses an aerosol jet deposition head to form an annularly propagating jet composed of an outer sheath flow and an inner aerosol-laden carrier flow. Miniaturization of the deposition head facilitates the fabrication and operation of arrayed deposition heads, enabling construction and operation of arrays of aerosol jets capable of independent motion and deposition. Arrayed aerosol jets provide an increased deposition rate, arrayed deposition, and multi-material deposition.
摘要翻译：小型化气溶胶喷射器或用于直接印刷各种气雾化材料的小型化气溶胶喷射器阵列。在最常用的实施例中，气溶胶流被聚焦并沉积到平面或非平面靶上，形成热或光化学处理的图案，以达到靠近相应散装材料的物理，光学和/或电特性。该装置使用气溶胶喷射沉积头来形成由外鞘流和内部气溶胶载体流组成的环形传播射流。沉积头的小型化有助于阵列沉积头的制造和操作，使得能够独立运动和沉积的气溶胶喷嘴阵列的构造和操作成为可能。阵列气溶胶喷射器提供增加的沉积速率，排列沉积和多材料沉积。

4. 发明授权

US08132744B2 Miniature aerosol jet and aerosol jet array 有权
标题翻译：微型气溶胶喷射和气溶胶喷射阵列
公开(公告)号：US08132744B2
公开(公告)日：2012-03-13
申请号：US12761201
申请日：2010-04-15
申请人： Bruce H. King , Michael J. Renn , Jason A. Paulsen
发明人： Bruce H. King , Michael J. Renn , Jason A. Paulsen
IPC分类号： A62C31/00
CPC分类号： A62C31/00 , B05B7/0416 , B05B7/0884 , C23C18/06 , F23D11/16
摘要： A miniaturized aerosol jet, or an array of miniaturized aerosol jets for direct printing of various aerosolized materials. In the most commonly used embodiment, an aerosol stream is focused and deposited onto a planar or non-planar target, forming a pattern that is thermally or photochemically processed to achieve physical, optical, and/or electrical properties near that of the corresponding bulk material. The apparatus uses an aerosol jet deposition head to form an annularly propagating jet composed of an outer sheath flow and an inner aerosol-laden carrier flow. Miniaturization of the deposition head facilitates the fabrication and operation of arrayed deposition heads, enabling construction and operation of arrays of aerosol jets capable of independent motion and deposition. Arrayed aerosol jets provide an increased deposition rate, arrayed deposition, and multi-material deposition.
摘要翻译：小型化气溶胶喷射器或用于直接印刷各种气雾化材料的小型化气溶胶喷射器阵列。在最常用的实施例中，气溶胶流被聚焦并沉积到平面或非平面靶上，形成热或光化学处理的图案，以达到靠近相应散装材料的物理，光学和/或电特性。该装置使用气溶胶喷射沉积头来形成由外鞘流和内部气溶胶载体流组成的环形传播射流。沉积头的小型化有助于阵列沉积头的制造和操作，使得能够独立运动和沉积的气溶胶喷嘴阵列的构造和操作成为可能。阵列气溶胶喷射器提供增加的沉积速率，排列沉积和多材料沉积。

5. 发明授权

US07938341B2 Miniature aerosol jet and aerosol jet array 有权
标题翻译：微型气溶胶喷射和气溶胶喷射阵列
公开(公告)号：US07938341B2
公开(公告)日：2011-05-10
申请号：US11302091
申请日：2005-12-12
申请人： Bruce H. King , Michael J. Renn , Jason A. Paulsen
发明人： Bruce H. King , Michael J. Renn , Jason A. Paulsen
IPC分类号： A62C31/00
CPC分类号： A62C31/00 , B05B7/0416 , B05B7/0884 , C23C18/06 , F23D11/16
摘要： A miniaturized aerosol jet, or an array of miniaturized aerosol jets for direct printing of various aerosolized materials. In the most commonly used embodiment, an aerosol stream is focused and deposited onto a planar or non-planar target, forming a pattern that is thermally or photochemically processed to achieve physical, optical, and/or electrical properties near that of the corresponding bulk material. The apparatus uses an aerosol jet deposition head to form an annularly propagating jet composed of an outer sheath flow and an inner aerosol-laden carrier flow. Miniaturization of the deposition head facilitates the fabrication and operation of arrayed deposition heads, enabling construction and operation of arrays of aerosol jets capable of independent motion and deposition. Arrayed aerosol jets provide an increased deposition rate, arrayed deposition, and multi-material deposition.
摘要翻译：小型化气溶胶喷射器或用于直接印刷各种气雾化材料的小型化气溶胶喷射器阵列。在最常用的实施例中，气溶胶流被聚焦并沉积到平面或非平面靶上，形成热或光化学处理的图案，以达到靠近相应散装材料的物理，光学和/或电特性。该装置使用气溶胶喷射沉积头来形成由外鞘流和内部气溶胶载体流组成的环形传播射流。沉积头的小型化有助于阵列沉积头的制造和操作，使得能够独立运动和沉积的气溶胶喷嘴阵列的构造和操作成为可能。阵列气溶胶喷射器提供增加的沉积速率，排列沉积和多材料沉积。

6. 发明授权

US07674671B2 Aerodynamic jetting of aerosolized fluids for fabrication of passive structures 有权
标题翻译：用于制造被动结构的雾化流体的气动喷射
公开(公告)号：US07674671B2
公开(公告)日：2010-03-09
申请号：US11302481
申请日：2005-12-12
申请人： Michael J. Renn , Marcelino Essien , Bruce H. King , Jason A. Paulsen
发明人： Michael J. Renn , Marcelino Essien , Bruce H. King , Jason A. Paulsen
IPC分类号： H01L21/8234
CPC分类号： H01L21/76877 , B05D1/02 , H01B13/0026 , H01C17/06 , H01C17/08 , H01L21/76802 , H01L21/76804 , H01L21/76805 , H01L21/76879 , H01L41/314
摘要： Method and apparatus for direct writing of passive structures having a tolerance of 5% or less in one or more physical, electrical, chemical, or optical properties. The present apparatus is capable of extended deposition times. The apparatus may be configured for unassisted operation and uses sensors and feedback loops to detect physical characteristics of the system to identify and maintain optimum process parameters.
摘要翻译：用于在一种或多种物理，电学，化学或光学性质中直接写入具有5％或更小的公差的被动结构的方法和装置。本装置能够延长沉积时间。该装置可以被配置为无辅助操作，并且使用传感器和反馈回路来检测系统的物理特性以识别和维持最佳过程参数。

7. 发明授权

US07938079B2 Annular aerosol jet deposition using an extended nozzle 有权
标题翻译：使用延长喷嘴的环形气溶胶喷射沉积
公开(公告)号：US07938079B2
公开(公告)日：2011-05-10
申请号：US11011366
申请日：2004-12-13
申请人： Bruce H. King , Michael J. Renn , Marcelino Essien , Gregory J. Marquez , Manampathy G. Giridharan , Jyh-Cherng Sheu
发明人： Bruce H. King , Michael J. Renn , Marcelino Essien , Gregory J. Marquez , Manampathy G. Giridharan , Jyh-Cherng Sheu
IPC分类号： B05C5/00 , B05C19/00 , F23D11/10
CPC分类号： H05K3/125
摘要： Method and apparatus for improved maskless deposition of electronic and biological materials using an extended nozzle. The process is capable of direct deposition of features with linewidths varying from a few microns to a fraction of a millimeter, and can be used to deposit features on targets with damage thresholds near 100° C. or less. Deposition and subsequent processing may be performed under ambient conditions and produce linewidths as low as 1 micron, with sub-micron edge definition. The extended nozzle reduces particle overspray and has a large working distance; that is, the orifice to target distance may be several millimeters or more, enabling direct write onto non-planar surfaces. The nozzle allows for deposition of features with linewidths that are approximately as small as one-twentieth the size of the nozzle orifice diameter, and is preferably interchangeable, enabling rapid variance of deposited linewidth.
摘要翻译：使用扩展喷嘴改善电子和生物材料的无掩模沉积的方法和装置。该过程能够直线沉积具有从几微米变化到几分之一毫米的线宽的特征，并且可以用于在具有接近100℃或更低的损伤阈值的靶上沉积特征。沉积和后续处理可以在环境条件下进行，并产生低至1微米的线宽，具有亚微米边缘定义。扩展喷嘴可以减少颗粒过度喷涂，工作距离大; 也就是说，孔到目标距离可以是几毫米或更多，使得能够直接写在非平面表面上。喷嘴允许具有大约等于喷嘴孔直径的二十分之二的线宽的特征的沉积，并且优选地是可互换的，使得沉积线宽的快速变化。

8. 发明授权

US07294366B2 Laser processing for heat-sensitive mesoscale deposition 有权
标题翻译：用于热敏中尺度沉积的激光加工
公开(公告)号：US07294366B2
公开(公告)日：2007-11-13
申请号：US10952108
申请日：2004-09-27
申请人： Michael J. Renn , Bruce H. King , Marcelino Essien , Manampathy G. Giridharan , Jyh-Cherng Sheu
发明人： Michael J. Renn , Bruce H. King , Marcelino Essien , Manampathy G. Giridharan , Jyh-Cherng Sheu
IPC分类号： B05D3/06
CPC分类号： H05K3/125 , B05D1/02 , B05D3/06 , C08F2/46 , C23C18/02 , C23C18/14 , H01L51/0009
摘要： A method of depositing various materials onto heat-sensitive targets. Heat-sensitive targets are generally defined as targets that have thermal damage thresholds that are lower than the temperature required to process a deposited material. The invention uses precursor solutions and/or particle or colloidal suspensions, along with optional pre-deposition treatment and/or post-deposition treatment to lower the laser power required to drive the deposit to its final state. The present invention uses Maskless Mesoscale Material Deposition (M3D™) to perform direct deposition of material onto the target in a precise, highly localized fashion. Features with linewidths as small as 4 microns may be deposited, with little or no material waste. A laser is preferably used to heat the material to process it to obtain the desired state, for example by chemical decomposition, sintering, polymerization, and the like. This laser processing may be performed in an ambient environment with laser powers of less than 100 milliwatts.
摘要翻译：将各种材料沉积在热敏靶上的方法。热敏靶标通常定义为具有低于处理沉积材料所需温度的热损伤阈值的靶。本发明使用前体溶液和/或颗粒或胶态悬浮液以及任选的预沉积处理和/或沉积后处理以降低将沉积物驱动到其最终状态所需的激光功率。本发明使用无掩模中尺度材料沉积（M 3 S D D TM）以精确，高度局部化的方式将材料直接沉积到靶上。具有小至4微米的线宽的特征可能被沉积，很少或没有材料浪费。优选使用激光加热材料以加工以获得期望的状态，例如通过化学分解，烧结，聚合等。该激光处理可以在具有小于100毫瓦的激光功率的周围环境中进行。

9. 发明授权

US07045015B2 Apparatuses and method for maskless mesoscale material deposition 有权
公开(公告)号：US07045015B2
公开(公告)日：2006-05-16
申请号：US10346935
申请日：2003-01-17
申请人： Michael J. Renn , Bruce H. King , Marcelino Essien , Lemna J. Hunter
发明人： Michael J. Renn , Bruce H. King , Marcelino Essien , Lemna J. Hunter
IPC分类号： B05C11/06
CPC分类号： B05D1/02 , B05D3/06 , B05D3/068 , B05D5/00 , B05D5/12 , C23C18/06 , C23C18/14 , H05K3/1241
摘要： Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.

10. 发明授权

US08272579B2 Mechanically integrated and closely coupled print head and mist source 有权
标题翻译：机械一体化和紧密耦合的打印头和雾源
公开(公告)号：US08272579B2
公开(公告)日：2012-09-25
申请号：US12203037
申请日：2008-09-02
申请人： Bruce H. King , Gregory J. Marquez , Michael J. Renn
发明人： Bruce H. King , Gregory J. Marquez , Michael J. Renn
IPC分类号： B05B1/28
CPC分类号： B05B1/28 , B01L3/0268 , B01L2200/0636 , B01L2200/0652 , B01L2300/0819 , B01L2400/0439 , B01L2400/0487 , B05B7/0012 , B05B7/0408 , B05B7/0458 , B05B7/0475 , B05B7/12 , B05B7/16 , B05B12/18 , B05B17/0615 , B41J2/04
摘要： A deposition apparatus comprising one or more atomizers structurally integrated with a deposition head. The entire head may be replaceable, and prefilled with material. The deposition head may comprise multiple nozzles. Also an apparatus for three dimensional materials deposition comprising a tiltable deposition head attached to a non-tiltable atomizer. Also methods and apparatuses for depositing different materials either simultaneously or sequentially.
摘要翻译：一种沉积设备，包括一个或多个与沉积头结构一体化的雾化器。整个头部可以更换，并预填充材料。沉积头可以包括多个喷嘴。还有一种用于三维材料沉积的装置，其包括附接到不可倾斜雾化器的可倾斜沉积头。还有用于同时或顺序地沉积不同材料的方法和装置。

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