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    • 3. 发明授权
    • Vacuum vapor processing apparatus
    • 真空蒸气处理装置
    • US08375891B2
    • 2013-02-19
    • US12440635
    • 2007-09-10
    • Hiroshi NagataKyuzo NakamuraTakeo KatouAtsushi NakatsukaIchirou MukaeMasami ItouRyou YoshiizumiYoshinori Shingaki
    • Hiroshi NagataKyuzo NakamuraTakeo KatouAtsushi NakatsukaIchirou MukaeMasami ItouRyou YoshiizumiYoshinori Shingaki
    • C23C16/448C23C16/455C23C16/458C23C16/46C23F1/00H01L21/306C23C16/06C23C16/22
    • C23C14/24H01F41/0293
    • There is provided a vacuum evaporating apparatus which is suitable for performing a process in which a metal vapor atmosphere is formed in a processing chamber, the metal atoms in this metal vapor atmosphere are caused to be adhered to the surface of an object to be processed, and the metal atoms adhered to the surface of the object to be processed are diffused into grain boundary phases thereof. The apparatus comprises: a processing furnace (11); at least one processing box (4) disposed inside the processing furnace; and a heating means (2) provided inside the processing furnace so as to enclose the processing box. An evacuating means is provided which, after housing the processing box inside the processing furnace in a state in which the object to be processed (S) and the metal evaporating material (V) are disposed in the processing box, reduces the processing furnace and the processing box to a predetermined pressure and keep them at that pressure. The heating means is operated in the reduced pressure to evaporate the metal evaporating material while increasing the object to be processed to a predetermined temperature. The evaporated metal atoms are supplied to the surface of the object to be processed.
    • 提供了一种真空蒸发装置,其适于进行在处理室中形成金属蒸汽气氛的过程,使金属蒸气气氛中的金属原子粘附到待处理物体的表面, 并且附着在待处理物体表面的金属原子扩散到其晶界相。 该装置包括:加工炉(11); 设置在处理炉内的至少一个处理箱(4) 以及设置在处理炉内部以包围处理盒的加热装置(2)。 本发明提供一种排气装置,其特征在于,处理炉内处理箱内处理箱体(S)和金属蒸发材料(V)的状态被设置在处理箱内时,将加工炉和 处理箱到预定的压力并保持在该压力下。 加热装置在减压下操作以蒸发金属蒸发材料,同时将待处理物体增加到预定温度。 蒸发的金属原子被供应到待处理物体的表面。
    • 9. 发明申请
    • VACUUM VAPOR PROCESSING APPARATUS
    • 真空蒸汽加工设备
    • US20100012035A1
    • 2010-01-21
    • US12440635
    • 2007-09-10
    • Hiroshi NagataKyuzo NakamuraTakeo KatouAtsushi NakatsukaIchirou MukaeMasami ItouRyou YoshiizumiYoshinori Shingaki
    • Hiroshi NagataKyuzo NakamuraTakeo KatouAtsushi NakatsukaIchirou MukaeMasami ItouRyou YoshiizumiYoshinori Shingaki
    • C23C14/14C23C14/24
    • C23C14/24H01F41/0293
    • There is provided a vacuum evaporating apparatus which is suitable for performing a process in which a metal vapor atmosphere is formed in a processing chamber, the metal atoms in this metal vapor atmosphere are caused to be adhered to the surface of an object to be processed, and the metal atoms adhered to the surface of the object to be processed are diffused into grain boundary phases thereof. The apparatus comprises: a processing furnace (11); at least one processing box (4) disposed inside the processing furnace; and a heating means (2) provided inside the processing furnace so as to enclose the processing box. An evacuating means is provided which, after housing the processing box inside the processing furnace in a state in which the object to be processed (S) and the metal evaporating material (V) are disposed in the processing box, reduces the processing furnace and the processing box to a predetermined pressure and keep them at that pressure. The heating means is operated in the reduced pressure to evaporate the metal evaporating material while increasing the object to be processed to a predetermined temperature. The evaporated metal atoms are supplied to the surface of the object to be processed.
    • 提供了一种真空蒸发装置,其适于进行在处理室中形成金属蒸汽气氛的过程,使金属蒸气气氛中的金属原子粘附到待处理物体的表面, 并且附着在待处理物体表面的金属原子扩散到其晶界相。 该装置包括:加工炉(11); 设置在处理炉内的至少一个处理箱(4) 以及设置在处理炉内部以包围处理盒的加热装置(2)。 本发明提供一种排气装置,其特征在于,处理炉内处理箱内处理箱体(S)和金属蒸发材料(V)的状态被设置在处理箱内时,将加工炉和 处理箱到预定的压力并保持在该压力下。 加热装置在减压下操作以蒸发金属蒸发材料,同时将待处理物体增加到预定温度。 蒸发的金属原子被供应到待处理物体的表面。