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1. 发明授权

US09304405B2 Microlithography illumination system and microlithography illumination optical unit 有权
标题翻译：微光刻照明系统和微光刻照明光学单元
公开(公告)号：US09304405B2
公开(公告)日：2016-04-05
申请号：US12974436
申请日：2010-12-21
申请人： Damian Fiolka , Michael Totzeck , Hartmut Enkisch , Stephan Muellender
发明人： Damian Fiolka , Michael Totzeck , Hartmut Enkisch , Stephan Muellender
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70075 , G03F7/70116 , G03F7/702 , G03F7/70566
摘要： An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel.
摘要翻译：用于微光刻的照明光学单元用照明光照亮物场。该单元包括具有多个第一小面的第一小面镜和具有多个第二面的第二小面镜。该单元具有分面对，其分别包括第一分面反射镜的小平面和第二分面反射镜的小平面，其预定义用于照亮对象场的多个照明通道。至少一些照明通道在每种情况下都具有分配的偏振元件，用于预定义在各个照明通道中引导的照明光的单独偏振状态。

2. 发明申请

US20110122392A1 MICROLITHOGRAPHY ILLUMINATION SYSTEM AND MICROLITHOGRAPHY ILLUMINATION OPTICAL UNIT 有权
标题翻译：微观照明系统和微观照明光学单元
公开(公告)号：US20110122392A1
公开(公告)日：2011-05-26
申请号：US12974436
申请日：2010-12-21
申请人： Damian Fiolka , Michael Totzeck , Hartmut Enkisch , Stephan Muellender
发明人： Damian Fiolka , Michael Totzeck , Hartmut Enkisch , Stephan Muellender
IPC分类号： G03B27/72
CPC分类号： G03F7/70191 , G03F7/70075 , G03F7/70116 , G03F7/702 , G03F7/70566
摘要： An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel.
摘要翻译：用于微光刻的照明光学单元用照明光照亮物场。该单元包括具有多个第一小面的第一小面镜和具有多个第二面的第二小面镜。该单元具有分面对，其分别包括第一分面反射镜的小平面和第二分面反射镜的小平面，其预定义用于照亮对象场的多个照明通道。至少一些照明通道在每种情况下都具有分配的偏振元件，用于预定义在各个照明通道中引导的照明光的单独偏振状态。

3. 发明申请

US20110007293A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20110007293A1
公开(公告)日：2011-01-13
申请号：US12884485
申请日：2010-09-17
申请人： Damian Fiolka , Michael Totzeck , Alexandra Pazidis , Michael Ricker
发明人： Damian Fiolka , Michael Totzeck , Alexandra Pazidis , Michael Ricker
IPC分类号： G03B27/72 , G03F7/20
CPC分类号： G03F7/70083 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.
摘要翻译：本公开涉及微光刻投影曝光装置，以及相关的部件和方法。在一些实施例中，微光刻投影曝光装置包括照明系统和投影物镜，其中照明系统可照亮投影物镜的物平面，并且投影物镜可以在像平面上产生物平面的图像。可以在照明系统中产生偏振相关的透射，使得对于相对于物体平面上的光的至少一个偏振分布，获得物平面中的非均匀强度分布。非均匀强度分布可以通过投影物镜的偏振依赖透射特性在图像平面中提供均匀的强度分布。

4. 发明授权

US07817250B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US07817250B2
公开(公告)日：2010-10-19
申请号：US12146200
申请日：2008-06-25
申请人： Damian Fiolka , Michael Totzeck , Alexandra Pazidis , Michael Ricker
发明人： Damian Fiolka , Michael Totzeck , Alexandra Pazidis , Michael Ricker
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70083 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.
摘要翻译：本公开涉及微光刻投影曝光装置，以及相关的部件和方法。在一些实施例中，微光刻投影曝光装置包括照明系统和投影物镜，其中照明系统可照亮投影物镜的物平面，并且投影物镜可以在像平面上产生物平面的图像。可以在照明系统中产生偏振相关的透射，使得对于相对于物体平面上的光的至少一个偏振分布，获得物平面中的非均匀强度分布。非均匀强度分布可以通过投影物镜的偏振依赖透射特性在图像平面中提供均匀的强度分布。

5. 发明申请

US20050243222A1 Optical system of a microlithographic projection exposure apparatus 审中-公开
标题翻译：微光刻投影曝光装置的光学系统
公开(公告)号：US20050243222A1
公开(公告)日：2005-11-03
申请号：US11104101
申请日：2005-04-12
申请人： Manfred Maul , Michael Totzeck , Olaf Dittman , Damian Fiolka
发明人： Manfred Maul , Michael Totzeck , Olaf Dittman , Damian Fiolka
IPC分类号： G02B13/24 , G02B5/30 , G02B13/14 , G02F1/1335 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70966 , G02B5/3083 , G02B13/143 , G03F7/70566
摘要： An optical system, for example an illumination system or a projection objective (10), of a microlithographic projection exposure apparatus contains an optical element (L2, L3) which consists of a birefringent material. A projection light beam (14) formed by linearly polarized light rays passes through the optical element (L2, L3). In order to avoid perturbations of the polarization distribution of the light beam, the birefringent material is aligned such that each light ray entering the material is polarized substantially parallel or substantially perpendicularly to a slow birefringent axis for the respective light ray.
摘要翻译：微光刻投影曝光装置的光学系统例如照明系统或投影物镜（10）包含由双折射材料构成的光学元件（L 2，L 3）。由线偏振光形成的投影光束（14）通过光学元件（L 2，L 3）。为了避免光束的偏振分布的扰动，双折射材料被对准，使得进入材料的每个光线基本上平行或基本垂直于相应光线的慢双折射轴线偏振。

6. 发明申请

US20050152046A1 Optical system, in particular illumination system, of a microlithographic projection exposure apparatus 有权
标题翻译：光学系统，特别是照明系统，微光刻投影曝光装置
公开(公告)号：US20050152046A1
公开(公告)日：2005-07-14
申请号：US11014199
申请日：2004-12-16
申请人： Toralf Gruner , Michael Totzeck , Damian Fiolka , Wilhelm Ulrich , Gerhard Fuerter
发明人： Toralf Gruner , Michael Totzeck , Damian Fiolka , Wilhelm Ulrich , Gerhard Fuerter
IPC分类号： G02B27/00 , G02B27/28 , G03F7/20 , G02B17/00
CPC分类号： G03F7/70191 , G02B5/04 , G02B5/3066 , G02B27/286 , G03F7/70566
摘要： An optical system, particularly an illumination system, of a microlithographic projection exposure apparatus contains at least one plane reflecting surface for folding the beam path. The at least one reflecting surface is arranged with respect to an optical axis of the optical system such that the intensity ratio between two mutually perpendicular polarization directions is at least substantially preserved for an axially parallel light ray deviated by the at least one reflecting surface. In accordance with a second aspect, the at least one reflecting surface is arranged such that a maximum effect on the polarization of the projection light is achieved, so as to be able to compensate for polarization dependencies which occur in other components of the illumination system.
摘要翻译：微光刻投影曝光装置的光学系统，特别是照明系统包含用于折叠光束路径的至少一个平面反射表面。所述至少一个反射表面相对于所述光学系统的光轴布置，使得对于由所述至少一个反射表面偏离的轴向平行的光线，至少基本上保留了两个相互垂直的偏振方向之间的强度比。根据第二方面，至少一个反射表面被布置成使得能够实现对投射光的极化的最大影响，以便能够补偿在照明系统的其它部件中发生的偏振依赖性。

7. 发明申请

US20050146704A1 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US20050146704A1
公开(公告)日：2005-07-07
申请号：US10949396
申请日：2004-09-27
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03F7/20 , G03B27/72
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

8. 发明申请

US20090040496A1 MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE SYSTEM FOR CARRYING OUT THE METHOD 有权
标题翻译：作为实施方法的投影曝光系统的微观曝光方法
公开(公告)号：US20090040496A1
公开(公告)日：2009-02-12
申请号：US12177715
申请日：2008-07-22
申请人： Toralf GRUNER , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf GRUNER , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

9. 发明授权

US07408616B2 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US07408616B2
公开(公告)日：2008-08-05
申请号：US10949396
申请日：2004-09-27
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/42
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

10. 发明授权

US08237918B2 Optical system of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的光学系统
公开(公告)号：US08237918B2
公开(公告)日：2012-08-07
申请号：US12498475
申请日：2009-07-07
申请人： Michael Totzeck , Toralf Gruner , Damian Fiolka
发明人： Michael Totzeck , Toralf Gruner , Damian Fiolka
IPC分类号： G03B27/72
CPC分类号： G03F7/70566
摘要： An optical system, such as an illumination device or a projection objective of a microlithographic projection exposure apparatus, is disclosed. The optical system can include a polarization compensator which has at least one polarization-modifying partial element. The optical system can also include a manipulator by which the position of the at least one partial element can be altered. At least one operating mode of the optical system can be set in which the intensity, over a region which belongs to a plane perpendicular to the optical axis and which can be illuminated with light from the light source, does not exceed 20% of the maximum intensity in the plane, and the manipulator is arranged in the region.
摘要翻译：公开了一种光学系统，例如微光刻投影曝光装置的照明装置或投影物镜。光学系统可以包括具有至少一个偏振修正部分元件的偏振补偿器。光学系统还可以包括操纵器，通过该操纵器可以改变至少一个部分元件的位置。可以设置光学系统的至少一种操作模式，其中在属于垂直于光轴并且可以用来自光源的光照射的平面的区域上的强度不超过最大值的20％平面内的强度，机械手配置在该区域。

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