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1. 发明授权

US5532107A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5532107A
公开(公告)日：1996-07-02
申请号：US227145
申请日：1994-04-13
申请人： Masayuki Oie , Shoji Kawata , Takamasa Yamada , Shinya Ikeda
发明人： Masayuki Oie , Shoji Kawata , Takamasa Yamada , Shinya Ikeda
IPC分类号： G03F7/022 , H01L21/027 , H01L21/30 , G03F7/023 , C07C245/00
CPC分类号： G03F7/022
摘要： Disclosed herein is a positive resist composition comprising an alkali-soluble phenolic resin and a photosensitive agent, characterized in that the positive resist composition contains, as the photosensitive agent, the quinonediazide sulfonate of at least one of phenolic compounds represented by the following general formulae (I) and (II): ##STR1## wherein R.sub.1 through R.sub.4 mean individually a hydrogen or halogen atom, a hydroxyl group, an alkyl or alkenyl group having 1-3 carbon atoms, or a hydroxyalkyl group having 1-3 carbon atoms and may be equal to or different from one another, and R.sub.5 denotes a hydrogen atom, an alkyl or alkenyl group having 1-3 carbon atoms, or an aryl group with the proviso that the number of hydroxyl groups is 3 or 4; and ##STR2## wherein R.sub.6 through R.sub.9 mean individually a hydrogen or halogen atom, an alkyl or alkenyl group having 1-3 carbon atoms, or a hydroxyalkyl group having 1-3 carbon atoms and may be equal to or different from one another, and R.sub.10 denotes a hydrogen atom, an alkyl or alkenyl group having 1-3 carbon atoms, or an aryl group with the proviso that the number of hydroxyl groups is 5 and at least one of R.sub.6 through R.sub.9 is an atom or group other than hydrogen atom. It is suitable for use in minute processing.
摘要翻译：本文公开了包含碱溶性酚醛树脂和感光剂的正性抗蚀剂组合物，其特征在于，所述正性抗蚀剂组合物含有由以下通式表示的酚类化合物中的至少一种的醌二叠氮化物磺酸盐作为感光剂： I）和（II）：其中R 1至R 4分别表示氢或卤素原子，羟基，具有1-3个碳原子的烷基或烯基或具有1-3个碳原子的羟烷基并且可以彼此相同或不同，R5表示氢原子，具有1-3个碳原子的烷基或烯基或芳基，条件是羟基数为3或4; 和其中R6至R9分别表示氢或卤素原子，具有1-3个碳原子的烷基或烯基或具有1-3个碳原子的羟烷基，并且可以等于或不同于一个另一个，R 10表示氢原子，具有1-3个碳原子的烷基或烯基或芳基，条件是羟基数为5，并且R6至R9中的至少一个为原子或其它基团比氢原子。适用于分钟处理。

2. 发明授权

US5306596A Positive resist composition comprising a polyphenolic o-quinone diazide sulfonate 失效
标题翻译：正型抗蚀剂组合物，其包含多酚邻醌二叠氮化物磺酸盐
公开(公告)号：US5306596A
公开(公告)日：1994-04-26
申请号：US603597
申请日：1990-10-26
申请人： Masayuki Oie , Shoji Kawata , Takamasa Yamada , Shinya Ikeda
发明人： Masayuki Oie , Shoji Kawata , Takamasa Yamada , Shinya Ikeda
IPC分类号： G03F7/022 , H01L21/027 , H01L21/30 , G03F7/023 , C07C245/00
CPC分类号： G03F7/022
摘要： Disclosed herein is a positive resist composition comprising an alkali-soluble phenolic resin and a photosensitive agent, characterized in that the positive resist composition contains, as the photosensitive agent, the quinonediazide sulfonate of at least one of phenolic compounds represented by the following general formulae (I) and (II): ##STR1## wherein R.sub.1 through R.sub.4 mean individually a hydrogen or halogen atom, a hyaroxyl group, an alkyl or alkenyl group having 1-3 carbon atoms, or a hydroxyalkyl group having 1-3 carbon atoms and may be equal to or different from one another, and R.sub.5 denotes a hydrogen atom, an alkyl or alkenyl group having 1-3 carbon atoms, or an aryl group with the proviso that the number of hydroxyl groups is 3 or 4; and ##STR2## wherein R.sub.6 through R.sub.9 mean individually a hydrogen or halogen atom, an alkyl or alkenyl group having 1-3 carbon atoms, or a hydroxyalkyl group having 1-3 carbon atoms and may be equal to or different from one another, and R.sub.10 denotes a hydrogen atom, an alkyl or alkenyl group having 1-3 carbon atoms, or an aryl group with the proviso that the number of hydroxyl groups is 5 and at least one of R.sub.6 through R.sub.9 is an atom or group other than hydrogen atom. It is suitable for use in minute processing.
摘要翻译：本文公开了含有碱溶性酚醛树脂和感光剂的正性抗蚀剂组合物，其特征在于，所述正性抗蚀剂组合物含有由以下通式表示的酚类化合物中的至少一种的醌二叠氮化物磺酸盐作为感光剂 I）和（II）：（*化学结构*）（I）其中R 1至R 4分别表示氢或卤素原子，杂环基，具有1-3个碳原子的烷基或烯基或具有1个 -3个碳原子并且可以彼此相同或不同，R5表示氢原子，具有1-3个碳原子的烷基或烯基或芳基，条件是羟基数为3或 4; 和（*化学结构*）（II）其中R6至R9分别表示氢或卤素原子，具有1-3个碳原子的烷基或烯基或具有1-3个碳原子的羟烷基，并且可以等于或 R 10表示氢原子，具有1-3个碳原子的烷基或烯基或芳基，条件是羟基数为5，并且R6至R9中的至少一个为原子或氢原子以外的基团。适用于分钟处理。

3. 发明授权

US5112719A Positive resist composition containing alkali-soluble phenolic resin, quinonediazide sulfonic acid ester photosensitive agent and polyhydroxy sensitizer 失效
标题翻译：含有碱性可溶性酚醛树脂的阳离子组合物，邻苯二甲酸二异氰酸酯感光剂和聚羟基敏感剂
公开(公告)号：US5112719A
公开(公告)日：1992-05-12
申请号：US603355
申请日：1990-10-26
申请人： Takamasa Yamada , Shoji Kawata , Masayuki Oie
发明人： Takamasa Yamada , Shoji Kawata , Masayuki Oie
IPC分类号： G03F7/023 , G03F7/022 , H01L21/027
CPC分类号： G03F7/0226
摘要： Disclosed herein is a positive resist composition comprising an alkali-soluble phenolic resin, a photosensitive agent formed of a quinonediazide sulfonic acid ester and at least one compound represented by the following general formula (I): ##STR1## wherein R.sup.1 through R.sup.6 mean individually a hydrogen or halogen atom, a hydroxyl group or an alkyl or alkenyl group having 1-4 carbon atoms and may be equal to or different from one another,R.sup.7 and R.sup.8 denote individually a hydrogen or halogen atom, or an alkyl group having 1-4 carbon atoms and may be equal to or different from each other, andR.sup.9 through R.sup.11 stand individually for a hydrogen atom or an alkyl group having 1-4 carbon atoms and may be equal to or different from one another. It is suitable for use in minute processing.

4. 发明授权

US5166033A Positive resist composition containing quinone diazide sulfonate ester of vinylphenol compounds or isopropenylphenol compounds 失效
标题翻译：含有乙烯基酚化合物或异丙苯酚化合物的二苯甲酮磺酸酯的正极性组合物
公开(公告)号：US5166033A
公开(公告)日：1992-11-24
申请号：US587917
申请日：1990-09-25
申请人： Masayuki Oie , Shoji Kawata , Takamasa Yamada
发明人： Masayuki Oie , Shoji Kawata , Takamasa Yamada
IPC分类号： G03F7/023 , G03F7/022 , H01L21/027 , H01L21/30
CPC分类号： G03F7/0226
摘要： Disclosed herein is a positive resist composition comprising an alkali-soluble phenolic resin and the quinonediazide sulfonate of at least one phenolic compound selected from vinylphenol compounds and isopropenylphenol compounds as a photosensitive agent. It is suitable for use in minute processing.

5. 发明授权

US5707784A Method of forming chemically amplified resist pattern and manufacturing for semiconductor device by using the chemically amplified resist pattern 失效
标题翻译：通过使用化学放大抗蚀剂图案形成化学放大抗蚀剂图案和制造半导体器件的方法
公开(公告)号：US5707784A
公开(公告)日：1998-01-13
申请号：US567210
申请日：1995-12-05
申请人： Akira Oikawa , Hiroyuki Tanaka , Masayuki Oie , Hideyuki Tanaka , Nobunori Abe
发明人： Akira Oikawa , Hiroyuki Tanaka , Masayuki Oie , Hideyuki Tanaka , Nobunori Abe
IPC分类号： G03F7/26 , G03F7/00 , G03F7/004 , G03F7/039 , G03F7/11 , G03F7/20 , G03F7/38 , H01L21/027 , G03C5/00
CPC分类号： G03F7/11 , G03F7/2006 , G03F7/0045
摘要： A chemically amplified resist pattern is formed by applying chemically amplified resist, forming thereafter a layer of an amorphous polyolefines substance thereon, then exposing the chemically amplified resist, and furthermore, developing the chemically amplified resist after removing the amorphous polyolefines substance.
摘要翻译：通过施加化学放大抗蚀剂形成化学放大抗蚀剂图案，然后在其上形成一层无定形聚烯烃物质，然后暴露化学放大的抗蚀剂，此外，在除去无定形聚烯烃物质后显影化学放大的抗蚀剂。

6. 发明授权

US5773190A Resist composition 失效
标题翻译：抗蚀组成
公开(公告)号：US5773190A
公开(公告)日：1998-06-30
申请号：US795266
申请日：1997-02-10
申请人： Masayuki Oie , Hideyuki Tanaka , Nobunori Abe
发明人： Masayuki Oie , Hideyuki Tanaka , Nobunori Abe
IPC分类号： G03F7/004 , G03F7/038 , G03F7/00
CPC分类号： G03F7/0045 , G03F7/038 , Y10S430/117 , Y10S430/122 , Y10S430/126
摘要： Disclosed herein is a resist composition comprising in admixture (a) 100 parts by weight of an alkali-soluble phenolic resin, (b) 0.2-50 parts by weight of a compound which forms an acid upon exposure to active rays and consists of a specific halogen-containing aromatic compound, (c) 0.01-50 parts by weight of a compound which crosslinks the alkali-soluble phenolic resin in the presence of the acid formed from the compound (b), and (d) sufficient solvent to dissolve the foregoing composition components.
摘要翻译：本文公开了一种抗蚀剂组合物，其包含（a）100重量份的碱溶性酚醛树脂，（b）0.2-50重量份在暴露于活性光线时形成酸的化合物，并由特定的含卤素的芳族化合物，（c）0.01〜50重量份在由化合物（b）形成的酸存在下交联碱溶性酚醛树脂的化合物，和（d）足够的溶剂以溶解上述组成成分。

7. 发明授权

US5688628A Resist composition 失效
标题翻译：抗蚀组成
公开(公告)号：US5688628A
公开(公告)日：1997-11-18
申请号：US339203
申请日：1994-11-10
申请人： Masayuki Oie , Nobunori Abe , Hideyuki Tanaka , Akira Oikawa , Shuichi Miyata
发明人： Masayuki Oie , Nobunori Abe , Hideyuki Tanaka , Akira Oikawa , Shuichi Miyata
IPC分类号： G03F7/039 , G03F7/004 , G03F7/023 , H01L21/027 , G03F7/021
CPC分类号： G03F7/0045 , G03F7/0233
摘要： A resist composition comprising in admixture (A) a compound which forms an acid upon exposure to active rays, (B) a polymer which has at least one structural unit with a group unstable to an acid and cleaves at this group in the presence of the acid derived from the compound (A) to turn alkali-soluble, and (C) a phenolic compound, and a process for forming a resist pattern using this resist composition are provided.
摘要翻译：一种抗蚀剂组合物，其包含（A）暴露于活性射线时形成酸的化合物，（B）具有至少一个具有对酸不稳定的基团的结构单元的聚合物，并且在提供由化合物（A）衍生的转化为碱溶性的酸和（C）酚类化合物，以及使用该抗蚀剂组合物形成抗蚀剂图案的方法。

8. 发明授权

US4654292A Photoresist composition containing a pyrazole compound anti-halation agent 失效
标题翻译：含有吡唑化合物防卤剂的光致抗蚀剂组合物
公开(公告)号：US4654292A
公开(公告)日：1987-03-31
申请号：US776781
申请日：1985-09-17
申请人： Masayuki Oie , Satoshi Ogawa , Sadao Sugimoto , Masahiro Yamazaki , Katsuhiro Fujino
发明人： Masayuki Oie , Satoshi Ogawa , Sadao Sugimoto , Masahiro Yamazaki , Katsuhiro Fujino
IPC分类号： G03C1/00 , G03F7/004 , G03F7/008 , G03F7/038 , G03F7/09 , G03C1/52 , C08C19/00 , G03C1/71
CPC分类号： G03F7/091
摘要： A photoresist composition comprising a conjugated diene polymer or its cyclized product, a photocuring agent soluble in an organic solvent and a pyrazole compound having a skeleton represented by the following formula. ##STR1## Also provided is a method of forming a photoresist pattern using the aforesaid composition.
摘要翻译：包含共轭二烯聚合物或其环化产物的光致抗蚀剂组合物，可溶于有机溶剂的光固化剂和具有由下式表示的骨架的吡唑化合物。还提供了使用上述组成形成光致抗蚀剂图案的方法。

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