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1. 发明授权

US5593540A Plasma etching system and plasma etching method 失效
标题翻译：等离子体蚀刻系统和等离子体蚀刻方法
公开(公告)号：US5593540A
公开(公告)日：1997-01-14
申请号：US429648
申请日：1995-04-27
申请人： Kazushi Tomita , Yoshikazu Ito , Motohiro Hirano , Akira Nozawa , Hiromitsu Matsuo , Shunichi Iimuro , Shigeki Tozawa , Yutaka Miura
发明人： Kazushi Tomita , Yoshikazu Ito , Motohiro Hirano , Akira Nozawa , Hiromitsu Matsuo , Shunichi Iimuro , Shigeki Tozawa , Yutaka Miura
IPC分类号： H01J37/32 , B44C1/22
CPC分类号： H01J37/32449 , H01J37/3244 , H01J37/32532 , H01J37/32724 , H01J2237/3347
摘要： The present invention provides a plasma etching system, comprising a process chamber enclosing a plasma, means for evacuating said process chamber, a chuck electrode for supporting a substrate, a shower electrode positioned to face said chuck electrode and provided with a large number of small holes, a power source for applying a plasma voltage between the chuck electrode and said shower electrode, gas supply means communicating with said small holes of the shower electrode for supplying a plasma-forming gas into the process chamber through the small holes, and means for controlling said gas supply means such that said plasma-forming gas flows through said small holes at a mass flow rate of at least 620 kg/m.sup.2 /hr.
摘要翻译：本发明提供了一种等离子体蚀刻系统，其包括封装等离子体的处理室，用于抽出处理室的装置，用于支撑基板的卡盘电极，与所述卡盘电极相对设置并设有大量小孔的喷淋电极用于在所述卡盘电极和所述淋浴电极之间施加等离子体电压的电源，与所述淋浴电极的所述小孔连通的气体供给装置，用于通过所述小孔将等离子体形成气体供给到所述处理室，以及用于控制所述气体供给装置使得所述等离子体形成气体以至少620kg / m 2 / hr的质量流量流过所述小孔。

2. 发明授权

US5423936A Plasma etching system 失效
标题翻译：等离子体蚀刻系统
公开(公告)号：US5423936A
公开(公告)日：1995-06-13
申请号：US138039
申请日：1993-10-19
申请人： Kazushi Tomita , Yoshikazu Ito , Motohiro Hirano , Akira Nozawa , Hiromitsu Matsuo , Shunichi Iimuro , Shigeki Tozawa , Yutaka Miura
发明人： Kazushi Tomita , Yoshikazu Ito , Motohiro Hirano , Akira Nozawa , Hiromitsu Matsuo , Shunichi Iimuro , Shigeki Tozawa , Yutaka Miura
IPC分类号： H01J37/32 , H01L21/00
CPC分类号： H01J37/32449 , H01J37/3244 , H01J37/32532 , H01J37/32724 , H01J2237/3347
摘要： The present invention provides a plasma etching system, comprising a process chamber enclosing a plasma, means for evacuating said process chamber, a chuck electrode for supporting a substrate, a shower electrode positioned to face said chuck electrode and provided with a large number of small holes, a power source for applying a plasma voltage between the chuck electrode and said shower electrode, gas supply means communicating with said small holes of the shower electrode for supplying a plasma-forming gas into the process chamber through the small holes, and means for controlling said gas supply means such that said plasma-forming gas flows through said small holes at a mass flow rate of at least 620 kg/m.sup.2 /hr.
摘要翻译：本发明提供了一种等离子体蚀刻系统，其包括封装等离子体的处理室，用于抽出处理室的装置，用于支撑基板的卡盘电极，与所述卡盘电极相对设置并设有大量小孔的喷淋电极用于在所述卡盘电极和所述淋浴电极之间施加等离子体电压的电源，与所述淋浴电极的所述小孔连通的气体供给装置，用于通过所述小孔将等离子体形成气体供给到所述处理室，以及用于控制所述气体供给装置使得所述等离子体形成气体以至少620kg / m 2 / hr的质量流量流过所述小孔。

3. 发明授权

US07666678B2 Proteins imparting boron-tolerance and genes thereof 失效
标题翻译：赋予耐硼性的蛋白质及其基因
公开(公告)号：US07666678B2
公开(公告)日：2010-02-23
申请号：US11522168
申请日：2006-09-15
申请人： Toru Fujiwara , Akira Nozawa
发明人： Toru Fujiwara , Akira Nozawa
IPC分类号： C12N15/81
CPC分类号： C07K14/415 , C12N15/8271
摘要： The present invention provides genes and proteins having possibilities to generate plants having tolerance against excessive boron, which can confer a boric acid tolerance to organisms. 5 types of genes that can confer a boric acid tolerance to yeast, such as AtPAB2, AtRBP47c′, AtRPS20B, AtMYB13 and AtMYB68, AtRBP45a, AtRBP45b, AtRBP45c, AtRBP45d, AtRBP47a, AtRBP47b, AtRBP47c, AtUBP1a, AtUBP1b and AtUBP1c which were found by expressing several genes of higher plant Arabidopsis thaliana in yeast that is a organism model of eukaryote. Further, a key to the toxicity mechanism of boric acid exists in the specific inhibition of splicing, and a gene related to enhancement of splicing efficiency also confers a boric acid tolerance.
摘要翻译：本发明提供具有产生对过量硼具有耐受性的植物的可能性的基因和蛋白质，其可以赋予对生物体的硼酸耐受性。可以赋予酵母硼酸耐受性的5种类型，例如AtPAB2，AtRBP47c'，AtRPS20B，AtMYB13和AtMYB68，AtRBP45a，AtRBP45b，AtRBP45c，AtRBP45d，AtRBP47a，AtRBP47b，AtRBP47c，AtUBP1a，AtUBP1b和AtUBP1c。在真核生物模型的酵母中表达高等植物拟南芥的几种基因。此外，硼酸的毒性机制的关键存在于剪接的特异性抑制中，与剪接效率的提高有关的基因也赋予硼酸耐受性。

4. 发明申请

US20090137651A1 PHARMACEUTICAL COMPOSITION FOR EXTERNAL USE 有权
标题翻译：用于外用的药物组合物
公开(公告)号：US20090137651A1
公开(公告)日：2009-05-28
申请号：US12281967
申请日：2006-10-02
申请人： Hirokazu Kobayashi , Akira Nozawa , Katsumasa Ariyoshi
发明人： Hirokazu Kobayashi , Akira Nozawa , Katsumasa Ariyoshi
IPC分类号： A61K31/4178
CPC分类号： A61K31/4178 , A61K9/0014 , A61K9/08 , A61K31/167 , A61K31/385 , A61K31/4015 , A61K47/18 , A61K47/22 , C07D409/06
摘要： A pharmaceutical composition for external use, including: i) luliconazole represented by the following structural formula (1) and/or a salt thereof; and ii) one or two or more selected from N-methyl-2-pyrrolidone, propylene carbonate, and crotamiton.
摘要翻译：一种外用药物组合物，其包括：i）由以下结构式（1）表示的luliconazole和/或其盐; 和ii）选自N-甲基-2-吡咯烷酮，碳酸亚丙酯和克罗他米通中的一种或两种以上。

5. 发明申请

US20070079394A1 Proteins imparting boron-tolerance and genes thereof 失效
标题翻译：赋予耐硼性的蛋白质及其基因
公开(公告)号：US20070079394A1
公开(公告)日：2007-04-05
申请号：US11522168
申请日：2006-09-15
申请人： Toru Fujiwara , Akira Nozawa
发明人： Toru Fujiwara , Akira Nozawa
IPC分类号： A01H1/00 , C07H21/04 , C12N15/82 , C12N5/04 , C12N1/18 , C07K14/395 , C07K14/415
CPC分类号： C07K14/415 , C12N15/8271
摘要： The present invention provides genes and proteins having possibilities to generate plants having tolerance against excessive boron, which can confer a boric acid tolerance to organisms. 5 types of genes that can confer a boric acid tolerance to yeast, such as AtPAB2, AtRBP47c′, AtRPS20B, AtMYB13 and AtMYB68, AtRBP45a, AtRBP45b, AtRBP45c, AtRBP45d, AtRBP47a, AtRBP47b, AtRBP47c, AtUBP1a, AtUBP1b and AtUBP1c which were found by expressing several genes of higher plant Arabidopsis thaliana in yeast that is a organism model of eukaryote. Further, a key to the toxicity mechanism of boric acid exists in the specific inhibition of splicing, and a gene related to enhancement of splicing efficiency also confers a boric acid tolerance.
摘要翻译：本发明提供具有产生对过量硼具有耐受性的植物的可能性的基因和蛋白质，其可以赋予对生物体的硼酸耐受性。可以赋予酵母硼酸耐受性的5种类型，例如AtPAB2，AtRBP47c'，AtRPS20B，AtMYB13和AtMYB68，AtRBP45a，AtRBP45b，AtRBP45c，AtRBP45d，AtRBP47a，AtRBP47b，AtRBP47c，AtUBP1a，AtUBP1b和AtUBP1c。在真核生物模型的酵母中表达高等植物拟南芥的几种基因。此外，硼酸的毒性机制的关键存在于剪接的特异性抑制中，与剪接效率的提高有关的基因也赋予硼酸耐受性。

6. 发明授权

US08268876B2 Pharmaceutical composition for external use 有权
标题翻译：外用药物组合物
公开(公告)号：US08268876B2
公开(公告)日：2012-09-18
申请号：US12281969
申请日：2006-10-02
申请人： Toyohiko Miki , Akira Nozawa , Nobuo Kubota , Susumu Tomiyama , Hirokazu Kobayashi
发明人： Toyohiko Miki , Akira Nozawa , Nobuo Kubota , Susumu Tomiyama , Hirokazu Kobayashi
IPC分类号： A61K31/415
CPC分类号： A61K31/4178 , A61K31/19 , A61K2300/00
摘要： Provided is a pharmaceutical composition for external use, including: (i) luliconazole represented by the following structural formula (1) and/or a salt thereof; and (ii) α-hydroxycarboxylic acid and/or a salt thereof.
摘要翻译：本发明提供一种外用药物组合物，其包括：（i）由以下结构式（1）表示的联利康唑和/或其盐; 和（ii）α-羟基羧酸和/或其盐。

7. 发明授权

US07052866B2 Method for evaluating the efficacy of an antifungal agent 有权
标题翻译：评估抗真菌剂功效的方法
公开(公告)号：US07052866B2
公开(公告)日：2006-05-30
申请号：US11153181
申请日：2005-06-15
申请人： Takuji Nakashima , Akira Nozawa , Takao Ito
发明人： Takuji Nakashima , Akira Nozawa , Takao Ito
IPC分类号： C12Q1/18 , C12Q1/00 , C12Q1/02 , C12Q1/24 , G01N33/53
CPC分类号： C12Q1/18 , C12Q1/06 , G01N33/5088
摘要： A correct viable cell number of a microorganism in a biological tissue is measured by cultivating a fragment of the biological tissue such as skin infected with the microorganism and administered with an antimicrobial agent, in a medium containing a phospholipid, a nonionic surfactant, or both of the phospholipid and the nonionic surfactant.
摘要翻译：通过在含有磷脂，非离子表面活性剂或两者的培养基中培养生物组织的片段，例如感染微生物的皮肤并施用抗微生物剂来测量生物组织中微生物的正确的活细胞数磷脂和非离子表面活性剂。

8. 发明申请

US20050232879A1 Antifungal medicinal compositions 有权
标题翻译：抗真菌药用组合物
公开(公告)号：US20050232879A1
公开(公告)日：2005-10-20
申请号：US10518776
申请日：2003-06-10
申请人： Hideaki Sasagawa , Madoka Ito , Takuji Nakashima , Akira Nozawa
发明人： Hideaki Sasagawa , Madoka Ito , Takuji Nakashima , Akira Nozawa
IPC分类号： A61K9/70 , A61K31/4178 , A61K47/10 , A61K47/38 , A61P31/10 , A61K7/04
CPC分类号： A61K47/10 , A61K9/7015 , A61K31/4178 , A61K47/38
摘要： An object of the present invention is to provide a medicinal composition useful for external application in the treatment of a fungal infection reaching the lower part of a thick keratin layer. Provided is an antifungal medicinal composition, comprising: (1) a film-forming agent; (2) a water-soluble plasticizer in a form of a solid or a paste at 20° C. at 1 atm; and (3) an antifungal compound represented by a general formula (1) and/or a physiologically acceptable salt thereof.
摘要翻译：本发明的目的是提供一种可用于外用于治疗到达厚角蛋白层下部的真菌感染的药物组合物。提供一种抗真菌药用组合物，其包含：（1）成膜剂; （2）在20℃，1atm下固体或糊状形式的水溶性增塑剂; 和（3）由通式（1）表示的抗真菌化合物和/或其生理学上可接受的盐。

9. 发明授权

US08058303B2 Pharmaceutical composition for external use 有权
标题翻译：外用药物组合物
公开(公告)号：US08058303B2
公开(公告)日：2011-11-15
申请号：US12281973
申请日：2006-10-02
申请人： Toyohiko Miki , Hiroyuki Fujii , Akira Nozawa , Hirokazu Kobayashi
发明人： Toyohiko Miki , Hiroyuki Fujii , Akira Nozawa , Hirokazu Kobayashi
IPC分类号： A61K31/4178
CPC分类号： C07D409/06 , A61K9/0014 , A61K31/4178 , A61K47/30
摘要： Provided is a pharmaceutical composition for external use which includes the following components: 1) luliconazole and/or a salt thereof; 2) N-methyl-2-pyrollidone; and 3) benzyl alcohol and/or diester of a dibasic acid. The diester of the dibasic acid is a diethyl ester or a diisopropyl ester of a dibasic acid having 6-10 carbon atoms. The pharmaceutical composition is useful for the treatment of a mycotic disease such as foot trichophytosis, trichophytosis corporis, trichophytosis on a hard keratin or hyperkeratotic portion, onychomycosis, particularly on a nail, or dermatomycosis.
摘要翻译：本发明提供一种外用药物组合物，其含有以下成分：1）柳氮唑醇和/或其盐; 2）N-甲基-2-吡咯烷酮; 和3）二元酸的苄醇和/或二酯。二元酸的二酯是具有6-10个碳原子的二元酸的二酯或二异丙酯。药物组合物可用于治疗真菌病，例如脚毛虫病，头毛虫病，硬角蛋白或角化过度部分的毛发症，甲癣，特别是指甲或皮肤真皮病。

10. 发明授权

US07660308B2 Transmission apparatus 失效
标题翻译：传输装置
公开(公告)号：US07660308B2
公开(公告)日：2010-02-09
申请号：US11583117
申请日：2006-10-19
申请人： Kenichi Hasegawa , Akira Nozawa , Minoru Tateno , Kenichi Miyama
发明人： Kenichi Hasegawa , Akira Nozawa , Minoru Tateno , Kenichi Miyama
IPC分类号： H04L12/46
CPC分类号： H04L49/102 , H04L49/3009 , H04L49/357 , H04L49/552 , H04L49/557
摘要： A transmission apparatus that does not include a plurality of switches, that cross-connects a signal, and that can handle various redundancy settings determined by a user. An address information generation section generates address information indicative of the destination of a signal, from redundancy setting information and cross connect setting information. An activation information setting section activates and deactivates activation information included in the address information when failure occurs. An address information insertion section inserts the address information stored in an address information storage section into the signal and outputs the signal to a bus. A signal output section receives the signal having the address information that is the same as own address information and outputs the signal to a next stage in the case of the activation information indicating activation.
摘要翻译：不包括多个开关的传输装置，其交叉连接信号，并且可以处理由用户确定的各种冗余设置。地址信息生成部从冗余设定信息和交叉连接设定信息生成表示信号的目的地的地址信息。当发生故障时，激活信息设置部分激活和停用包括在地址信息中的激活信息。地址信息插入部将存储在地址信息存储部中的地址信息插入到信号中，并将该信号输出到总线。信号输出部分接收具有与自身地址信息相同的地址信息的信号，并且在激活信息指示激活的情况下将信号输出到下一级。

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