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1. 发明授权

US06744057B2 Convergent charged particle beam apparatus and inspection method using same 有权
标题翻译：收敛带电粒子束装置及其检验方法
公开(公告)号：US06744057B2
公开(公告)日：2004-06-01
申请号：US10426702
申请日：2003-05-01
申请人： Maki Tanaka , Masahiro Watanabe , Takashi Hiroi , Hiroyuki Shinada , Taku Ninomiya
发明人： Maki Tanaka , Masahiro Watanabe , Takashi Hiroi , Hiroyuki Shinada , Taku Ninomiya
IPC分类号： H01J37244
CPC分类号： H01J37/21 , G01N2001/2893 , H01J2237/2817 , H01J2237/304
摘要： A convergent charged particle beam apparatus and method of detecting an electron beam image of a specimen in which a converged electron beam is irradiated and scanned over a surface of a specimen which is mounted on a movable stage and moves at least in one direction. An electron beam image of the surface of the specimen mounted on the stage is observed and a height of the specimen mounted on the stage is detected. A focus position of the electron beam is controlled in accordance with the height detected.
摘要翻译：收敛带电粒子束装置和方法，其检测其中会聚的电子束在安装在可移动台上并且至少沿一个方向移动的样本的表面上照射和扫描的样本的电子束图像。观察安装在载物台上的试样的表面的电子束图像，并检测安装在载物台上的试样的高度。根据检测到的高度来控制电子束的聚焦位置。

2. 发明授权

US06559459B2 Convergent charged particle beam apparatus and inspection method using same 有权
公开(公告)号：US06559459B2
公开(公告)日：2003-05-06
申请号：US10012400
申请日：2001-12-12
申请人： Maki Tanaka , Masahiro Watanabe , Takashi Hiroi , Hiroyuki Shinada , Taku Ninomiya
发明人： Maki Tanaka , Masahiro Watanabe , Takashi Hiroi , Hiroyuki Shinada , Taku Ninomiya
IPC分类号： H01J37244
CPC分类号： H01J37/21 , G01N2001/2893 , H01J2237/2817 , H01J2237/304
摘要： A convergent charged particle beam apparatus and method includes an electron beam image observation arrangement which observes an electron beam image of a surface of a specimen mounted on a movable stage inside of a vacuum chamber when an electron beam converged by an electron optical system is irradiated and scanned over the surface of the specimen and detecting secondary charged particles produced from the specimen so as to provide electron image data of the surface. A height detector optically detects a surface height of the specimen by irradiating light from outside of the vacuum chamber onto the specimen and detecting reflected light from the specimen with a detector disposed outside of the vacuum chamber. A controller controls a focal point of the converged and focused electron beam in accordance with the output from the height detector, and a display displays the electron image of the surface of the specimen.

3. 发明授权

US06885012B2 Convergent charged particle beam apparatus and inspection method using same 有权
标题翻译：收敛带电粒子束装置及其检验方法
公开(公告)号：US06885012B2
公开(公告)日：2005-04-26
申请号：US10851322
申请日：2004-05-24
申请人： Maki Tanaka , Masahiro Watanabe , Takashi Hiroi , Hiroyuki Shinada , Taku Ninomiya
发明人： Maki Tanaka , Masahiro Watanabe , Takashi Hiroi , Hiroyuki Shinada , Taku Ninomiya
IPC分类号： G01N1/28 , G01Q30/16 , G01Q30/20 , G01Q40/00 , G01Q60/44 , H01J37/21 , H01J37/244 , H01J37/28
CPC分类号： H01J37/21 , G01N2001/2893 , H01J2237/2817 , H01J2237/304
摘要： A convergent charged particle beam apparatus includes an electron beam system which emits a converged electron beam, a vacuum chamber which is connected to the electron beam system, and a stage which mounts a specimen and moves at least in one direction inside of the vacuum chamber. An electron beam image observation unit observes an electron beam image of a surface of the specimen. A height detector optically detects a height of the specimen mounted on the stage by illuminating the surface of said specimen with light and by detecting reflected light of the illumination reflected from the surface of the specimen, and a controller controls a focus position of the electron beam in accordance with an output from the height detector while the stage is moving at least in one direction.
摘要翻译：收敛带电粒子束装置包括发射会聚电子束的电子束系统，连接到电子束系统的真空室和安装样本并至少沿真空室内的一个方向移动的台。电子束图像观察单元观察样品表面的电子束图像。高度检测器通过用光照射所述样本的表面并通过检测从样本表面反射的照明的反射光来光学地检测安装在舞台上的样本的高度，并且控制器控制电子束的聚焦位置根据来自高度检测器的输出，而舞台至少在一个方向上移动。

4. 发明授权

US06335532B1 Convergent charged particle beam apparatus and inspection method using same 有权
标题翻译：收敛带电粒子束装置及其检验方法
公开(公告)号：US06335532B1
公开(公告)日：2002-01-01
申请号：US09258461
申请日：1999-02-26
申请人： Maki Tanaka , Masahiro Watanabe , Takashi Hiroi , Hiroyuki Shinada , Taku Ninomiya
发明人： Maki Tanaka , Masahiro Watanabe , Takashi Hiroi , Hiroyuki Shinada , Taku Ninomiya
IPC分类号： H01J37244
CPC分类号： H01J37/21 , G01N2001/2893 , H01J2237/2817 , H01J2237/304
摘要： A method and apparatus to enable observation of an electron beam image of a specimen surface with an electron beam being always in focus in a convergent charged particle beam apparatus. Using an optical height detection system which does not cause interference with the electron beam, a specimen surface height in the vicinity of an electron beam irradiating point on the specimen surface is detected, and the specimen surface height is adjusted while the electron beam image of the specimen surface is being observed. The optical height detection system is calibrated using a calibration specimen having known step pattern features, and a surface height of an object under inspection is calculated accordingly. In the optical height detection system, a light beam is projected onto a surface of the object under inspection at an angle of at least 60 degrees with respect to a normal line on the surface of the object and a reflected light beam therefrom is detected for attaining surface height data of the object under inspection.
摘要翻译：一种能够以会聚的带电粒子束装置中始终聚焦的电子束来观察样品表面的电子束图像的方法和装置。使用不会对电子束造成干扰的光学高度检测系统，检测在试样表面上的电子束照射点附近的试样表面高度，并且在正在观察样品表面。使用具有已知步骤图案特征的校准样本校准光学高度检测系统，并且相应地计算检查对象的表面高度。在光学高度检测系统中，将光束相对于物体表面上的法线以至少60度的角度投影到被检查物体的表面上，并且检测其中的反射光束以获得检查对象的表面高度数据。

5. 发明申请

US20100193686A1 Electron Beam Exposure Or System Inspection Or Measurement Apparatus And Its Method And Height Detection Apparatus 有权
标题翻译：电子束曝光或系统检测或测量装置及其方法和高度检测装置
公开(公告)号：US20100193686A1
公开(公告)日：2010-08-05
申请号：US12754181
申请日：2010-04-05
申请人： Masahiro Watanabe , Takashi Hiroi , Maki Tanaka , Hiroyuki Shinada , Yasutsugu Usami
发明人： Masahiro Watanabe , Takashi Hiroi , Maki Tanaka , Hiroyuki Shinada , Yasutsugu Usami
IPC分类号： H01J37/28 , G01N23/22
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/21 , H01J37/222 , H01J37/226 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/20235 , H01J2237/20292 , H01J2237/216 , H01J2237/2445 , H01J2237/24578 , H01J2237/2482 , H01J2237/2487 , H01J2237/2814 , H01J2237/2817 , H01J2237/2826 , H01J2237/304 , H01J2237/3175
摘要： An electron beam apparatus equipped with a height detection system includes an electron beam unit emitting an electron beam to the specimen, and a height detection system for detecting height of the specimen which is set on a table. The height detection system includes an illumination system configured to direct first and second beams of light through a mask with a multi-slit pattern to a surface of the specimen at substantially opposite azimuth angles and at substantially equal angles of incidence, first and second detectors which respectively detect first and second multi-slit images of the first and second beams reflected from the specimen and generate output signals thereof, and a device which receives the output signals and generates a comparison signal which is responsive to the height of the specimen. An objective lens of the electron beam unit is controlled in accordance with the comparison signal.
摘要翻译：配备有高度检测系统的电子束装置包括向样本发射电子束的电子束单元和用于检测设置在桌子上的样本的高度的高度检测系统。高度检测系统包括照明系统，其被配置为将第一和第二光束通过具有多狭缝图案的掩模以基本上相反的方位角和基本上相等的入射角度引导到样本的表面，第一和第二检测器分别检测从样本反射的第一和第二光束的第一和第二多个狭缝图像，并产生其输出信号;以及接收输出信号并产生响应于样本的高度的比较信号的装置。根据比较信号控制电子束单元的物镜。

6. 发明授权

US06828554B2 Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same 失效
公开(公告)号：US06828554B2
公开(公告)日：2004-12-07
申请号：US10785949
申请日：2004-02-26
申请人： Takashi Hiroi , Maki Tanaka , Masahiro Watanabe , Asahiro Kuni , Yukio Matsuyama , Yuji Takagi , Hiroyuki Shinada , Mari Nozoe , Aritoshi Sugimoto
发明人： Takashi Hiroi , Maki Tanaka , Masahiro Watanabe , Asahiro Kuni , Yukio Matsuyama , Yuji Takagi , Hiroyuki Shinada , Mari Nozoe , Aritoshi Sugimoto
IPC分类号： G01N2300
CPC分类号： H01J37/28 , H01J2237/2817
摘要： A method of detecting a defect includes of determining an image acquisition condition for irradiating a converged electron beam onto a specimen and detecting a secondary electron emanated from the specimen, acquiring an image by detecting the secondary electron emanated from the specimen in synchronism with the irradiation of the electron beam, processing the acquired image to detect a defect on the specimen, and outputting information regarding the detected defect. The image acquisition condition is determined based on plural images which are acquired by changing at least one of acceleration condition of the secondary electron and an electrical field in the vicinity of the specimen.

7. 发明授权

US06373054B1 Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same 有权
公开(公告)号：US06373054B1
公开(公告)日：2002-04-16
申请号：US09752468
申请日：2001-01-03
申请人： Takashi Hiroi , Maki Tanaka , Masahiro Watanabe , Asahiro Kuni , Yukio Matsuyama , Yuji Takagi , Hiroyuki Shinada , Mari Nozoe , Aritoshi Sugimoto
发明人： Takashi Hiroi , Maki Tanaka , Masahiro Watanabe , Asahiro Kuni , Yukio Matsuyama , Yuji Takagi , Hiroyuki Shinada , Mari Nozoe , Aritoshi Sugimoto
IPC分类号： H01J37304
摘要： An inspection method and apparatus which controls an acceleration voltage of an electron beam, irradiates the electron beam to an object to be inspected mounted on a stage which is continuously moving at least in one direction, detects at least one of a secondary electron and a reflected electron emanated from the object by the irradiating, obtains an image of the object from the detected electron by using positional information of the stage, conducts inspection or measurement of the object using the image obtained, and outputs a result of the inspection or the measurement through a network system which is connected to a computer.

8. 发明授权

US06333510B1 Electron beam exposure or system inspection of measurement apparatus and its method and height detection apparatus 有权
标题翻译：电子束曝光或测量装置的系统检查及其方法和高度检测装置
公开(公告)号：US06333510B1
公开(公告)日：2001-12-25
申请号：US09642014
申请日：2000-08-21
申请人： Masahiro Watanabe , Takashi Hiroi , Maki Tanaka , Hiroyuki Shinada , Yasutsugu Usami
发明人： Masahiro Watanabe , Takashi Hiroi , Maki Tanaka , Hiroyuki Shinada , Yasutsugu Usami
IPC分类号： G01N2186
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/21 , H01J37/222 , H01J37/226 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/20235 , H01J2237/20292 , H01J2237/216 , H01J2237/2445 , H01J2237/24578 , H01J2237/2482 , H01J2237/2487 , H01J2237/2814 , H01J2237/2817 , H01J2237/2826 , H01J2237/304 , H01J2237/3175
摘要： An electron beam apparatus and method for at least obtaining an image of a specimen. The apparatus includes an electron optical system having an electron beam source, an element for deflecting electron beams emitted from the electron beam source, an objective lens for converting and irradiating electron beams deflected by the deflection element onto the specimen and a detector for detecting a secondary electron emanated from the specimen by irradiation of the electron beams. The apparatus further includes a projection optical system for projecting a light pattern onto a surface of the specimen in the vicinity of a beam axis of the electron optical system from an oblique direction to the surface, a detection optical system for detecting an image of the light pattern projected on the surface of the specimen and outputting information of a position of the image of the light pattern, and a surface height detection unit for outputting height information of the surface of the specimen by using the output information from the detection optical system. A focus controller is provided for focusing the electron beam onto the surface of the specimen by controlling the objective lens of the electron optical system in accordance with the height information from the surface height detection unit.
摘要翻译：一种用于至少获得样本图像的电子束装置和方法。该装置包括具有电子束源的电子光学系统，用于偏转从电子束源发射的电子束的元件，用于将由偏转元件偏转的电子束转换和照射到样本上的物镜，以及用于检测次级通过照射电子束从样品发出的电子。该装置还包括投影光学系统，用于将光图案从电子光学系统的光束轴线附近的倾斜方向投影到样本表面上，用于检测光的图像的检测光学系统输出样本表面上的图案，并输出光图案的图像位置的信息;以及表面高度检测单元，用于通过使用来自检测光学系统的输出信息输出样本表面的高度信息。提供了一种聚焦控制器，用于根据来自表面高度检测单元的高度信息控制电子光学系统的物镜，将电子束聚焦到样品的表面上。

9. 发明授权

US06172365B2 Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same 有权
标题翻译：电子束检查方法及装置及半导体制造方法及其制造线
公开(公告)号：US06172365B2
公开(公告)日：2001-01-09
申请号：US09437313
申请日：1999-11-10
申请人： Takashi Hiroi , Maki Tanaka , Masahiro Watanabe , Asahiro Kuni , Yukio Matsuyama , Yuji Takagi , Hiroyuki Shinada , Mari Nozoe , Aritoshi Sugimoto
发明人： Takashi Hiroi , Maki Tanaka , Masahiro Watanabe , Asahiro Kuni , Yukio Matsuyama , Yuji Takagi , Hiroyuki Shinada , Mari Nozoe , Aritoshi Sugimoto
IPC分类号： H01J3728
CPC分类号： H01J37/28 , H01J2237/2817
摘要： An electron beam inspection method including the steps of irradiating an electron beam to an object to be inspected, detecting at least one of a secondary electron and a reflected electron emanated from the object by the irradiation of the electron beam, and obtaining an image of the object from the detected electron. The method further includes the steps of controlling an electric field in a neighborhood of the object for filtering the at least one of the secondary and reflected electron emanated from the object so as to control the contrast of the image, detecting at least one of the secondary and reflected electron emanated from the object which passes through the electric field in the neighborhood of the object by the irradiation of the electron beam, and conducting inspection or measurement of the object on the basis of a detected signal of the detection in the controlled electric field.
摘要翻译：一种电子束检查方法，包括以下步骤：将电子束照射到待检查对象，通过电子束的照射检测从物体发射的二次电子和反射电子中的至少一种，并获得物体来自被检测的电子。该方法还包括以下步骤：控制物体附近的电场，以对从物体发出的次级和反射电子中的至少一种进行过滤，以便控制图像的对比度，检测二次以及通过电子束的照射而在物体附近通过电场发射的反射电子，并且根据检测到的受控电场的检测信号进行物体的检查或测量。

10. 发明授权

US5986263A Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same 失效
标题翻译：电子束检查方法及装置及半导体制造方法及其制造线
公开(公告)号：US5986263A
公开(公告)日：1999-11-16
申请号：US824413
申请日：1997-03-26
申请人： Takashi Hiroi , Maki Tanaka , Masahiro Watanabe , Asahiro Kuni , Yukio Matsuyama , Yuji Takagi , Hiroyuki Shinada , Mari Nozoe , Aritoshi Sugimoto
发明人： Takashi Hiroi , Maki Tanaka , Masahiro Watanabe , Asahiro Kuni , Yukio Matsuyama , Yuji Takagi , Hiroyuki Shinada , Mari Nozoe , Aritoshi Sugimoto
IPC分类号： G01Q20/00 , G01Q30/04 , G01Q30/02 , G01Q60/00 , H01J37/20 , H01J37/22 , H01J37/256 , H01J37/28 , H01L21/66
CPC分类号： H01J37/28 , H01J2237/2817
摘要： An electron beam inspection method and apparatus. The method includes controlling acceleration voltage of electron beam and electric field on a sample, beam current, beam diameter, image detection rate, image dimensions, precharge, discharge, or a combination of them, exposing an object to the electron beam, detecting in a sensor a physical change generated from the object, and inspecting or measuring the object on the basis of a signal representing the detected physical change. The apparatus includes an electron source (potential E2) for generating an electron beam, a deflector for scanning generated electrons, an objective lens for focusing the electron beam upon the object, a grid (potential E1) disposed between the object and the objective lens, a wafer holder (potential E0) for holding the object, a sensor for detecting generated secondary electrons, a potential controller for controlling the potential E0, E1 and E2, and a storage for storing optimum potential conditions. By changing conditions of an electron optic system such as potential E0, E1 and E2, the acceleration voltage and electric field on the object are controlled. For a material located at least in an upper layer of a plurality of materials forming the object, the secondary electron yield ratio can be made nearly unity and appropriate contrast of an obtained image can be provided with minimized influence of charge up.
摘要翻译：电子束检查方法和装置。该方法包括控制电子束的加速电压和样品上的电场，束电流，光束直径，图像检测率，图像尺寸，预充电，放电或它们的组合，将物体暴露于电子束，在传感器从物体产生的物理变化，以及根据表示检测到的物理变化的信号检查或测量物体。该装置包括用于产生电子束的电子源（电位E2），用于扫描产生的电子的偏转器，用于将电子束聚焦在物体上的物镜，设置在物体和物镜之间的格栅（电位E1）用于保持物体的晶片保持器（电位E0），用于检测产生的二次电子的传感器，用于控制电位E0，E1和E2的电位控制器，以及用于存储最佳电位条件的存储器。通过改变诸如电位E0，E1和E2的电子光学系统的状态，控制对象上的加速电压和电场。对于至少位于形成物体的多种材料的上层中的材料，二次电子屈服比可以几乎一致，并且可以以最小化的充电影响来提供所获得的图像的适当的对比度。

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