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1. 发明授权

US08221551B2 Apparatus for producing a reflector 有权
标题翻译：用于制造反射器的装置
公开(公告)号：US08221551B2
公开(公告)日：2012-07-17
申请号：US12307312
申请日：2007-06-07
申请人： Masayuki Iljima , Yosuke Kobayashi , Kouji Hirayama , Yusuke Hashimoto , Ryuji Hamada , Ken Momono , Atsushi Nakatsuka
发明人： Masayuki Iljima , Yosuke Kobayashi , Kouji Hirayama , Yusuke Hashimoto , Ryuji Hamada , Ken Momono , Atsushi Nakatsuka
IPC分类号： B01J19/08 , C23C16/54
CPC分类号： C23C28/00 , G02B5/0808
摘要： Provided is a deposition apparatus that has a metal evaporation source for depositing a reflective layer, a pigment evaporation source for depositing a coloring layer, and a plasma polymerization source (electrode) for depositing a protective layer disposed inside a single vacuum processing room. By carrying out a step of depositing the reflective layer, a step of depositing the coloring layer, and a step of depositing the protective layer in the common vacuum processing room, processes can be simplified and an operation time can be reduced.
摘要翻译：提供了一种沉积设备，其具有用于沉积反射层的金属蒸发源，用于沉积着色层的颜料蒸发源和用于沉积设置在单个真空处理室内的保护层的等离子体聚合源（电极）。通过进行沉积反射层的步骤，沉积着色层的步骤和在普通真空处理室中沉积保护层的步骤可以简化并且可以减少操作时间。

2. 发明申请

US20090208664A1 APPARATUS AND METHOD FOR PRODUCING A REFLECTOR 有权
标题翻译：用于制造反射器的装置和方法
公开(公告)号：US20090208664A1
公开(公告)日：2009-08-20
申请号：US12307312
申请日：2007-06-07
申请人： Masayuki Iijima , Yosuke Kobayashi , Kouji Hirayama , Yusuke Hashimoto , Ryuji Hamada , Ken Momono , Atsushi Nakatsuka
发明人： Masayuki Iijima , Yosuke Kobayashi , Kouji Hirayama , Yusuke Hashimoto , Ryuji Hamada , Ken Momono , Atsushi Nakatsuka
IPC分类号： B01J19/08 , C23C16/54
CPC分类号： C23C28/00 , G02B5/0808
摘要： Provided is a deposition apparatus that has a metal evaporation source for depositing a reflective layer, a pigment evaporation source for depositing a coloring layer, and a plasma polymerization source (electrode) for depositing a protective layer disposed inside a single vacuum processing room. By carrying out a step of depositing the reflective layer, a step of depositing the coloring layer, and a step of depositing the protective layer in the common vacuum processing room, processes can be simplified and an operation time can be reduced.
摘要翻译：提供了一种沉积设备，其具有用于沉积反射层的金属蒸发源，用于沉积着色层的颜料蒸发源和用于沉积设置在单个真空处理室内的保护层的等离子体聚合源（电极）。通过进行沉积反射层的步骤，沉积着色层的步骤和在普通真空处理室中沉积保护层的步骤可以简化并且可以减少操作时间。

3. 发明申请

US20110001593A1 PERMANENT MAGNET AND METHOD OF MANUFACTURING SAME 有权
标题翻译：永磁体及其制造方法
公开(公告)号：US20110001593A1
公开(公告)日：2011-01-06
申请号：US12519884
申请日：2007-12-19
申请人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
发明人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
IPC分类号： H01F7/02 , B05D5/00
CPC分类号： H01F41/026 , H01F1/0577 , H01F7/02 , H01F41/0293
摘要： By eliminating the necessity of a prior step for cleaning a sintered magnet before adhering Dy and/or Tb to the surface of the sintered magnet S, the productivity of a permanent magnet having diffused Dy and/or Tb into grain boundary phase is improved. Iron-boron-rare earth based sintered magnet (S) disposed in a processing chamber (20) is heated to a predetermined temperature. An evaporating material (V) which is made of a hydride containing at least one of Dy and Tb is disposed in the same or in another processing chamber and is evaporated to cause the evaporated evaporating material to the surface of the sintered magnet. Metal atoms of Dy and/or Tb are diffused into grain boundary phase of the sintered magnet.
摘要翻译：通过消除在将Dy和/或Tb粘附到烧结磁体S的表面之前清洁烧结磁体的先前步骤的必要性，具有扩散的Dy和/或Tb的永磁体的生产率提高到晶界相。设置在处理室（20）中的铁 - 硼 - 稀土类烧结磁体（S）被加热到预定温度。将由含有Dy和Tb中的至少一种的氢化物制成的蒸发材料（V）设置在同一处理室中或在另一个处理室中，蒸发而使蒸发的蒸发材料到烧结磁体的表面。 Dy和/或Tb的金属原子扩散到烧结磁体的晶界相。

4. 发明申请

US20100055311A1 Film Conveyor Apparatus and Roll-to-Roll Vacuum Deposition Method 审中-公开
标题翻译：薄膜输送设备和卷对卷真空沉积方法
公开(公告)号：US20100055311A1
公开(公告)日：2010-03-04
申请号：US12597916
申请日：2008-04-18
申请人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka
发明人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka
IPC分类号： C23C16/44 , C23C16/00 , B65G13/00
CPC分类号： C23C14/562 , B65H27/00 , B65H2701/1315
摘要： [Object] To enable a deposition area of a base film to be protected and realize stable film traveling performance.[Solving Means] A roll-to-roll vacuum deposition apparatus according to the present invention includes a guide unit including a guide roller and an auxiliary roller, the guide roller including a pair of annular guide portions that support side edge portions of a base film, the auxiliary roller being opposed to the guide roller and pressing the side edge portions of the base film against the pair of guide portions. As a result, a deposition area of the base film and roll surfaces of the guide roller and auxiliary roller of the guide unit can be prevented from being brought into contact with each other, and the deposition area) can thus be protected.
摘要翻译：为了使基膜的沉积区域得到保护并且实现稳定的膜行进性能。本发明的卷绕式真空蒸镀装置具备：引导部，其具有引导辊和辅助辊，所述引导辊包括一对环状的引导部，所述导向部支承基膜的侧缘部辅助辊与引导辊相对并将基膜的侧边缘部分压靠在一对引导部上。结果，可以防止基膜的沉积区域和引导单元的引导辊和辅助辊的辊表面彼此接触，从而可以保护沉积区域）。

5. 发明授权

US08333841B2 Roll-to-roll vacuum deposition apparatus 有权
标题翻译：卷对卷真空沉积设备
公开(公告)号：US08333841B2
公开(公告)日：2012-12-18
申请号：US12374675
申请日：2007-07-26
申请人： Nobuhiro Hayashi , Tomoharu Fujii , Isao Tada , Atsushi Nakatsuka
发明人： Nobuhiro Hayashi , Tomoharu Fujii , Isao Tada , Atsushi Nakatsuka
IPC分类号： C23C16/00
CPC分类号： C23C14/042 , B05C1/0821 , B05C1/083 , B05C1/0834 , C23C14/562 , H01G13/00 , H01G13/006
摘要： [Object] To provide a roll-to-roll vacuum deposition apparatus capable of easily and speedily adjusting a pressing force between a printing roller and a backup roller.[Solving Means] In the present invention, by adjusting a pressing force between a printing roller and a backup roller through a relative movement of a mask forming unit including the printing roller and a transfer roller with respect to a vacuum chamber, individual adjustments of the printing roller and the transfer roller are eliminated and an adjustment of a pressing force on a unit basis is realized, thus achieving simplification of a structure, simplification and enhancement in precision of tasks, and a reduction in work time.
摘要翻译：本发明提供能够容易且快速地调整印刷辊和支承辊之间的按压力的卷对卷真空成膜装置。解决方案在本发明中，通过相对于真空室通过包括印刷辊和转印辊的掩模形成单元的相对运动调节印刷辊和支撑辊之间的按压力，可以对印刷辊和转印辊被消除，并且实现了基于单元的按压力的调节，从而实现了结构的简化，简化和提高了任务精度以及减少了工作时间。

6. 发明授权

US07670433B2 Vacuum deposition apparatus of the winding type 有权
标题翻译：卷绕式真空沉积设备
公开(公告)号：US07670433B2
公开(公告)日：2010-03-02
申请号：US11630761
申请日：2006-02-14
申请人： Nobuhiro Hayashi , Shin Yokoi , Isao Tada , Atsushi Nakatsuka
发明人： Nobuhiro Hayashi , Shin Yokoi , Isao Tada , Atsushi Nakatsuka
IPC分类号： C23C16/00 , C23C14/00
CPC分类号： C23C14/042 , C23C14/54 , C23C14/562
摘要： The problem solved by this Invention is to provide a vacuum evaporation deposition method of the winding type and a vacuum evaporation deposition apparatus of the winding type which can form a metal film on a base film made of single layer plastic film without thermal deformation and with superior productivity. To solve the above problem, there are provided an electron beam irradiator 21 for irradiating an electron beam onto a film material 12 arranged between an unwinding roller 13 and a deposition source 16; an auxiliary roller 18 for guiding the film 12 in contact with the deposited metal layer and arranged between a can roller 14 and a winding roller 15; a DC bias power source 22 for applying a DC voltage between the auxiliary roller 18 and the can roller 14; electricity removing unit 23 for removing electricity from the film 12 and arranged between the can roller 14 and the winding roller 15. The electricity removing unit 23 is a plasma generating source of the DC dipolar discharge type wherein one of its electrodes is earthed.
摘要翻译：本发明解决的问题是提供一种绕线式真空蒸发沉积方法和一种可在无热变形的单层塑料薄膜制成的基膜上形成金属薄膜的卷绕型真空蒸镀装置，生产率。为了解决上述问题，提供了一种用于将电子束照射到布置在退绕辊13和沉积源16之间的薄膜材料12上的电子束照射器21; 用于引导与沉积的金属层接触并且布置在罐辊14和卷绕辊15之间的膜12的辅助辊18; 用于在辅助辊18和罐辊14之间施加DC电压的DC偏压电源22; 电力去除单元23，用于从膜12移除电力并且布置在罐辊14和卷绕辊15之间。除电单元23是其中一个电极接地的直流偶极放电类型的等离子体发生源。

7. 发明申请

US20070259105A1 Vacuum Deposition Apparatus of the Winding Type 有权
标题翻译：绕线式真空沉积设备
公开(公告)号：US20070259105A1
公开(公告)日：2007-11-08
申请号：US11630761
申请日：2006-02-14
申请人： Nobuhiro Hayashi , Shin Yoki , Isao Tada , Atsushi Nakatsuka
发明人： Nobuhiro Hayashi , Shin Yoki , Isao Tada , Atsushi Nakatsuka
IPC分类号： C23C14/56
CPC分类号： C23C14/042 , C23C14/54 , C23C14/562
摘要： The problem solved by this Invention is to provide a vacuum evaporation deposition method of the winding type and a vacuum evaporation deposition apparatus of the winding type which can form a metal film on a base film made of single layer plastic film without thermal deformation and with superior productivity. To solve the above problem, there are provided an electron beam irradiator 21 for irradiating an electron beam onto a film material 12 arranged between an unwinding roller 13 and a deposition source 16; an auxiliary roller 18 for guiding the film 12 in contact with the deposited metal layer and arranged between a can roller 14 and a winding roller 15; a DC bias power source 22 for applying a DC voltage between the auxiliary roller 18 and the can roller 14; electricity removing unit 23 for removing electricity from the film 12 and arranged between the can roller 14 and the winding roller 15. The electricity removing unit 23 is a plasma generating source of the DC dipolar discharge type wherein one of its electrodes is earthed.
摘要翻译：本发明解决的问题是提供一种绕线式真空蒸发沉积方法和一种可在无热变形的单层塑料薄膜制成的基膜上形成金属薄膜的卷绕型真空蒸镀装置，生产率。为了解决上述问题，提供了一种用于将电子束照射到布置在退绕辊13和沉积源16之间的薄膜材料12上的电子束照射器21; 用于引导与沉积的金属层接触并且布置在罐辊14和卷绕辊15之间的膜12的辅助辊18; 用于在辅助辊18和罐辊14之间施加DC电压的DC偏压电源22; 电除去单元23，用于从薄膜12移除电力并且布置在罐辊14和卷绕辊15之间。除电单元23是其中一个电极接地的直流偶极放电类型的等离子体发生源。

8. 发明申请

US20070134426A1 Vacuum evaporation deposition method of the winding type and vacuum evaporation deposition apparatus of the same 审中-公开
标题翻译：卷取式真空蒸镀法和真空蒸镀沉积装置相同
公开(公告)号：US20070134426A1
公开(公告)日：2007-06-14
申请号：US10574715
申请日：2004-11-12
申请人： Nobuhiro Hayashi , Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka
发明人： Nobuhiro Hayashi , Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka
IPC分类号： B05D3/00 , C23C8/00 , H05B6/02 , C23C16/00 , B29C71/04
CPC分类号： C23C14/562 , C23C14/022 , G11B5/85
摘要： The invention provides a vacuum evaporation deposition method of the winding type and a vacuum evaporation deposition apparatus of the winding type which can form a metal film on a base film made of a single layer of insulating material such as plastic film without thermal deformation, and which is superior in productivity. An electron beam irradiator 21 irradiates an electron beam onto an insulating material base film 12 before deposition of metal, and a DC bias power source 22 applies bias voltage between an auxiliary roller 18 for guiding the base film 12 with metal film deposited thereon and a can roller 14, whereby the base film 12 charged by the irradiation of the electron beam before the deposition of metal film, is made to be in close contact with the can roller 14. The base film 12 after deposition of metal film is made to be in close contact with the can roller 14 by the bias voltage applied between the auxiliary roller 18 connected electrically to the metal film and the can roller 14.
摘要翻译：本发明提供一种绕线式真空蒸发沉积方法和一种绕线式的真空蒸发沉积设备，该真空蒸镀沉积设备可以在由单层绝缘材料如塑料薄膜制成的基膜上形成金属膜而不会发生热变形，生产力优越。电子束照射器21在沉积金属之前将电子束照射到绝缘材料基膜12上，并且DC偏压电源22在用于引导基膜12的辅助辊18与其上沉积有金属膜的辅助辊18之间施加偏置电压，辊14，由此通过在沉积金属膜之前通过电子束的照射而充电的基膜12被制成与罐辊14紧密接触。通过施加在与金属膜电连接的辅助辊18和罐辊14之间的偏压施加金属膜沉积后的基膜12与罐辊14紧密接触。

9. 发明授权

US08673392B2 Permanent magnet and method of manufacturing same 有权
标题翻译：永磁体及其制造方法
公开(公告)号：US08673392B2
公开(公告)日：2014-03-18
申请号：US12440748
申请日：2007-09-10
申请人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
发明人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
IPC分类号： H01F7/02 , H01F1/053
CPC分类号： H01F7/0221 , C23C14/18 , C23C14/24 , C23C14/243 , C23C14/5806 , H01F1/0577 , H01F41/0293
摘要： A permanent magnet is provided which has formed a Dy, Tb film on a surface of an iron-boron-rare earth sintered magnet of a predetermined shape, with diffusion thereof into grain boundary phases, having a higher coercive force. The method of manufacturing a permanent magnet includes a film-forming step of evaporating metal evaporating material containing at least one of Dy and Tb and adhering evaporated metal atoms to a surface of the iron-boron-rare earth sintered magnet, and a diffusing step of performing heat treatment to diffuse metal atoms adhered to the surface into grain boundary phases of the sintered magnet. The metal evaporating material contains at least one of Nd and Pr.
摘要翻译：提供一种永磁体，其在具有预定形状的铁 - 硼 - 稀土烧结磁体的表面上形成Dy，Tb膜，并将其扩散到具有较高矫顽力的晶界相中。制造永磁体的方法包括：蒸发含有Dy和Tb中的至少一种的金属蒸发材料并将蒸发的金属原子附着在铁 - 硼 - 稀土烧结磁体的表面上的成膜步骤，以及扩散步骤进行热处理，将附着在表面的金属原子扩散到烧结磁体的晶界相。金属蒸发材料含有Nd和Pr中的至少一种。

10. 发明授权

US08128759B2 Permanent magnet and method of manufacturing same 有权
标题翻译：永磁体及其制造方法
公开(公告)号：US08128759B2
公开(公告)日：2012-03-06
申请号：US12519871
申请日：2007-12-19
申请人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
发明人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
IPC分类号： H01F1/057
CPC分类号： H01F1/0577 , H01F41/0293
摘要： By causing at least one of Dy and Tb to be adhered to the surface of an iron-boron-rare earth based sintered magnet of a predetermined shape, and is then to be diffused into grain boundary phase, a permanent magnet can be manufactured at high workability and low cost. An iron-boron-rare earth based sintered magnet is disposed in a processing chamber and is heated to a predetermined temperature. Also, an evaporating material made up of a fluoride containing at least one of Dy and Tb disposed in the same or another processing chamber is evaporated, and the evaporated evaporating material is caused to be adhered to the surface of the sintered magnet. The Dy and/or Tb metal atoms of the adhered evaporating material are diffused into the grain particle phase of the sintered magnet before a thin film made of the evaporated material is formed on the surface of the sintered magnet.
摘要翻译：通过使Dy和Tb中的至少一种粘附到具有预定形状的铁 - 硼 - 稀土类烧结磁体的表面上，然后被扩散到晶界相中，可以高度制造永久磁铁可操作性和低成本。将铁 - 硼 - 稀土类烧结磁体设置在处理室中并加热至预定温度。此外，由含有设置在相同或另一处理室中的Dy和Tb中的至少一种的氟化物构成的蒸发材料蒸发，使蒸发的蒸发材料附着在烧结磁体的表面。在烧结磁体的表面上形成由蒸发材料制成的薄膜之前，附着的蒸发材料的Dy和/或Tb金属原子扩散到烧结磁体的颗粒相。

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