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    • 3. 发明授权
    • Thermoplastic elastomer molding
    • 热塑性弹性体成型
    • US07169851B2
    • 2007-01-30
    • US10522745
    • 2003-07-25
    • Shinya Ikeda
    • Shinya Ikeda
    • C08L53/00
    • C08L53/02C08F297/04C08F297/044C08F297/046C08L2666/04C08L2666/02C08L53/00
    • The invention provides a molding formed of a thermoplastic elastomer composition which molding exhibits suppressed compression set and satisfactory tensile strength while exhibiting low hardness.The molding is formed of a thermoplastic elastomer resin composition comprising; an aromatic vinyl-isoprene block copolymer (a) including two or more poly(aromatic vinyl) blocks each having a weight-average molecular weight of 14,000 to 100,000, in an amount of 55 to 95 wt %; an aromatic vinyl-isoprene diblock copolymer (b) in an amount of 0 to 40 wt %; and polyisoprene (c) having a weight-average molecular weight of 5,000 to 300,000, in an amount of 5 to 33 wt %; wherein the composition has an aromatic vinyl monomer unit content of 14 to 30 wt % based on the total amount of the components (a), (b), and (c).The molding can be widely employed in a variety of uses where the characteristics of the product are advantageous; such as roller members (e.g., a transport roller and a feed roller) used in OA machines and office machines.
    • 本发明提供了一种由热塑性弹性体组合物形成的模塑件,其显示出低硬度的压缩永久变形和令人满意的拉伸强度。 模制品由热塑性弹性体树脂组合物形成,包括: 包含重量平均分子量为14,000至100,000的两种或多种聚(芳族乙烯基)嵌段的芳族乙烯基 - 异戊二烯嵌段共聚物(a)的含量为55-95重量% 芳族乙烯基 - 异戊二烯二嵌段共聚物(b),其量为0〜40重量% 和重量平均分子量为5,000〜300,000的聚异戊二烯(c),为5〜33重量% 其中所述组合物的芳族乙烯基单体单元含量相对于组分(a),(b)和(c)的总量为14〜30重量%。 该成型可广泛用于产品特性有利的各种用途中; 例如在OA机器和办公机器中使用的辊构件(例如,输送辊和进给辊)。
    • 5. 发明授权
    • Positive resist composition comprising a polyphenolic o-quinone diazide
sulfonate
    • 正型抗蚀剂组合物,其包含多酚邻醌二叠氮化物磺酸盐
    • US5306596A
    • 1994-04-26
    • US603597
    • 1990-10-26
    • Masayuki OieShoji KawataTakamasa YamadaShinya Ikeda
    • Masayuki OieShoji KawataTakamasa YamadaShinya Ikeda
    • G03F7/022H01L21/027H01L21/30G03F7/023C07C245/00
    • G03F7/022
    • Disclosed herein is a positive resist composition comprising an alkali-soluble phenolic resin and a photosensitive agent, characterized in that the positive resist composition contains, as the photosensitive agent, the quinonediazide sulfonate of at least one of phenolic compounds represented by the following general formulae (I) and (II): ##STR1## wherein R.sub.1 through R.sub.4 mean individually a hydrogen or halogen atom, a hyaroxyl group, an alkyl or alkenyl group having 1-3 carbon atoms, or a hydroxyalkyl group having 1-3 carbon atoms and may be equal to or different from one another, and R.sub.5 denotes a hydrogen atom, an alkyl or alkenyl group having 1-3 carbon atoms, or an aryl group with the proviso that the number of hydroxyl groups is 3 or 4; and ##STR2## wherein R.sub.6 through R.sub.9 mean individually a hydrogen or halogen atom, an alkyl or alkenyl group having 1-3 carbon atoms, or a hydroxyalkyl group having 1-3 carbon atoms and may be equal to or different from one another, and R.sub.10 denotes a hydrogen atom, an alkyl or alkenyl group having 1-3 carbon atoms, or an aryl group with the proviso that the number of hydroxyl groups is 5 and at least one of R.sub.6 through R.sub.9 is an atom or group other than hydrogen atom. It is suitable for use in minute processing.
    • 本文公开了含有碱溶性酚醛树脂和感光剂的正性抗蚀剂组合物,其特征在于,所述正性抗蚀剂组合物含有由以下通式表示的酚类化合物中的至少一种的醌二叠氮化物磺酸盐作为感光剂 I)和(II):(*化学结构*)(I)其中R 1至R 4分别表示氢或卤素原子,杂环基,具有1-3个碳原子的烷基或烯基或具有1个 -3个碳原子并且可以彼此相同或不同,R5表示氢原子,具有1-3个碳原子的烷基或烯基或芳基,条件是羟基数为3或 4; 和(*化学结构*)(II)其中R6至R9分别表示氢或卤素原子,具有1-3个碳原子的烷基或烯基或具有1-3个碳原子的羟烷基,并且可以等于或 R 10表示氢原子,具有1-3个碳原子的烷基或烯基或芳基,条件是羟基数为5,并且R6至R9中的至少一个为原子 或氢原子以外的基团。 适用于分钟处理。
    • 10. 发明授权
    • Block copolymer composition for photosensitive flexographic plate
    • 光敏柔版印版的嵌段共聚物组合物
    • US07318985B2
    • 2008-01-15
    • US10573292
    • 2004-09-24
    • Hidemi TsubakiShinya Ikeda
    • Hidemi TsubakiShinya Ikeda
    • G03F7/033
    • G03F7/033Y10S430/108
    • A composition for photosensitive flexographic plates which is capable of forming a sheet having a smooth surface and excellent antiflowing properties and less apt to have trouble caused by sticking and which further has excellent thin-line reproducibility; a block copolymer composition for photosensitive flexographic plates which is suitable for use in the composition; and a flexographic plate obtained by exposing the composition to light. Also provided are: a block copolymer composition containing a three-branched aromatic vinyl/conjugated diene block copolymer obtained with a specific coupling agent; and a composition for photosensitive flexographic plates which comprises an ethylenic compound and a photopolymerization initiator.
    • 用于感光性柔版印刷版的组合物,其能够形成具有光滑表面的片材和优异的防发光性能,并且较不易于粘附引起的麻烦,并且还具有优异的细线再现性; 用于感光性柔版印刷板的嵌段共聚物组合物,其适用于该组合物; 以及通过将组合物曝光而获得的柔性版。 还提供:含有用特定偶联剂获得的三支化芳族乙烯基/共轭二烯嵌段共聚物的嵌段共聚物组合物; 以及包含烯属化合物和光聚合引发剂的感光性柔版印刷板的组合物。