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    • 3. 发明申请
    • ELECTROCHEMICAL BIOSENSORS AND ARRAYS
    • 电化学生物传感器和阵列
    • WO2008154416A2
    • 2008-12-18
    • PCT/US2008066172
    • 2008-06-06
    • MICROCHIPS INCSHEPPARD NORMAN F JRSANTINI JOHN T JR
    • SHEPPARD NORMAN F JRSANTINI JOHN T JR
    • A61B5/00C12Q1/00G01N27/49G01N33/487
    • A61B5/14865A61B5/14532C12Q1/004G01N27/3272
    • Electrochemical sensor devices are provided, in various amperometric, potentiometric, and conductometric sensor device configurations. An amperometric sensor device may include a structural body which has at least one reservoir that has at least one opening; a working electrode located within the reservoir; analyte sensor chemistry located within the reservoir and deposited on at least the working electrode; an auxiliary electrode located outside of the reservoir; a reference electrode; at least one reservoir cap closing the opening to isolate the working electrode and analyte sensor chemistry within the reservoir and to prevent an analyte outside of the reservoir from contacting the analyte sensor chemistry; and means for rupturing or displacing the reservoir cap to permit the analyte from outside of the reservoir to contact the analyte sensor chemistry.
    • 以各种电流,电位和电导率传感器装置配置提供电化学传感器装置。 电流传感器装置可以包括具有至少一个具有至少一个开口的储存器的结构体; 位于储存器内的工作电极; 分析物传感器化学位于储层内并沉积在至少工作电极上; 位于储存器外部的辅助电极; 参考电极; 至少一个储存器盖封闭所述开口以将所述工作电极和所述分析物传感器化学物质隔离在所述储存器内并防止所述储存器外的分析物接触所述分析物传感器化学物质; 以及用于破裂或移动储存器盖以允许来自储存器外部的分析物接触分析物传感器化学物质的装置。
    • 4. 发明申请
    • FABRICATION METHODS AND STRUCTURES FOR MICRO-RESERVOIR DEVICES
    • 微型储存装置的制造方法和结构
    • WO2006055593A3
    • 2007-04-19
    • PCT/US2005041453
    • 2005-11-15
    • MICROCHIPS INCMALONEY JOHN MSBIAA ZOUHAIRSANTINI JOHN T JRSHEPPARD NORMAN F JRUHLAND SCOTT A
    • MALONEY JOHN MSBIAA ZOUHAIRSANTINI JOHN T JRSHEPPARD NORMAN F JRUHLAND SCOTT A
    • B01L3/00
    • B01L3/50853A61K9/0024A61K9/0097B01L2200/12B01L2300/0819B01L2400/0677
    • Methods are provided for making a multi-reservoir device comprising (i) patterning one or more photoresist layers on a substrate; (ii) depositing onto the substrate at least one metal layer by a sputtering process to form a plurality of reservoir caps and conductive traces; (iii) removing the photoresist layers using a liftoff process; (iv) forming a plurality of reservoirs in the substrate; (v) loading each reservoir with reservoir contents (such as a drug or sensor); and (vi) sealing each reservoir. Optionally, the reservoir cap comprises a first conductive metal layer coated with one or more protective noble metal films. To enhance the resistance of the substrate (e.g., a silicon substrate) to etching in vivo, the interior sidewalls of the reservoirs optionally can include a protective coating (e.g., gold, platinum, carbon, silicon carbide, silicon dioxide, and platinum silicide), or sidewalls comprising silicon can be doped with boron or another impurity.
    • 提供了用于制造多贮存器器件的方法,包括(i)在衬底上图案化一个或多个光致抗蚀剂层; (ii)通过溅射工艺在衬底上沉积至少一个金属层,以形成多个储存器盖和导电迹线; (iii)使用剥离工艺除去光致抗蚀剂层; (iv)在所述基板中形成多个储存器; (v)向每个储存器装载储存器内容物(例如药物或传感器); 和(vi)密封每个储存器。 可选地,储存器盖包括涂覆有一个或多个保护性贵金属膜的第一导电金属层。 为了增强衬底(例如,硅衬底)在体内蚀刻的电阻,存储器的内侧壁任选地可以包括保护涂层(例如金,铂,碳,碳化硅,二氧化硅和硅化铂) ,或者包含硅的侧壁可以掺杂硼或另一种杂质。