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1. 发明授权

US06600138B2 Rapid thermal processing system for integrated circuits 有权
公开(公告)号：US06600138B2
公开(公告)日：2003-07-29
申请号：US09836098
申请日：2001-04-17
申请人： Markus Hauf , Sing-Pin Tay , Yao Zhi Hu
发明人： Markus Hauf , Sing-Pin Tay , Yao Zhi Hu
IPC分类号： F27B514
CPC分类号： H05B3/0047 , H01L21/67115
摘要： In a rapid thermal processing system an array of heat lamps generate radiant heat for heating the surfaces of a semiconductor substrate, such as a semiconductor wafer, to a selected temperature or set of temperatures while held within an enclosed chamber. The heat lamps are surrounded individually or in groups by one or more optically transparent enclosures that isolate the heat lamps from the chamber environment and the wafer or wafers therein. The optically transparent enclosures may include associated reflectors and/or lenses to direct a higher proportion of emitted radiant heat energy from the lamps toward the semiconductor wafer(s). Thin planar quartz liners may also be interposed between the lamps and the substrate. By controlling radiant energy distribution within the chamber, and eliminating thick planar quartz windows commonly used to isolate the lamps in prior art RTP systems, higher processing rates and improved reliability are obtained.

2. 发明授权

US08861102B2 Lithographic apparatus and thermal optical manipulator control method 有权
标题翻译：平版印刷设备和热光机械手控制方法
公开(公告)号：US08861102B2
公开(公告)日：2014-10-14
申请号：US13187751
申请日：2011-07-21
申请人： Bastiaan Stephanus Hendricus Jansen , Ulrich Schönhoff , Markus Hauf
发明人： Bastiaan Stephanus Hendricus Jansen , Ulrich Schönhoff , Markus Hauf
IPC分类号： G02B7/02 , G03F7/20
CPC分类号： G03F7/70891 , G03F7/70533 , Y10S359/90
摘要： A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control the heating of heater elements; providing a desired temperature profile of the thermal optical element by a set point signal; determining a feedforward control of the heater elements from the set point signal; and forwardly feeding an output of the feedforward control into the feedback loop.
摘要翻译：提供了一种用于控制热光学元件的加热的控制方法，所述热光学元件具有加热器元件的矩阵。该方法包括用反馈回路来稳定热光学元件的标称温度，以控制加热元件的加热; 通过设定点信号提供所述热光学元件的期望温度曲线; 从所述设定点信号确定所述加热器元件的前馈控制; 并将前馈控制的输出向前馈送到反馈回路中。

3. 发明申请

US20130176544A1 Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus 有权
公开(公告)号：US20130176544A1
公开(公告)日：2013-07-11
申请号：US13784979
申请日：2013-03-05
申请人： Markus Hauf , Norman Baer , Holger Walter , Joachim Hartjes
发明人： Markus Hauf , Norman Baer , Holger Walter , Joachim Hartjes
IPC分类号： G03F7/20 , G01J5/02
CPC分类号： G03F7/70058 , G01J5/02 , G02B7/181 , G02B7/1815 , G03F7/70266 , G03F7/70891
摘要： The disclosure concerns an arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus. The mirror has an optical effective surface and at least one access passage extending from a surface of the mirror, that does not correspond to the optical effective surface, in the direction of the effective surface. The arrangement is designed for mirror temperature measurement and/or thermal actuation of the mirror via electromagnetic radiation which is propagated along the access passage. The electromagnetic radiation is reflected a plurality of times within the access passage.

4. 发明授权

US08325322B2 Optical correction device 有权
标题翻译：光学校正装置
公开(公告)号：US08325322B2
公开(公告)日：2012-12-04
申请号：US12700122
申请日：2010-02-04
申请人： Markus Hauf , Ulrich Schoenhoff , Payam Tayebati , Michael Thier , Tilmann Heil , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner , Aksel Goehnermeier , Dirk Hellweg
发明人： Markus Hauf , Ulrich Schoenhoff , Payam Tayebati , Michael Thier , Tilmann Heil , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner , Aksel Goehnermeier , Dirk Hellweg
IPC分类号： G03B27/68 , G03B27/52
CPC分类号： G02B7/008 , G02B7/1815 , G02B26/06 , G02B27/0025 , G03F7/70191 , G03F7/70308 , G03F7/70825 , G03F7/70891
摘要： The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.
摘要翻译：本发明涉及具有用于影响光学校正装置中的温度分布的热致动器的光学校正装置。光学校正装置由至少两个部分元件构成，这些部分元素关于其传送热量的能力而不同。此外，本公开涉及影响光学元件中的温度分布的方法。

5. 发明申请

US20120044474A1 OPTICAL MODULE FOR GUIDING A RADIATION BEAM 审中-公开
标题翻译：用于引导辐射束的光学模块
公开(公告)号：US20120044474A1
公开(公告)日：2012-02-23
申请号：US13075929
申请日：2011-03-30
申请人： Markus Hauf , Severin Waldis , Wilfried Noell , Yves Petremend , Marco Jassman , Lothar Kulzer , Caglar Ataman
发明人： Markus Hauf , Severin Waldis , Wilfried Noell , Yves Petremend , Marco Jassman , Lothar Kulzer , Caglar Ataman
IPC分类号： G03B27/54 , G03B27/32 , G02B7/182
CPC分类号： G03F7/7015 , G02B7/1815 , G02B26/0816 , G02B26/0833 , G03F7/70075 , G03F7/70116 , G03F7/70291 , G03F7/70891
摘要： An optical module is used to guide an EUV radiation beam. The optical module has a chamber that can be evacuated and at least one mirror accommodated in the chamber. The mirror has a plurality of individual mirrors, the reflection faces of which complement one another to form an overall mirror reflection face. A support structure is in each case mechanically connected via a thermally conductive portion to a mirror body of the respective individual mirror. At least some of the mirror bodies have an associated actuator for the predetermined displacement of the mirror body relative to the support structure in at least one degree of freedom. The thermally conductive portions are configured to dissipate a thermal power density of at least 1 kW/m2 absorbed by the mirror bodies to the support structure. In one aspect of the optical module, an integrated electronic displacement circuit is associated with each of the displaceable individual mirrors in spatial proximity, and a central control device has a signal connection with the integrated electronic displacement circuits of the displaceable individual mirrors. The result is an optical module, with which an illumination optical system can be constructed, which, even with a non-negligible thermal load on the individual mirrors, ensures a high EUV radiation throughput.
摘要翻译：光学模块用于引导EUV辐射束。光学模块具有能够抽真空的腔室和容纳在腔室中的至少一个反射镜。反射镜具有多个单独的反射镜，其反射面相互补充以形成整体的镜面反射面。在每种情况下，支撑结构通过导热部分机械连接到各个反射镜的镜体。至少一些镜体具有相关联的致动器，用于在至少一个自由度中相对于支撑结构预定位移镜体。导热部分被配置为将由镜体吸收的至少1kW / m 2的热功率密度消散到支撑结构。在光学模块的一个方面，集成电子位移电路与空间接近的每个可移动的独立反射镜相关联，并且中央控制装置具有与可移动的各个反射镜的集成电子位移电路的信号连接。结果是可以构造照明光学系统的光学模块，其甚至在各个反射镜上具有不可忽视的热负载，确保高的EUV辐射通量。

6. 发明申请

US20120026476A1 DEVICE FOR CONTROLLING TEMPERATURE OF AN OPTICAL ELEMENT 有权
标题翻译：用于控制光学元件温度的装置
公开(公告)号：US20120026476A1
公开(公告)日：2012-02-02
申请号：US13268303
申请日：2011-10-07
申请人： Markus Hauf
发明人： Markus Hauf
IPC分类号： G03B27/52 , G02B5/08
CPC分类号： G03F7/70891 , G02B5/08 , G02B5/0891 , G02B7/008 , G02B7/1815 , G03B27/26 , G03F7/70008 , G03F7/70825 , G05D23/1919 , G21K1/067 , H01L2924/0002 , H01L2924/00
摘要： A device serves for controlling temperature of an optical element provided in vacuum atmosphere. The device has a cooling apparatus having a radiational cooling part, arranged apart from the optical element, for cooling the optical element by radiation heat transfer. A controller serves for controlling temperature of the radiational cooling part. Further, the device comprises a heating part for heating the optical element. The heating part is connected to the controller for controlling the temperature of the heating part. The resulting device for controlling temperature in particular can be used with an optical element in a EUV microlithography tool leading to a stable performance of its optics.
摘要翻译：该装置用于控制在真空气氛中提供的光学元件的温度。该装置具有冷却装置，该冷却装置具有与该光学元件隔开的辐射冷却部，用于通过辐射热传递来冷却该光学元件。控制器用于控制辐射冷却部件的温度。此外，该装置包括用于加热光学元件的加热部件。加热部连接到控制器，用于控制加热部件的温度。用于特别控制温度的所得装置可以与EUV微光刻工具中的光学元件一起使用，导致其光学器件的稳定性能。

7. 发明授权

US08064151B2 Lithographic apparatus and thermal optical manipulator control method 有权
标题翻译：平版印刷设备和热光机械手控制方法
公开(公告)号：US08064151B2
公开(公告)日：2011-11-22
申请号：US11889583
申请日：2007-08-14
申请人： Bastiaan Stephanus Hendricus Jansen , Ulrich Schönhoff , Markus Hauf
发明人： Bastiaan Stephanus Hendricus Jansen , Ulrich Schönhoff , Markus Hauf
IPC分类号： G02B7/02 , H05B1/02
CPC分类号： G03F7/70891 , G03F7/70533 , Y10S359/90
摘要： A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control the heating of heater elements; providing a desired temperature profile of the thermal optical element by a set point signal; determining a feedforward control of the heater elements from the set point signal; and forwardly feeding an output of the feedforward control into the feedback loop.
摘要翻译：提供了一种用于控制热光学元件的加热的控制方法，所述热光学元件具有加热器元件的矩阵。该方法包括用反馈回路来稳定热光学元件的标称温度，以控制加热元件的加热; 通过设定点信号提供所述热光学元件的期望温度曲线; 从所述设定点信号确定所述加热器元件的前馈控制; 并将前馈控制的输出向前馈送到反馈回路中。

8. 发明授权

US07528348B2 Apparatus and method for measuring the temperature of substrates 有权
标题翻译：用于测量基板温度的装置和方法
公开(公告)号：US07528348B2
公开(公告)日：2009-05-05
申请号：US11021915
申请日：2004-12-22
申请人： Markus Hauf
发明人： Markus Hauf
IPC分类号： G01J5/06 , G01J5/08 , F27B5/18
CPC分类号： G01J5/06 , G01J5/0003 , G01J5/0007 , G01J5/08 , G01J5/0806 , G01J5/0831 , G01J5/0846 , G01J2005/0048
摘要： An apparatus for measuring an object temperature of an object, and including at least one heating apparatus having at least one heating element for heating an object via electromagnetic radiation. Also included is at least one first radiation detector that detects radiation coming from the object within a first field of vision, and, for determining correction parameters, a measuring device that detects the electromagnetic radiation that reaches the first field of vision from the at least one heating element up to a proportionality factor or a known intensity-dependent function.
摘要翻译：一种用于测量物体的物体温度的装置，并且包括至少一个具有至少一个用于通过电磁辐射加热物体的加热元件的加热装置。还包括至少一个第一辐射检测器，其在第一视野内检测来自物体的辐射，并且为了确定校正参数，测量装置从至少一个检测器检测到达到第一视场的电磁辐射加热元件达到比例因子或已知的强度依赖功能。

9. 发明申请

US20060100735A1 Process for determining the temperature of a semiconductor wafer in a rapid heating unit 有权
标题翻译：用于确定快速加热单元中的半导体晶片的温度的方法
公开(公告)号：US20060100735A1
公开(公告)日：2006-05-11
申请号：US10540613
申请日：2003-11-28
申请人： Markus Hauf , Christoph Merkl , Christoph Striebel
发明人： Markus Hauf , Christoph Merkl , Christoph Striebel
IPC分类号： G06F19/00 , H01L21/00 , H01L21/66
CPC分类号： H01L21/324 , G01J5/0003 , H01L21/67115 , H01L21/67248
摘要： The invention relates to a process for determining at least one state variable from a model of an RTP system by means of at least one measurement signal measured on the RTP system—the measurement value—which has a dependency upon the state variable to be determined, and a measurement value forecast by means of the model—the forecast value—, whereby the measurement value and the forecast value respectively comprise components of a constant and a changeable portion, and whereby respectively at least the changeable portion is established, separated by a filter, so as to form a first difference between the changeable portion of the measurement value and the changeable portion of the measurement value forecast by the model, parameter adaptation of at least one model parameter by recirculation of the first difference in the model with the aim of adapting the model behavior to variable system parameters, forming of a second difference from the measurement value and the forecast value or from the measurement value adjusted by the changeable portion and the adjusted forecast value, state correction of a state of the model system by recirculation of the second difference in the model, with the aim of bringing the state of the model system into correspondence with that of the real system, and measurement of the at least one state variable on the model.
摘要翻译：本发明涉及一种用于通过在RTP系统上测量的至少一个测量信号从RTP系统的模型确定至少一个状态变量的过程 - 测量值，其与待确定的状态变量有关，以及通过模型 - 预测值预测的测量值，由此测量值和预测值分别包括常数和可变部分的分量，并且由此分别至少建立可变部分，由滤波器分隔开，以便在模型的可变部分和通过模型预测的测量值的可变部分之间形成第一差异，通过再循环模型中的第一差异来至少一个模型参数的参数自适应，目的是将模型行为适应于可变系统参数，与测量值和预测值形成第二个差异通过可变部分调整的测量值和经调整的预测值，通过模型中的第二差异的再循环对模型系统的状态进行状态校正，目的是使模型系统的状态与实际系统和模型上至少一个状态变量的测量。

10. 发明申请

US20060040478A1 Method of producing a calibration wafer 有权
标题翻译：校准晶圆的制造方法
公开(公告)号：US20060040478A1
公开(公告)日：2006-02-23
申请号：US10536788
申请日：2003-11-13
申请人： Christoph Merkl , Markus Hauf , Rolf Bremensdorfer
发明人： Christoph Merkl , Markus Hauf , Rolf Bremensdorfer
IPC分类号： H01L21/04
CPC分类号： G01N21/278 , H01L21/67115 , H01L22/34
摘要： A method of producing a calibration wafer having at least a predetermined emissivity, including providing a wafer of semiconductor material; subjecting the bulk material of the wafer to doping with foreign atoms and/or generating lattice defects to obtain the predetermined emissivity; and coating the wafer to obtain a further optical characteristic.
摘要翻译：一种制造具有至少预定发射率的校准晶片的方法，包括提供半导体材料晶片; 使晶片的体材料掺杂异质原子和/或产生晶格缺陷以获得预定的发射率; 并涂覆晶片以获得另外的光学特性。

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