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    • 4. 发明授权
    • Semiconductor laser device including transparent electrode
    • 半导体激光器件包括透明电极
    • US07826512B2
    • 2010-11-02
    • US11850603
    • 2007-09-05
    • Tetsuzo UedaMasaaki Yuri
    • Tetsuzo UedaMasaaki Yuri
    • H01S5/00H01S3/097
    • H01S5/34333B82Y20/00H01S5/0208H01S5/0425H01S5/2009H01S5/2214H01S5/2231H01S5/3214H01S2304/12Y10S438/973Y10S438/977
    • It is an object of the present invention to provide a semiconductor laser device with high-yielding in which a clack generated in an epitaxial growth layer is restrained and to the manufacturing method thereof, the semiconductor laser device includes a GaN substrate 1, an n-type GaN layer 2, an n-type AlGaN cladding layer 3, a n-type GaN guide layer 4, an InGaN multiple quantum well active layer 5, an undoped-GaN guide layer 6, a p-type AlGaN electron overflow suppression layer 7, a p-type GaN guide layer 8, a SiO2 blocking layer 9, an Ni/ITO cladding layer electrode 10 as a transparent electrode, a Ti/Au pad electrode 11, and a Ti/Al/Ni/Au electrode 12. The SiO2 blocking layer 9 is formed above the InGaN multiple quantum well active layer 5 so as to have an opening. The Ni/ITO cladding layer electrode 10 is formed inside the opening, and which is transparent for the light from the InGaN multiple quantum well active layer, and serves as a cladding layer.
    • 本发明的目的是提供一种具有高产量的半导体激光器件,其中在外延生长层中产生的夹克被抑制,并且其制造方法,半导体激光器件包括GaN衬底1, 型GaN层2,n型AlGaN包覆层3,n型GaN引导层4,InGaN多量子阱有源层5,未掺杂GaN引导层6,p型AlGaN电子溢出抑制层7 p型GaN引导层8,SiO 2阻挡层9,作为透明电极的Ni / ITO包层电极10,Ti / Au焊盘电极11和Ti / Al / Ni / Au电极12。 在InGaN多量子阱活性层5的上方形成SiO 2阻挡层9,以具有开口。 Ni / ITO包层电极10形成在开口内部,对于来自InGaN多量子阱有源层的光是透明的,并且用作覆层。
    • 9. 发明授权
    • Method for manufacturing semiconductor substrate
    • 半导体衬底的制造方法
    • US07306675B2
    • 2007-12-11
    • US10145149
    • 2002-05-15
    • Masaaki Yuri
    • Masaaki Yuri
    • C30B25/02
    • C30B25/02C30B25/18C30B29/403C30B29/406H01L21/0242H01L21/02458H01L21/0254H01L21/02664Y10S117/902Y10S117/904
    • A method for manufacturing a semiconductor substrate of the present invention includes the steps of: (a) providing a support substrate; (b) epitaxially growing a first semiconductor layer on the support substrate; (c) epitaxially growing a second semiconductor layer on the first semiconductor layer; and (d) forming a semiconductor substrate including the first semiconductor layer and the second semiconductor layer by removing the support substrate, wherein an interatomic distance of atoms of the support substrate to which atoms of the first semiconductor layer attach and an interatomic distance of atoms of the second semiconductor layer have the same magnitude relationship with respect to an interatomic distance of the atoms of the first semiconductor layer in an epitaxial growth plane.
    • 本发明的半导体衬底的制造方法包括以下步骤:(a)提供支撑衬底; (b)在所述支撑基板上外延生长第一半导体层; (c)在第一半导体层上外延生长第二半导体层; 以及(d)通过去除所述支撑衬底来形成包括所述第一半导体层和所述第二半导体层的半导体衬底,其中所述第一半导体层的原子附着到所述支撑衬底的原子与原子间的原子间距离 第二半导体层在外延生长面中相对于第一半导体层的原子的原子间距离具有相同的大小关系。