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1. 发明申请

US20130176544A1 Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus 有权
公开(公告)号：US20130176544A1
公开(公告)日：2013-07-11
申请号：US13784979
申请日：2013-03-05
申请人： Markus Hauf , Norman Baer , Holger Walter , Joachim Hartjes
发明人： Markus Hauf , Norman Baer , Holger Walter , Joachim Hartjes
IPC分类号： G03F7/20 , G01J5/02
CPC分类号： G03F7/70058 , G01J5/02 , G02B7/181 , G02B7/1815 , G03F7/70266 , G03F7/70891
摘要： The disclosure concerns an arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus. The mirror has an optical effective surface and at least one access passage extending from a surface of the mirror, that does not correspond to the optical effective surface, in the direction of the effective surface. The arrangement is designed for mirror temperature measurement and/or thermal actuation of the mirror via electromagnetic radiation which is propagated along the access passage. The electromagnetic radiation is reflected a plurality of times within the access passage.

2. 发明申请

US20110063598A1 ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND RELATED SYSTEM AND APPARATUS 有权
标题翻译： EUV微观照相和相关系统和装置的照明光学
公开(公告)号：US20110063598A1
公开(公告)日：2011-03-17
申请号：US12915785
申请日：2010-10-29
申请人： Damian Fiolka , Berndt Warm , Christian Steigerwald , Martin Endres , Ralf Stuetzle , Jens Ossmann , Ralf Scharnweber , Markus Hauf , Udo Dinger , Severin Waldis , Marc Kirch , Joachim Hartjes
发明人： Damian Fiolka , Berndt Warm , Christian Steigerwald , Martin Endres , Ralf Stuetzle , Jens Ossmann , Ralf Scharnweber , Markus Hauf , Udo Dinger , Severin Waldis , Marc Kirch , Joachim Hartjes
IPC分类号： G03B27/72
CPC分类号： G03F7/70191 , G03F7/70083
摘要： An illumination optics for EUV microlithography guides an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1. A field facet mirror has a plurality of field facets that set defined illumination conditions in the object field. A following optics downstream of the field facet mirror transmits the illumination light into the object field. The following optics includes a pupil facet mirror with a plurality of pupil facets. The field facets are in each case individually allocated to the pupil facets so that portions of the illumination light bundle impinging upon in each case one of the field facets are guided on to the object field via the associated pupil facet. The field facet mirror not only includes a plurality of basic illumination field facets which provide a basic illumination of the object field via associated basic illumination pupil facets, but also includes a plurality of correction illumination field facets which provide for a correction of the illumination of the object field via associated correction illumination pupil facets. The result is an illumination optics which allows unwanted variations of illumination parameters, for instance an illumination intensity distribution or an illumination angle distribution, to be corrected across the object field.
摘要翻译：用于EUV微光刻的照明光学器件将照射光束从辐射源引导到物场，其具有在较大场尺寸和较短场尺寸之间的延伸比，其中该比率远大于1.场分面镜具有多个的场面在场景中设置定义的照明条件。在场面反射镜下游的以下光学器件将照明光透射到物体场中。以下光学器件包括具有多个光瞳面的光瞳小面镜。场分面在每种情况下分别被分配给光瞳面，使得在各种情况下照射的照明光束的一部分通过相关联的光瞳小面被引导到物场。场面镜不仅包括多个基本照明场面，它们通过相关联的基本照明光瞳面提供物场的基本照明，而且还包括多个校正照明场面，其提供对照射的照明的校正通过相关联的校正照明光瞳面进行物体场。结果是照明光学元件允许在整个对象场校正照明参数的不期望的变化，例如照明强度分布或照明角度分布。

3. 发明授权

US08587767B2 Illumination optics for EUV microlithography and related system and apparatus 有权
标题翻译：用于EUV微光刻的照明光学器件及相关系统和装置
公开(公告)号：US08587767B2
公开(公告)日：2013-11-19
申请号：US12915785
申请日：2010-10-29
申请人： Damian Fiolka , Berndt Warm , Christian Steigerwald , Martin Endres , Ralf Stuetzle , Jens Ossmann , Ralf Scharnweber , Markus Hauf , Udo Dinger , Severin Waldis , Marc Kirch , Joachim Hartjes
发明人： Damian Fiolka , Berndt Warm , Christian Steigerwald , Martin Endres , Ralf Stuetzle , Jens Ossmann , Ralf Scharnweber , Markus Hauf , Udo Dinger , Severin Waldis , Marc Kirch , Joachim Hartjes
IPC分类号： G03B27/72 , G03B27/54 , G03B27/68 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70191 , G03F7/70083
摘要： Illumination optics for EUV microlithography guide an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1.
摘要翻译：用于EUV微光刻的照明光学器件将照射光束从辐射源引导到物场，其具有较长场尺寸和较短场尺寸之间的延伸比，其中该比率显着大于1。

4. 发明申请

US20120293785A1 OPTICAL ELEMENT HAVING A PLURALITY OF REFLECTIVE FACET ELEMENTS 有权
标题翻译：具有多重反射面元素的光学元件
公开(公告)号：US20120293785A1
公开(公告)日：2012-11-22
申请号：US13486073
申请日：2012-06-01
申请人： Marc Kirch , Martin Endres , Damian Fiolka , Joachim Hartjes
发明人： Marc Kirch , Martin Endres , Damian Fiolka , Joachim Hartjes
IPC分类号： G03B27/72
CPC分类号： G02B26/0816 , G02B5/0891 , G02B5/09 , G02B7/1822 , G02B27/0927 , G02B27/0977 , G03F7/70075 , G03F7/70116
摘要： An optical element for use in an illumination optical unit of an EUV microlithography projection exposure apparatus includes a plurality of reflective facet elements. Each reflective facet element has at least one reflective surface. In this case, at least one facet element is arranged in a manner rotatable about a rotation axis. The rotation axis intersects the at least one reflective surface of the facet element. With such an optical element, it is possible to alter the direction and/or the intensity of at least part of the illumination radiation within the illumination optical unit in a simple manner.
摘要翻译：用于EUV微光刻投影曝光装置的照明光学单元的光学元件包括多个反射小面元件。每个反射小面元件具有至少一个反射表面。在这种情况下，以围绕旋转轴线旋转的方式布置至少一个小面元件。旋转轴与小面元件的至少一个反射表面相交。利用这种光学元件，可以以简单的方式改变照明光学单元内的照明辐射的至少一部分的方向和/或强度。

5. 发明授权

US09134501B2 Optical element unit and method of supporting an optical element 有权
公开(公告)号：US09134501B2
公开(公告)日：2015-09-15
申请号：US11901131
申请日：2007-09-14
申请人： Dirk Schaffer , Willi Heintel , Hagen Federau , Joachim Hartjes , Harald Kirchner
发明人： Dirk Schaffer , Willi Heintel , Hagen Federau , Joachim Hartjes , Harald Kirchner
IPC分类号： G03B27/68 , G03B27/52 , G03B27/54 , G02B7/02 , G03F7/20 , G03B27/42 , G02B7/00
CPC分类号： G02B7/026 , G02B7/008 , G03F7/70825
摘要： There is provided an optical element unit comprising an optical element, a connector element, and an optical element holder. The optical element has a plane of main extension as well as an outer circumference and defines a radial direction. The connector element connects the optical element and the optical element holder, the connector element having a first connector part connected to the optical element at the outer circumference and a second connector part connected to the optical element holder. The first connector part and the second connector part are connected via at least one coupling part, the coupling part being compliant in the radial direction and substantially preventing rotation between the first connector part and the second connector part in a plane substantially parallel to the plane of main extension.

6. 发明申请

US20120300195A1 METHOD AND APPARATUS FOR SETTING AN ILLUMINATION OPTICAL UNIT 有权
标题翻译：用于设置照明光学单元的方法和装置
公开(公告)号：US20120300195A1
公开(公告)日：2012-11-29
申请号：US13469240
申请日：2012-05-11
申请人： Joachim Hartjes , Stig Bieling , Artur Hoegele
发明人： Joachim Hartjes , Stig Bieling , Artur Hoegele
IPC分类号： G01B9/00
CPC分类号： G03F7/70091 , G03F7/70133 , G03F7/70141 , G03F7/70266
摘要： A method for setting an illumination optical unit involves determining an actual value of an intensity-weighted illumination parameter of the illumination optical unit for multiple field points and for multiple illumination angles. The influence of a deformation of at least one of the optical surfaces of the illumination optical unit on the at least one illumination parameter is then determined. A desired value of the illumination parameter is then predefined. A desired form of the at least one optical surface is determined so that the actual value of the illumination parameter corresponds to the desired value of the illumination parameter within predefined limits. Finally, the optical surface is deformed with the aid of at least one actuator so that an actual form of the optical surface corresponds to the desired form.
摘要翻译：用于设置照明光学单元的方法包括确定用于多个场点和多个照明角度的照明光学单元的强度加权照明参数的实际值。然后确定照明光学单元的至少一个光学表面的变形对至少一个照明参数的影响。然后预定义所需的照明参数值。确定至少一个光学表面的期望形式，使得照明参数的实际值对应于预定义限度内的照明参数的期望值。最后，光学表面借助于至少一个致动器变形，使得光学表面的实际形式对应于所需的形式。

7. 发明授权

US09063336B2 Optical element having a plurality of reflective facet elements 有权
标题翻译：具有多个反射小面元件的光学元件
公开(公告)号：US09063336B2
公开(公告)日：2015-06-23
申请号：US13486073
申请日：2012-06-01
申请人： Marc Kirch , Martin Endres , Damian Fiolka , Joachim Hartjes
发明人： Marc Kirch , Martin Endres , Damian Fiolka , Joachim Hartjes
IPC分类号： G03B27/68 , G03B27/54 , G03B27/72 , G02B26/08 , G02B5/09 , G02B7/182 , G02B27/09 , G03F7/20 , G02B5/08
CPC分类号： G02B26/0816 , G02B5/0891 , G02B5/09 , G02B7/1822 , G02B27/0927 , G02B27/0977 , G03F7/70075 , G03F7/70116
摘要： An optical element for use in an illumination optical unit of an EUV microlithography projection exposure apparatus includes a plurality of reflective facet elements. Each reflective facet element has at least one reflective surface. In this case, at least one facet element is arranged in a manner rotatable about a rotation axis. The rotation axis intersects the at least one reflective surface of the facet element. With such an optical element, it is possible to alter the direction and/or the intensity of at least part of the illumination radiation within the illumination optical unit in a simple manner.
摘要翻译：用于EUV微光刻投影曝光装置的照明光学单元的光学元件包括多个反射小面元件。每个反射小面元件具有至少一个反射表面。在这种情况下，以围绕旋转轴线旋转的方式布置至少一个小面元件。旋转轴与小面元件的至少一个反射表面相交。利用这种光学元件，可以以简单的方式改变照明光学单元内的照明辐射的至少一部分的方向和/或强度。

8. 发明申请

US20130182264A1 Projection Exposure Tool for Microlithography and Method for Microlithographic Exposure 审中-公开
标题翻译：用于微光刻的投影曝光工具和微光刻曝光方法
公开(公告)号：US20130182264A1
公开(公告)日：2013-07-18
申请号：US13788042
申请日：2013-03-07
申请人： Jochen Hetzler , Sascha Bleidistel , Toralf Gruner , Joachim Hartjes
发明人： Jochen Hetzler , Sascha Bleidistel , Toralf Gruner , Joachim Hartjes
IPC分类号： G03F7/20
CPC分类号： G03F7/70133 , G03F7/70608 , G03F7/70733 , G03F9/7003 , G03F9/7034 , G03F9/7049
摘要： A projection exposure tool for microlithography for exposing a substrate is disclosed. The tool includes a projection objective. The tool also includes an optical measuring apparatus for determining a surface topography of the substrate before the substrate is exposed. The measuring apparatus has a measuring beam path which extends outside of the projection objective. The measuring apparatus is a wavefront measuring apparatus configured to determine topography measurement values simultaneously at a number of points on the substrate surface.
摘要翻译：公开了一种用于曝光衬底的用于微光刻的投影曝光工具。该工具包括投影物镜。该工具还包括用于在衬底暴露之前确定衬底的表面形貌的光学测量装置。测量装置具有延伸到投影物镜外部的测量光束路径。所述测量装置是波面测量装置，其被配置为在所述基板表面上的多个点处同时确定地形测量值。

9. 发明申请

US20120069313A1 EUV MICROLITHOGRAPHY ILLUMINATION OPTICAL SYSTEM AND EUV ATTENUATOR FOR SAME 有权
标题翻译： EUV微波照相光学系统和EUV抗体
公开(公告)号：US20120069313A1
公开(公告)日：2012-03-22
申请号：US13223458
申请日：2011-09-01
申请人： Nicolas Schmidts , Joachim Hartjes , Ulrich Bingel , Boaz Pnini-Mittler
发明人： Nicolas Schmidts , Joachim Hartjes , Ulrich Bingel , Boaz Pnini-Mittler
IPC分类号： G03B27/54
CPC分类号： G03F7/702 , G03F7/70083 , G03F7/701 , G03F7/70191
摘要： An illumination optical system for EUV microlithography is used to direct an illumination light beam from a radiation source to an object field. At least one EUV mirror has a reflective face with a nonplanar mirror topography for forming the illumination light beam. The EUV mirror has at least one EUV attenuator arranged in front of it. The attenuator face which faces the reflective face of the EUV mirror has an attenuator topography which is designed to complement the mirror topography such that at least sections of the attenuator face are arranged at a constant interval from the reflective face. The result is an illumination optical system in which it is possible to correct unwanted variations in illumination parameters, for example an illumination intensity distribution or an illumination angle distribution, over the object field with as few unwanted radiation losses as possible.
摘要翻译：用于EUV微光刻的照明光学系统用于将来自辐射源的照明光束引导到物场。至少一个EUV反射镜具有用于形成照明光束的具有非平面镜面的反射面。 EUV镜具有至少一个安置在其前面的EUV衰减器。面向EUV反射镜的反射面的衰减器面具有衰减器形貌，其被设计为补充镜面形貌，使得衰减器面的至少部分以与反射面成一定间隔的距离布置。结果是照明光学系统，其中可以在尽可能少的不需要的辐射损失的物场上校正照明参数的不期望的变化，例如照明强度分布或照明角度分布。

10. 发明申请

US20110019171A1 OPTICAL UNIT HAVING ADJUSTABLE FORCE ACTION ON AN OPTICAL MODULE 审中-公开
标题翻译：光学单元在光学模块上具有可调节的作用
公开(公告)号：US20110019171A1
公开(公告)日：2011-01-27
申请号：US12730395
申请日：2010-03-24
申请人： Erich Schubert , Andreas Heisler , Joachim Hartjes
发明人： Erich Schubert , Andreas Heisler , Joachim Hartjes
IPC分类号： G03B27/54 , G02B7/00
CPC分类号： G02B7/00 , G03F7/70266 , G03F7/70825
摘要： The present disclosure relates to an optical device, in particular for microlithography, having an optical module, a supporting structure and a force-generating device. The force-generating device is connected to the optical module and the supporting structure and is designed to exert a clamping force on the optical module. The force-generating device has a fluidic force-generating element having a working chamber to which a working fluid having a working pressure can be applied. The force-generating element takes the form of a muscle element which exerts a first tensile force at a first working pressure and a second tensile force which is increased with respect to the first tensile force at a second working pressure which is increased with respect to the first working pressure.
摘要翻译：本发明涉及具有光学模块，支撑结构和力产生装置的光学装置，特别是用于微光刻的光学装置。力产生装置连接到光学模块和支撑结构，并被设计成在光学模块上施加夹紧力。力产生装置具有流体力产生元件，其具有可以施加工作压力的工作流体的工作室。力产生元件采取在第一工作压力下施加第一拉力的肌肉元件的形式和在相对于第一工作压力增加的第二工作压力下相对于第一拉力增加的第二张力第一工作压力。

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