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1. 发明授权

US5445709A Anisotropic etching method and apparatus 失效
标题翻译：各向异性蚀刻方法和装置
公开(公告)号：US5445709A
公开(公告)日：1995-08-29
申请号：US154566
申请日：1993-11-19
申请人： Masayuki Kojima , Yoshikazu Ito , Kazuhsi Tomita , Shigeki Tozawa , Shunichi Iimuro , Masashi Arasawa , Eiichi Nishimura
发明人： Masayuki Kojima , Yoshikazu Ito , Kazuhsi Tomita , Shigeki Tozawa , Shunichi Iimuro , Masashi Arasawa , Eiichi Nishimura
IPC分类号： C23F4/00 , H01J37/32 , H01L21/302 , H01L21/3065 , H01L21/06
CPC分类号： H01J37/32009 , H01J37/3244 , H01J37/32522 , H01J37/32532 , H01J37/32541 , H01J37/32724 , H01J2237/3345
摘要： A parallel-plate plasma etching apparatus includes a susceptor electrode and a shower electrode which are arranged in a process chamber. A semiconductor wafer is placed on the susceptor electrode. A shower region defined by a plurality of process gas supply holes is formed in the shower electrode. The shower electrode is cooled by a cooling block and causes an effective electrode portion of the shower electrode to have a temperature gradient such that a temperature at the central portion of the effective electrode portion is lower than a temperature at the peripheral portion of the effective electrode portion. The diameter of the shower region is selected to be smaller than the diameter of the wafer by 5 to 25% such that degradation of planar uniformity of a degree of etching anisotropy on the wafer caused by the temperature gradient of the effective electrode portion is compensated for. The diameter of the effective electrode portion is selected to be larger than the size of a wafer by 5 to 35% such that a taper angle of a side wall to be etched formed by etching is set to be 85.degree. to 90.degree..
摘要翻译：平行板等离子体蚀刻装置包括布置在处理室中的基座电极和淋浴电极。将半导体晶片放置在基座电极上。在淋浴电极中形成由多个处理气体供给孔限定的淋浴区域。淋浴电极被冷却块冷却，使淋浴电极的有效电极部分具有温度梯度，使得有效电极部分的中心部分的温度低于有效电极周边部分的温度一部分。淋浴区域的直径被选择为小于晶片的直径5至25％，使得由有效电极部分的温度梯度引起的晶片上的蚀刻各向异性程度的平面均匀度的降低被补偿。选择有效电极部分的直径大于晶片的尺寸5至35％，使得通过蚀刻形成的待蚀刻侧壁的锥角设定为85°至90°。

2. 发明授权

US5766498A Anisotropic etching method and apparatus 失效
公开(公告)号：US5766498A
公开(公告)日：1998-06-16
申请号：US623737
申请日：1996-03-29
申请人： Masayuki Kojima , Yoshikazu Ito , Kazushi Tomita , Shigeki Tozawa , Shunichi Iimuro , Masashi Arasawa , Eiichi Nishimura
发明人： Masayuki Kojima , Yoshikazu Ito , Kazushi Tomita , Shigeki Tozawa , Shunichi Iimuro , Masashi Arasawa , Eiichi Nishimura
IPC分类号： C23F4/00 , H01J37/32 , H01L21/302 , H01L21/3065
CPC分类号： H01J37/32009 , H01J37/3244 , H01J37/32522 , H01J37/32532 , H01J37/32541 , H01J37/32724 , H01J2237/3345
摘要： A parallel-plate plasma etching apparatus includes a susceptor electrode and a shower electrode which are arranged in a process chamber. A semiconductor wafer is placed on the susceptor electrode. A shower region defined by a plurality of process gas supply holes is formed in the shower electrode. The shower electrode is cooled by a cooling block and causes an effective electrode portion of the shower electrode to have a temperature gradient such that a temperature at the central portion of the effective electrode portion is lower than a temperature at the peripheral portion of the effective electrode portion. The diameter of the shower region is selected to be smaller than the diameter of the wafer by 5 to 25% such that degradation of planar uniformity of a degree of etching anisotropy on the wafer caused by the temperature gradient of the effective electrode portion is compensated for. The diameter of the effective electrode portion is selected to be larger than the size of a wafer by 5 to 35% such that a taper angle of a side wall to be etched formed by etching is set to be 85.degree. to 90.degree..

3. 发明授权

US5593540A Plasma etching system and plasma etching method 失效
标题翻译：等离子体蚀刻系统和等离子体蚀刻方法
公开(公告)号：US5593540A
公开(公告)日：1997-01-14
申请号：US429648
申请日：1995-04-27
申请人： Kazushi Tomita , Yoshikazu Ito , Motohiro Hirano , Akira Nozawa , Hiromitsu Matsuo , Shunichi Iimuro , Shigeki Tozawa , Yutaka Miura
发明人： Kazushi Tomita , Yoshikazu Ito , Motohiro Hirano , Akira Nozawa , Hiromitsu Matsuo , Shunichi Iimuro , Shigeki Tozawa , Yutaka Miura
IPC分类号： H01J37/32 , B44C1/22
CPC分类号： H01J37/32449 , H01J37/3244 , H01J37/32532 , H01J37/32724 , H01J2237/3347
摘要： The present invention provides a plasma etching system, comprising a process chamber enclosing a plasma, means for evacuating said process chamber, a chuck electrode for supporting a substrate, a shower electrode positioned to face said chuck electrode and provided with a large number of small holes, a power source for applying a plasma voltage between the chuck electrode and said shower electrode, gas supply means communicating with said small holes of the shower electrode for supplying a plasma-forming gas into the process chamber through the small holes, and means for controlling said gas supply means such that said plasma-forming gas flows through said small holes at a mass flow rate of at least 620 kg/m.sup.2 /hr.
摘要翻译：本发明提供了一种等离子体蚀刻系统，其包括封装等离子体的处理室，用于抽出处理室的装置，用于支撑基板的卡盘电极，与所述卡盘电极相对设置并设有大量小孔的喷淋电极用于在所述卡盘电极和所述淋浴电极之间施加等离子体电压的电源，与所述淋浴电极的所述小孔连通的气体供给装置，用于通过所述小孔将等离子体形成气体供给到所述处理室，以及用于控制所述气体供给装置使得所述等离子体形成气体以至少620kg / m 2 / hr的质量流量流过所述小孔。

4. 发明授权

US5423936A Plasma etching system 失效
标题翻译：等离子体蚀刻系统
公开(公告)号：US5423936A
公开(公告)日：1995-06-13
申请号：US138039
申请日：1993-10-19
申请人： Kazushi Tomita , Yoshikazu Ito , Motohiro Hirano , Akira Nozawa , Hiromitsu Matsuo , Shunichi Iimuro , Shigeki Tozawa , Yutaka Miura
发明人： Kazushi Tomita , Yoshikazu Ito , Motohiro Hirano , Akira Nozawa , Hiromitsu Matsuo , Shunichi Iimuro , Shigeki Tozawa , Yutaka Miura
IPC分类号： H01J37/32 , H01L21/00
CPC分类号： H01J37/32449 , H01J37/3244 , H01J37/32532 , H01J37/32724 , H01J2237/3347
摘要： The present invention provides a plasma etching system, comprising a process chamber enclosing a plasma, means for evacuating said process chamber, a chuck electrode for supporting a substrate, a shower electrode positioned to face said chuck electrode and provided with a large number of small holes, a power source for applying a plasma voltage between the chuck electrode and said shower electrode, gas supply means communicating with said small holes of the shower electrode for supplying a plasma-forming gas into the process chamber through the small holes, and means for controlling said gas supply means such that said plasma-forming gas flows through said small holes at a mass flow rate of at least 620 kg/m.sup.2 /hr.
摘要翻译：本发明提供了一种等离子体蚀刻系统，其包括封装等离子体的处理室，用于抽出处理室的装置，用于支撑基板的卡盘电极，与所述卡盘电极相对设置并设有大量小孔的喷淋电极用于在所述卡盘电极和所述淋浴电极之间施加等离子体电压的电源，与所述淋浴电极的所述小孔连通的气体供给装置，用于通过所述小孔将等离子体形成气体供给到所述处理室，以及用于控制所述气体供给装置使得所述等离子体形成气体以至少620kg / m 2 / hr的质量流量流过所述小孔。

5. 发明授权

US08836979B2 Printing management program, printing management apparatus, printing management method, and printing system 有权
标题翻译：印刷管理程序，印刷管理装置，印刷管理方法和印刷系统
公开(公告)号：US08836979B2
公开(公告)日：2014-09-16
申请号：US13369726
申请日：2012-02-09
申请人： Yoshikazu Ito
发明人： Yoshikazu Ito
IPC分类号： G06F15/02 , G06F3/12
CPC分类号： G06F3/1208 , G06F3/1255 , G06F3/1288
摘要： A printing management program is disclosed. The program causes a computer to function as a printing job accepting unit which accepts a printing job from a pre-process within a printing process; a printing setting change accepting unit which accepts, from a user, a change of a printing setting which is set for the accepted printing job; a specifying unit which specifies a pagination setting for the printing job that is set in the pre-process; and a warning unit which provides a warning on a change of the printing setting depending on the specified pagination setting.
摘要翻译：公开了一种打印管理程序。该程序使计算机作为从打印过程中的预处理接受打印作业的打印作业接收单元; 打印设置改变接收单元，其从用户接受为所接受的打印作业设置的打印设置的改变; 指定单元，其指定在所述预处理中设置的所述打印作业的分页设置; 以及警告单元，其根据指定的分页设置提供关于打印设置的改变的警告。

6. 发明授权

US08830493B2 Computer readable information recording medium storing printing control program, printing control apparatus, printing control method and printing system 有权
标题翻译：存储打印控制程序，打印控制装置，打印控制方法和打印系统的计算机可读信息记录介质
公开(公告)号：US08830493B2
公开(公告)日：2014-09-09
申请号：US13360042
申请日：2012-01-27
申请人： Yoshikazu Ito , Takao Suzuki , Tatsuya Ishikawa , Yusuke Karube
发明人： Yoshikazu Ito , Takao Suzuki , Tatsuya Ishikawa , Yusuke Karube
IPC分类号： G06F3/12
CPC分类号： G06F3/1209 , G06F3/1211 , G06F3/1245 , G06F3/1247 , G06F3/1285
摘要： A computer readable information recording medium stores a printing control program. The printing control program, when executed by one or plural processors, functions of a first conversion function part configured to derive data of a form of page description language converted from printing data, based on the printing data; a second conversion function part configured to disassemble the data of the form of page description language converted from the printing data and data to be inserted into the data of the form of page description language converted from the printing data, and derive disassembled printing output data, based on data of a form of job definition format associated with the printing data and the data of the form of page description language converted from the printing data; and a transmission function part configured to transmit the disassembled printing output data to a printer apparatus.
摘要翻译：计算机可读信息记录介质存储打印控制程序。打印控制程序由一个或多个处理器执行时，被配置为基于打印数据导出从打印数据转换的页面描述语言的形式的数据的第一转换功能部件的功能; 第二转换功能部件，被配置为将从打印数据转换的页面描述语言的形式的数据和要插入的数据的数据拆分成从打印数据转换的页面描述语言的形式的数据，并导出分解的打印输出数据，基于与打印数据相关联的作业定义格式的形式的数据和从打印数据转换的页面描述语言的形式的数据; 以及发送功能部，被配置为将分解的打印输出数据发送到打印机装置。

7. 发明授权

US08254083B2 Ceramic electronic component and method for producing same 有权
标题翻译：陶瓷电子部件及其制造方法
公开(公告)号：US08254083B2
公开(公告)日：2012-08-28
申请号：US12851106
申请日：2010-08-05
申请人： Takashi Sakurai , Shinya Yoshihara , Ko Onodera , Hisayuki Abe , Masahiko Konno , Satoshi Kurimoto , Hiroshi Shindo , Akihiro Horita , Genichi Watanabe , Yoshikazu Ito
发明人： Takashi Sakurai , Shinya Yoshihara , Ko Onodera , Hisayuki Abe , Masahiko Konno , Satoshi Kurimoto , Hiroshi Shindo , Akihiro Horita , Genichi Watanabe , Yoshikazu Ito
IPC分类号： H01G4/06
CPC分类号： H01G4/2325 , B23K1/0016 , H01G4/30
摘要： There are provided a ceramic electronic component and a method for producing the ceramic electronic component, where a ground electrode layer can be directly coated with lead-free solder without lowering reliabilities. Terminal electrode 3 is provided with a ground electrode layer 21 of Cu having been formed by firing, a solder layer 22 formed of a lead-free solder based on five elements of Sn—Ag—Cu—Ni—Ge, and a diffusion layer 23 having been formed by the diffusion of Ni between the ground electrode layer 21 and the solder layer 22. Because the diffusion layer 23 of Ni is formed between the ground electrode layer 21 and the solder layer 22, the diffusion layer 23, which functions as a barrier layer, suppresses the solder leach of Cu from the ground electrode layer 21. The diffusion layer 23 of Ni can also suppress the growth of fragile intermetallic compounds of Sn—Cu. Therefore, a decrease in the bonding strength between the ground electrode layer 21 and the solder layer 22 can be prevented.
摘要翻译：提供陶瓷电子部件和陶瓷电子部件的制造方法，其中接地电极层可以直接涂覆无铅焊料，而不降低可靠性。端子电极3设置有通过烧制形成的Cu的接地电极层21，基于Sn-Ag-Cu-Ni-Ge的五个元素的无铅焊料形成的焊料层22和扩散层23 这是由于接地电极层21和焊料层22之间的Ni的扩散而形成的。由于在接地电极层21和焊料层22之间形成有Ni的扩散层23，所以作为从接地电极层21抑制Cu的浸出.Ni的扩散层23也可以抑制Sn-Cu的易碎金属间化合物的生长。因此，可以防止接地电极层21和焊料层22之间的接合强度的降低。

8. 发明申请

US20100280284A1 OPTICALLY ACTIVE 2,2'-BIPHENOL DERIVATIVE AND PRODUCTION METHOD OF SAME 有权
标题翻译：具有活性的2,2'-联苯酚衍生物及其制备方法
公开(公告)号：US20100280284A1
公开(公告)日：2010-11-04
申请号：US12811805
申请日：2009-01-06
申请人： Yoshikazu Ito , Yasushi Kubota , Tsutomu Inoue
发明人： Yoshikazu Ito , Yasushi Kubota , Tsutomu Inoue
IPC分类号： C07C39/15
CPC分类号： C07B57/00 , C07B2200/07 , C07C37/00 , C07C37/11 , C07C37/50 , C07C39/367 , C07C39/15
摘要： An optically active 2,2′-biphenol derivative and a production method that enables simple and efficient production of this compound. More specifically, an optically active biphenol derivative represented by the following formulas (1) and (2), a method for optically resolving a biphenol derivative represented by formula (2′), a production method of an optically active biphenol derivative (1) comprising a step for reacting a Brønsted acid with a biphenol derivative (2), and a production method of an optically active biphenol derivative (3) comprising a step for reacting a Lewis acid with an optically active biphenol derivative (1) or an optically active biphenol derivative (2). In the following formulas, R represents, for example, a primary or secondary alkyl group having 1 to 10 carbon atoms, * represents an axially asymmetric center, X represents a halogen atom, and R2 represents a tertiary alkyl group having 4 to 6 carbon atoms.
摘要翻译：一种光学活性的2,2'-联苯酚衍生物和能够简单且有效地生产该化合物的制备方法。更具体地，由下式（1）和（2）表示的光学活性联苯酚衍生物，用于光学拆分由式（2'）表示的联苯酚衍生物的方法，光学活性联苯酚衍生物（1）的制备方法，包括将布朗斯台德酸与联苯酚衍生物（2）反应的步骤和光学活性联苯酚衍生物（3）的制备方法，其包括使路易斯酸与光学活性联苯酚衍生物（1）或光学活性联苯酚衍生物（2）。在下式中，R表示例如碳原子数1〜10的伯或仲烷基，*表示轴向不对称中心，X表示卤素原子，R 2表示碳原子数4〜6的叔烷基。

9. 发明授权

US07609017B2 Open/close body drive device 有权
标题翻译：打开/关闭车身驱动装置
公开(公告)号：US07609017B2
公开(公告)日：2009-10-27
申请号：US11920770
申请日：2006-05-23
申请人： Kazutaka Sugimoto , Yoshikazu Ito , Tomokazu Murakami
发明人： Kazutaka Sugimoto , Yoshikazu Ito , Tomokazu Murakami
IPC分类号： G05B5/00
CPC分类号： H02P6/22 , B60J7/0573 , E05F15/695 , E05F15/697 , E05Y2201/434 , E05Y2400/336 , E05Y2800/422 , E05Y2900/542 , E05Y2900/55 , H02P6/12 , H02P6/185
摘要： The open/close body drive device is capable of restarting a brushless motor, without using magnetic pole sensors, so as to securely drive an open/close body in an arbitrary direction when any of the magnetic pole sensors has failed. When a CPU (1) detects an abnormal logic as a detection pattern of the magnetic pole sensors (9), the CPU (1) determines that the sensor has failed and temporarily stops drive of a DC brushless motor (5), and a motor drive unit (4) generates a phase switching signal to prolong one of electric connection patterns for performing sensorless drive when restarting the DC brushless motor (5).
摘要翻译：开/关体驱动装置能够在不使用磁极传感器的情况下重新启动无刷电动机，以便当任何磁极传感器发生故障时，可以在任意方向上牢固地驱动开闭体。当CPU（1）检测到异常逻辑作为磁极传感器（9）的检测图案时，CPU（1）确定传感器发生故障并暂时停止DC无刷电动机（5）的驱动，并且电动机驱动单元（4）产生相切换信号，以在重新启动直流无刷电动机（5）时延长用于执行无传感器驱动的电连接模式之一。

10. 发明申请

US20070182218A1 Sun roof drive device 有权
标题翻译：太阳屋顶驱动装置
公开(公告)号：US20070182218A1
公开(公告)日：2007-08-09
申请号：US10588752
申请日：2005-02-04
申请人： Takashi Kanai , Takahiro Maruyama , Yutaka Nagai , Munehiro Kawai , Yoshikazu Ito
发明人： Takashi Kanai , Takahiro Maruyama , Yutaka Nagai , Munehiro Kawai , Yoshikazu Ito
IPC分类号： B60J7/043
CPC分类号： H02P6/18 , B60J7/0573 , H02P6/16
摘要： The sun roof drive device opens and closes a vehicle sun roof by a DC brushless motor, which is driven by rectangular waves when high torque is required at a low rotational speed and which is driven by sinusoidal waves or pseudo-sinusoidal waves when low noise is required.
摘要翻译：太阳屋顶驱动装置通过直流无刷电动机打开和关闭车辆屋顶，该直流无刷电动机以低转速需要高扭矩并由正弦波或伪正弦波驱动时由矩形波驱动，当低噪声为需要。

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