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1. 发明申请

WO2006055223A1 THERMAL MASS FLOW RATE SENSOR HAVING BYPASS RATIO 审中-公开
标题翻译：具有旁路比例的热流量传感器
公开(公告)号：WO2006055223A1
公开(公告)日：2006-05-26
申请号：PCT/US2005/039151
申请日：2005-10-26
申请人： MKS INSTRUMENTS, INC. , SHAJII, Ali , MENEGHINI, Paul , SMITH, Daniel, Alexander
发明人： SHAJII, Ali , MENEGHINI, Paul , SMITH, Daniel, Alexander
IPC分类号： G01F5/00 , G01F1/684
CPC分类号： G01F1/6847 , G01F5/00
摘要： A flow rate sensor includes a main conduit, a sensor tube and a bypass tube connecting an upstream portion of the main conduit to a downstream portion of the main conduit such that flow through the main conduit is divided through the sensor tube and the bypass tube, and at least one heater element for heating the sensor tube. A first flow restrictor of porous media is positioned between the upstream portion of the main conduit and the sensor tube, and a second flow restrictor of porous media is positioned between the upstream portion of the main conduit and the bypass tube. The flow restrictors provide the flow rate sensor with a fixed bypass ratio so that the sensor can operate independently of the type of gas being measured.
摘要翻译：流量传感器包括主导管，传感器管和旁通管，其将主管道的上游部分连接到主管道的下游部分，使得通过主管道的流经传感器管和旁通管分开，以及用于加热传感器管的至少一个加热器元件。多孔介质的第一限流器位于主管道的上游部分和传感器管之间，并且多孔介质的第二限流器位于主管道的上游部分和旁路管之间。流量限制器为流量传感器提供固定旁路比，使得传感器可以独立于所测量气体的类型进行操作。

2. 发明申请

WO2006055314A2 REYNOLDS NUMBER CORRECTION FUNCTION FOR MASS FLOW RATE SENSOR 审中-公开
标题翻译：适用于大量流量传感器的数字校正功能
公开(公告)号：WO2006055314A2
公开(公告)日：2006-05-26
申请号：PCT/US2005/040280
申请日：2005-11-07
申请人： MKS INSTRUMENTS, INC. , SHAJII, Ali , MENEGHINI, Paul
发明人： SHAJII, Ali , MENEGHINI, Paul
CPC分类号： G01F15/046 , G01F1/6847 , G01F1/6965 , G01F5/00
摘要： A mass flow rate sensor uses a Reynolds number correction function to compensate for errors in a bypass ratio of the sensor for all gases, based on the fact that all bypass errors are functions of Reynolds number. The sensor includes a sensor tube and a bypass tube dividing flow, wherein a bypass ratio of the sensor equals a total flow rate through the sensor divided by a flow rate through just the sensor tube. Heater elements heat an upstream portion and a downstream portion of the sensor tube, and a circuit is connected to the heater elements for producing a voltage based upon a difference in resistance between the heater elements. The voltage is calibrated based on known flow rates of a reference gas, and the flow rate through the sensor is based upon the calibrated voltage multiplied by a multi-gas correction function and a Reynolds number correction function.
摘要翻译：基于所有旁路误差是雷诺数的函数的事实，质量流量传感器使用雷诺数校正功能来补偿所有气体的传感器的旁路比的误差。传感器包括传感器管和旁路管分流，其中传感器的旁路比等于通过传感器的总流量除以仅通过传感器管的流量。加热元件加热传感器管的上游部分和下游部分，并且电路连接到加热器元件，用于基于加热器元件之间的电阻差产生电压。基于参考气体的已知流速校准电压，并且通过传感器的流量基于校准电压乘以多气体校正功能和雷诺数校正功能。

3. 发明申请

WO2007032826A3 PRECURSOR GAS DELIVERY WITH CARRIER GAS MIXING 审中-公开
公开(公告)号：WO2007032826A3
公开(公告)日：2007-03-22
申请号：PCT/US2006/029921
申请日：2006-07-28
申请人： MKS INSTRUMENTS, INC. , MENEGHINI, Paul , SMITH, Daniel , SHAJII, Ali
发明人： MENEGHINI, Paul , SMITH, Daniel , SHAJII, Ali
IPC分类号： C23C16/455
摘要： A system (100) and method are described that control the amount of precursor that is delivered to a process chamber by precisely measuring the mole fraction of the gas mixture being delivered. A gas delivery system includes a delivery chamber "(110); a precursor inlet valve (120), a carrier inlet valve (130), an outlet valve (140), and a controller. The controller controls the opening and closing of the precursor inlet valve, the carrier inlet valve, and the outlet valve, so as to introduce a desired amount of a precursor gas and a carrier gas into the delivery chamber, to generate a gas mixture having a desired mole fraction of the precursor gas, and to deliver to the process chamber the gas mixture having the desired mole fraction of the precursor gas.

4. 发明申请

WO2006101697A3 VAPORIZER AND METHOD OF VAPORIZING A LIQUID FOR THIN FILM DELIVERY 审中-公开
公开(公告)号：WO2006101697A3
公开(公告)日：2006-09-28
申请号：PCT/US2006/007752
申请日：2006-03-03
申请人： MKS INSTRUMENTS, INC. , MENEGHINI, Paul , SHAJII, Ali , SMITH, Daniel , CLARK, William
发明人： MENEGHINI, Paul , SHAJII, Ali , SMITH, Daniel , CLARK, William
IPC分类号： C23C16/448 , C23C16/455 , B01B1/00
摘要： A vaporizer (10) including an inlet (12) for liquid and an outlet (14) for gas, a gas valve (16) controlling gas flow to the outlet (14) of the vaporizer (10), and means (20) for heating liquid flowing between the liquid inlet (12) and the gas valve (16) . The vaporizer (10) also includes means (18) for increasing a heat transfer rate of the liquid flowing between the liquid inlet and the gas valve, and for causing a pressure drop in the liquid so that a pressure of the liquid drops below a vapor transition pressure of the liquid upon reaching the gas valve. The pressure drop occurs under isothermal conditions, and the liquid is vaporized on demand only when the valve (16) is opened. The means (18) for increasing a heat transfer rate and for causing a pressure drop can be a plug of porous media.

5. 发明申请

WO2005098375A3 THERMAL MASS FLOW RATE SENSOR PROVIDING INCREASED RATE OF HEAT TRANSFER TO GAS 审中-公开
公开(公告)号：WO2005098375A3
公开(公告)日：2005-10-20
申请号：PCT/US2005/009800
申请日：2005-03-24
申请人： MKS INSTRUMENTS, INC. , SHAJII, Ali , MENEGHINI, Paul , MYATT, Leonard
发明人： SHAJII, Ali , MENEGHINI, Paul , MYATT, Leonard
IPC分类号： G01F1/68
摘要： A sensing apparatus for use in a mass flow rate sensor for measuring a fluid flow rate includes a main conduit for containing a fluid flow, and a capillary tube for tapping a portion of the fluid flow from the main conduit at a first location, and returning the portion of the fluid flow to the conduit at a second location. The capillary tube is disposed about a centerline, and includes an inner wall defined by an inside radius measured from the centerline. The inside radius varies periodically, preferably sinusoidally, along the centerline for at least a portion of the capillary tube, thereby forming a turbulated surface on the inner wall. The turbulated inner wall increases wall surface area, and fluid mixing. The resulting increased heat transfer rate decreases the error in sensor output from nonlinear behavior.

6. 发明申请

WO2010098779A1 METHOD AND APPARATUS OF PROVIDING POWER TO IGNITE AND SUSTAIN A PLASMA IN A REACTIVE GAS GENERATOR 审中-公开
标题翻译：向IGNITE提供电力的方法和装置，并在可靠的气体发生器中保持等离子体
公开(公告)号：WO2010098779A1
公开(公告)日：2010-09-02
申请号：PCT/US2009/040358
申请日：2009-04-13
申请人： MKS INSTRUMENTS, INC. , BENZERROUK, Souheil , NAGARKATTI, Siddharth, P. , COWE, Andrew , SHAJII, Ali , AMBROSINA, Jesse, E. , TRAN, Ken , CHEN, Xing
发明人： BENZERROUK, Souheil , NAGARKATTI, Siddharth, P. , COWE, Andrew , SHAJII, Ali , AMBROSINA, Jesse, E. , TRAN, Ken , CHEN, Xing
IPC分类号： H01J37/32
CPC分类号： H01J37/32009 , H01J37/321
摘要： Described are methods and apparatuses, including computer program products, for igniting and/or sustaining a plasma in a reactive gas generator. Power is provided from an ignition power supply to a plasma ignition circuit. A pre-ignition signal of the plasma ignition circuit is measured. The power provided to the plasma ignition circuit is adjusted based on the measured pre-ignition signal and an adjustable pre-ignition control signal. The adjustable pre-ignition control signal is adjusted after a period of time has elapsed.
摘要翻译：描述了用于在反应性气体发生器中点燃和/或维持等离子体的方法和装置，包括计算机程序产品。从点火电源向等离子体点火电路供电。测量等离子体点火电路的预点火信号。基于所测量的预先点火信号和可调节的预点火控制信号来调节提供给等离子体点火电路的功率。经过一段时间后，调节可调节点火控制信号。

7. 发明申请

WO2009158249A2 PARTICLE TRAP FOR A PLASMA SOURCE 审中-公开
标题翻译：用于等离子体源的颗粒捕获
公开(公告)号：WO2009158249A2
公开(公告)日：2009-12-30
申请号：PCT/US2009/047631
申请日：2009-06-17
申请人： MKS INSTRUMENTS, INC. , SHAJII, Ali , CHEN, Xing , COWE, Andrew , BURTNER, David , ENTLEY, William, Robert , SHAO, Shouqian
发明人： SHAJII, Ali , CHEN, Xing , COWE, Andrew , BURTNER, David , ENTLEY, William, Robert , SHAO, Shouqian
IPC分类号： H01J37/32
CPC分类号： H01J37/32357 , H01J37/32871 , Y10S55/15 , Y10T29/4935
摘要： A particle trap for a remote plasma source includes a body structure having an inlet for coupling to a chamber of a remote plasma source and an outlet for coupling to a process chamber inlet. The particle trap for a remote plasma source also includes a gas channel formed in the body structure and in fluid communication with the body structure inlet and the body structure outlet. The gas channel can define a path through the body structure that causes particles in a gas passing from a first portion of the channel to strike a wall that defines a second portion of the gas channel at an angle relative to a surface of the wall. A coolant member can be in thermal communication with the gas channel.
摘要翻译：用于远程等离子体源的颗粒捕集器包括具有用于耦合到远程等离子体源的室的入口和用于耦合到处理室入口的出口的主体结构。用于远程等离子体源的颗粒捕获器还包括形成在主体结构中并与主体结构入口和主体结构出口流体连通的气体通道。气体通道可以限定穿过主体结构的路径，其使得从通道的第一部分通过的气体中的颗粒撞击限定气体通道的第二部分的壁，该壁相对于壁的表面成一定角度。冷却剂构件可以与气体通道热连通。

8. 发明申请

WO2008154222A1 PARTICLE REDUCTION THROUGH GAS AND PLASMA SOURCE CONTROL 审中-公开
标题翻译：通过气体和等离子体源控制减少颗粒
公开(公告)号：WO2008154222A1
公开(公告)日：2008-12-18
申请号：PCT/US2008/065651
申请日：2008-06-03
申请人： MKS INSTRUMENTS, INC. , ENTLEY, William, Robert , CHEN, Xing , SHAJII, Ali , BAKHTARI, Kaveh , COWE, Andrew
发明人： ENTLEY, William, Robert , CHEN, Xing , SHAJII, Ali , BAKHTARI, Kaveh , COWE, Andrew
IPC分类号： H01J37/32
CPC分类号： H01J37/3299 , H01J37/32357 , H01J37/3244 , H01J37/32449
摘要： A system for producing excited gases for introduction to a. semiconductor processing chamber. The system includes a plasma source (104) for generating a plasma. The plasma source includes a plasma chamber (156) and a gas inlet (126) for receiving process gases from a gas source (116). A gas flow rate controller (108) is coupled to the gas inlet for controlling an inlet flow rate of the process gases from the gas source to the plasma chamber via the gas inlet. The system includes a control loop for detecting a transition from a first process gas. to a second process gas and for adjusting the inlet flow rate of the second process gas from about 0 seem to about 10,000 seem over a period of time greater than about 300 milliseconds to maintain transient heat flux loads applied by the plasma to an inner surface of the plasma chamber below a vaporization temperature of the plasma chamber.
摘要翻译：用于生产用于引入a的激发气体的系统。半导体处理室。该系统包括用于产生等离子体的等离子体源（104）。等离子体源包括用于从气体源（116）接收工艺气体的等离子体室（156）和气体入口（126）。气体流量控制器（108）耦合到气体入口，用于经由气体入口控制从气体源到等离子体室的处理气体的入口流量。该系统包括用于检测来自第一处理气体的转变的控制回路。到第二工艺气体并且用于在大于约300毫秒的时间段内将第二工艺气体的入口流量从约0sccm调节至约10,000sccm，以将由等离子体施加的瞬态热通量负载保持在等离子体室低于等离子体室的汽化温度。

9. 发明申请

WO2007053569A1 RADIO FREQUENCY POWER DELIVERY SYSTEM 审中-公开
标题翻译：无线电频率供电系统
公开(公告)号：WO2007053569A1
公开(公告)日：2007-05-10
申请号：PCT/US2006/042360
申请日：2006-10-31
申请人： MKS INSTRUMENTS, INC. , NAGARKATTI, Siddharth, P. , KISHINEVSKY, Michael , SHAJII, Ali , KALVAITIS, Timothy, E. , MCKINNEY, William, S. , GOODMAN, Daniel , HOLBER, William, M. , SMITH, John, A.
发明人： NAGARKATTI, Siddharth, P. , KISHINEVSKY, Michael , SHAJII, Ali , KALVAITIS, Timothy, E. , MCKINNEY, William, S. , GOODMAN, Daniel , HOLBER, William, M. , SMITH, John, A.
IPC分类号： H03H7/40
CPC分类号： H03H7/40
摘要： A system (200) and method are provided for delivering power to a dynamic load (260). The system includes a power supply (210) providing DC power having a substantially constant power open loop response, a power amplifier (220) for converting the DC power to RF power, a sensor (240) for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system (250, 252) to modify the impedance of the power amplifier to at least a substantially matched impedance of the dynamic load (260), and a controller (230) for controlling the electrically controllable impedance matching system (200). The system (200) further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module (252) for determining power delivered to the dynamic load, (260) and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.
摘要翻译：提供了一种用于将功率传递给动态负载（260）的系统（200）和方法。该系统包括提供具有基本上恒定的功率开环响应的DC电力的电源（210），用于将DC功率转换成RF功率的功率放大器（220），用于测量DC功率的电压，电流和相位角的传感器（240）与RF功率相关联的电压和电流矢量;将电力可控阻抗匹配系统（250,252）修改成至少动态负载（260）的基本上匹配的阻抗的功率放大器的阻抗;以及控制器（230）用于控制电可控阻抗匹配系统（200）。所述系统（200）还包括用于确定由所述功率放大器输出的功率的传感器校准测量模块，用于确定输送到所述动态负载的功率的电子匹配系统校准模块（252）和用于计算功率的功率耗散模块消耗在电可控阻抗匹配系统中。

10. 发明申请

WO2005094404A3 SEMICONDUCTOR MANUFACTURING GAS FLOW DIVIDER SYSTEM AND METHOD 审中-公开
公开(公告)号：WO2005094404A3
公开(公告)日：2005-10-13
申请号：PCT/US2005/002783
申请日：2005-02-01
申请人： MKS INSTRUMENTS, INC. , SHAJII, Ali , NAGARKATTI, Siddharth
发明人： SHAJII, Ali , NAGARKATTI, Siddharth
IPC分类号： G05D7/00 , G05D11/00
摘要： A system for dividing a single flow into two or more secondary flows of desired ratios, including an inlet adapted to receive the single flow, at least two secondary flow lines connected to the inlet, an input device adapted to receive at least one desired ratio of flow, at least one in-situ process monitor providing measurements of products produced by each of the flows lines, and a controller connected to the input device and the in-situ process monitor. The controller is programmed to receive the desired ratio of flow through the input device, receive the product measurements from the in-situ process monitor, and calculate a corrected ratio of flow based upon the desired ratio of flow and the product measurements. If the product measurements are not equal, then the corrected ratio of flow will be different than the desired ratio of flow.

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