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    • 3. 发明授权
    • Two-dimensional linear B-scan ultrasound diagnostic apparatus with phase
and amplitude tapering
    • 二维线性B扫描超声诊断仪具有相位和幅度逐渐减小
    • US4224829A
    • 1980-09-30
    • US962609
    • 1978-11-21
    • Masami KawabuchiJun-ichi SatoKiyotaka NagaiHiroshi FukukitaAkira Fukumoto
    • Masami KawabuchiJun-ichi SatoKiyotaka NagaiHiroshi FukukitaAkira Fukumoto
    • A61B8/00A61B8/14G01N29/04G01N29/06G01S7/52G10K11/34G01N29/00
    • G10K11/345G01N29/06G01N29/245G01S7/5206
    • An ultrasound diagnostic apparatus includes a linear array of piezoelectric transducers or plates with a width-to-thickness ratio of less than 0.8 and a control circuit which includes a transmitter and a receiver. The transmitter comprises a plurality of transmitting channels each including a local oscillator for generating an ultrasonic pulse in response to a clock signal. The plurality of such ultrasonic pulses are applied through a switching network to a selected group of successively arranged piezoelectric transducers to transmit a beam of ultrasonic energy into a human body. Each of the ultrasonic pulses is phase shifted and amplitude modulated with respect to the ultrasonic pulses of the other transmitting channels to provide phase and amplitude taper which results in a narrow width beam through the depth of the body. The ultrasonic energy returned from discontinuities between different tissues is detected by the activated transducers and applied through the switching network to the receiver in which each of the return signals is phase shifted and amplitude modulated with respect to the other signals to provide an output signal which is displayed on a cathode ray tube screen.
    • 超声波诊断装置包括宽度与厚度比小于0.8的压电换能器或板的线性阵列和包括发射器和接收器的控制电路。 发射机包括多个发射信道,每个发射信道包括响应于时钟信号产生超声波脉冲的本地振荡器。 多个这样的超声波脉冲通过切换网络施加到所选择的一组连续布置的压电换能器,以将超声能量束传输到人体内。 每个超声波脉冲相对于其他发射通道的超声波脉冲进行相移和幅度调制,以提供相位和幅度锥度,这导致通过身体深度的窄宽度束。 通过激活的换能器检测从不同组织之间的不连续性返回的超声能量,并通过开关网络将其施加到接收机,其中每个返回信号相对于其他信号被相移和幅度调制以提供输出信号, 显示在阴极射线管屏幕上。
    • 4. 发明授权
    • Semiconductor device and manufacturing method thereof
    • 半导体装置及其制造方法
    • US07528442B2
    • 2009-05-05
    • US11399441
    • 2006-04-07
    • Akira FukumotoRie Watanabe
    • Akira FukumotoRie Watanabe
    • H01L29/72
    • H01L29/1083H01L29/7833
    • In this invention, the semiconductor device is provided with a gate electrode formed on a gate insulating film in a region sectioned by an element isolation formed on a semiconductor layer of the first conduction type, and a source region and a drain region of the second conduction type. At least one of the source region and the drain region has a first low concentration region and a high concentration region. Also, the semiconductor device of the present invention is provided with a second low concentration region of the second conduction type between a channel stopper region formed below the element isolation and the source region, and between the channel stopper region and the drain region. The semiconductor layer immediately below the gate electrode projects to the channel stopper region side along the gate electrode, and the semiconductor layer and the channel stopper region make contact with each other.
    • 在本发明中,半导体器件设置有形成在栅极绝缘膜上的栅电极,该栅电极由形成在第一导电类型的半导体层上的元件隔离区域和第二导电的源极区域和漏极区域 类型。 源极区域和漏极区域中的至少一个具有第一低浓度区域和高浓度区域。 此外,本发明的半导体器件在第一导电类型的第二低浓度区域之间设置在形成于元件隔离部之下的沟道阻挡区域与源极区域之间以及沟道阻挡区域与漏极区域之间。 栅电极正下方的半导体层沿着栅极突出到沟道截止区侧,半导体层和沟道截止区相互接触。
    • 8. 发明申请
    • SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
    • 半导体器件及其制造方法
    • US20090203179A1
    • 2009-08-13
    • US12423332
    • 2009-04-14
    • Akira FukumotoRie Watanabe
    • Akira FukumotoRie Watanabe
    • H01L21/8234
    • H01L29/1083H01L29/7833
    • In this invention, the semiconductor device is provided with a gate electrode formed on a gate insulating film in a region sectioned by an element isolation formed on a semiconductor layer of the first conduction type, and a source region and a drain region of the second conduction type. At least one of the source region and the drain region has a first low concentration region and a high concentration region. Also, the semiconductor device of the present invention is provided with a second low concentration region of the second conduction type between a channel stopper region formed below the element isolation and the source region, and between the channel stopper region and the drain region. The semiconductor layer immediately below the gate electrode projects to the channel stopper region side along the gate electrode, and the semiconductor layer and the channel stopper region make contact with each other.
    • 在本发明中,半导体器件设置有形成在栅极绝缘膜上的栅电极,该栅电极由形成在第一导电类型的半导体层上的元件隔离区域和第二导电的源极区域和漏极区域 类型。 源极区域和漏极区域中的至少一个具有第一低浓度区域和高浓度区域。 此外,本发明的半导体器件在第一导电类型的第二低浓度区域之间设置在形成于元件隔离部之下的沟道阻挡区域与源极区域之间以及沟道阻挡区域与漏极区域之间。 栅电极正下方的半导体层沿着栅极突出到沟道截止区侧,半导体层和沟道截止区相互接触。
    • 10. 发明授权
    • Solid state imaging device and a method of driving the same
    • 固态成像装置及其驱动方法
    • US06248133B1
    • 2001-06-19
    • US08631834
    • 1996-04-10
    • Hiroyoshi KomobuchiAkira FukumotoTakahiro YamadaTakao KurodaYuji Matsuda
    • Hiroyoshi KomobuchiAkira FukumotoTakahiro YamadaTakao KurodaYuji Matsuda
    • H04M5335
    • H01L27/14806
    • A solid state imaging device has: a first polysilicon layer 901; a second polysilicon layer 902; a photoelectric converting portion or PD 903; a read gate 904; a read channel 905 (in this case, an N-layer) which is formed in a semiconductor below the read gate; a P-layer 906 which prevents a signal charge from erroneously entering a VCCD of a unit pixel adjacent in a horizontal direction; a P-layer 907 which defines the transfer channel region of a VCCD; and a VCCD 908 which transfers a signal charge in the direction of the arrows. A unit pixel 900 is indicated by a one-dot chain line. The two-dimensionally arrayed solid state imaging device is driven by driving pulses of eight phases in total, namely, a driving pulse &phgr;V1 911, a driving pulse &phgr;V2 912, a driving pulse &phgr;V3 913, a driving pulse &phgr;V4 914, a driving pulse &phgr;V5 915, a driving pulse &phgr;V6 916, a driving pulse &phgr;V7 917, and a driving pulse &phgr;V8 918.
    • 固态成像装置具有:第一多晶硅层901; 第二多晶硅层902; 光电转换部分或PD 903; 读门904; 在读取栅极下方形成半导体的读通道905(在这种情况下为N层); P层906,其防止信号电荷错误地进入水平方向相邻的单位像素的VCCD; 限定VCCD的传输通道区域的P层907; 以及VCCD 908,其沿箭头方向传送信号电荷。 单位像素900由单点划线表示。 二维排列的固态成像装置由驱动脉冲phiV1 911,驱动脉冲phiV2 912,驱动脉冲phiV3 913,驱动脉冲phiV4 914,驱动脉冲phiV5 驱动脉冲phiV6 916,驱动脉冲phiV7 917,驱动脉冲phiV8 918。