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1. 发明申请

US20110063598A1 ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND RELATED SYSTEM AND APPARATUS 有权
标题翻译： EUV微观照相和相关系统和装置的照明光学
公开(公告)号：US20110063598A1
公开(公告)日：2011-03-17
申请号：US12915785
申请日：2010-10-29
申请人： Damian Fiolka , Berndt Warm , Christian Steigerwald , Martin Endres , Ralf Stuetzle , Jens Ossmann , Ralf Scharnweber , Markus Hauf , Udo Dinger , Severin Waldis , Marc Kirch , Joachim Hartjes
发明人： Damian Fiolka , Berndt Warm , Christian Steigerwald , Martin Endres , Ralf Stuetzle , Jens Ossmann , Ralf Scharnweber , Markus Hauf , Udo Dinger , Severin Waldis , Marc Kirch , Joachim Hartjes
IPC分类号： G03B27/72
CPC分类号： G03F7/70191 , G03F7/70083
摘要： An illumination optics for EUV microlithography guides an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1. A field facet mirror has a plurality of field facets that set defined illumination conditions in the object field. A following optics downstream of the field facet mirror transmits the illumination light into the object field. The following optics includes a pupil facet mirror with a plurality of pupil facets. The field facets are in each case individually allocated to the pupil facets so that portions of the illumination light bundle impinging upon in each case one of the field facets are guided on to the object field via the associated pupil facet. The field facet mirror not only includes a plurality of basic illumination field facets which provide a basic illumination of the object field via associated basic illumination pupil facets, but also includes a plurality of correction illumination field facets which provide for a correction of the illumination of the object field via associated correction illumination pupil facets. The result is an illumination optics which allows unwanted variations of illumination parameters, for instance an illumination intensity distribution or an illumination angle distribution, to be corrected across the object field.
摘要翻译：用于EUV微光刻的照明光学器件将照射光束从辐射源引导到物场，其具有在较大场尺寸和较短场尺寸之间的延伸比，其中该比率远大于1.场分面镜具有多个的场面在场景中设置定义的照明条件。在场面反射镜下游的以下光学器件将照明光透射到物体场中。以下光学器件包括具有多个光瞳面的光瞳小面镜。场分面在每种情况下分别被分配给光瞳面，使得在各种情况下照射的照明光束的一部分通过相关联的光瞳小面被引导到物场。场面镜不仅包括多个基本照明场面，它们通过相关联的基本照明光瞳面提供物场的基本照明，而且还包括多个校正照明场面，其提供对照射的照明的校正通过相关联的校正照明光瞳面进行物体场。结果是照明光学元件允许在整个对象场校正照明参数的不期望的变化，例如照明强度分布或照明角度分布。

2. 发明授权

US08587767B2 Illumination optics for EUV microlithography and related system and apparatus 有权
标题翻译：用于EUV微光刻的照明光学器件及相关系统和装置
公开(公告)号：US08587767B2
公开(公告)日：2013-11-19
申请号：US12915785
申请日：2010-10-29
申请人： Damian Fiolka , Berndt Warm , Christian Steigerwald , Martin Endres , Ralf Stuetzle , Jens Ossmann , Ralf Scharnweber , Markus Hauf , Udo Dinger , Severin Waldis , Marc Kirch , Joachim Hartjes
发明人： Damian Fiolka , Berndt Warm , Christian Steigerwald , Martin Endres , Ralf Stuetzle , Jens Ossmann , Ralf Scharnweber , Markus Hauf , Udo Dinger , Severin Waldis , Marc Kirch , Joachim Hartjes
IPC分类号： G03B27/72 , G03B27/54 , G03B27/68 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70191 , G03F7/70083
摘要： Illumination optics for EUV microlithography guide an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1.
摘要翻译：用于EUV微光刻的照明光学器件将照射光束从辐射源引导到物场，其具有较长场尺寸和较短场尺寸之间的延伸比，其中该比率显着大于1。

3. 发明申请

US20110235015A1 ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY 审中-公开
标题翻译： EUV微观光谱的照明光学
公开(公告)号：US20110235015A1
公开(公告)日：2011-09-29
申请号：US13076730
申请日：2011-03-31
申请人： Guenther Dengel , Gero Wittich , Udo Dinger , Ralf Stuetzle , Martin Endres , Jens Ossmann , Berndt Warm
发明人： Guenther Dengel , Gero Wittich , Udo Dinger , Ralf Stuetzle , Martin Endres , Jens Ossmann , Berndt Warm
IPC分类号： G03B27/72
CPC分类号： G03F7/7085 , G03F7/70141 , G03F7/702 , G03F7/70558
摘要： An illumination optics for EUV microlithography illuminates an object field with the aid of an EUV used radiation beam. Preset devices preset illumination parameters. An illumination correction device corrects the intensity distribution and/or the angular distribution of the object field illumination. The latter has an optical component to which the used radiation beam is at least partially applied upstream of the object field and which can be driven in a controlled manner. A detector acquires one of the illumination parameters. An evaluation device evaluates the detector data and converts the latter into control signals. At least one actuator displaces the optical component. During exposures, the actuators are controlled with the aid of the detector signals during the period of a projection exposure. A maximum displacement of below 8 μm is ensured for edges of the object field towards an object to be exposed. The result is an illumination optics that is used to ensure conformance with preset illumination parameters even given the most stringent demands upon precision.
摘要翻译：用于EUV微光刻的照明光学器件借助EUV使用的辐射束照亮物体场。预设设备预设照明参数。照明校正装置校正物场照明的强度分布和/或角分布。后者具有光学部件，使用的辐射束至少部分地施加在物场的上游，并且可以以受控的方式驱动。检测器获取照明参数之一。评估装置评估检测器数据并将其转换成控制信号。至少一个致动器移动光学部件。在曝光期间，在投影曝光期间借助于检测器信号来控制致动器。确保物体边缘朝向待曝光物体的8μm以下的最大位移。结果是一个照明光学器件，用于确保符合预设的照明参数，即使在最严格的精度要求下。

4. 发明授权

US08797507B2 Illumination system of a microlithographic projection exposure apparatus having a temperature control device 有权
标题翻译：具有温度控制装置的微光刻投影曝光装置的照明系统
公开(公告)号：US08797507B2
公开(公告)日：2014-08-05
申请号：US13044160
申请日：2011-03-09
申请人： Florian Bach , Daniel Benz , Severin Waldis , Armin Werber , Berndt Warm
发明人： Florian Bach , Daniel Benz , Severin Waldis , Armin Werber , Berndt Warm
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70058 , G03F7/70116 , G03F7/70141 , G03F7/70266 , G03F7/70291 , G03F7/70891
摘要： An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.
摘要翻译：微光刻投影曝光装置的照明系统包括主光源，系统光瞳表面和反射镜阵列。镜阵列布置在主光源和系统光瞳表面之间。镜阵列包括多个自适应镜元件。每个镜子元件包括镜子支撑和反射涂层。每个镜元件被构造成将由主光源产生的光引向系统光瞳表面。反射镜元件可相对于支撑结构倾斜地安装。反射镜元件包括具有不同热膨胀系数并且彼此固定地附接的结构。温度控制装置被配置为可变地修改结构内的温度分布以改变反射镜元件的形状。

5. 发明申请

US20110181850A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：US20110181850A1
公开(公告)日：2011-07-28
申请号：US13044160
申请日：2011-03-09
申请人： Florian Bach , Daniel Benz , Severin Waldis , Armin Werber , Berndt Warm
发明人： Florian Bach , Daniel Benz , Severin Waldis , Armin Werber , Berndt Warm
IPC分类号： G03B27/54
CPC分类号： G03F7/70058 , G03F7/70116 , G03F7/70141 , G03F7/70266 , G03F7/70291 , G03F7/70891
摘要： An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.
摘要翻译：微光刻投影曝光装置的照明系统包括主光源，系统光瞳表面和反射镜阵列。镜阵列布置在主光源和系统光瞳表面之间。镜阵列包括多个自适应镜元件。每个镜子元件包括镜子支撑和反射涂层。每个镜元件被构造成将由主光源产生的光引向系统光瞳表面。反射镜元件可相对于支撑结构倾斜地安装。反射镜元件包括具有不同热膨胀系数并且彼此固定地附接的结构。温度控制装置被配置为可变地修改结构内的温度分布以改变反射镜元件的形状。

6. 发明申请

US20100007866A1 METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：生产面镜和投影曝光装置的方法
公开(公告)号：US20100007866A1
公开(公告)日：2010-01-14
申请号：US12504844
申请日：2009-07-17
申请人： Berndt Warm , Siegfried Rennon , Guenther Dengel , Juergen Baier , Udo Dinger , Stefan Burkart , Christos Kourouklis , Hin Yiu Anthony Chung , Stefan Wiesner , Hartmut Enkisch
发明人： Berndt Warm , Siegfried Rennon , Guenther Dengel , Juergen Baier , Udo Dinger , Stefan Burkart , Christos Kourouklis , Hin Yiu Anthony Chung , Stefan Wiesner , Hartmut Enkisch
IPC分类号： G03B27/70
CPC分类号： G02B5/08 , B29D11/00596 , G02B5/09 , G03F7/702 , G03F7/70825
摘要： The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors.
摘要翻译：本公开涉及用于制造镜子，特别是小平面反射镜的方法和配备有反射镜的投影曝光设备。

7. 发明申请

US20120274917A1 IMAGING OPTICS 审中-公开
标题翻译：成像光学
公开(公告)号：US20120274917A1
公开(公告)日：2012-11-01
申请号：US13482794
申请日：2012-05-29
申请人： Hans-Juergen Mann , Martin Endres , David Shafer , Berndt Warm , Alois Herkommer
发明人： Hans-Juergen Mann , Martin Endres , David Shafer , Berndt Warm , Alois Herkommer
IPC分类号： G03B27/70 , G03B27/32 , G02B17/06
CPC分类号： G03F7/70233 , G02B17/0652 , G03F7/702 , G03F7/70275
摘要： An imaging optics is provided for lithographic projection exposure for guiding a bundle of imaging light with a wavelength shorter than 193 nm via a plurality of mirrors for beam-splitter-free imaging of a reflective object in an object field in an object plane into an image field in an image plane. An object field point has a central ray angle which is smaller than 3°. At least one of the mirrors is a near-field mirror. The imaging optics which can allow for high-quality imaging of a reflective object.
摘要翻译：提供了一种用于光刻投影曝光的成像光学装置，用于通过多个反射镜引导波长短于193nm的成像光束，用于在物体平面中的物体场中的反射物体成像成图像场中的图像平面。物体场点具有小于3°的中心射线角度。至少一个镜子是近场镜。成像光学元件可以允许反射物体的高质量成像。

8. 发明授权

US08562133B2 Simulator for use in ophthalmological measurements 有权
标题翻译：用于眼科测量的模拟器
公开(公告)号：US08562133B2
公开(公告)日：2013-10-22
申请号：US12894314
申请日：2010-09-30
申请人： Stefan Schmid , Berndt Warm
发明人： Stefan Schmid , Berndt Warm
IPC分类号： A61B3/00 , A61B3/10
CPC分类号： A61B3/11
摘要： A simulator to be used in ophthalmological measurements includes a display apparatus and a control device. The control device is adapted to control the display apparatus in such a manner that the display apparatus displays an image that is adapted to simulate the arrangement of a pupillary midpoint relative to a reference structure.
摘要翻译：用于眼科测量的模拟器包括显示装置和控制装置。控制装置适于以这样的方式控制显示装置，使得显示装置显示适于模拟相对于参考结构的瞳孔中点的布置的图像。

9. 发明申请

US20120083771A1 Apparatus and method for processing material with focused electromagnetic radiation 有权
标题翻译：用聚焦电磁辐射处理材料的装置和方法
公开(公告)号：US20120083771A1
公开(公告)日：2012-04-05
申请号：US12894375
申请日：2010-09-30
申请人： Berndt Warm , Peter Riedel , Claudia Gorschboth , Franziska Woittennek
发明人： Berndt Warm , Peter Riedel , Claudia Gorschboth , Franziska Woittennek
IPC分类号： A61F9/01 , G02B27/40
CPC分类号： A61F9/00836
摘要： An apparatus for processing material with focused electromagnetic radiation, comprises: a source emitting electromagnetic radiation, means for directing the radiation onto the material, means for focusing the radiation on or in the material, a unit for generating a pattern in the optical path of the electromagnetic radiation, an at least partially reflective surface in the optical path before the focus of the focused radiation, said pattern being imaged onto said at least partially reflective surface through at least part of said directing means and said focusing means, at least one detector onto which an image of the pattern is reflected by said surface and which generates electrical signals corresponding to said image, said image containing information on the position of the focus, a computer receiving said electrical signals and programmed to process said image so as to generate an electrical signal depending on the focal position, and a divergence adjustment element arranged in said optical path and adapted to receive said electrical signal of the computer so as to change a divergence of the electromagnetic radiation depending on said signal.
摘要翻译：一种用于处理具有聚焦电磁辐射的材料的设备，包括：发射电磁辐射的源，用于将辐射引导到材料上的装置，用于将辐射聚焦在材料上或其中的装置，用于在该光学系统的光路中产生图案的单元电磁辐射，在聚焦辐射的聚焦之前的光路中的至少部分反射的表面，所述图案通过所述引导装置和所述聚焦装置的至少一部分成像到所述至少部分反射表面上，至少一个检测器其中所述图案的图像被所述表面反射并且产生对应于所述图像的电信号，所述图像包含关于焦点位置的信息，接收所述电信号的计算机，并被编程以处理所述图像，以便产生电信号取决于焦点位置，发散调节元件以sai布置 d光路，并且适于接收计算机的所述电信号，以便根据所述信号改变电磁辐射的发散。

10. 发明申请

US20110255067A1 MICROLITHOGRAPHY ILLUMINATION SYSTEMS, COMPONENTS AND METHODS 有权
标题翻译：微观照明系统，组件和方法
公开(公告)号：US20110255067A1
公开(公告)日：2011-10-20
申请号：US13164860
申请日：2011-06-21
申请人： Berndt Warm , Guenther Dengel
发明人： Berndt Warm , Guenther Dengel
IPC分类号： G03B27/74 , G03B27/32
CPC分类号： G03F7/702 , G03F7/70083 , G03F7/701 , G03F7/70133
摘要： The disclosure relates to microlithography systems, such as EUV micro-lithography illumination systems, as well as related components, systems and methods.
摘要翻译：本公开涉及微光刻系统，例如EUV微光刻照明系统，以及相关部件，系统和方法。

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