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1. 发明申请

US20070143032A1 Apparatus and method for the detection of a surface reaction, especially for cleaning of an arbitrary two-dimensional surface or three-dimensional body 审中-公开
标题翻译：用于检测表面反应的装置和方法，特别是用于清洁任意的二维表面或三维体
公开(公告)号：US20070143032A1
公开(公告)日：2007-06-21
申请号：US11522783
申请日：2006-09-15
申请人： Fokko Wieringa , Norbertus Koster , Roland Van Vliet , Marco Wedowski , Nadyeh Shariloo , Thomas Stein
发明人： Fokko Wieringa , Norbertus Koster , Roland Van Vliet , Marco Wedowski , Nadyeh Shariloo , Thomas Stein
IPC分类号： G01N31/00
CPC分类号： G01N31/22 , A61B90/70 , G03F7/70916 , G03F7/70925
摘要： There is provided an apparatus that includes a film that undergoes a chemical reaction when exposed to a species. The chemical reaction causes an alteration of a physical property of the film as an indicator of the species.
摘要翻译：提供了一种装置，其包括当暴露于物种时经历化学反应的膜。化学反应导致膜的物理性质的改变作为物种的指示剂。

2. 发明申请

US20070285643A1 Method For Manufacturing Reflective Optical Element, Reflective Optical Elements, Euv-Lithography Apparatus And Methods For Operating Optical Elements And Euv-Lithography Apparatus, Methods For Determining The Phase Shift, Methods For Determining The Layer Thickness, And Apparatuses For Carrying Out The Methods 审中-公开
标题翻译：制造反射光学元件的方法，反射光学元件，Euv光刻设备以及用于操作光学元件和Euv光刻设备的方法，用于确定相移的方法，用于确定层厚度的方法以及用于执行方法的设备
公开(公告)号：US20070285643A1
公开(公告)日：2007-12-13
申请号：US10598481
申请日：2005-03-04
申请人： Marco Wedowski , Nadyeh Shariloo , Frank Scholze , Johannes Tuemmler
发明人： Marco Wedowski , Nadyeh Shariloo , Frank Scholze , Johannes Tuemmler
IPC分类号： G03B27/54 , G01B9/00
CPC分类号： G01B11/0625 , G03F7/70958
摘要： The invention relates to a method for manufacturing of a multilayer system (25) with a cap layer system (30), in particular for a reflective optical element for the extreme ultraviolet up to the soft x-ray wavelength range, comprising the steps of: 1. preparing a coating design for the multilayer system (25) with cap layer system (30); 2. coating a substrate (20) with the multilayer system (25) with cap layer system (30); 3. spatially resolved measurement of the coated substrate in terms of reflectance and photoelectron current in at least one surface point; 4. comparison of the measured data with data modelled for different thicknesses of the layers (31, 32, 33) of the cap layer system (30) and/or the layers (21, 22, 23, 24) of the multilayer system (25) for determining of the thickness distribution obtained by the coating; 5. if necessary, adjusting of the coating parameters and repeating steps 2 to 5 until the coated thickness distribution coincides with the design. The invention also relates to further manufacturing methods, reflective optical elements, EUV-lithography apparatuses, and methods for operating optical elements and EUV-lithography apparatuses as well as methods for determining the phase shift, methods for determining the layer thickness, and apparatuses for carrying out the methods.
摘要翻译：本发明涉及一种用于制造具有盖层系统（30）的多层系统（25）的方法，特别是用于直到软x射线波长范围的极紫外线的反射光学元件，包括以下步骤： 1.制备具有盖层系统（30）的多层系统（25）的涂层设计; 用盖层系统（30）用多层系统（25）涂覆基底（20）; 3.在至少一个表面点的反射率和光电子电流方面，对涂覆的基底进行空间分辨测量; 4.测量数据与盖层系统（30）的层（31,32,33）和/或多层系统的层（21,22,23,24）的不同厚度建模的数据的比较（ 25），用于确定由涂层获得的厚度分布; 5.如果需要，调整涂层参数并重复步骤2至5，直到涂层厚度分布与设计一致。本发明还涉及进一步的制造方法，反射光学元件，EUV光刻设备以及用于操作光学元件和EUV光刻设备的方法以及用于确定相移的方法，用于确定层厚度的方法以及用于承载的设备出来的方法。

3. 发明申请

US20070114466A1 Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least on optical element 有权
标题翻译：用于EUV和/或软X射线区域中的辐射的光学元件以及至少具有光学元件的光学系统
公开(公告)号：US20070114466A1
公开(公告)日：2007-05-24
申请号：US11439854
申请日：2006-05-24
申请人： Marco Wedowski , Markus Weiss , Stephan Mullender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H.A. van Mierlo , Michiel Nijkerk , Fokko Wieringa , Nadyeh Shariloo
发明人： Marco Wedowski , Markus Weiss , Stephan Mullender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H.A. van Mierlo , Michiel Nijkerk , Fokko Wieringa , Nadyeh Shariloo
IPC分类号： G01J3/10
CPC分类号： G03F7/70958 , B82Y10/00 , G03F7/70175 , G03F7/70316 , G03F7/70916 , G21K1/00 , G21K1/062 , G21K2201/067
摘要： An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
摘要翻译：描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。多层涂层的至少一层用作第一电容器电极。在两个电容器电极之间提供至少一个电介质层。还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。

4. 发明授权

US08164077B2 Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element 有权
标题翻译：用于EUV和/或软X射线区域中的辐射的光学元件以及具有至少一个光学元件的光学系统
公开(公告)号：US08164077B2
公开(公告)日：2012-04-24
申请号：US12625336
申请日：2009-11-24
申请人： Marco Wedowski , Nadyeh Shariloo, legal representative , Markus Weiss , Stephan Muellender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , Hubert Adriaan van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa
发明人： Marco Wedowski , Markus Weiss , Stephan Muellender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , Hubert Adriaan van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa
IPC分类号： G01J3/10
CPC分类号： G03F7/70958 , B82Y10/00 , G03F7/70175 , G03F7/70316 , G03F7/70916 , G21K1/00 , G21K1/062 , G21K2201/067
摘要： An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
摘要翻译：描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。多层涂层的至少一层用作第一电容器电极。在两个电容器电极之间提供至少一个电介质层。还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。

5. 发明申请

US20100067653A1 OPTICAL ELEMENT FOR RADIATION IN THE EUV AND/OR SOFT X-RAY REGION AND AN OPTICAL SYSTEM WITH AT LEAST ONE OPTICAL ELEMENT 有权
标题翻译：在欧盟和/或软X射线区域辐射的光学元件和具有至少一个光学元件的光学系统
公开(公告)号：US20100067653A1
公开(公告)日：2010-03-18
申请号：US12625336
申请日：2009-11-24
申请人： Marco Wedowski , Markus Weiss , Stephan Mûllender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H.A. van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa , Nadyeh Shariloo
发明人： Marco Wedowski , Markus Weiss , Stephan Mûllender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H.A. van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa , Nadyeh Shariloo
IPC分类号： G21K1/06 , A61N5/06 , G01J1/42
CPC分类号： G03F7/70958 , B82Y10/00 , G03F7/70175 , G03F7/70316 , G03F7/70916 , G21K1/00 , G21K1/062 , G21K2201/067
摘要： An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
摘要翻译：描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。多层涂层的至少一层用作第一电容器电极。在两个电容器电极之间提供至少一个电介质层。还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。

6. 发明授权

US07646004B2 Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element 有权
标题翻译：用于EUV和/或软X射线区域中的辐射的光学元件以及具有至少一个光学元件的光学系统
公开(公告)号：US07646004B2
公开(公告)日：2010-01-12
申请号：US11439854
申请日：2006-05-24
申请人： Marco Wedowski , Nadyeh Shariloo, legal representative , Markus Weiss , Stephan Müllender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H. A. van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa
发明人： Marco Wedowski , Markus Weiss , Stephan Müllender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H. A. van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa
IPC分类号： G01J3/10
CPC分类号： G03F7/70958 , B82Y10/00 , G03F7/70175 , G03F7/70316 , G03F7/70916 , G21K1/00 , G21K1/062 , G21K2201/067
摘要： An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
摘要翻译：描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。多层涂层的至少一层用作第一电容器电极。在两个电容器电极之间提供至少一个电介质层。还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。

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