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1. 发明申请

US20120162620A1 Lithographic Apparatus and Method of Modifying a Beam of Radiation Within a Lithographic Apparatus 有权
标题翻译：平版印刷设备和在光刻设备内修改辐射束的方法
公开(公告)号：US20120162620A1
公开(公告)日：2012-06-28
申请号：US13249423
申请日：2011-09-30
申请人： Bastiaan Stephanus Hendricus JANSEN , Maria Johanna Agnes Rubingh
发明人： Bastiaan Stephanus Hendricus JANSEN , Maria Johanna Agnes Rubingh
IPC分类号： G03B27/52
CPC分类号： G03F7/70308
摘要： A lithographic apparatus comprises a beam modifying apparatus mounted in the path of a beam of radiation. The beam modifying apparatus comprises a conduit configured to allow the flow of a fluid through it, the conduit being arranged such that, in use, the beam of radiation passes through the conduit and the fluid flowing through it. The beam modifying apparatus further comprises a heat exchanger in thermal communication with a portion of the conduit located upstream, having regard to the direction of the fluid flow, of the location at which the beam of radiation passes through the conduit.
摘要翻译：光刻设备包括安装在辐射束的路径中的光束修改设备。光束修改装置包括被配置为允许流体通过其的流动的导管，导管布置成使得在使用中，辐射束穿过导管并流过其中的流体。光束修改装置还包括热交换器，其与位于上游的管道的一部分（考虑到流体流动的方向）热辐射辐射束穿过导管的位置。

2. 发明申请

US20080074629A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20080074629A1
公开(公告)日：2008-03-27
申请号：US11527729
申请日：2006-09-27
申请人： Rogier Herman Mathijs Groeneveld , Antonius Johannes Josephus Van Dijsseldonk , Dominicus Jacobus Petrus Adrianus Franken , Bastiaan Stephanus Hendricus Jansen , Robertus Johannes Marinus De Jongh , Marc Wilhelmus Maria Van Der Wijst , Maurice Wijckmans
发明人： Rogier Herman Mathijs Groeneveld , Antonius Johannes Josephus Van Dijsseldonk , Dominicus Jacobus Petrus Adrianus Franken , Bastiaan Stephanus Hendricus Jansen , Robertus Johannes Marinus De Jongh , Marc Wilhelmus Maria Van Der Wijst , Maurice Wijckmans
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70833
摘要： A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.
摘要翻译：公开了一种光刻设备，其包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，以及被构造成保持衬底的衬底台。此外，光刻设备包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上，投影系统通过弹性安装件安装到光刻设备的参考元件，以减少高频振动从投影系统的参考元件和用于抵消衬底台和支撑件相对于投影系统的位置误差的控制系统。

3. 发明授权

US09146477B2 Lithographic apparatus and method of modifying a beam of radiation within a lithographic apparatus 有权
标题翻译：光刻设备和修改光刻设备内的辐射束的方法
公开(公告)号：US09146477B2
公开(公告)日：2015-09-29
申请号：US13249423
申请日：2011-09-30
申请人： Bastiaan Stephanus Hendricus Jansen , Maria Johanna Agnes Rubingh
发明人： Bastiaan Stephanus Hendricus Jansen , Maria Johanna Agnes Rubingh
IPC分类号： G03B27/52 , G03B27/68 , G03B27/54 , G03F7/20 , G03B27/42
CPC分类号： G03F7/70308
摘要： A lithographic apparatus comprises a beam modifying apparatus mounted in the path of a beam of radiation. The beam modifying apparatus comprises a conduit configured to allow the flow of a fluid through it, the conduit being arranged such that, in use, the beam of radiation passes through the conduit and the fluid flowing through it. The beam modifying apparatus further comprises a heat exchanger in thermal communication with a portion of the conduit located upstream, having regard to the direction of the fluid flow, of the location at which the beam of radiation passes through the conduit.
摘要翻译：光刻设备包括安装在辐射束的路径中的光束修改设备。光束修改装置包括被配置为允许流体通过其的流动的导管，导管布置成使得在使用中，辐射束穿过导管并流过其中的流体。光束修改装置还包括热交换器，其与位于上游的管道的一部分（考虑到流体流动的方向）热辐射辐射束穿过导管的位置。

4. 发明授权

US08908144B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08908144B2
公开(公告)日：2014-12-09
申请号：US11527729
申请日：2006-09-27
申请人： Rogier Herman Mathijs Groeneveld , Antonius Johannes Josephus Van Dijsseldonk , Dominicus Jacobus Petrus Adrianus Franken , Bastiaan Stephanus Hendricus Jansen , Robertus Johannes Marinus De Jongh , Marc Wilhelmus Maria Van Der Wijst , Maurice Willem Jozef Etiënne Wijckmans
发明人： Rogier Herman Mathijs Groeneveld , Antonius Johannes Josephus Van Dijsseldonk , Dominicus Jacobus Petrus Adrianus Franken , Bastiaan Stephanus Hendricus Jansen , Robertus Johannes Marinus De Jongh , Marc Wilhelmus Maria Van Der Wijst , Maurice Willem Jozef Etiënne Wijckmans
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/709 , G03F7/70833
摘要： A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.
摘要翻译：公开了一种光刻设备，其包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，以及构造成保持衬底的衬底台。此外，光刻设备包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上，投影系统通过弹性安装件安装到光刻设备的参考元件，以减少高频振动从投影系统的参考元件和用于抵消衬底台和支撑件相对于投影系统的位置误差的控制系统。

5. 发明申请

US20110273682A1 Lithographic Apparatus and Thermal Optical Manipulator Control Method 有权
标题翻译：光刻设备和热光机械手控制方法
公开(公告)号：US20110273682A1
公开(公告)日：2011-11-10
申请号：US13187751
申请日：2011-07-21
申请人： Bastiaan Stephanus Hendricus JANSEN , Ulrich SCHÖNHOFF , Markus HAUF
发明人： Bastiaan Stephanus Hendricus JANSEN , Ulrich SCHÖNHOFF , Markus HAUF
IPC分类号： G03B27/52 , H05B1/02
CPC分类号： G03F7/70891 , G03F7/70533 , Y10S359/90
摘要： A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control the heating of heater elements; providing a desired temperature profile of the thermal optical element by a set point signal; determining a feedforward control of the heater elements from the set point signal; and forwardly feeding an output of the feedforward control into the feedback loop.
摘要翻译：提供了一种用于控制热光学元件的加热的控制方法，所述热光学元件具有加热器元件的矩阵。该方法包括用反馈回路来稳定热光学元件的标称温度，以控制加热元件的加热; 通过设定点信号提供所述热光学元件的期望温度曲线; 从所述设定点信号确定所述加热器元件的前馈控制; 并将前馈控制的输出向前馈送到反馈回路中。

6. 发明授权

US07525640B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07525640B2
公开(公告)日：2009-04-28
申请号：US11593648
申请日：2006-11-07
申请人： Bastiaan Stephanus Hendricus Jansen , Erik Roelof Loopstra , Marius Ravensbergen , Markus Josef Hauf
发明人： Bastiaan Stephanus Hendricus Jansen , Erik Roelof Loopstra , Marius Ravensbergen , Markus Josef Hauf
IPC分类号： G03B27/54
CPC分类号： G02B7/028 , G02B27/0025 , G03F7/70091 , G03F7/70891
摘要： A lithographic apparatus is disclosed that includes an optical arrangement having an array of optical elements arranged in a plane perpendicular to the radiation beam. Each optical element comprises an electrical heating device to change an optical path length of the radiation beam. By selectively actuating the electrical heating devices, a position dependent change in optical path length can be achieved in order to correct for irradiation-induced optical path length errors.
摘要翻译：公开了一种光刻设备，其包括具有布置在垂直于辐射束的平面中的光学元件阵列的光学装置。每个光学元件包括用于改变辐射束的光路长度的电加热装置。通过选择性地致动电加热装置，可以实现光程长度的位置相关的改变，以便校正照射引起的光程长度误差。

7. 发明申请

US20150261095A1 Radiation Source 审中-公开
标题翻译：辐射源
公开(公告)号：US20150261095A1
公开(公告)日：2015-09-17
申请号：US14349883
申请日：2012-09-06
申请人： Bastiaan Stephanus Hendricus Jansen , Jan Frederik Hoogkamp
发明人： Bastiaan Stephanus Hendricus Jansen , Jan Frederik Hoogkamp
IPC分类号： G03F7/20
CPC分类号： G03F7/70033 , H05G2/003 , H05G2/008
摘要： A radiation source suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location. The radiation source is configured to receive a first amount of radiation such that, in use, the first amount of radiation is incident on a fuel droplet at the plasma formation location, and such that, in use, the first amount of radiation transfers energy to the fuel droplet to generate a radiation generating plasma that emits a second amount of radiation. The radiation source further comprises a first sensor arrangement configured to measure a property of the first amount of radiation that is indicative of a focus position of the first amount of radiation; and a second sensor arrangement configured to measure a property of a fuel droplet that is indicative of a position of the fuel droplet.
摘要翻译：适用于向光刻设备的照明器提供辐射束的辐射源。辐射源包括喷嘴，该喷嘴构造成沿着等离子体形成位置的轨迹引导燃料液滴流。辐射源被配置为接收第一量的辐射，使得在使用中，第一量的辐射入射在等离子体形成位置处的燃料液滴上，并且使得在使用中，第一量的辐射将能量传递到所述燃料液滴产生发射第二量的辐射的辐射产生等离子体。辐射源还包括第一传感器装置，其配置成测量指示第一辐射量的聚焦位置的第一辐射量的特性; 以及第二传感器装置，被配置为测量指示燃料液滴位置的燃料液滴的性质。

8. 发明授权

US08861102B2 Lithographic apparatus and thermal optical manipulator control method 有权
标题翻译：平版印刷设备和热光机械手控制方法
公开(公告)号：US08861102B2
公开(公告)日：2014-10-14
申请号：US13187751
申请日：2011-07-21
申请人： Bastiaan Stephanus Hendricus Jansen , Ulrich Schönhoff , Markus Hauf
发明人： Bastiaan Stephanus Hendricus Jansen , Ulrich Schönhoff , Markus Hauf
IPC分类号： G02B7/02 , G03F7/20
CPC分类号： G03F7/70891 , G03F7/70533 , Y10S359/90
摘要： A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control the heating of heater elements; providing a desired temperature profile of the thermal optical element by a set point signal; determining a feedforward control of the heater elements from the set point signal; and forwardly feeding an output of the feedforward control into the feedback loop.
摘要翻译：提供了一种用于控制热光学元件的加热的控制方法，所述热光学元件具有加热器元件的矩阵。该方法包括用反馈回路来稳定热光学元件的标称温度，以控制加热元件的加热; 通过设定点信号提供所述热光学元件的期望温度曲线; 从所述设定点信号确定所述加热器元件的前馈控制; 并将前馈控制的输出向前馈送到反馈回路中。

9. 发明授权

US08064151B2 Lithographic apparatus and thermal optical manipulator control method 有权
标题翻译：平版印刷设备和热光机械手控制方法
公开(公告)号：US08064151B2
公开(公告)日：2011-11-22
申请号：US11889583
申请日：2007-08-14
申请人： Bastiaan Stephanus Hendricus Jansen , Ulrich Schönhoff , Markus Hauf
发明人： Bastiaan Stephanus Hendricus Jansen , Ulrich Schönhoff , Markus Hauf
IPC分类号： G02B7/02 , H05B1/02
CPC分类号： G03F7/70891 , G03F7/70533 , Y10S359/90
摘要： A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control the heating of heater elements; providing a desired temperature profile of the thermal optical element by a set point signal; determining a feedforward control of the heater elements from the set point signal; and forwardly feeding an output of the feedforward control into the feedback loop.
摘要翻译：提供了一种用于控制热光学元件的加热的控制方法，所述热光学元件具有加热器元件的矩阵。该方法包括用反馈回路来稳定热光学元件的标称温度，以控制加热元件的加热; 通过设定点信号提供所述热光学元件的期望温度曲线; 从所述设定点信号确定所述加热器元件的前馈控制; 并将前馈控制的输出向前馈送到反馈回路中。

10. 发明申请

US20080123066A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20080123066A1
公开(公告)日：2008-05-29
申请号：US11593648
申请日：2006-11-07
申请人： Bastiaan Stephanus Hendricus Jansen , Erik Roelof Loopstra , Marius Ravensbergen , Markus Josef Hauf
发明人： Bastiaan Stephanus Hendricus Jansen , Erik Roelof Loopstra , Marius Ravensbergen , Markus Josef Hauf
IPC分类号： G03B27/42
CPC分类号： G02B7/028 , G02B27/0025 , G03F7/70091 , G03F7/70891
摘要： A lithographic apparatus is disclosed that includes an optical arrangement having an array of optical elements arranged in a plane perpendicular to the radiation beam. Each optical element comprises an electrical heating device to change an optical path length of the radiation beam. By selectively actuating the electrical heating devices, a position dependent change in optical path length can be achieved in order to correct for irradiation-induced optical path length errors.
摘要翻译：公开了一种光刻设备，其包括具有布置在垂直于辐射束的平面中的光学元件阵列的光学装置。每个光学元件包括用于改变辐射束的光路长度的电加热装置。通过选择性地致动电加热装置，可以实现光程长度的位置相关的改变，以便校正照射引起的光程长度误差。

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