专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07145641B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
公开(公告)号：US07145641B2
公开(公告)日：2006-12-05
申请号：US10748751
申请日：2003-12-31
申请人： Mark Kroon , Michael Cornelis Van Beek , Peter Dirksen , Ralph Kurt , Cassandra May Owen
发明人： Mark Kroon , Michael Cornelis Van Beek , Peter Dirksen , Ralph Kurt , Cassandra May Owen
IPC分类号： G03B27/72 , G03B27/42 , G03B27/52 , G03G27/54
CPC分类号： G03F7/70983 , G03F7/70808 , G03F7/70916 , G03F7/70933
摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.

2. 发明授权

US07142287B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
公开(公告)号：US07142287B2
公开(公告)日：2006-11-28
申请号：US11345316
申请日：2006-02-02
申请人： Mark Kroon , Michael Cornelis Van Beek , Peter Dirksen , Ralph Kurt , Cassandra May Owen
发明人： Mark Kroon , Michael Cornelis Van Beek , Peter Dirksen , Ralph Kurt , Cassandra May Owen
IPC分类号： G03B27/72 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70983 , G03F7/70808 , G03F7/70916 , G03F7/70933
摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.

3. 发明授权

US07230674B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07230674B2
公开(公告)日：2007-06-12
申请号：US11373503
申请日：2006-03-13
申请人： Mark Kroon , Michael Cornelis Van Beek , Peter Dirksen , Ralph Kurt , Cassandra May Owen
发明人： Mark Kroon , Michael Cornelis Van Beek , Peter Dirksen , Ralph Kurt , Cassandra May Owen
IPC分类号： G03B27/52 , G03B27/42 , G03B27/72
CPC分类号： G03F7/70983 , G03F7/70808 , G03F7/70916 , G03F7/70933
摘要： A lithographic apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a fluid cleaning system that cleans a fluid to be introduced into a region in between the optical element and the substrate. The fluid cleaning system includes a fluid inlet, a fluid outlet, and a cleaning zone disposed between the inlet and outlet. The cleaning zone includes a nucleated surface provided with a plurality of nucleation sites.
摘要翻译：光刻设备包括提供辐射束的辐射系统和支撑图案化结构的支撑结构。图形结构被配置为根据期望的图案对辐射束进行图案化。该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。投影系统包括光学元件，该光学元件具有通过图案化光束通过的每一个的光束出射区域。该装置还包括清洁被引入到光学元件和基板之间的区域中的流体的流体清洁系统。流体清洁系统包括流体入口，流体出口和布置在入口和出口之间的清洁区域。清洁区包括具有多个成核位点的成核表面。

4. 发明申请

US20060215132A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060215132A1
公开(公告)日：2006-09-28
申请号：US11373503
申请日：2006-03-13
申请人： Mark Kroon , Michael Van Beek , Peter Dirksen , Ralph Kurt , Cassandra Owen
发明人： Mark Kroon , Michael Van Beek , Peter Dirksen , Ralph Kurt , Cassandra Owen
IPC分类号： G03B27/52
CPC分类号： G03F7/70983 , G03F7/70808 , G03F7/70916 , G03F7/70933
摘要： A lithographic apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a fluid cleaning system that cleans a fluid to be introduced into a region in between the optical element and the substrate. The fluid cleaning system includes a fluid inlet, a fluid outlet, and a cleaning zone disposed between the inlet and outlet. The cleaning zone includes a nucleated surface provided with a plurality of nucleation sites.
摘要翻译：光刻设备包括提供辐射束的辐射系统和支撑图案化结构的支撑结构。图形结构被配置为根据期望的图案对辐射束进行图案化。该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。投影系统包括光学元件，该光学元件具有通过图案化光束通过的每一个的光束出射区域。该装置还包括清洁被引入到光学元件和基板之间的区域中的流体的流体清洁系统。流体清洁系统包括流体入口，流体出口和布置在入口和出口之间的清洁区域。清洁区包括具有多个成核位点的成核表面。

5. 发明申请

US20060176463A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US20060176463A1
公开(公告)日：2006-08-10
申请号：US11345316
申请日：2006-02-02
申请人： Mark Kroon , Michael Van Beek , Peter Dirksen , Ralph Kurt , Cassandra Owen
发明人： Mark Kroon , Michael Van Beek , Peter Dirksen , Ralph Kurt , Cassandra Owen
IPC分类号： G03B27/72
CPC分类号： G03F7/70983 , G03F7/70808 , G03F7/70916 , G03F7/70933
摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.
摘要翻译：公开了一种光刻设备。该装置包括提供辐射束的辐射系统和支撑图形结构的支撑结构。图形结构被配置为根据期望的图案对辐射束进行图案化。该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。投影系统包括具有光束入射区域的光学元件和具有通过图案化光束通过的每一个的光束出射区域的光学元件。该装置还包括与投影系统相关联的成核表面，其上设置有多个成核位置。表面远离光束入射区域和光束出射区域中的至少一个设置。

6. 发明申请

US20050140956A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US20050140956A1
公开(公告)日：2005-06-30
申请号：US10748751
申请日：2003-12-31
申请人： Mark Kroon , Michael Van Beek , Peter Dirksen , Ralph Kurt , Cassandra Owen
发明人： Mark Kroon , Michael Van Beek , Peter Dirksen , Ralph Kurt , Cassandra Owen
IPC分类号： G03F7/20 , G03B27/72
CPC分类号： G03F7/70983 , G03F7/70808 , G03F7/70916 , G03F7/70933
摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.
摘要翻译：公开了一种光刻设备。该装置包括提供辐射束的辐射系统和支撑图形结构的支撑结构。图形结构被配置为根据期望的图案对辐射束进行图案化。该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。投影系统包括具有光束入射区域的光学元件和具有通过图案化光束通过的每一个的光束出射区域的光学元件。该装置还包括与投影系统相关联的成核表面，其上设置有多个成核位置。表面远离光束入射区域和光束出射区域中的至少一个设置。

7. 发明授权

US09784805B2 MRI radio frequency receiver comprising digital down converter with connector that passes analog signal being contained within radio frequency receiver coil unit 有权
公开(公告)号：US09784805B2
公开(公告)日：2017-10-10
申请号：US12665336
申请日：2008-06-16
申请人： Marc Paul Saes , Johan Samuel Van Den Brink , Filips Van Liere , Roel Penterman , Ralph Kurt , Emiel Peeters , Dirk Jan Broer , Michel Paul Barbara Van Bruggen , Hans Van Zon , Miha Fuderer
发明人： Marc Paul Saes , Johan Samuel Van Den Brink , Filips Van Liere , Roel Penterman , Ralph Kurt , Emiel Peeters , Dirk Jan Broer , Michel Paul Barbara Van Bruggen , Hans Van Zon , Miha Fuderer
IPC分类号： G01R33/341 , G01R33/3415 , G01R33/36
CPC分类号： G01R33/341 , G01R33/3415 , G01R33/3621 , G01R33/3692
摘要： The invention relates to a nuclear magnetic resonance imaging radio frequency-receiver (112; 216; 308; 404), the receiver (112; 216; 308; 404) being adapted to receive analog signals from at least one radio frequency receiver coil unit (106; 200; 202; 300; 400; 402), the radio frequency receiver (112; 216; 308; 404) comprising: an analog-digital converter (118; 226) to convert the analog pre-amplified magnetic resonance signal into a digital signal, means (120; 230) for digital down converting the digital signal and a first communication interface (130; 252) adapted for transmitting the down converted digital signal via a communication link (e.g. wireless, optical or wire-bound).

8. 发明授权

US09357607B2 LED light source 有权
公开(公告)号：US09357607B2
公开(公告)日：2016-05-31
申请号：US14124733
申请日：2012-06-04
申请人： Henricus Marius Joseph Maria Kahlman , Ralph Kurt
发明人： Henricus Marius Joseph Maria Kahlman , Ralph Kurt
IPC分类号： H05B37/04 , H05B33/08
CPC分类号： H05B33/0845 , H05B33/0812 , H05B33/0815 , H05B33/083 , H05B33/0842 , H05B33/0851 , H05B37/02 , Y02B20/347 , Y02B20/348
摘要： A LED light source comprises—a full bridge rectifier equipped with a first input terminal and a second input terminal for coupling to output terminals of the phase cut dimmer, —a series arrangement comprising N LED loads, a first and second end of said series arrangement being coupled to a first output terminal and a second output terminal of the full bridge rectifier respectively, —control means for during a period of the rectified AC supply voltage subsequently making the LED loads comprised in the first series arrangement carry a current, one by one and in dependency of the momentary amplitude of the rectified AC supply voltage when the momentary amplitude increases and for subsequently making the LED loads stop carrying a current, one by one, and in dependency of the momentary amplitude of the rectified AC supply voltage when the momentary amplitude decreases, said control means controlling the current through the LED loads at zero when the output voltage of the phase cut dimmer equals zero and controlling the current through the LED loads at a value that is independent from the phase angle of the phase cut dimmer when the output voltage of the phase cut dimmer differs from zero Volt. In order to make the LED light source compatible with a phase cut dimmer, the LED light source is further equipped with—a switchable bleeder current source coupled between the first and second output terminal of the full bridge rectifier, —a latch coupled between the first and second output terminals of the full rectifier bridge and comprising a series arrangement of a resistor and a capacitor to prevent the current through the dimmer from crossing zero after a leading edge generated by the phase cut dimmer, in case the phase cut dimmer is a leading edge phase cut dimmer, —a unidirectional element arranged in series with the capacitor for preventing discharging of the capacitor via the LED loads or the adjustable bleeder current source, and—a clamp circuit coupled to the capacitor and comprising a current source for discharging the capacitor and providing a low ohmic path for the dimmer current when the dimmer is off.

9. 发明申请

US20150061499A1 LIGHT GENERATING DEVICE 有权
标题翻译：发光装置
公开(公告)号：US20150061499A1
公开(公告)日：2015-03-05
申请号：US14117391
申请日：2012-05-11
申请人： Christian Hattrup , Henricus Marius Joseph Maria Kahlman , Ralph Kurt , Georg Sauerländer , Bertrand Johan Edward Hontele , Haimin Tao
发明人： Christian Hattrup , Henricus Marius Joseph Maria Kahlman , Ralph Kurt , Georg Sauerländer , Bertrand Johan Edward Hontele , Haimin Tao
IPC分类号： H05B33/08
CPC分类号： H05B33/0824 , H05B33/0809 , H05B33/0815 , H05B33/083 , Y02B20/347
摘要： A light generating device (1) is provided with at least a voltage input (21) adapted for receiving a variable voltage, at least three LED circuits (10), coupled with said voltage input (21), wherein each LED circuit (10) comprises a LED unit (14) and controllable current regulator (15) to control the current through said LED circuit (10). The light generating device (1) further comprises a controllable switch matrix (30) comprising a plurality of switches (25, 26, 27), said switch matrix (30) is configured to operate in at least three different switching modes and a controller (50), connected at least with said switch matrix (30), configured to determine said variable operating voltage and to control the switching mode of said switch matrix (30) in dependence of the determined operating voltage. To provide an efficient operation of such device (1) with a variable operating voltage, such as an AC voltage, in a first switching mode, said LED units (10) are connected parallel to each other, in a second switching mode, at least two of said LED units (10) are connected in series and in a third switching mode, said LED units 10 are connected in series with each other.
摘要翻译：光发生装置（1）至少设置有用于接收可变电压的电压输入（21），与所述电压输入（21）耦合的至少三个LED电路（10），其中每个LED电路（10）包括LED单元（14）和可控电流调节器（15），以控制通过所述LED电路（10）的电流。光产生装置（1）还包括可控开关矩阵（30），其包括多个开关（25,26,27），所述开关矩阵（30）被配置为以至少三种不同的开关模式操作，以及控制器至少与所述开关矩阵（30）相连接，被配置为确定所述可变工作电压并且根据所确定的工作电压来控制所述开关矩阵（30）的开关模式。为了在第一开关模式中提供具有诸如AC电压的可变工作电压的这种装置（1）的有效操作，所述LED单元（10）以第二开关模式至少并联连接两个所述LED单元（10）串联连接，在第三开关模式下，所述LED单元10彼此串联连接。

10. 发明授权

US08840839B2 Hydrogel based device for detecting an environmental state 有权
标题翻译：用于检测环境状态的基于水凝胶的装置
公开(公告)号：US08840839B2
公开(公告)日：2014-09-23
申请号：US12593305
申请日：2008-04-02
申请人： Ventzeslav Petrov Iordanov , Hendrika Cecilia Krijnsen , Michel Paul Barbara Van Bruggen , Anna-Maria Janner , Ralph Kurt
发明人： Ventzeslav Petrov Iordanov , Hendrika Cecilia Krijnsen , Michel Paul Barbara Van Bruggen , Anna-Maria Janner , Ralph Kurt
IPC分类号： G01N21/00 , A61B5/00 , A61B5/1459
CPC分类号： A61B5/1459 , A61B5/0008 , A61B5/0031 , A61B5/4839
摘要： A transducer device for detecting an environmental state within a biological material including a channel comprising a fluid, a hydrogel material, which is adapted to change its volume when getting into contact with an environmental material and/or when detecting an environmental change, and which is mechanically coupled to the channel such that the volume of the channel changes when the volume of the hydrogel material changes. The transducer device further includes a sensor, which is adapted to generate a signal upon detection of the change of a physical property of the fluid that is induced by the volume change of the channel. By applying the transducer device, an accurate monitoring of physiological parameters, for which the hydrogel material is sensitive is possible. It is also possible to apply the transducer device outside of the bodily lumen, for example to monitor the blood of a patient outside the bodily lumen.
摘要翻译：一种用于检测生物材料内的环境状态的换能器装置，包括包含流体的通道，水凝胶材料，其在与环境材料接触时和/或当检测到环境变化时改变其体积，并且其是机械地耦合到通道，使得当水凝胶材料的体积变化时，通道的体积变化。换能器装置还包括传感器，其适于在检测到由通道的体积变化引起的流体的物理特性的变化时产生信号。通过应用传感器装置，水凝胶材料敏感的生理参数的准确监测是可能的。也可以将换能器装置应用于体腔外，例如监测患者体外的血液。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式