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1. 发明授权

US09568845B2 Mirror for use in a microlithography projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的镜子
公开(公告)号：US09568845B2
公开(公告)日：2017-02-14
申请号：US13417510
申请日：2012-03-12
申请人： Martin Rocktaeschel , Hartmut Enkisch , Franz-Josef Stickel , Oliver Natt , Hans-Juergen Mann , Sascha Migura
发明人： Martin Rocktaeschel , Hartmut Enkisch , Franz-Josef Stickel , Oliver Natt , Hans-Juergen Mann , Sascha Migura
IPC分类号： G03B27/68 , G03B27/52 , G03B27/54 , G03F7/20 , G02B5/08
CPC分类号： G03F7/70958 , G02B5/0833 , G03F7/70191 , G03F7/70308 , G03F7/70316
摘要： A mirror including a substrate and a reflective coating that includes a first group of layers and a second group of layers arranged between the substrate and the first group of layers. Both the first and second groups of layers include a plurality of alternating first material layers and second material layers, arranged one above another. The refractive index of the first material for radiation in the range of 5-30 nm is greater than the refractive index of the second material in that wavelength range. The first group of layers is configured to have a number of layers that is greater than 20, such that, upon irradiation with radiation having a wavelength in the range of 5-30 nm, less than 20% of the radiation reaches the second group of layers, which has a layer thickness variation for correcting the surface form of the mirror.
摘要翻译：一种包括基板和反射涂层的反射镜，其包括布置在基板和第一组层之间的第一组层和第二组层。第一组和第二组都包括多个交替的第一材料层和第二材料层，其彼此排列。用于5-30nm范围内的辐射的第一材料的折射率大于在该波长范围内的第二材料的折射率。第一组层被配置为具有大于20的多个层，使得当辐射具有在5-30nm范围内的波长的辐射时，少于20％的辐射达到第二组层，其具有用于校正反射镜的表面形式的层厚度变化。

2. 发明申请

US20100265481A1 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION 有权
标题翻译：成像光学系统和投影曝光安装
公开(公告)号：US20100265481A1
公开(公告)日：2010-10-21
申请号：US12767627
申请日：2010-04-26
申请人： Hans-Juergen Mann , Wilhelm Ulrich , Stephan Muellender , Hartmut Enkisch
发明人： Hans-Juergen Mann , Wilhelm Ulrich , Stephan Muellender , Hartmut Enkisch
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06 , G03B27/70
CPC分类号： G02B5/0891 , G02B13/143 , G02B17/06 , G03F7/70175 , G03F7/70233
摘要： An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.
摘要翻译：成像光学系统具有多个反射镜。这些图像将物体平面中的对象场映射成图像平面中的图像场。在成像光学系统中，成像光在镜面反射面上的最大入射角与成像光学系统的像侧数值孔径之比小于33.8°。这可以导致成像光学系统，其为反射镜的反射涂层提供了良好的条件，通过该成像光学系统可以实现低反射损失，用于在通过成像光学系统时成像光，特别是甚至在EUV范围的波长小于10nm。

3. 发明申请

US20090015951A1 PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE 审中-公开
标题翻译：投影目标及其制造方法
公开(公告)号：US20090015951A1
公开(公告)日：2009-01-15
申请号：US12196618
申请日：2008-08-22
申请人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
发明人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
IPC分类号： G02B7/182 , G03B27/54
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译：一种制造微光刻投影曝光装置（10）的投影物镜（22）的方法。投影物镜（22）包括至少一个镜子（M1至M6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。测量预组装的投影物镜的第一成像像差。在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。如果反射镜（M1至M6）对于没有涂层（26）的投影光不反射，则使用具有另一波长的测量光。或者，可以提供两个相同的反射镜支撑件（246）。具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

4. 发明授权

US08605255B2 Imaging optical system and projection exposure system including the same 有权
标题翻译：成像光学系统和投影曝光系统包括相同的
公开(公告)号：US08605255B2
公开(公告)日：2013-12-10
申请号：US12767627
申请日：2010-04-26
申请人： Hans-Juergen Mann , Wilhelm Ulrich , Stephan Muellender , Hartmut Enkisch
发明人： Hans-Juergen Mann , Wilhelm Ulrich , Stephan Muellender , Hartmut Enkisch
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G02B5/0891 , G02B13/143 , G02B17/06 , G03F7/70175 , G03F7/70233
摘要： An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.
摘要翻译：成像光学系统具有多个反射镜。这些图像将物体平面中的对象场映射成图像平面中的图像场。在成像光学系统中，成像光在镜面反射面上的最大入射角与成像光学系统的像侧数值孔径之比小于33.8°。这可以导致成像光学系统，其为反射镜的反射涂层提供了良好的条件，通过该成像光学系统可以实现低反射损失，用于在通过成像光学系统时成像光，特别是甚至在EUV范围的波长小于10nm。

5. 发明授权

US07429116B2 Projection objective and method for its manufacture 有权
标题翻译：投影目的及其制造方法
公开(公告)号：US07429116B2
公开(公告)日：2008-09-30
申请号：US11014537
申请日：2004-12-16
申请人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
发明人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
IPC分类号： G02B7/182
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译：一种制造微光刻投影曝光装置（10）的投影物镜（22）的方法。投影物镜（22）包括至少一个镜子（M 1至M 6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。测量预组装的投影物镜的第一成像像差。在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。如果反射镜（M 1至M 6）对于没有涂层（26）的投射光不反射，则使用具有另一波长的测量光。或者，可以提供两个相同的反射镜支撑件（246）。具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

6. 发明申请

US20050134980A1 Projection objective and method for its manufacture 有权
标题翻译：投影目的及其制造方法
公开(公告)号：US20050134980A1
公开(公告)日：2005-06-23
申请号：US11014537
申请日：2004-12-16
申请人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
发明人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
IPC分类号： G02B1/10 , G02B5/08 , G02B17/06 , G03F7/20 , G02B26/08
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10) is described. The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译：描述了制造微光刻投影曝光装置（10）的投影物镜（22）的方法。投影物镜（22）包括至少一个镜子（M 1至M 6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。测量预组装的投影物镜的第一成像像差。在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。如果反射镜（M 1至M 6）对于没有涂层（26）的投射光不反射，则使用具有另一波长的测量光。或者，可以提供两个相同的反射镜支撑件（246）。具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

7. 发明授权

US07672044B2 Lens made of a crystalline material 有权
标题翻译：透镜由结晶材料制成
公开(公告)号：US07672044B2
公开(公告)日：2010-03-02
申请号：US11864193
申请日：2007-09-28
申请人： Birgit Enkisch , Hartmut Enkisch , Toralf Gruner
发明人： Birgit Enkisch , Hartmut Enkisch , Toralf Gruner
IPC分类号： G02B13/14
CPC分类号： G03F7/70966 , B24B13/00 , G02B1/02 , G02B3/00
摘要： As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.
摘要翻译：作为用于物镜的透镜或透镜部件的制造的初步阶段，特别是用于微光刻投影系统的投影物镜，光学坯料由晶体材料制成。作为制造光学坯料的第一步，确定在材料的晶体结构中限定的第一晶体方向的取向。然后将该材料加工成光学坯料，使得第一结晶方向基本上垂直于光学坯料的光学坯料表面。随后，将标记施加到光学毛坯或光学毛坯的安装元件。标记与第二结晶方向具有定义的关系，其相对于第一结晶方向定向成非零角度。

8. 发明申请

US20070114466A1 Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least on optical element 有权
标题翻译：用于EUV和/或软X射线区域中的辐射的光学元件以及至少具有光学元件的光学系统
公开(公告)号：US20070114466A1
公开(公告)日：2007-05-24
申请号：US11439854
申请日：2006-05-24
申请人： Marco Wedowski , Markus Weiss , Stephan Mullender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H.A. van Mierlo , Michiel Nijkerk , Fokko Wieringa , Nadyeh Shariloo
发明人： Marco Wedowski , Markus Weiss , Stephan Mullender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H.A. van Mierlo , Michiel Nijkerk , Fokko Wieringa , Nadyeh Shariloo
IPC分类号： G01J3/10
CPC分类号： G03F7/70958 , B82Y10/00 , G03F7/70175 , G03F7/70316 , G03F7/70916 , G21K1/00 , G21K1/062 , G21K2201/067
摘要： An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
摘要翻译：描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。多层涂层的至少一层用作第一电容器电极。在两个电容器电极之间提供至少一个电介质层。还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。

9. 发明申请

US20050170748A1 Lens made of a crystalline material 有权
标题翻译：透镜由结晶材料制成
公开(公告)号：US20050170748A1
公开(公告)日：2005-08-04
申请号：US10983569
申请日：2004-11-08
申请人： Birgit Enkisch , Hartmut Enkisch , Toralf Gruner
发明人： Birgit Enkisch , Hartmut Enkisch , Toralf Gruner
IPC分类号： G02B17/08 , B24B49/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70966 , B24B13/00 , G02B1/02 , G02B3/00
摘要： As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.
摘要翻译：作为用于物镜的透镜或透镜部件的制造的初步阶段，特别是用于微光刻投影系统的投影物镜，光学坯料由晶体材料制成。作为制造光学坯料的第一步，确定在材料的晶体结构中限定的第一晶体方向的取向。然后将该材料加工成光学坯料，使得第一结晶方向基本上垂直于光学坯料的光学坯料表面。随后，将标记施加到光学毛坯或光学毛坯的安装元件。标记与第二结晶方向具有定义的关系，其相对于第一结晶方向定向成非零角度。

10. 发明授权

US09304405B2 Microlithography illumination system and microlithography illumination optical unit 有权
标题翻译：微光刻照明系统和微光刻照明光学单元
公开(公告)号：US09304405B2
公开(公告)日：2016-04-05
申请号：US12974436
申请日：2010-12-21
申请人： Damian Fiolka , Michael Totzeck , Hartmut Enkisch , Stephan Muellender
发明人： Damian Fiolka , Michael Totzeck , Hartmut Enkisch , Stephan Muellender
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70075 , G03F7/70116 , G03F7/702 , G03F7/70566
摘要： An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel.
摘要翻译：用于微光刻的照明光学单元用照明光照亮物场。该单元包括具有多个第一小面的第一小面镜和具有多个第二面的第二小面镜。该单元具有分面对，其分别包括第一分面反射镜的小平面和第二分面反射镜的小平面，其预定义用于照亮对象场的多个照明通道。至少一些照明通道在每种情况下都具有分配的偏振元件，用于预定义在各个照明通道中引导的照明光的单独偏振状态。

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