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    • 9. 发明申请
    • METHODS TO FORM WIDE HEATER TRENCHES AND TO FORM MEMORY CELLS TO ENGAGE HEATERS
    • 形成宽加热器的方法和形成记忆细胞进入加热器的方法
    • WO2008124444A1
    • 2008-10-16
    • PCT/US2008/059148
    • 2008-04-02
    • MARVELL WORLD TRADE LTD.SUTARDJA, PantasWU, AlbertCHANG, RunziWEI, Chien-ChuanLEE, WinstonLEE, Peter
    • SUTARDJA, PantasWU, AlbertCHANG, RunziWEI, Chien-ChuanLEE, WinstonLEE, Peter
    • H01L45/00
    • H01L45/1233H01L27/2445H01L27/2463H01L45/06H01L45/126H01L45/144H01L45/1675H01L45/1683
    • Embodiments of the present invention, provide a method that includes providing a wafer including multiple cells, each cell including at least one emitter (108), and performing a lithographic operation on the wafer. The lithographic operation comprises forming heater trenches adjacent the emitters, each heater trench having a width' that extends over at least respective portions of two cells. Embodiments of the present invention also provide a method that includes providing wafer including multiple cells, each cell including at least -one emitter. The method further includes performing a lithographic operation in a word line direction of the wafer across the cells to form pre-heater element arrangements, performing a lithographic operation in a bit line direction of the wafer across the pre-heater element arrangements to form a pre-heater element adjacent each emitter, and performing a lithographic operation in the word line direction across a portion of the pre-heater elements to form a heater element (402a, 402b) adjacent each emitter. Other embodiments are also described.
    • 本发明的实施例提供了一种方法,其包括提供包括多个单元的晶片,每个单元包括至少一个发射极(108),并对所述晶片进行光刻操作。 光刻操作包括在发射器附近形成加热器沟槽,每个加热器沟槽具有在两个单元的至少相应部分上延伸的宽度。 本发明的实施例还提供了一种方法,其包括提供包括多个单元的晶片,每个单元包括至少一个发射极。 所述方法还包括在晶片的字线方向上执行平版印刷操作,以形成预热器元件布置,在跨过预热器元件布置的晶片的位线方向上执行平版印刷操作,以形成预先 加热器元件,并且跨越预热器元件的一部分在字线方向上执行光刻操作,以形成与每个发射器相邻的加热器元件(402a,402b)。 还描述了其它实施例。