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1. 发明授权

US06379231B1 Apparatus and methods for chemical mechanical polishing with an advanceable polishing sheet 有权
标题翻译：用可推进的抛光片进行化学机械抛光的装置和方法
公开(公告)号：US06379231B1
公开(公告)日：2002-04-30
申请号：US09597957
申请日：2000-06-20
申请人： Manoocher Birang , Lawrence M. Rosenberg , Sasson Somekh , John M. White
发明人： Manoocher Birang , Lawrence M. Rosenberg , Sasson Somekh , John M. White
IPC分类号： B24B2100
CPC分类号： B24D7/12 , B24B21/04 , B24B27/0023 , B24B37/04 , H01L21/30625
摘要： A chemical mechanical polishing apparatus has a rotatable platen, a generally linear polishing sheet having an exposed portion extending over a top surface of the platen for polishing the substrate, and a drive mechanism to incrementally advance the polishing sheet in a linear direction across a top surface of the platen. The polishing sheet is releasably secured to the platen to rotate with the platen, and it has a width greater than a diameter of the substrate.
摘要翻译：一种化学机械抛光装置具有可旋转的压板，大体上线性的抛光片具有在压板的顶表面上延伸以用于抛光衬底的暴露部分;以及驱动机构，用于沿着线性方向跨越顶表面递增地推进抛光片的压板。抛光片可释放地固定到压板上以与压板一起旋转，并且其宽度大于衬底的直径。

2. 发明授权

US06244935B1 Apparatus and methods for chemical mechanical polishing with an advanceable polishing sheet 有权
标题翻译：用可推进的抛光片进行化学机械抛光的装置和方法
公开(公告)号：US06244935B1
公开(公告)日：2001-06-12
申请号：US09244456
申请日：1999-02-04
申请人： Manoocher Birang , Lawrence M. Rosenberg , Sasson Somekh , John M White
发明人： Manoocher Birang , Lawrence M. Rosenberg , Sasson Somekh , John M White
IPC分类号： B24B100
CPC分类号： B24D7/12 , B24B21/04 , B24B27/0023 , B24B37/04 , H01L21/30625
摘要： A chemical mechanical polishing apparatus has a rotatable platen, a generally linear polishing sheet having an exposed portion extending over a top surface of the platen for polishing the substrate, and a drive mechanism to incrementally advance the polishing sheet in a linear direction across a top surface of the platen. The polishing sheet is releasably secured to the platen to rotate with the platen, and it has a width greater than a diameter of the substrate.
摘要翻译：一种化学机械抛光装置具有可旋转的压板，大体上线性的抛光片具有在压板的顶表面上延伸以用于抛光衬底的暴露部分;以及驱动机构，用于沿着线性方向跨越顶表面递增地推进抛光片的压板。抛光片可释放地固定到压板上以与压板一起旋转，并且其宽度大于衬底的直径。

3. 发明授权

US07303467B2 Chemical mechanical polishing apparatus with rotating belt 有权
标题翻译：化学机械抛光装置带旋转带
公开(公告)号：US07303467B2
公开(公告)日：2007-12-04
申请号：US11531272
申请日：2006-09-12
申请人： Manoocher Birang , Lawrence M. Rosenberg , Sasson Somekh , John M. White
发明人： Manoocher Birang , Lawrence M. Rosenberg , Sasson Somekh , John M. White
IPC分类号： B24B21/00
CPC分类号： B24B21/004 , B24B21/008 , B24B21/04 , B24B27/0023 , B24B37/04 , B24B37/16 , B24B37/24 , B24B37/245 , B24B53/017 , B24D7/12 , H01L21/30625
摘要： A chemical mechanical polishing apparatus has a movable platen, a drive mechanism and a chucking mechanism. The drive mechanism is attached to the platen, is configured to support a generally linear polishing sheet with a portion of the polishing sheet extending over the platen, and is configured to incrementally advance the polishing sheet in a linear direction relative to the platen. The chucking mechanism is configured to intermittently secure the portion of the polishing sheet to the platen.
摘要翻译：化学机械抛光装置具有可移动的压板，驱动机构和夹紧机构。所述驱动机构附接到所述压板，所述驱动机构被配置为支撑大致线性的抛光片，所述抛光片的一部分延伸在所述压板上，并且被配置为相对于所述压板沿线性方向递增地推进所述抛光片。夹持机构构造成将抛光片的部分间歇地固定到压板上。

4. 发明授权

US06991517B2 Linear polishing sheet with window 失效
公开(公告)号：US06991517B2
公开(公告)日：2006-01-31
申请号：US10814405
申请日：2004-03-31
申请人： Fred C. Redeker , Manoocher Birang , Shijian Li , Sasson Somekh
发明人： Fred C. Redeker , Manoocher Birang , Shijian Li , Sasson Somekh
IPC分类号： B24B1/00
CPC分类号： B24B37/005 , B24B21/04 , B24B49/04 , B24B49/12 , H01L21/30625
摘要： A polishing article for chemical mechanical polishing. The polishing article includes a generally elongated polishing sheet with a polishing surface. The polishing article is formed from a material that is substantially opaque, and has a discrete region extending substantially the length of the polishing sheet that is at least semi-transparent.

5. 发明授权

US06585563B1 In-situ monitoring of linear substrate polishing operations 失效
标题翻译：线性衬底抛光操作的原位监控
公开(公告)号：US06585563B1
公开(公告)日：2003-07-01
申请号：US09724846
申请日：2000-11-28
申请人： Fred C. Redeker , Manoocher Birang , Shijian Li , Sasson Somekh
发明人： Fred C. Redeker , Manoocher Birang , Shijian Li , Sasson Somekh
IPC分类号： B24B100
CPC分类号： B24B37/005 , B24B21/04 , B24B49/04 , B24B49/12 , H01L21/30625
摘要： A substrate polishing scheme (apparatus and method) is described according to which a polishing surface of a polishing sheet is driven in a generally linear direction by a drive mechanism, a surface of a substrate is held against the polishing surface of the polishing sheet by a polishing head, and the substrate is probed through the polishing sheet by a monitoring system.
摘要翻译：描述了基板抛光方案（装置和方法），根据该基板抛光方案，研磨片的抛光表面通过驱动机构在大致线性方向上被驱动，基板的表面通过一个抛光头，并且通过监视系统通过抛光片探测基板。

6. 发明授权

US06179709B2 In-situ monitoring of linear substrate polishing operations 失效
标题翻译：线性衬底抛光操作的原位监控
公开(公告)号：US06179709B2
公开(公告)日：2001-01-30
申请号：US09244816
申请日：1999-02-04
申请人： Fred C. Redeker , Manoocher Birang , Shijian Li , Sasson Somekh
发明人： Fred C. Redeker , Manoocher Birang , Shijian Li , Sasson Somekh
IPC分类号： B24B100
CPC分类号： B24B37/005 , B24B21/04 , B24B49/04 , B24B49/12 , H01L21/30625
摘要： A substrate polishing scheme (apparatus and method) is described according to which a polishing surface of a polishing sheet is driven in a generally linear direction by a drive mechanism, a surface of a substrate is held against the polishing surface of the polishing sheet by a polishing head, and the substrate is probed through the polishing sheet by a monitoring system.
摘要翻译：描述了基板抛光方案（装置和方法），根据该基板抛光方案，研磨片的抛光表面通过驱动机构在大致线性方向上被驱动，基板的表面通过一个抛光头，并且通过监视系统通过抛光片探测基板。

7. 发明授权

US5745331A Electrostatic chuck with conformal insulator film 失效
标题翻译：带保形绝缘膜的静电吸盘
公开(公告)号：US5745331A
公开(公告)日：1998-04-28
申请号：US381786
申请日：1995-01-31
申请人： Shamouil Shamouilian , Sasson Somekh , Hyman J. Levinstein , Manoocher Birang , Semyon Sherstinsky , John F. Cameron
发明人： Shamouil Shamouilian , Sasson Somekh , Hyman J. Levinstein , Manoocher Birang , Semyon Sherstinsky , John F. Cameron
IPC分类号： B23Q3/15 , H01L21/683 , H02N13/00
CPC分类号： H01L21/6831 , H01L21/6833 , H02N13/00
摘要： An electrostatic chuck (20) for holding a substrate (75) comprises (i) a base (80) having an upper surface (95) with grooves (85) therein, the grooves (85) sized and distributed for holding coolant for cooling a substrate (75), and (ii) a substantially continuous insulator film (45) conformal to the grooves (85) on upper surface (95) of the base (80). The base (80) can be electrically conductive and capable of serving as the electrode (50) of the chuck (20), or the electrode (50) can be embedded in the insulator film (45). The insulator film (45) has a dielectric breakdown strength sufficiently high that when a substrate (75) placed on the chuck (20) and electrically biased with respect to the electrode (50), electrostatic charge accumulates in the substrate (75) and in the electrode (50) forming an electrostatic force that attracts and holds the substrate (75) to the chuck (20). Preferably the chuck (20) is fabricated using a pressure forming process, and more preferably using a pressure differential process.
摘要翻译：用于保持基板（75）的静电卡盘（20）包括（i）具有在其中具有凹槽（85）的上表面（95）的基部（80），所述凹槽（85）的尺寸和分布以保持用于冷却的冷却剂衬底（75），和（ii）与基座（80）的上表面（95）上的凹槽（85）共形的基本上连续的绝缘膜（45）。基座（80）可以是导电的并且能够用作卡盘（20）的电极（50），或者电极（50）可以嵌入绝缘膜（45）中。绝缘体膜（45）具有足够高的绝缘击穿强度，当放置在卡盘（20）上并相对于电极（50）电偏置的基板（75）时，静电电荷积聚在基板（75）中所述电极（50）形成吸引并保持所述基板（75）到所述卡盘（20）的静电力。优选地，使用压力成形方法制造卡盘（20），更优选使用压差法。

8. 发明申请

US20080076330A1 CHEMICAL MECHANICAL POLISHING WITH NAPPED POROMERIC 审中-公开
标题翻译：化学机械抛光与复合材料
公开(公告)号：US20080076330A1
公开(公告)日：2008-03-27
申请号：US11923544
申请日：2007-10-24
申请人： Manoocher Birang , Lawrence Rosenberg , Sasson Somekh , John White
发明人： Manoocher Birang , Lawrence Rosenberg , Sasson Somekh , John White
IPC分类号： B24B1/00
CPC分类号： B24B21/004 , B24B21/008 , B24B21/04 , B24B27/0023 , B24B37/04 , B24B37/16 , B24B37/24 , B24B37/245 , B24B53/017 , B24D7/12 , H01L21/30625
摘要： A method of polishing a substrate includes polishing a substrate with a generally linear polishing sheet, polishing the substrate with polishing pad composed of a napped poromeric material, and conditioning the polishing pad.
摘要翻译：抛光衬底的方法包括用基本上线性的抛光片抛光衬底，用由新鲜的孔体材料构成的抛光垫抛光衬底，并调理抛光垫。

9. 发明授权

US06796880B2 Linear polishing sheet with window 有权
标题翻译：线性抛光板带窗
公开(公告)号：US06796880B2
公开(公告)日：2004-09-28
申请号：US10394599
申请日：2003-03-21
申请人： Fred C. Redeker , Manoocher Birang , Shijian Li , Sasson Somekh
发明人： Fred C. Redeker , Manoocher Birang , Shijian Li , Sasson Somekh
IPC分类号： B24B100
CPC分类号： B24B37/005 , B24B21/04 , B24B49/04 , B24B49/12 , H01L21/30625
摘要： A polishing article for chemical mechanical polishing. The polishing article includes a generally elongated polishing sheet with a polishing surface. The polishing article is formed from a material that is substantially opaque, and has a discrete region extending substantially the length of the polishing sheet that is at least semi-transparent.
摘要翻译：用于化学机械抛光的抛光制品。抛光制品包括具有抛光表面的大致细长的抛光片。抛光制品由基本上不透明的材料形成，并且具有基本上延伸至少半透明的抛光片的长度的离散区域。

10. 发明授权

US5753132A Method of making electrostatic chuck with conformal insulator film 失效
标题翻译：用保形绝缘膜制作静电卡盘的方法
公开(公告)号：US5753132A
公开(公告)日：1998-05-19
申请号：US725482
申请日：1996-10-04
申请人： Shamouil Shamouilian , Sasson Somekh , Hyman J. Levinstein , Manoocher Birang , Semyon Sherstinsky , John F. Cameron
发明人： Shamouil Shamouilian , Sasson Somekh , Hyman J. Levinstein , Manoocher Birang , Semyon Sherstinsky , John F. Cameron
IPC分类号： B23Q3/15 , H01L21/683 , H02N13/00 , B44C1/22
CPC分类号： H01L21/6831 , H01L21/6833 , H02N13/00
摘要： A process for fabricating an electrostatic chuck (20) comprising the steps of (c) forming a base (80) having an upper surface with cooling grooves (85) therein, the grooves sized and distributed for holding a coolant therein for cooling the base; and (d) pressure conforming an electrical insulator layer (45) to the grooves on the base by the steps of (i) placing the base into a pressure forming apparatus (25) and applying an electrical insulator layer over the grooves in the base; and (ii) applying a sufficiently high pressure onto the insulator layer to pressure conform the insulator layer to the grooves to form a substantially continuous layer of electrical insulator conformal to the grooves on the base.
摘要翻译：一种用于制造静电卡盘（20）的方法，包括以下步骤：（c）形成具有上表面的基部（80），其中具有冷却槽（85），所述凹槽的尺寸和分布用于将冷却剂保持在其中用于冷却基座; 和（d）通过以下步骤将电绝缘体层（45）施加到基底上的凹槽上：（i）将基底放置在压力成形设备（25）中并将电绝缘体层施加在基底中的凹槽上; 和（ii）将足够高的压力施加到绝缘体层上以使绝缘体层压到沟槽上，以形成与基底上的凹槽保形的基本上连续的电绝缘层。

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