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    • 10. 发明授权
    • Unbalanced plasma generating apparatus having cylindrical symmetry
    • 具有圆柱对称性的不平衡等离子体发生装置
    • US06497803B2
    • 2002-12-24
    • US09805331
    • 2001-03-13
    • David A. GlockerMark M. Romach
    • David A. GlockerMark M. Romach
    • C23C1435
    • H01J37/3461C23C14/352H01J37/3405
    • Apparatus for creating subatmospheric high plasma densities in the vicinity of a substrate in a work space for use in magnetron sputter deposition aided by ion bombardment of the substrate. Unbalanced flux lines emanating from cylindrical or frusto-conical targets cannot be captured across the work space, because the energizing magnets are cylindrical, and instead converge toward the axis of the apparatus to provide a high flux density, and therefore a high plasma density, in the vicinity of a substrate disposed in this region. The plasma profile and the coating material profile within the work space are both cylindrically symmetrical, resulting in a consistent and predictable coating on substrates.
    • 用于在工作空间中的基板附近产生低于大气压的高等离子体密度的装置,用于通过基板的离子轰击辅助的磁控溅射沉积。 从圆柱形或截头圆锥形目标发出的不平衡磁通线不能被捕获在整个工作空间内,因为激励磁体是圆柱形的,而是朝着装置的轴线会聚,以提供高的磁通密度,因此具有高的等离子体密度 设置在该区域中的基板的附近。 工作空间内的等离子体轮廓和涂层材料轮廓都是圆柱对称的,从而在基底上形成一致且可预测的涂层。