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1. 发明授权

US5302725A Aryl triflate compounds and radiologically acid producing agents thereof 失效
标题翻译：芳基三氟甲磺酸酯化合物及其放射性酸产生剂
公开(公告)号：US5302725A
公开(公告)日：1994-04-12
申请号：US963754
申请日：1992-10-20
申请人： Makoto Kaji , S. Peter Pappas
发明人： Makoto Kaji , S. Peter Pappas
IPC分类号： G03F7/00 , C07C309/65 , C08F2/50 , G03F7/004 , G03F7/029 , G03F7/039 , G03H1/02 , H01L21/027 , H05K3/00 , C07D209/48
CPC分类号： G03F7/0045 , C07C309/65
摘要： Aryl triflate compounds can generate a strong acid when exposed to irradiation of radiation and can be used as an acid generator in a radiologically-acid-producing agent system and a radiosensitive composition.
摘要翻译：当暴露于辐射照射时，三氟甲磺酸芳酯化合物可以产生强酸，并且可以在放射性酸产生剂体系和放射敏感组合物中用作产酸剂。

2. 发明授权

US5198402A Aryl triflate compound, radiologically acid producing agent, radiologically acid producing agent system, and radiosensitive composition 失效
标题翻译：芳香化合物，放射性酸生产剂，放射性酸生产剂系统和放射性组合物
公开(公告)号：US5198402A
公开(公告)日：1993-03-30
申请号：US790169
申请日：1991-10-18
申请人： Makoto Kaji , S. Peter Pappas
发明人： Makoto Kaji , S. Peter Pappas
IPC分类号： G03F7/00 , C07C309/65 , C08F2/50 , G03F7/004 , G03F7/029 , G03F7/039 , G03H1/02 , H01L21/027 , H05K3/00
CPC分类号： G03F7/0045 , C07C309/65
摘要： Aryl triflate compounds can generate a strong acid when exposed to irradiation of radiation and can be used as an acid generator in a radiologically-acid-producing agent system and a radiosensitive composition.

3. 发明授权

US08696108B2 Printing press 有权
标题翻译：印刷机
公开(公告)号：US08696108B2
公开(公告)日：2014-04-15
申请号：US13322230
申请日：2010-05-21
申请人： Hideaki Sakurai , Shoichi Aoki , Makoto Kaji , Norifumi Tasaka
发明人： Hideaki Sakurai , Shoichi Aoki , Makoto Kaji , Norifumi Tasaka
IPC分类号： B41J2/01
CPC分类号： B41J3/546 , B41F13/02 , B41F19/007
摘要： In a printing press, it is configured such that a newspaper web offset printing press is composed by a feeder device, a printing device, a guiding device, a turn bar device, and a folding unit; as a guiding device, there are provided an upstream side guide roller and a downstream side guide roller which are disposed with a predetermined interval along a transportation direction of a web for guiding transportation of the web; and there is disposed an ink-jet printer for performing digital printing on the web guided between the guide rollers. By setting diameters of the upstream side guide roller and the downstream side guide roller to different values, vibration of the print medium which is transported while being guided by the guide rollers is suppressed, and the print quality is thereby improved.
摘要翻译：在印刷机中，由纸送纸装置，印刷装置，引导装置，转杆装置和折叠单元构成报纸卷筒纸胶版印刷机。作为引导装置，设置有沿着幅材的传送方向以预定间隔布置的上游侧引导辊和下游侧引导辊，用于引导幅材的传送; 并且设置有用于在引导辊之间引导的幅材上进行数字印刷的喷墨打印机。通过将上游侧引导辊和下游侧引导辊的直径设定为不同的值，可以抑制在被引导辊引导的同时传送的打印介质的振动，从而提高打印质量。

4. 发明授权

US06600053B2 Method of preparing photosensitive resin composition 有权
标题翻译：制备感光性树脂组合物的方法
公开(公告)号：US06600053B2
公开(公告)日：2003-07-29
申请号：US09941703
申请日：2001-08-30
申请人： Noriyoshi Arai , Makoto Kaji , Akihiro Sasaki , Toshiki Hagiwara
发明人： Noriyoshi Arai , Makoto Kaji , Akihiro Sasaki , Toshiki Hagiwara
IPC分类号： C07D40702
CPC分类号： G03F7/0388 , C07C69/76 , C07D307/89 , C08G73/10 , G03F7/0233 , G03F7/037 , G03F7/0382 , G03F7/0387 , G03F7/039 , G03F7/0392
摘要： A 6,6′-dialkyl-3,3′,4,4′-biphenyltetracarboxylic dianhydride is prepared by brominating a 4-alkylphthalic anhydride at its 5-position, and coupling the bromination product in the presence of a nickel catalyst; A photosensitive resin composition containing a polyimide precursor having repetitive units of general formula (7) is applied onto a substrate, exposed to i-line, developed and heated to form a polyimide relief pattern. wherein Y is a divalent organic group, R7 and R8 are OH or a monovalent organic group, R9 and R10 are a monovalent hydrocarbon group, R11, R12 and R13 are a monovalent hydrocarbon group, a and b are an integer of 0 to 2, c is an integer of 0 to 4, and m is an integer of 0 to 3.
摘要翻译：通过在其5位上溴化4-烷基邻苯二甲酸酐并在镍催化剂存在下偶联溴化产物来制备6,6'-二烷基-3,3'，4,4'-联苯四羧酸二酐。将含有具有通式（7）的重复单元的聚酰亚胺前体的感光性树脂组合物涂布在基板上，暴露于i线，显影加热形成聚酰亚胺浮雕图案。其中Y为二价有机基团，R7和R8 是OH或一价有机基团，R 9和R 10是一价烃基，R 11，R 12和R 13是一价烃基，a和b是0-2的整数，c是0-4的整数，m 是0〜3的整数。

5. 发明授权

US06329494B1 Photosensitive resin composition 有权
标题翻译：感光树脂组合物
公开(公告)号：US06329494B1
公开(公告)日：2001-12-11
申请号：US09431773
申请日：1999-11-01
申请人： Noriyoshi Arai , Makoto Kaji , Akihiro Sasaki , Toshiki Hagiwara
发明人： Noriyoshi Arai , Makoto Kaji , Akihiro Sasaki , Toshiki Hagiwara
IPC分类号： C08G7300
CPC分类号： G03F7/0388 , C07C69/76 , C07D307/89 , C08G73/10 , G03F7/0233 , G03F7/037 , G03F7/0382 , G03F7/0387 , G03F7/039 , G03F7/0392
摘要： A 6,6′-dialkyl-3,3′4,4′-biphenyltetracarboxylic dianhydride is prepared by brominating a 4-alkylphthalic anhydride at its 5-position, and coupling the bromination product in the presence of a nickel catalyst; A photosensitive resin composition containing a polyimide precursor having repetitive units of general formula (7) is applied onto a substrate, exposed to i-line, developed and heated to form a polyimide relief pattern wherein Y is a divalent organic group, R7 and R8 are OH or a monovalent organic group, R9 and R10 are a monovalent hydrocarbon group, R11, R12 and R13 are a monovalent hydrocarbon group, a and b are an integer of 0 to 2, c is an integer of 0 to 4, and m is an integer of 0 to 3.
摘要翻译：通过在其5位上溴化4-烷基邻苯二甲酸酐并在镍催化剂存在下偶联溴化产物来制备6,6'-二烷基-3,3,4,4'-联苯四羧酸二酐。将含有具有通式（7）的重复单元的聚酰亚胺前体的感光性树脂组合物涂布在基板上，暴露于i线，显影加热形成聚酰亚胺浮雕图案，其中Y为二价有机基团，R 7和R 8为OH 或一价有机基团，R 9和R 10为一价烃基，R 11，R 12和R 13为一价烃基，a和b为0〜2的整数，c为0〜4的整数，m为 0〜3的整数。

6. 发明授权

US4987057A Photoinitiator and photopolymerizable composition using the same 失效
标题翻译：光引发剂和使用其的可光聚合组合物
公开(公告)号：US4987057A
公开(公告)日：1991-01-22
申请号：US355123
申请日：1989-05-22
申请人： Makoto Kaji , Nobuyuki Hayashi
发明人： Makoto Kaji , Nobuyuki Hayashi
IPC分类号： C08F2/50 , G03F7/028 , G03F7/031
CPC分类号： G03F7/031 , Y10S430/114 , Y10S430/117 , Y10S430/12 , Y10S430/121 , Y10S430/123 , Y10S430/125
摘要： A photoinitiator composition comprising (1) an aminobenzylidene carbonyl compound and (2) an N-aryl-.alpha.-amino acid is suitable for use in a photo-polymerizable composition comprising (a) an addition-polymerizable compound having a boiling point of 100.degree. C. or higher at an atmospheric pressure and (b) said photoinitiator composition.

7. 发明申请

US20070160937A1 Photocurable resin composition and a method for forming a pattern 有权
标题翻译：光固化树脂组合物和形成图案的方法
公开(公告)号：US20070160937A1
公开(公告)日：2007-07-12
申请号：US11622542
申请日：2007-01-12
申请人： Masahiko Ogino , Makoto Kaji , Hanako Yori
发明人： Masahiko Ogino , Makoto Kaji , Hanako Yori
IPC分类号： G03C5/00
CPC分类号： C08F2/48 , B82Y10/00 , B82Y40/00 , C08F220/18 , C08F222/1006 , C09D4/00 , G03F7/0002
摘要： A photocurable resin composition containing a photopolymerization initiator and a (meth)acrylate monomer and/or oligomer, said (meth)acrylate monomer or oligomer having a cyclic structure, in which the atomic weight of carbon (Mcr) in said cyclic structure and the number of whole carbon atoms (MTOT) in said composition have the relation of Mcr/MTOT>0.1, or the total number (N) of carbon atoms in said cyclic structure, the total number of carbon atoms (Nc) in said composition and the total number of oxygen atoms (No) have the relation of N/(Nc−No)
摘要翻译：含有光聚合引发剂和（甲基）丙烯酸酯单体和/或低聚物的所述（甲基）丙烯酸酯单体或低聚物的光固化性树脂组合物，其中所述环状结构中的碳原子量（Mcr）和数量在所述组合物中的全碳原子数（MTOT）具有Mcr / MTOT> 0.1的关系，或所述环状结构中的碳原子总数（N），所述组合物中的总碳数（Nc）和总计氧原子数（No）与N /（Nc-No）<4的关系，组合物的动力粘度为10mPa.s以下。该低粘度光固化性树脂组合物具有优异的耐干蚀刻性，适用于光学纳米打印。

8. 发明授权

US07153631B2 Pattern-forming process using photosensitive resin composition 有权
标题翻译：使用感光性树脂组合物的图案形成工艺
公开(公告)号：US07153631B2
公开(公告)日：2006-12-26
申请号：US10713036
申请日：2003-11-17
申请人： Hideo Hagiwara , Makoto Kaji , Masataka Nunomura
发明人： Hideo Hagiwara , Makoto Kaji , Masataka Nunomura
IPC分类号： G03F7/037
CPC分类号： G03F7/0387 , C08G73/10 , G03F7/0125 , G03F7/037 , G03F7/038 , G03F7/075 , H05K3/4676 , Y10S430/106 , Y10S430/107
摘要： There are disclosed a photosensitive resin composition which comprises (A) a polyamic acid having recurring units represented by the formula (I): wherein R1 represents and R2 represents a divalent organic group, and (B) an acryl compound having an amino group, and also a photosensitive resin composition for an i-line stepper which further comprises a photoinitiator in addition to the photosensitive resin composition.
摘要翻译：公开了一种光敏树脂组合物，其包含（A）具有由式（I）表示的重复单元的聚酰胺酸：其中R 1表示，R 2表示二价有机基团和（B）具有氨基的丙烯酸类化合物，以及除了感光性树脂组合物之外，还含有光引发剂的i线步进机用感光性树脂组合物。

9. 发明授权

US06773866B2 Photosensitive resin composition, patterning method, and electronic components 失效
标题翻译：感光树脂组合物，图案化方法和电子部件
公开(公告)号：US06773866B2
公开(公告)日：2004-08-10
申请号：US10012462
申请日：2001-12-12
申请人： Akihiro Sasaki , Noriyoshi Arai , Makoto Kaji , Toshiki Hagiwara , Brian C. Auman
发明人： Akihiro Sasaki , Noriyoshi Arai , Makoto Kaji , Toshiki Hagiwara , Brian C. Auman
IPC分类号： G03C556
CPC分类号： C08G73/10 , G03F7/038 , G03F7/0387 , H05K3/4676
摘要： A photosensitive resin composition comprising an aromatic polyimide precursor, wherein a 35 &mgr;m film made by imidating ring closure on a silicon substrate has a light transmittance at a wavelength of 365 nm of at least 1% and a residual stress of at most 25 MPa. The composition can be patterned through i-line exposure followed by development with alkaline solutions, and can be imidized into low-stress polyimide patterns. Electronic components having the polyimide patterns have high reliability.
摘要翻译：一种包含芳族聚酰亚胺前体的感光性树脂组合物，其中通过在硅衬底上酰胺化闭环制得的35μm膜具有至少1％的波长365nm的光透射率和至多25MPa的残余应力。组合物可以通过i线曝光进行图案化，然后用碱性溶液显影，并且可以被酰亚胺化成低应力聚酰亚胺图案。具有聚酰亚胺图案的电子元件具有高可靠性。

10. 发明授权

US06342333B1 Photosensitive resin composition, patterning method, and electronic components 有权
标题翻译：感光树脂组合物，图案化方法和电子部件
公开(公告)号：US06342333B1
公开(公告)日：2002-01-29
申请号：US09401196
申请日：1999-09-23
申请人： Akihiro Sasaki , Noriyoshi Arai , Makoto Kaji , Toshiki Hagiwara , Brian C. Auman
发明人： Akihiro Sasaki , Noriyoshi Arai , Makoto Kaji , Toshiki Hagiwara , Brian C. Auman
IPC分类号： G03C152
CPC分类号： C08G73/10 , G03F7/038 , G03F7/0387 , H05K3/4676
摘要： A photosensitive resin composition comprising an aromatic polyimide precursor, wherein a 10 &mgr;m thick layer of precursor has light transmittance at a wavelength of 365 nm of at least 1% and a 10 &mgr;m thick polyimide film made from the resin composition by imidation ring closure and deposited on a silicon substrate results in a residual stress of at most 25 MPa. The composition can be patterned through i-line exposure followed by development with alkaline solutions, and can be imidized into low-stress polyimide patterns. Electronic components having the polyimide patterns have high reliability.
摘要翻译：一种包含芳族聚酰亚胺前体的感光性树脂组合物，其中10μm厚的前体层具有至少1％的365nm波长的透光率和10μm厚的聚酰亚胺膜，该树脂组合物通过酰亚胺化闭合和沉积在硅衬底上导致至多25MPa的残余应力。组合物可以通过i线曝光进行图案化，然后用碱性溶液显影，并且可以被酰亚胺化成低应力聚酰亚胺图案。具有聚酰亚胺图案的电子元件具有高可靠性。

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