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1. 发明申请

WO2009048703A1 SHOWERHEAD ELECTRODE ASSEMBLIES AND PLASMA PROCESSING CHAMBERS INCORPORATING THE SAME 审中-公开
标题翻译：淋浴电极组件和等离子体加工炉
公开(公告)号：WO2009048703A1
公开(公告)日：2009-04-16
申请号：PCT/US2008/075676
申请日：2008-09-09
申请人： LAM RESEARCH CORPORATION , BETTENCOURT, Greg , DHINDSA, Rajinder , DIERCKS, George , HARDIN, Randall, A. , KEIHL, Jon , LYTLE, Duane , MARAKHTANOV, Alexei , PATRICK, Roger , PEGG, John , SPENCER, Shannon
发明人： BETTENCOURT, Greg , DHINDSA, Rajinder , DIERCKS, George , HARDIN, Randall, A. , KEIHL, Jon , LYTLE, Duane , MARAKHTANOV, Alexei , PATRICK, Roger , PEGG, John , SPENCER, Shannon
IPC分类号： C23C16/00 , C23C16/455 , H01L21/205
CPC分类号： H01J37/04 , C23C16/4401 , C23C16/45565 , H01J37/3255 , H01J37/32605 , H01J37/32724 , H01J2237/032
摘要： The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and securing hardware, wherein the silicon-based showerhead electrode comprises a plurality of partial recesses formed in the backside of the silicon-based showerhead electrode and backside inserts positioned in the partial recesses. The thermal control plate comprises securing hardware passages configured to permit securing hardware to access the backside inserts. The securing hardware and the backside inserts are configured to maintain engagement of the thermal control plate and the silicon-based showerhead electrode and to permit disengagement of the thermal control plate and the silicon-based showerhead electrode while isolating the silicon-based electrode material of the silicon-based showerhead electrode from frictional contact with the securing hardware during disengagement.
摘要翻译：本发明一般涉及等离子体处理，更具体地，涉及其中使用的等离子体处理室和电极组件。根据本发明的一个实施例，提供一种电极组件，其包括热控制板，硅基喷头电极和固定硬件，其中硅基喷头电极包括多个部分凹部，其形成在硅基喷头电极和位于部分凹部中的背面插入件。热控制板包括固定硬件通道，其配置成允许固定硬件以接近背面插入件。固定硬件和后侧插入件构造成保持热控制板和硅基喷头电极的接合，并且允许热控制板和硅基喷头电极分离，同时隔离硅基电极材料的硅基电极材料硅基喷头电极在分离时与固定硬件摩擦接触。

2. 发明申请

WO2009117181A1 ELECTRODE ASSEMBLY AND PLASMA PROCESSING CHAMBER UTILIZING THERMALLY CONDUCTIVE GASKET 审中-公开
标题翻译：电极组件和等离子体加热室，采用导热气体
公开(公告)号：WO2009117181A1
公开(公告)日：2009-09-24
申请号：PCT/US2009/033060
申请日：2009-02-04
申请人： LAM RESEARCH CORPORATION , PATRICK, Roger , DHINDSA, Rajinder , BETTENCOURT, Greg , MARAKHTANOV, Alexei
发明人： PATRICK, Roger , DHINDSA, Rajinder , BETTENCOURT, Greg , MARAKHTANOV, Alexei
IPC分类号： H05H1/34 , H01L21/3065 , H01L21/265 , H01L21/205
CPC分类号： C23C16/45565 , H01J37/32541 , H01J37/32724
摘要： The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and a thermally conductive gasket, wherein respective profiles of a frontside of the thermal control plate and a backside of the showerhead electrode cooperate to define a disjointed thermal interface comprising portions proximal to showerhead passages of the showerhead electrode and portions displaced from the showerhead passages. The displaced portions are recessed relative to the proximal portions and are separated from the showerhead passages by the proximal portions of the thermal interface. The gasket is positioned along the displaced portions such that the gasket is isolated from the showerhead passages and may facilitate heat transfer across the thermal interface from the showerhead electrode to the thermal control plate.
摘要翻译：本发明一般涉及等离子体处理，更具体地，涉及其中使用的等离子体处理室和电极组件。根据本发明的一个实施例，提供一种电极组件，其包括热控制板，硅基喷头电极和导热衬垫，其中热控制板的前侧和喷头的背面的各自的轮廓电极配合以限定不连接的热界面，其包括靠近喷头电极的喷头通道的部分和从喷头通道移位的部分。移位部分相对于近端部分凹陷，并且通过热界面的近端部分与喷头通道分离。垫圈沿着移位的部分定位，使得垫圈与喷头通道隔离，并且可以促进跨过从喷头电极到热控制板的热界面的热传递。

3. 发明申请

WO2008156958A2 ELECTRODE ASSEMBLY AND PLASMA PROCESSING CHAMBER UTILIZING THERMALLY CONDUCTIVE GASKET AND O-RINGS 审中-公开
标题翻译：电极组件和等离子体加工室，采用导热垫片和O形圈
公开(公告)号：WO2008156958A2
公开(公告)日：2008-12-24
申请号：PCT/US2008/064488
申请日：2008-05-22
申请人： LAM RESEARCH CORPORATION , PATRICK, Roger , DHINDSA, Raj , BETTENCOURT, Greg , MARAKHTANOV, Alexei
发明人： PATRICK, Roger , DHINDSA, Raj , BETTENCOURT, Greg , MARAKHTANOV, Alexei
IPC分类号： H01L21/3065 , C23C16/50
CPC分类号： H05H1/46 , H01J37/32541 , H01J37/32724
摘要： The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, a thermally conductive gasket, and a plurality of o-rings, wherein respective profiles of a frontside of the thermal control plate and a backside of the showerhead electrode cooperate to define a thermal interface. The thermally conductive gasket and the o-rings are positioned along this thermal interface with the o-rings separating the thermally conductive gasket from the showerhead passages such that the gasket is isolated from the showerhead passages. The gasket may facilitate heat transfer across the thermal interface from the showerhead electrode to the thermal control plate.
摘要翻译：本发明一般涉及等离子体处理，更具体地，涉及其中使用的等离子体处理室和电极组件。根据本发明的一个实施例，提供一种电极组件，其包括热控制板，硅基喷头电极，导热衬垫和多个O形环，其中热控制器的前侧的各个轮廓板和喷头电极的背面配合以限定热界面。导热垫圈和O形环沿着该热界面定位，其中O形环将导热垫片与喷头通道分开，使得垫圈与喷头通道隔离。衬垫可以促进从喷头电极到热控制板的热界面的热传递。

4. 发明申请

WO2005048301A2 METHODS AND APPARATUS FOR OPTIMIZING A SUBSTRATE IN A PLASMA PROCESSING SYSTEM 审中-公开
标题翻译：用于优化等离子体处理系统中的基板的方法和装置
公开(公告)号：WO2005048301A2
公开(公告)日：2005-05-26
申请号：PCT/US2004/035980
申请日：2004-10-28
申请人： LAM RESEARCH CORPORATION , PATRICK, Roger , RICHARDSON, Brett , WILLIAMS, Norman
发明人： PATRICK, Roger , RICHARDSON, Brett , WILLIAMS, Norman
IPC分类号： H01L
CPC分类号： H01J37/3299 , H01J37/32082 , H01J37/321 , H01J37/32174 , H01J37/32183 , H01J37/32935 , H03H7/40
摘要： An arrangement for processing a semiconductor substrate in a plasma processing system is disclosed. The arrangement includes providing a RF coupling structure having a first terminal and a second terminal, the first terminal being coupled with a first electrical measuring device, the second terminal being coupled with a second electrical measuring device. The arrangement also includes coupling a compensating circuit to the second terminal. The arrangement further includes providing a feedback circuit coupled to receive information from the first electrical measuring device and the second electrical measuring device, an output of the feedback circuit being employed to control the compensating circuit in order to keep a ratio between a first electrical value at the first terminal and a second electrical value at the second terminal substantially at a predefined value.
摘要翻译：公开了一种在等离子体处理系统中处理半导体衬底的装置。该装置包括提供具有第一端子和第二端子的RF耦合结构，第一端子与第一电测量装置耦合，第二端子与第二电测量装置耦合。该布置还包括将补偿电路耦合到第二端子。该装置还包括提供耦合以从第一电测量装置和第二电测量装置接收信息的反馈电路，反馈电路的输出被用于控制补偿电路，以便保持第一电气值在第一端子和第二端子处的第二电气值基本上是预定义的值。

5. 发明申请

WO2009032095A1 METHOD AND APPARATUS FOR DIAGNOSING STATUS OF PARTS IN REAL TIME IN PLASMA PROCESSING EQUIPMENT 审中-公开
标题翻译：用于在等离子体处理设备中实时诊断部件状态的方法和装置
公开(公告)号：WO2009032095A1
公开(公告)日：2009-03-12
申请号：PCT/US2008/010070
申请日：2008-08-26
申请人： LAM RESEARCH CORPORATION , PATRICK, Roger
发明人： PATRICK, Roger
IPC分类号： H01L21/3065 , C23C16/52 , C23F4/00
CPC分类号： G01N27/20 , C23C16/50 , G01N17/00 , G01N17/04 , Y10T29/49004
摘要： Apparatus and methods for diagnosing status of a consumable part of a plasma reaction chamber, the consumable part including at least one conductive element embedded therein. The method includes the steps of: coupling the conductive element to a power supply so that a bias potential relative to the ground is applied to the conductive element; exposing the consumable part to plasma erosion until the conductive element draws a current from the plasma upon exposure of the conductive element to the plasma; measuring the current; and evaluating a degree of erosion of the consumable part due to the plasma based on the measured current.
摘要翻译：用于诊断等离子体反应室的可消耗部件的状态的装置和方法，所述可消耗部件包括嵌入其中的至少一个导电元件。该方法包括以下步骤：将导电元件耦合到电源，使得相对于地面的偏置电位被施加到导电元件; 将所述消耗部件暴露于等离子体侵蚀，直到所述导电元件在将所述导电元件暴露于所述等离子体时从所述等离子体吸取电流; 测量电流; 以及基于测量的电流评估由于等离子体引起的消耗部件的侵蚀程度。

6. 发明申请

WO2010005540A2 CLAMPED MONOLITHIC SHOWERHEAD ELECTRODE 审中-公开
标题翻译：夹层整体式喷头电极
公开(公告)号：WO2010005540A2
公开(公告)日：2010-01-14
申请号：PCT/US2009/003952
申请日：2009-07-06
申请人： LAM RESEARCH CORPORATION , PATRICK, Roger , BETTENCOURT, Gregory, R. , KELLOGG, Michael, C.
发明人： PATRICK, Roger , BETTENCOURT, Gregory, R. , KELLOGG, Michael, C.
IPC分类号： H05H1/34 , H05H1/38 , H01L21/3065
CPC分类号： H01L21/3065 , C23C16/45565 , C23C16/4557 , H01J37/32091 , H01J37/3244 , H01J37/32458 , H01J37/32532 , H01J37/32541 , H01J37/32568 , H01J37/32605 , Y10S403/12 , Y10S403/13
摘要： An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.
摘要翻译：用于半导体衬底处理中的等离子体反应室的电极组件。该组件包括上部喷头电极，其通过一系列间隔开的凸轮锁机械地附接到背板。护环围绕背板并可移动到护环中的开口与背板中的开口对齐的位置，使得凸轮锁可以利用工具旋转以释放从电极的上表面延伸的锁定销。

7. 发明申请

WO2005001893A2 ARCHITECTURE FOR GENERAL PURPOSE PROGRAMMABLE SEMICONDUCTOR PROCESSING SYSTEM AND METHODS THEREFOR 审中-公开
标题翻译：一般用途可编程半导体处理系统的结构及其方法
公开(公告)号：WO2005001893A2
公开(公告)日：2005-01-06
申请号：PCT/US2004/016414
申请日：2004-05-24
申请人： LAM RESEARCH CORPORATION , PATRICK, Roger , WONG, Vincent , HUANG, Chung Ho
发明人： PATRICK, Roger , WONG, Vincent , HUANG, Chung Ho
IPC分类号： H01L
CPC分类号： G05B19/418 , G05B2219/32128 , G05B2219/35262 , G05B2219/45031 , H01L21/67276 , Y02P90/02 , Y02P90/86
摘要： A method of optimizing a set of steps in a semi-conductor processing system comprising a software control program, wherein the semi-conductor processing system includes a first function, a second function, and a third function, and further includes a memory for storing a set of variables, and wherein the set of steps further includes a first step, a second step, and a third step. The invention includes generating the first step on an editor application, wherein the first function is added to the first step, and if required, a first set of user input instructions is added. The invention also includes generating the second step on the editor application, wherein the second function is added to the second step, and if required, a second set of user input instructions is added; and generating the third step on the editor application, wherein the third function is added to the third step, and if required, a third set of user input instructions is added. The invention further includes placing the first step, the second step, and the third step in a proper order; transferring the set of steps to the semi-conductor processing system; executing the set of steps; storing a set of results in the set of variables; and, if required, generating a report from the set of variables.
摘要翻译：一种在包括软件控制程序的半导体处理系统中优化一组步骤的方法，其中所述半导体处理系统包括第一功能，第二功能和第三功能，并且还包括用于存储一组变量，并且其中该组步骤还包括第一步骤，第二步骤和第三步骤。本发明包括在编辑器应用中生成第一步骤，其中第一功能被添加到第一步骤，如果需要，则添加第一组用户输入指令。本发明还包括在编辑器应用上生成第二步骤，其中将第二功能添加到第二步骤，如果需要，则添加第二组用户输入指令; 以及在所述编辑器应用程序中生成第三步骤，其中将所述第三功能添加到所述第三步骤，并且如果需要，则添加第三组用户输入指令。本发明还包括以适当的顺序放置第一步骤，第二步骤和第三步骤; 将所述步骤转移到所述半导体处理系统; 执行一组步骤; 将一组结果存储在变量集合中; 如果需要，从该组变量生成报告。

8. 发明申请

WO2016057565A1 MOBILE DEVICE USER INTERFACE FOR SUPPORTING SERVICE MAINTENANCE AND TRACKING ACTIVITIES IN SEMICONDUCTOR TOOL 审中-公开
标题翻译：用于支持半导体工具中的维护和跟踪活动的移动设备用户界面
公开(公告)号：WO2016057565A1
公开(公告)日：2016-04-14
申请号：PCT/US2015/054306
申请日：2015-10-06
申请人： LAM RESEARCH CORPORATION
发明人： GOSSELIN, Simon , WONG, Vincent , RAMNARINE, Ronald , NEWTON, Neal K , SHAH, Mukesh , HOVERSTEN, Kerwin , AHRENS, Bob , MORA, Marco , PATRICK, Roger
IPC分类号： G05B19/409
CPC分类号： G06Q10/20
摘要： Integration of semiconductor tool maintenance operations on mobile devices enables technicians to more accurately perform semiconductor tool maintenance, and allows for more accurate collection and analysis of data so that maintenance procedures and resulting tool operations can be more repeatable, consistent and efficient.
摘要翻译：将半导体工具维护操作集成到移动设备上，使技术人员能够更准确地执行半导体工具维护，并允许更准确地收集和分析数据，从而使维护过程和结果的工具操作更具可重复性，一致性和高效性。

9. 发明公开

EP1016116A2 APPARATUS FOR IMPROVING ETCH UNIFORMITY AND METHODS THEREFOR 审中-公开
标题翻译：设备和方法以增加蚀刻均一
公开(公告)号：EP1016116A2
公开(公告)日：2000-07-05
申请号：EP98944696.8
申请日：1998-09-01
申请人： LAM RESEARCH CORPORATION
发明人： PATRICK, Roger , JONES, Phillip, L.
IPC分类号： H01J37/00
CPC分类号： H01J37/32431 , H01J2237/3343 , H01L21/32136
摘要： A method in a plasma processing chamber for improving etch uniformity while etching a semiconductor substrate. The method includes placing the semiconductor substrate into a sacrificial substrate holder. The sacrificial substrate holder is configured to present a sacrificial etch portion surrounding the semiconductor substrate to a plasma within the plasma processing chamber to permit the plasma to etch a first surface of the semiconductor substrate and a first surface of the sacrificial etch portion simultaneously. The first surface of the sacrificial etch portion is formed of a material capable of being etched by the plasma. The method further includes positioning the semiconductor substrate and the sacrificial substrate holder into the plasma processing chamber. There is also included striking the plasma from an etchant source gas released into the plasma processing chamber. Additionally, there is included simultaneously etching the first surface of the semiconductor substrate and the first surface of the sacrificial etch portion using the plasma.

10. 发明申请

WO2023003832A1 PLASMA SYSTEMS AND METHODS FOR USING SQUARE-SHAPED PULSE SIGNALS 审中-公开
公开(公告)号：WO2023003832A1
公开(公告)日：2023-01-26
申请号：PCT/US2022/037516
申请日：2022-07-18
申请人： LAM RESEARCH CORPORATION
发明人： MARAKHTANOV, Alexei, M. , RIGHETTI, Fabio , ZHAO, Lin , LUCCHESI, Kenneth , DORAI, Rajesh , HOLLAND, John, P. , BENNET, Alexander, Declan , PATRICK, Roger
IPC分类号： H01J37/32
摘要： A system for using a square wave signal for processing a substrate is described. The system includes a first pulse generator that generates a first square wave signal of a first frequency. The system further includes a first filter that filters a second frequency from interfering with the first square wave signal to provide a first filter output signal. The first filter provides the first filter output signal via a first transmission line to an electrode of a plasma chamber. The system includes a second pulse generator that generates a second square wave signal of a third frequency. The system also includes a second filter that filters the second frequency from interfering with the second square wave signal to provide a second filter output signal. The second filter provides the second filter output signal via a second transmission line to an edge ring of the plasma chamber.

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