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    • 4. 发明授权
    • Deflector array, exposure apparatus, and device manufacturing method
    • 偏转器阵列,曝光装置和装置制造方法
    • US08143588B2
    • 2012-03-27
    • US12815507
    • 2010-06-15
    • Kenichi NagaeMasatoshi Kanamaru
    • Kenichi NagaeMasatoshi Kanamaru
    • G21K1/087
    • H01J37/1477B82Y10/00B82Y40/00H01J37/30H01J37/3174H01J2237/0437H01J2237/1518
    • A deflector array includes a plurality of deflectors, which deflect charged particle beams, arrayed on a substrate. Each of the plurality of deflectors includes a single opening formed in the substrate, and each of the plurality of deflectors includes a pair of electrodes that oppose each other through the opening and are configured to deflect a single charged particle beam. The plurality of deflectors are arrayed such that a length of the pair of electrodes in a longitudinal direction thereof is not less than a distance between centers of two of the plurality of deflectors that are located nearest to each other. The plurality of deflectors is arrayed to form a checkerboard lattice, and two openings of the two of the plurality of deflectors overlap in the longitudinal direction.
    • 偏转器阵列包括多个偏转器,其偏转排列在基板上的带电粒子束。 多个偏转器中的每一个包括形成在基板中的单个开口,并且多个偏转器中的每一个包括通过开口彼此相对的一对电极,并且被配置为偏转单个带电粒子束。 多个偏转器被排列成使得一对电极在其纵向方向上的长度不小于彼此最靠近的多个偏转器中的两个偏转器的中心之间的距离。 排列多个偏转器以形成棋盘格格,并且多个偏转器中的两个的两个开口在纵向方向上重叠。