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1. 发明授权

US5468590A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5468590A
公开(公告)日：1995-11-21
申请号：US348994
申请日：1994-11-29
申请人： Kazuhiko Hashimoto , Haruyoshi Osaki , Chinehito Ebina , Kyoko Nagase , Hiroshi Moriuma , Yasunori Uetani
发明人： Kazuhiko Hashimoto , Haruyoshi Osaki , Chinehito Ebina , Kyoko Nagase , Hiroshi Moriuma , Yasunori Uetani
IPC分类号： C08G8/24 , G03F7/023 , H01L21/027 , G03F7/30
CPC分类号： G03F7/0236 , C08G8/24
摘要： A positive resist composition containing a quinone diazide compound and an alkali-soluble resin which contains a resin (A) obtained by a condensation reaction of an aldehyde compound, at least one phenol compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are independently a hydrogen atom, or a C.sub.1 -C.sub.4 alkyl or alkoxy group, and j is 1 or 2, and at least one compound of the formula: ##STR2## wherein R'.sub.1, R'.sub.2, R'.sub.3, R'.sub.4, R'.sub.5 and R'.sub.6 are independently a hydrogen atom, or a C.sub.1 -C.sub.4 alkyl or alkoxy group, R'.sub.7 is a hydrogen, a C.sub.1 -C.sub.4 alkyl group or an aryl group, and k, m and n are independently 0, 1 or 2 provided that a sum of k, m and n is larger than 2, which composition is excellent in balance among various properties such as a profile, a sensitivity, heat resistance and a depth of focus.
摘要翻译：含有醌二叠氮化合物和碱溶性树脂的正性抗蚀剂组合物，其含有通过醛化合物，至少一种下式的酚化合物缩合反应获得的树脂（A）：其中R1， R2和R3独立地为氢原子或C1-C4烷基或烷氧基，j为1或2，以及至少一种下式化合物：其中R'1，R'2， R'3，R'4，R'5和R'6独立地是氢原子或C1-C4烷基或烷氧基，R'7是氢，C1-C4烷基或芳基，以及 k，m和n独立地为0,1或2，条件是k，m和n的和大于2，该组成在各种性质如轮廓，灵敏度，耐热性和深度之间的平衡优异焦点。

2. 发明授权

US5429904A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5429904A
公开(公告)日：1995-07-04
申请号：US67935
申请日：1993-05-27
申请人： Kyoko Nagase , Haruyoshi Osaki , Kazuhiko Hashimoto , Hiroshi Moriuma
发明人： Kyoko Nagase , Haruyoshi Osaki , Kazuhiko Hashimoto , Hiroshi Moriuma
IPC分类号： G03F7/022 , C08G8/04 , G03F7/023 , H01L21/027
CPC分类号： C08G8/04 , G03F7/0236
摘要： A positive resist composition comprising a quinonediazide compound and an alkali-soluble resin containing resin (A) obtainable through a condensation reaction of at least one compound represented by the general formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one polyphenol compound represented by the general formula ( II ): ##STR2## wherein R.sub.4 ' to R.sub.6 ' each represent a hydrogen atom or an alkyl or alkoxy group and n represents 1 or 2, with an aldehyde compound. This positive resist composition is excellent in properties such as profile, resolution, heat resistance, etc. and nearly completely free from scum
摘要翻译：一种正型抗蚀剂组合物，其包含醌二叠氮化合物和通过至少一种由通式（I）表示的化合物缩合反应获得的含有树脂（A）的碱溶性树脂：其中R1，R2和R3 彼此独立地表示氢原子或具有1-4个碳原子的烷基或烷氧基，k表示1或2个，至少一种由通式（II）表示的多酚化合物：其中R 4 '至R6'各自表示氢原子或烷基或烷氧基，n表示1或2，表示醛化合物。该正型抗蚀剂组合物的特性如型材，分辨率，耐热性等，几乎完全不含浮渣

3. 发明授权

US5451484A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5451484A
公开(公告)日：1995-09-19
申请号：US067933
申请日：1993-05-27
申请人： Kyoko Nagase , Haruyoshi Osaki , Hiroshi Moriuma
发明人： Kyoko Nagase , Haruyoshi Osaki , Hiroshi Moriuma
IPC分类号： G03F7/022 , G03F7/023 , H01L21/027
CPC分类号： G03F7/0236
摘要： A positive resist composition comprising a quinonediazide compound and an alkali-soluble resin containing resin (A) obtainable through a condensation reaction of at least one compound represented by the general formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one polyphenol compound represented by the general formula (II): ##STR2## wherein R.sub.4 ' to R.sub.6 ' each represent a hydrogen atom or an alkyl or alkoxy group and n represents 1 or 2, with an aldehyde compound. This positive resist composition is excellent in properties such as profile, resolution, heat resistance, etc.
摘要翻译：一种正型抗蚀剂组合物，其包含醌二叠氮化合物和通过至少一种由通式（I）表示的化合物缩合反应获得的含有树脂（A）的碱溶性树脂：其中R1，R2和R3 彼此独立地表示氢原子或具有1-4个碳原子的烷基或烷氧基，k表示1或2个，至少一种由通式（II）表示的多酚化合物：其中R 4 '至R6'各自表示氢原子或烷基或烷氧基，n表示1或2，表示醛化合物。该正型抗蚀剂组合物的特性如型材，分辨率，耐热性等优异。

4. 发明授权

US5326665A Positive type resist composition 失效
标题翻译：正型抗蚀剂组合物
公开(公告)号：US5326665A
公开(公告)日：1994-07-05
申请号：US24499
申请日：1993-03-01
申请人： Haruyoshi Osaki , Hiroshi Moriuma , Yasunori Uetani
发明人： Haruyoshi Osaki , Hiroshi Moriuma , Yasunori Uetani
IPC分类号： C08G8/04 , G03F7/023 , G03F7/039 , H01L21/027 , G03F7/30
CPC分类号： C08G8/04 , G03F7/0236
摘要： A positive type resist composition comprising an alkali-soluble resin and a quinonediazide compound, wherein the alkali-soluble resin containing resin (A) is obtainable through a condensation reaction with at least one phenol compound represented by the following general formula (I): ##STR1## wherein R.sub.1 to R.sub.3 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one compound represented by the following general formula (II): ##STR2## wherein R.sub.4 represents a hydrogen atom, an alkyl group having 1-4 carbon atoms or a phenyl group, R.sub.5 to R.sub.7 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and n represents 1 or 2, and an aldehyde compound. This composition is excellent in the balance between performances such as sensitivity, heat resistance and profile, and is free from scum.
摘要翻译：包含碱溶性树脂和醌二叠氮化合物的正型抗蚀剂组合物，其中所述含碱树脂（A）的树脂可通过与至少一种由以下通式（I）表示的酚化合物的缩合反应获得：（I）其中R1至R3彼此独立地表示氢原子或具有1-4个碳原子的烷基或烷氧基，k表示1或2，至少一种由以下通式（II）表示的化合物：：其中R 4表示氢原子，具有1-4个碳原子的烷基或苯基，R 5至R 7彼此独立地表示氢原子或具有1-4个碳原子的烷基或烷氧基碳原子，n表示1或2，醛化合物。该组合物在灵敏度，耐热性和轮廓性能之间的平衡方面是优异的，并且没有浮渣。

5. 发明授权

US5188920A Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound 失效
标题翻译：含有1,2-二酮双酯化合物的阳离子组合物，碱溶性树脂和聚羟基苯酚添加剂化合物
公开(公告)号：US5188920A
公开(公告)日：1993-02-23
申请号：US712729
申请日：1991-06-10
申请人： Hiroshi Moriuma , Haruyoshi Osaki , Takeshi Hioki , Yasunori Uetani
发明人： Hiroshi Moriuma , Haruyoshi Osaki , Takeshi Hioki , Yasunori Uetani
IPC分类号： G03F7/039 , C07C39/15 , G03F7/022 , H01L21/027
CPC分类号： G03F7/0226 , C07C39/15
摘要： A positive resist composition comprising a radiation-sensitive component and an alkali-soluble resin and a phenol compound of the formula: ##STR1## wherein R is a hydrogen atom, a lower alkyl group or a phenyl group, R' is an alkyl group or an alkoxy group, and n is a number of 0 to 3, which has well balanced good properties such as sensitivity, resolution, heat resistance and adhesiveness.

6. 发明授权

US5849457A Positive-working quinonediazide sulfonic acid ester resist composition utilizing solvent system including 2-heptanone, ethyl lactate, and .gamma. - 失效
标题翻译：使用包括2-庚酮，乳酸乙酯和γ-丁内酯的溶剂体系的正性醌二叠氮磺酸酯抗蚀剂组合物
公开(公告)号：US5849457A
公开(公告)日：1998-12-15
申请号：US959294
申请日：1997-10-24
申请人： Katsuhiko Namba , Kaoru Tatekawa , Hiroshi Moriuma , Yasunori Uetani
发明人： Katsuhiko Namba , Kaoru Tatekawa , Hiroshi Moriuma , Yasunori Uetani
IPC分类号： G03F7/004 , G03F7/022 , H01L21/027 , G03F7/023 , G03C1/61
CPC分类号： G03F7/0226 , G03F7/0048 , G03F7/022
摘要： A positive-working resist composition comprising (A) a quinonediazide compound, (B) an alkali-soluble resin, and (C) a solvent system comprising 2-heptanone, ethyl lactate and .gamma.-butylactone in which the quinonediazide compound exhibits a very high solubility and which characteristics such as sensitivity, profile and coatability are excellent.
摘要翻译：一种正性抗蚀剂组合物，其包含（A）醌二叠氮化合物，（B）碱溶性树脂和（C）包含2-庚酮，乳酸乙酯和γ-丁内酯的溶剂体系，其中醌二叠氮化合物显示非常高的溶解性和敏感性，外形和涂布性等特性优异。

7. 发明授权

US06767686B2 Chemically amplifying type positive resist composition 失效
标题翻译：化学放大型正型抗蚀剂组合物
公开(公告)号：US06767686B2
公开(公告)日：2004-07-27
申请号：US09988006
申请日：2001-11-16
申请人： Yasunori Uetani , Kenji Ohashi , Hiroshi Moriuma
发明人： Yasunori Uetani , Kenji Ohashi , Hiroshi Moriuma
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/111 , Y10S430/123 , Y10S430/124
摘要： A chemically amplifying type positive resist composition suitable for use in the lithography utilizing an ArF or KrF excimer laser and excellent in the shape of profile is provided, which comprises a resin which has an alkali-soluble group protected by 2-alkyl-2-adamantyl group or 1-adamantyl-1-alkylalkyl group, and which, per se, is insoluble or slightly soluble in alkali but becomes soluble in alkali by the action of an acid; and a sulfonium salt acid generating agent represented by the following formula (I): wherein Q1, Q2 and Q3 independently represent hydrogen, hydroxyl, alkyl having 1 to 6 carbon atoms or alkoxy having 1 to 6 carbon atoms; and Q4 represents perfluoroalkyl which may have a cyclic structure.
摘要翻译：提供一种适用于利用ArF或KrF准分子激光器的光刻技术的化学放大型正光刻胶组合物，它具有优异的轮廓形状，其包括具有由2-烷基-2-金刚烷基保护的碱溶性基团的树脂基团或1-金刚烷基-1-烷基烷基，其本身不溶于或微溶于碱，但通过酸的作用变得可溶于碱; 和由下式（I）表示的锍盐酸产生剂：其中Q 1，Q 2和Q 3独立地表示氢，羟基，具有1至6个碳原子的烷基或具有1至6个碳原子的烷氧基碳原子 Q 4表示可具有环状结构的全氟烷基。

8. 发明授权

US6068962A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US6068962A
公开(公告)日：2000-05-30
申请号：US934226
申请日：1997-09-19
申请人： Yasunori Uetani , Hiroshi Moriuma , Jun Tomioka
发明人： Yasunori Uetani , Hiroshi Moriuma , Jun Tomioka
IPC分类号： G03F7/022 , G03F7/023
CPC分类号： G03F7/0226 , Y10S430/121 , Y10S430/127
摘要： A non-chemically enhanced type positive resist composition includes an alkali-soluble novolak resin, a quinonediazide type sensitizer and at least one of the following compounds (a) and (b):(a) an acid-generator which is decomposed by the action of an alkali developer and generates an acid, and(b) compounds represented by the following formula (IV) or (V): ##STR1## wherein each of R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7 and R.sup.8 independently represents hydrogen, halogen, hydroxy, alkyl, alkoxy, aryl or nitro, each of R.sup.9 and R.sup.10 independently represents hydrogen, halogen, alkyl, aryl, nitro, a group of --(CH.sub.2).sub.n --OR.sup.11 or a group of --(CH.sub.2).sub.n --COOR.sup.12 in which R.sup.11 represents hydrogen, alkyl, aryl or alkanoyl and R.sup.12 represents hydrogen, alkyl or aryl, and n is a number from 0 to 3 and R.sup.13 represents hydrogen, halogen, alkyl, alkoxy or aryl.
摘要翻译：非化学增强型正型抗蚀剂组合物包括碱溶性酚醛清漆树脂，醌二叠氮化物型增感剂和至少一种以下化合物（a）和（b））：（a）通过动作分解的酸发生剂的碱显影剂，并产生酸，和（b）由下式（IV）或（V）表示的化合物：其中R1，R2，R3，R4，R5，R6，R7和R8各自独立地表示氢，卤素，羟基，烷基，烷氧基，芳基或硝基，R 9和R 10各自独立地表示氢，卤素，烷基，芳基，硝基， - （CH 2）n -OR 11或 - （CH 2）n -COOR 12基团其中R 11表示氢，烷基，芳基或烷酰基，R 12表示氢，烷基或芳基，n为0至3的数，R 13表示氢，卤素，烷基，烷氧基或芳基。

9. 发明授权

US06951706B2 Sulfonate and resist composition 失效
标题翻译：磺酸盐和抗蚀剂组成
公开(公告)号：US06951706B2
公开(公告)日：2005-10-04
申请号：US10646710
申请日：2003-08-25
申请人： Satoshi Yamaguchi , Yasunori Uetani , Hiroshi Moriuma
发明人： Satoshi Yamaguchi , Yasunori Uetani , Hiroshi Moriuma
IPC分类号： C07C309/58 , C07C381/12 , G03F7/004 , G03F7/039 , G03C1/492
CPC分类号： C07C309/58 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07C2603/74 , G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： The present invention provides a sulfonate of the formula (I): wherein Q1, Q2, Q3, Q4 and Q5 each independently represent hydrogen, alkyl having 1 to 16 carbon atoms, alkoxy having 1 to 16 carbon atoms, halogen, aryl having 6 to 12 carbon atoms, aralkyl having 7 to 12 carbon atoms, cyano, sulfide, hydroxy, nitro or a group of the formula (I′) —COO—X—Cy1 (I′) wherein X represents alkylene and at least one —CH2— in the alkylene may be substituted by —O— or —S—, and Cy1 represents alicyclic hydrocarbon having 3 to 20 carbon atoms, and A+ represents a counter ion, with the proviso that at least one of Q1, Q2, Q3, Q4 and Q5 is the group of the formula (I′). The present invention also provides a chemical amplification type positive resist composition comprising a sulfonate of the formula (I) and resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
摘要翻译：本发明提供式（I）的磺酸盐：其中Q 1，Q 2，Q 3，Q 4，各自独立地表示氢，具有1至16个碳原子的烷基，具有1至16个碳原子的烷氧基，卤素，具有6至12个碳原子的芳基，具有7-12个碳原子的芳烷基原子，氰基，硫化物，羟基，硝基或式（I'）的基团<？in-line-formula description =“In-line formula”end =“lead”→COO-X-Cy < （I'）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中X表示亚烷基和至少一个-CH 2 - 在亚烷基中可以被-O-或-S-取代，Cy1表示具有3〜20个碳原子的脂环族烃基，A + O表示抗衡离子，条件是Q 1，Q 2，Q 3，Q 4和Q 3中的至少一个， SUP> 5 是式（I'）的基团。本发明还提供一种化学扩增型正性抗蚀剂组合物，其包含式（I）的磺酸盐和含有具有酸不稳定基团的结构单元的树脂，其本身不溶于或难溶于碱性水溶液但易溶于碱性水溶液通过酸的作用。

10. 发明授权

US06815140B2 Positive resist composition 有权
标题翻译：正抗蚀剂组成
公开(公告)号：US06815140B2
公开(公告)日：2004-11-09
申请号：US09323230
申请日：1999-06-01
申请人： Yasunori Uetani , Hiroshi Moriuma , Yoshiyuki Takata
发明人： Yasunori Uetani , Hiroshi Moriuma , Yoshiyuki Takata
IPC分类号： G03F7023
CPC分类号： G03F7/0226
摘要： A positive resist composition, having a superior resolution as well as good resist performances such as sensitivity, depth of focus and profile, is described and includes a novolac resin, a radiation-sensitive quinonediazide compound and a thioxanthone compound represented by the following formula (I): wherein R1, R2, R3, R4, R5, R6, R7 and R8 independently represent hydrogen, halogen, alkyl, alkoxy, aryl, carboxyl or alkoxycarbonyl.

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