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    • 5. 发明申请
    • SEMICONDUCTOR WAFER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
    • 半导体晶体管,半导体器件及制造半导体器件的方法
    • US20110018033A1
    • 2011-01-27
    • US12934233
    • 2009-03-26
    • Mitsuru TakenakaShinichi TakagiMasahiko HataOsamu Ichikawa
    • Mitsuru TakenakaShinichi TakagiMasahiko HataOsamu Ichikawa
    • H01L29/205H01L21/283H01L29/78H01L21/3205
    • H01L29/7787H01L21/28264H01L29/205H01L29/517H01L29/66462H01L29/66522H01L29/78648H01L29/78681
    • It is an objective of the present invention to form a favorable interface between an oxide layer and a group 3-5 compound semiconductor using a practical and simple method.Provided is a semiconductor wafer comprising a first semiconductor layer that is a group 3-5 compound not containing arsenic and that lattice matches or pseudo-lattice matches with InP; and a second semiconductor layer that is formed to contact the first semiconductor layer, is a group 3-5 compound semiconductor layer that lattice matches or pseudo-lattice matches with InP, and can be selectively oxidized relative to the first semiconductor layer. Also provided is a semiconductor device comprising a first semiconductor layer that is a group 3-5 compound not containing arsenic and that lattice matches or pseudo-lattice matches with InP; an oxide layer formed by selectively oxidizing, relative to the first semiconductor layer, at least a portion of a second semiconductor layer that is a group 3-5 compound formed to contact the first semiconductor layer and that lattice matches or pseudo-lattice matches with InP; and a control electrode that adds an electric field to a channel formed in the first semiconductor layer.
    • 本发明的目的是使用实用和简单的方法在氧化物层和3-5族化合物半导体之间形成良好的界面。 提供了包括第一半导体层的半导体晶片,其是不含砷的组3-5化合物,并且晶格匹配或伪晶格与InP匹配; 和形成为与第一半导体层接触的第二半导体层是与InP晶格匹配或伪晶格匹配的组3-5化合物半导体层,并且可相对于第一半导体层选择性地氧化。 还提供了一种半导体器件,其包括第一半导体层,其是不含砷的组3-5化合物,并且晶格匹配或伪晶格与InP匹配; 通过相对于第一半导体层选择性地氧化形成为与第一半导体层接触的组3-5化合物的第二半导体层的至少一部分,并且晶格匹配或伪晶格匹配的InP形成的氧化物层 ; 以及将电场与形成在第一半导体层中的沟道相加的控制电极。
    • 6. 发明授权
    • Semiconductor wafer, semiconductor device, and method of manufacturing a semiconductor device
    • 半导体晶片,半导体器件以及半导体器件的制造方法
    • US08431459B2
    • 2013-04-30
    • US12934233
    • 2009-03-26
    • Mitsuru TakenakaShinichi TakagiMasahiko HataOsamu Ichikawa
    • Mitsuru TakenakaShinichi TakagiMasahiko HataOsamu Ichikawa
    • H01L21/00
    • H01L29/7787H01L21/28264H01L29/205H01L29/517H01L29/66462H01L29/66522H01L29/78648H01L29/78681
    • It is an objective of the present invention to form a favorable interface between an oxide layer and a group 3-5 compound semiconductor using a practical and simple method.Provided is a semiconductor wafer comprising a first semiconductor layer that is a group 3-5 compound not containing arsenic and that lattice matches or pseudo-lattice matches with InP; and a second semiconductor layer that is formed to contact the first semiconductor layer, is a group 3-5 compound semiconductor layer that lattice matches or pseudo-lattice matches with InP, and can be selectively oxidized relative to the first semiconductor layer. Also provided is a semiconductor device comprising a first semiconductor layer that is a group 3-5 compound not containing arsenic and that lattice matches or pseudo-lattice matches with InP; an oxide layer formed by selectively oxidizing, relative to the first semiconductor layer, at least a portion of a second semiconductor layer that is a group 3-5 compound formed to contact the first semiconductor layer and that lattice matches or pseudo-lattice matches with InP; and a control electrode that adds an electric field to a channel formed in the first semiconductor layer.
    • 本发明的目的是使用实用和简单的方法在氧化物层和3-5族化合物半导体之间形成良好的界面。 提供了包括第一半导体层的半导体晶片,其是不含砷的组3-5化合物,并且晶格匹配或伪晶格与InP匹配; 和形成为与第一半导体层接触的第二半导体层是与InP晶格匹配或伪晶格匹配的组3-5化合物半导体层,并且可相对于第一半导体层选择性地氧化。 还提供了一种半导体器件,其包括第一半导体层,其是不含砷的组3-5化合物,并且晶格匹配或伪晶格与InP匹配; 通过相对于第一半导体层选择性地氧化形成为与第一半导体层接触的组3-5化合物的第二半导体层的至少一部分,并且晶格匹配或伪晶格匹配的InP形成的氧化物层 ; 以及将电场与形成在第一半导体层中的沟道相加的控制电极。