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1. 发明申请

US20130298398A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD 审中-公开
标题翻译：感光性树脂组合物，感光元件，形成耐火图案的方法以及制造印刷线路板的方法
公开(公告)号：US20130298398A1
公开(公告)日：2013-11-14
申请号：US13885442
申请日：2011-11-15
申请人： Masahiro Miyasaka , Masaki Endou , Masataka Kushida , Yukiko Muramatsu , Makoto Kaji
发明人： Masahiro Miyasaka , Masaki Endou , Masataka Kushida , Yukiko Muramatsu , Makoto Kaji
IPC分类号： G03F7/004 , H05K3/10
CPC分类号： G03F7/004 , G03F7/027 , G03F7/031 , G03F7/033 , G03F7/38 , H05K3/10 , Y10T29/49155
摘要： The invention relates to a photosensitive resin composition comprising a binder polymer having a (meth)acrylic acid-based structural unit, with a dispersity (weight-average molecular weight/number-average molecular weight) of no greater than 1.6, a photopolymerizable compound, a photopolymerization initiator and a sensitizing dye.
摘要翻译：本发明涉及一种感光性树脂组合物，其包含具有（甲基）丙烯酸系结构单元的粘合剂聚合物，分散性（重均分子量/数均分子量）为1.6以下，光聚合性化合物，光聚合引发剂和增感染料。

2. 发明授权

US07622243B2 Photosensitive element, resist pattern formation method and printed wiring board production method 有权
标题翻译：感光元件，抗蚀剂图案形成方法和印刷线路板制造方法
公开(公告)号：US07622243B2
公开(公告)日：2009-11-24
申请号：US10572859
申请日：2004-09-17
申请人： Takashi Kumaki , Masahiro Miyasaka , Yasuhisa Ichihashi , Toshiki Ito , Makoto Kaji
发明人： Takashi Kumaki , Masahiro Miyasaka , Yasuhisa Ichihashi , Toshiki Ito , Makoto Kaji
IPC分类号： G03F7/00 , G03F7/04
CPC分类号： G03F7/029 , C08F2/50 , G03F7/031 , Y10S430/106 , Y10S430/114 , Y10S430/115
摘要： The present invention is a photosensitive element including a support and a photosensitive resin composition layer composed of a photosensitive resin composition containing (A) a binder polymer, (B) a photopolymerizable compound, and (C) a photopolymerization initiator, wherein, the photosensitive resin composition contains a thioxanthone-based compound represented by the following general formula (I) as the component (C), and when the parts by weight of the thioxanthone-based compound relative to 100 parts by weight for the total weight of the component (A) and the component (B) is taken to be P, and the film thickness of the photosensitive resin composition layer is taken to be Q (μm), then R, which is the product of P and Q, satisfies the condition of the following formula (1). In the following general formula (I), R1to R8 represent a hydrogen atom, halogen atom or hydrocarbon group. 25.5≦R≦79.0 (1) [Chemical Formula I]
摘要翻译：本发明是一种感光性元件，其特征在于，包含支持体和感光性树脂组合物层，所述感光性树脂组合物含有（A）粘合剂聚合物，（B）光聚合性化合物和（C）光聚合引发剂，组合物含有作为组分（C）的由以下通式（I）表示的噻吨酮基化合物，并且当相对于组分（A）的总重量相对于100重量份的噻吨酮系化合物的重量份），成分（B）为P，感光性树脂组合物层的膜厚取为Q（母体），则P和Q的乘积R满足以下条件公式1）。在下列通式（I）中，R 1至R 8表示氢原子，卤素原子或烃基。 25.5 [化学式I]

3. 发明申请

US20070105036A1 Photosensitive element, resist pattern formation method and printed wiring board production method 有权
标题翻译：感光元件，抗蚀剂图案形成方法和印刷线路板制造方法
公开(公告)号：US20070105036A1
公开(公告)日：2007-05-10
申请号：US10572859
申请日：2004-09-17
申请人： Takashi Kumaki , Masahiro Miyasaka , Yasuhisa Ichihashi , Toshiki Ito , Makoto Kaji
发明人： Takashi Kumaki , Masahiro Miyasaka , Yasuhisa Ichihashi , Toshiki Ito , Makoto Kaji
IPC分类号： G03C1/00
CPC分类号： G03F7/029 , C08F2/50 , G03F7/031 , Y10S430/106 , Y10S430/114 , Y10S430/115
摘要： The present invention is a photosensitive element including a support and a photosensitive resin composition layer composed of a photosensitive resin composition containing (A) a binder polymer, (B) a photopolymerizable compound, and (C) a photopolymerization initiator, wherein, the photosensitive resin composition contains a thioxanthone-based compound represented by the following general formula (I) as the component (C), and when the parts by weight of the thioxanthone-based compound relative to 100 parts by weight for the total weight of the component (A) and the component (B) is taken to be P, and the film thickness of the photosensitive resin composition layer is taken to be Q (μm), then R, which is the product of P and Q, satisfies the condition of the following formula (1). In the following general formula (I), R1 to R8 represent a hydrogen atom, halogen atom or hydrocarbon group. 25.5≦R≦79.0 (1) [Chemical Formula I]
摘要翻译：本发明是一种感光性元件，其特征在于，包含支持体和感光性树脂组合物层，所述感光性树脂组合物含有（A）粘合剂聚合物，（B）光聚合性化合物和（C）光聚合引发剂，组合物含有作为组分（C）的由以下通式（I）表示的噻吨酮基化合物，并且当相对于组分（A）的总重量相对于100重量份的噻吨酮系化合物的重量份），成分（B）为P，感光性树脂组合物层的膜厚取为Q（母体），则P和Q的乘积R满足以下条件公式1）。在下列通式（I）中，R 1至R 8表示氢原子，卤素原子或烃基。 <？in-line-formula description =“In-line Formulas”end =“lead”？> 25.5 <= R <= 79.0（1）<？in-line-formula description =“In-line Formulas”end = 尾“？> [化学式I]

4. 发明授权

US08696108B2 Printing press 有权
标题翻译：印刷机
公开(公告)号：US08696108B2
公开(公告)日：2014-04-15
申请号：US13322230
申请日：2010-05-21
申请人： Hideaki Sakurai , Shoichi Aoki , Makoto Kaji , Norifumi Tasaka
发明人： Hideaki Sakurai , Shoichi Aoki , Makoto Kaji , Norifumi Tasaka
IPC分类号： B41J2/01
CPC分类号： B41J3/546 , B41F13/02 , B41F19/007
摘要： In a printing press, it is configured such that a newspaper web offset printing press is composed by a feeder device, a printing device, a guiding device, a turn bar device, and a folding unit; as a guiding device, there are provided an upstream side guide roller and a downstream side guide roller which are disposed with a predetermined interval along a transportation direction of a web for guiding transportation of the web; and there is disposed an ink-jet printer for performing digital printing on the web guided between the guide rollers. By setting diameters of the upstream side guide roller and the downstream side guide roller to different values, vibration of the print medium which is transported while being guided by the guide rollers is suppressed, and the print quality is thereby improved.
摘要翻译：在印刷机中，由纸送纸装置，印刷装置，引导装置，转杆装置和折叠单元构成报纸卷筒纸胶版印刷机。作为引导装置，设置有沿着幅材的传送方向以预定间隔布置的上游侧引导辊和下游侧引导辊，用于引导幅材的传送; 并且设置有用于在引导辊之间引导的幅材上进行数字印刷的喷墨打印机。通过将上游侧引导辊和下游侧引导辊的直径设定为不同的值，可以抑制在被引导辊引导的同时传送的打印介质的振动，从而提高打印质量。

5. 发明授权

US06600053B2 Method of preparing photosensitive resin composition 有权
标题翻译：制备感光性树脂组合物的方法
公开(公告)号：US06600053B2
公开(公告)日：2003-07-29
申请号：US09941703
申请日：2001-08-30
申请人： Noriyoshi Arai , Makoto Kaji , Akihiro Sasaki , Toshiki Hagiwara
发明人： Noriyoshi Arai , Makoto Kaji , Akihiro Sasaki , Toshiki Hagiwara
IPC分类号： C07D40702
CPC分类号： G03F7/0388 , C07C69/76 , C07D307/89 , C08G73/10 , G03F7/0233 , G03F7/037 , G03F7/0382 , G03F7/0387 , G03F7/039 , G03F7/0392
摘要： A 6,6′-dialkyl-3,3′,4,4′-biphenyltetracarboxylic dianhydride is prepared by brominating a 4-alkylphthalic anhydride at its 5-position, and coupling the bromination product in the presence of a nickel catalyst; A photosensitive resin composition containing a polyimide precursor having repetitive units of general formula (7) is applied onto a substrate, exposed to i-line, developed and heated to form a polyimide relief pattern. wherein Y is a divalent organic group, R7 and R8 are OH or a monovalent organic group, R9 and R10 are a monovalent hydrocarbon group, R11, R12 and R13 are a monovalent hydrocarbon group, a and b are an integer of 0 to 2, c is an integer of 0 to 4, and m is an integer of 0 to 3.
摘要翻译：通过在其5位上溴化4-烷基邻苯二甲酸酐并在镍催化剂存在下偶联溴化产物来制备6,6'-二烷基-3,3'，4,4'-联苯四羧酸二酐。将含有具有通式（7）的重复单元的聚酰亚胺前体的感光性树脂组合物涂布在基板上，暴露于i线，显影加热形成聚酰亚胺浮雕图案。其中Y为二价有机基团，R7和R8 是OH或一价有机基团，R 9和R 10是一价烃基，R 11，R 12和R 13是一价烃基，a和b是0-2的整数，c是0-4的整数，m 是0〜3的整数。

6. 发明授权

US06329494B1 Photosensitive resin composition 有权
标题翻译：感光树脂组合物
公开(公告)号：US06329494B1
公开(公告)日：2001-12-11
申请号：US09431773
申请日：1999-11-01
申请人： Noriyoshi Arai , Makoto Kaji , Akihiro Sasaki , Toshiki Hagiwara
发明人： Noriyoshi Arai , Makoto Kaji , Akihiro Sasaki , Toshiki Hagiwara
IPC分类号： C08G7300
CPC分类号： G03F7/0388 , C07C69/76 , C07D307/89 , C08G73/10 , G03F7/0233 , G03F7/037 , G03F7/0382 , G03F7/0387 , G03F7/039 , G03F7/0392
摘要： A 6,6′-dialkyl-3,3′4,4′-biphenyltetracarboxylic dianhydride is prepared by brominating a 4-alkylphthalic anhydride at its 5-position, and coupling the bromination product in the presence of a nickel catalyst; A photosensitive resin composition containing a polyimide precursor having repetitive units of general formula (7) is applied onto a substrate, exposed to i-line, developed and heated to form a polyimide relief pattern wherein Y is a divalent organic group, R7 and R8 are OH or a monovalent organic group, R9 and R10 are a monovalent hydrocarbon group, R11, R12 and R13 are a monovalent hydrocarbon group, a and b are an integer of 0 to 2, c is an integer of 0 to 4, and m is an integer of 0 to 3.
摘要翻译：通过在其5位上溴化4-烷基邻苯二甲酸酐并在镍催化剂存在下偶联溴化产物来制备6,6'-二烷基-3,3,4,4'-联苯四羧酸二酐。将含有具有通式（7）的重复单元的聚酰亚胺前体的感光性树脂组合物涂布在基板上，暴露于i线，显影加热形成聚酰亚胺浮雕图案，其中Y为二价有机基团，R 7和R 8为OH 或一价有机基团，R 9和R 10为一价烃基，R 11，R 12和R 13为一价烃基，a和b为0〜2的整数，c为0〜4的整数，m为 0〜3的整数。

7. 发明授权

US5302725A Aryl triflate compounds and radiologically acid producing agents thereof 失效
标题翻译：芳基三氟甲磺酸酯化合物及其放射性酸产生剂
公开(公告)号：US5302725A
公开(公告)日：1994-04-12
申请号：US963754
申请日：1992-10-20
申请人： Makoto Kaji , S. Peter Pappas
发明人： Makoto Kaji , S. Peter Pappas
IPC分类号： G03F7/00 , C07C309/65 , C08F2/50 , G03F7/004 , G03F7/029 , G03F7/039 , G03H1/02 , H01L21/027 , H05K3/00 , C07D209/48
CPC分类号： G03F7/0045 , C07C309/65
摘要： Aryl triflate compounds can generate a strong acid when exposed to irradiation of radiation and can be used as an acid generator in a radiologically-acid-producing agent system and a radiosensitive composition.
摘要翻译：当暴露于辐射照射时，三氟甲磺酸芳酯化合物可以产生强酸，并且可以在放射性酸产生剂体系和放射敏感组合物中用作产酸剂。

8. 发明授权

US4987057A Photoinitiator and photopolymerizable composition using the same 失效
标题翻译：光引发剂和使用其的可光聚合组合物
公开(公告)号：US4987057A
公开(公告)日：1991-01-22
申请号：US355123
申请日：1989-05-22
申请人： Makoto Kaji , Nobuyuki Hayashi
发明人： Makoto Kaji , Nobuyuki Hayashi
IPC分类号： C08F2/50 , G03F7/028 , G03F7/031
CPC分类号： G03F7/031 , Y10S430/114 , Y10S430/117 , Y10S430/12 , Y10S430/121 , Y10S430/123 , Y10S430/125
摘要： A photoinitiator composition comprising (1) an aminobenzylidene carbonyl compound and (2) an N-aryl-.alpha.-amino acid is suitable for use in a photo-polymerizable composition comprising (a) an addition-polymerizable compound having a boiling point of 100.degree. C. or higher at an atmospheric pressure and (b) said photoinitiator composition.

9. 发明申请

US20070160937A1 Photocurable resin composition and a method for forming a pattern 有权
标题翻译：光固化树脂组合物和形成图案的方法
公开(公告)号：US20070160937A1
公开(公告)日：2007-07-12
申请号：US11622542
申请日：2007-01-12
申请人： Masahiko Ogino , Makoto Kaji , Hanako Yori
发明人： Masahiko Ogino , Makoto Kaji , Hanako Yori
IPC分类号： G03C5/00
CPC分类号： C08F2/48 , B82Y10/00 , B82Y40/00 , C08F220/18 , C08F222/1006 , C09D4/00 , G03F7/0002
摘要： A photocurable resin composition containing a photopolymerization initiator and a (meth)acrylate monomer and/or oligomer, said (meth)acrylate monomer or oligomer having a cyclic structure, in which the atomic weight of carbon (Mcr) in said cyclic structure and the number of whole carbon atoms (MTOT) in said composition have the relation of Mcr/MTOT>0.1, or the total number (N) of carbon atoms in said cyclic structure, the total number of carbon atoms (Nc) in said composition and the total number of oxygen atoms (No) have the relation of N/(Nc−No)
摘要翻译：含有光聚合引发剂和（甲基）丙烯酸酯单体和/或低聚物的所述（甲基）丙烯酸酯单体或低聚物的光固化性树脂组合物，其中所述环状结构中的碳原子量（Mcr）和数量在所述组合物中的全碳原子数（MTOT）具有Mcr / MTOT> 0.1的关系，或所述环状结构中的碳原子总数（N），所述组合物中的总碳数（Nc）和总计氧原子数（No）与N /（Nc-No）<4的关系，组合物的动力粘度为10mPa.s以下。该低粘度光固化性树脂组合物具有优异的耐干蚀刻性，适用于光学纳米打印。

10. 发明授权

US07153631B2 Pattern-forming process using photosensitive resin composition 有权
标题翻译：使用感光性树脂组合物的图案形成工艺
公开(公告)号：US07153631B2
公开(公告)日：2006-12-26
申请号：US10713036
申请日：2003-11-17
申请人： Hideo Hagiwara , Makoto Kaji , Masataka Nunomura
发明人： Hideo Hagiwara , Makoto Kaji , Masataka Nunomura
IPC分类号： G03F7/037
CPC分类号： G03F7/0387 , C08G73/10 , G03F7/0125 , G03F7/037 , G03F7/038 , G03F7/075 , H05K3/4676 , Y10S430/106 , Y10S430/107
摘要： There are disclosed a photosensitive resin composition which comprises (A) a polyamic acid having recurring units represented by the formula (I): wherein R1 represents and R2 represents a divalent organic group, and (B) an acryl compound having an amino group, and also a photosensitive resin composition for an i-line stepper which further comprises a photoinitiator in addition to the photosensitive resin composition.
摘要翻译：公开了一种光敏树脂组合物，其包含（A）具有由式（I）表示的重复单元的聚酰胺酸：其中R 1表示，R 2表示二价有机基团和（B）具有氨基的丙烯酸类化合物，以及除了感光性树脂组合物之外，还含有光引发剂的i线步进机用感光性树脂组合物。

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