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1. 发明授权

US5468590A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5468590A
公开(公告)日：1995-11-21
申请号：US348994
申请日：1994-11-29
申请人： Kazuhiko Hashimoto , Haruyoshi Osaki , Chinehito Ebina , Kyoko Nagase , Hiroshi Moriuma , Yasunori Uetani
发明人： Kazuhiko Hashimoto , Haruyoshi Osaki , Chinehito Ebina , Kyoko Nagase , Hiroshi Moriuma , Yasunori Uetani
IPC分类号： C08G8/24 , G03F7/023 , H01L21/027 , G03F7/30
CPC分类号： G03F7/0236 , C08G8/24
摘要： A positive resist composition containing a quinone diazide compound and an alkali-soluble resin which contains a resin (A) obtained by a condensation reaction of an aldehyde compound, at least one phenol compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are independently a hydrogen atom, or a C.sub.1 -C.sub.4 alkyl or alkoxy group, and j is 1 or 2, and at least one compound of the formula: ##STR2## wherein R'.sub.1, R'.sub.2, R'.sub.3, R'.sub.4, R'.sub.5 and R'.sub.6 are independently a hydrogen atom, or a C.sub.1 -C.sub.4 alkyl or alkoxy group, R'.sub.7 is a hydrogen, a C.sub.1 -C.sub.4 alkyl group or an aryl group, and k, m and n are independently 0, 1 or 2 provided that a sum of k, m and n is larger than 2, which composition is excellent in balance among various properties such as a profile, a sensitivity, heat resistance and a depth of focus.
摘要翻译：含有醌二叠氮化合物和碱溶性树脂的正性抗蚀剂组合物，其含有通过醛化合物，至少一种下式的酚化合物缩合反应获得的树脂（A）：其中R1， R2和R3独立地为氢原子或C1-C4烷基或烷氧基，j为1或2，以及至少一种下式化合物：其中R'1，R'2， R'3，R'4，R'5和R'6独立地是氢原子或C1-C4烷基或烷氧基，R'7是氢，C1-C4烷基或芳基，以及 k，m和n独立地为0,1或2，条件是k，m和n的和大于2，该组成在各种性质如轮廓，灵敏度，耐热性和深度之间的平衡优异焦点。

2. 发明授权

US5429904A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5429904A
公开(公告)日：1995-07-04
申请号：US67935
申请日：1993-05-27
申请人： Kyoko Nagase , Haruyoshi Osaki , Kazuhiko Hashimoto , Hiroshi Moriuma
发明人： Kyoko Nagase , Haruyoshi Osaki , Kazuhiko Hashimoto , Hiroshi Moriuma
IPC分类号： G03F7/022 , C08G8/04 , G03F7/023 , H01L21/027
CPC分类号： C08G8/04 , G03F7/0236
摘要： A positive resist composition comprising a quinonediazide compound and an alkali-soluble resin containing resin (A) obtainable through a condensation reaction of at least one compound represented by the general formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one polyphenol compound represented by the general formula ( II ): ##STR2## wherein R.sub.4 ' to R.sub.6 ' each represent a hydrogen atom or an alkyl or alkoxy group and n represents 1 or 2, with an aldehyde compound. This positive resist composition is excellent in properties such as profile, resolution, heat resistance, etc. and nearly completely free from scum
摘要翻译：一种正型抗蚀剂组合物，其包含醌二叠氮化合物和通过至少一种由通式（I）表示的化合物缩合反应获得的含有树脂（A）的碱溶性树脂：其中R1，R2和R3 彼此独立地表示氢原子或具有1-4个碳原子的烷基或烷氧基，k表示1或2个，至少一种由通式（II）表示的多酚化合物：其中R 4 '至R6'各自表示氢原子或烷基或烷氧基，n表示1或2，表示醛化合物。该正型抗蚀剂组合物的特性如型材，分辨率，耐热性等，几乎完全不含浮渣

3. 发明授权

US06383708B1 Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US06383708B1
公开(公告)日：2002-05-07
申请号：US08160290
申请日：1993-12-02
申请人： Yasunori Uetani , Yasunori Doi , Kazuhiko Hashimoto , Haruyoshi Osaki , Ryotaro Hanawa
发明人： Yasunori Uetani , Yasunori Doi , Kazuhiko Hashimoto , Haruyoshi Osaki , Ryotaro Hanawa
IPC分类号： G03C152
CPC分类号： G03F7/0048 , G03F7/0226
摘要： A positive resist composition comprising, in admixture, an alkali-soluble resin, a quinone diazide compound and a mixed solvent of (B) at least one organic solvent selected from the group consisting of &ggr;-butyrolactone, 3-methoxybutanol and cyclohexanone and (A) an organic solvent other than the solvents (B) which does not have simultaneously an alkylcarbonyl group and an alkoxy group in a molecule and has a boiling point of from 140 to 180° C. under atmospheric pressure (B), which composition has a large &ggr;-value and provides an improved profile and a large depth of focus.
摘要翻译：一种正性抗蚀剂组合物，其包含碱溶性树脂，醌二叠氮化合物和（B）至少一种选自γ-丁内酯，3-甲氧基丁醇和环己酮的至少一种有机溶剂和（A ）除了在大气压（B）下在分子中不具有烷基羰基和烷氧基并且沸点为140〜180℃的溶剂（B）的有机溶剂，该组合物具有大的伽马值，并提供改进的轮廓和较大的焦点深度。

4. 发明授权

US5843616A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5843616A
公开(公告)日：1998-12-01
申请号：US419604
申请日：1995-04-10
申请人： Kunishige Edamatsu , Yuji Yoshida , Kazuhiko Hashimoto , Haruyoshi Osaki
发明人： Kunishige Edamatsu , Yuji Yoshida , Kazuhiko Hashimoto , Haruyoshi Osaki
IPC分类号： G03F7/022 , C08G8/24 , G03F7/004 , G03F7/023 , H01L21/027
CPC分类号： C08G8/24 , G03F7/0236
摘要： A positive resist composition sensitive to radiations such as ultraviolet rays, far ultraviolet rays, which comprises; an o-quinonediazide compound; and a novolac resin(1) obtained by allowing an aromatic aldehyde of the formula(I) ##STR1## wherein R.sub.4 to R.sub.6 represents hydrogen, alkyl, cycloalkyl, alkoxy, alkenyl or aryl, k'0 represents an integer not smaller than 0 and p represents 1, 2 or 3, to react with a phenol compound of the formula (II) ##STR2## wherein R.sub.7 to R.sub.9 represents hydrogen, hydroxy, alkyl, cycloalkyl, alkoxy, alkenyl or aryl, provided that at least one of R.sub.7 to R.sub.9 is cycloalkyl having 6 or less carbon atoms, in the presence of an acid catalyst to obtain a reaction product(1) containing low molecular weight ingredients; and, then, allowing the reaction product(1) to further react with a phenol compound(1) and formaldehyde.
摘要翻译：对紫外线，远紫外线等辐射敏感的正性抗蚀剂组合物，其包含：邻醌二叠氮化合物; 和通过使式（I）的芳香醛（I）得到的酚醛清漆树脂（1），其中R4至R6表示氢，烷基，环烷基，烷氧基，烯基或芳基，k'0表示不小于与式（II）的酚化合物反应，其中R 7至R 9表示氢，羟基，烷基，环烷基，烷氧基，烯基或芳基，条件是在酸催化剂的存在下，R7至R9中的至少一个是具有6个或更少个碳原子的环烷基，得到含有低分子量成分的反应产物（1）; 然后使反应产物（1）进一步与酚化合物（1）和甲醛反应。

5. 发明授权

US5792586A Positive resist composition comprising a novolac resin made from a cycloalkyl substituted phenol 失效
标题翻译：正型抗蚀剂组合物，其包含由环烷基取代的苯酚制成的酚醛清漆树脂
公开(公告)号：US5792586A
公开(公告)日：1998-08-11
申请号：US335406
申请日：1994-11-03
申请人： Kazuhiko Hashimoto , Haruyoshi Osaki , Yasunori Uetani
发明人： Kazuhiko Hashimoto , Haruyoshi Osaki , Yasunori Uetani
IPC分类号： C08G8/08 , G03F7/023 , H01L21/027 , G03F7/30
CPC分类号： C08G8/08 , G03F7/023
摘要： The present invention provides a positive photoresist composition comprising a 1,2-naphthoquinonediazide compound and a novolac resin obtained through a condensation reaction between an aldehyde compound and a phenol compound represented by the following general formula (I): ##STR1## wherein R.sub.5, R.sub.6 and R.sub.7 each independently represents hydrogen atom, hydroxyl group or alkyl, cycloalkyl, alkoxy or alkenyl group having 6 or less carbon atoms or aryl group, provided that at least one of R.sub.5, R.sub.6 and R.sub.7 represents a cycloalkyl group having 6 or less carbon atoms. The composition of the present invention is excellent in the balance between properties such as sensitivity, resolution, heat resistance, profile, depth of focus, etc. and free from scum.
摘要翻译：本发明提供一种正型光致抗蚀剂组合物，其包含通过醛化合物和由以下通式（I）表示的酚化合物之间的缩合反应获得的1,2-萘醌二叠氮化合物和酚醛清漆树脂：其中 R5，R6和R7各自独立地表示氢原子，羟基或具有6个或更少碳原子的烷基，环烷基，烷氧基或烯基或芳基，条件是R 5，R 6和R 7中的至少一个表示具有6或碳原子少。本发明的组合物在灵敏度，分辨率，耐热性，轮廓，焦深等等并且没有浮渣之类的性能之间的平衡方面是优异的。

6. 发明授权

US5336583A Positive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanone 失效
标题翻译：使用乳酸乙酯和2-庚酮的混合溶剂的正醌二叠氮化物抗蚀剂组合物
公开(公告)号：US5336583A
公开(公告)日：1994-08-09
申请号：US161440
申请日：1993-12-06
申请人： Yasunori Uetani , Yasunori Doi , Kazuhiko Hashimoto , Haruyoshi Osaki , Ryotaro Hanawa
发明人： Yasunori Uetani , Yasunori Doi , Kazuhiko Hashimoto , Haruyoshi Osaki , Ryotaro Hanawa
IPC分类号： G03F7/022 , G03F7/004 , G03F7/039 , G03F7/22 , H01L21/027 , G03F7/023 , G03C1/61
CPC分类号： G03F7/0048 , G03F7/0226
摘要： A positive resist composition containing, in admixture, an alkali-soluble resin, a quinone diazide compound and a mixed solvent of ethyl lactate and at least one solvent selected from the group consisting of (a) n-amyl acetate and (b) 2-heptanone in a weight ratio of 5:95 to 80:20, which composition has a good coating properties and provides an improved profile and a large depth of focus.
摘要翻译：一种正极抗蚀剂组合物，其包含碱溶性树脂，醌二叠氮化合物和乳酸乙酯与至少一种选自（a）乙酸正戊酯和（b）2- 庚酮，重量比为5:95至80:20，该组合物具有良好的涂层性能并提供改进的轮廓和较大的聚焦深度。

7. 发明申请

US20120228564A1 REFLECTOR FOR LIGHT-EMITTING DEVICE, AND LIGHT-EMITTING DEVICE 有权
标题翻译：用于发光装置的反射器和发光装置
公开(公告)号：US20120228564A1
公开(公告)日：2012-09-13
申请号：US13395013
申请日：2010-09-07
申请人： Kazuhiko Hashimoto , Kazunori Terada , Masafumi Kuramoto , Motohisa Kitani
发明人： Kazuhiko Hashimoto , Kazunori Terada , Masafumi Kuramoto , Motohisa Kitani
IPC分类号： C08G69/26 , G02B5/26
CPC分类号： C08G69/26 , C08K3/22 , C08K5/3435 , C08K2003/2237 , H01L33/486 , H01L33/60 , H01L2224/32245 , H01L2224/45144 , H01L2224/48091 , H01L2224/48247 , H01L2224/48465 , H01L2224/49107 , H01L2224/73265 , H01L2924/01322 , C08L77/06 , H01L2924/00 , H01L2924/00014
摘要： The present invention relates to a reflector for a light-emitting device consisting of (A) an polyamide composition comprising a polyamide polymerized from (a) a dicarboxylic acid comprising at least 50 mol % of an alicyclic dicarboxylic acid and (b) a diamine comprising at least 50 mol % of a diamine with a branched main chain.
摘要翻译：本发明涉及一种用于发光装置的反射器，其由（A）聚酰胺组合物组成，该聚酰胺组合物包含由（a）包含至少50摩尔％的脂环族二羧酸的二羧酸聚合的聚酰胺和（b）二胺，至少50mol％具有支链主链的二胺。

8. 发明授权

US08003296B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US08003296B2
公开(公告)日：2011-08-23
申请号：US12536386
申请日：2009-08-05
申请人： Masahiko Shimada , Kazuhiko Hashimoto , Junji Shigematsu , Takayuki Miyagawa , Satoshi Yamamoto
发明人： Masahiko Shimada , Kazuhiko Hashimoto , Junji Shigematsu , Takayuki Miyagawa , Satoshi Yamamoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified positive composition comprising: (A) a resin comprising a structural unit having an acid-labile group and being itself insoluble or poorly soluble in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid, (B) a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and a structural unit having a fluorine atom in a side chain, and an acid generator.
摘要翻译：本发明提供了一种化学放大阳性组合物，其包含：（A）包含具有酸不稳定基团的结构单元的树脂，其本身不溶于或难溶于碱性水溶液，但通过作用于酸，（B）包含由式（I）表示的结构单元的树脂：其中R1表示氢原子，卤素原子，C1-C4烷基或C1-C4全氟烷基，Z表示单键或 - （CH 2）k -CO-X 4 - ，k表示1〜4的整数，X 1，X 2，X 3，X 4各自独立地表示氧原子或硫原子，m表示1〜3的整数，n表示 0〜3的整数，侧链具有氟原子的结构单元和酸发生剂。

9. 发明授权

US07385496B2 Monitoring system 失效
标题翻译：监视系统
公开(公告)号：US07385496B2
公开(公告)日：2008-06-10
申请号：US10510986
申请日：2003-02-21
申请人： Hiroyuki Ogino , Hideki Omori , Hidekazu Yamashita , Naofumi Nakatani , Osamu Eguchi , Makoto Imai , Wataru Uchiyama , Kazuhiko Hashimoto , Tadashi Miki , Haruo Terai , Kenji Kida
发明人： Hiroyuki Ogino , Hideki Omori , Hidekazu Yamashita , Naofumi Nakatani , Osamu Eguchi , Makoto Imai , Wataru Uchiyama , Kazuhiko Hashimoto , Tadashi Miki , Haruo Terai , Kenji Kida
IPC分类号： G08B29/00
CPC分类号： G08B13/19656 , G08B13/19645 , G08B13/19658 , G08B13/19691 , G08B13/19697 , G08B25/08
摘要： A monitoring system for preventing crime in a home, includes a plurality of terminals for monitoring whether predetermined monitoring points are in a stationary or nonstationary state. Further, the monitoring system includes a central processing device for controlling the setting/canceling of alarm operations of the terminals. The central processing device has a communication unit that receives stationary/nonstationary information from the terminals and transmits predetermined information including commands to the terminals. Each terminal has a communication unit that transmits stationary/nonstationary information to the central processing device and receives the predetermined information from the central processing device. Thus bidirectional communication can be achieved between the central processing device and the terminals. The terminals may include a terminal with an emergency call unit which, in an emergency, calls or notifies another, and a terminal having a notification unit which indicates that a nonstationary state has been accepted by a predetermined point of contact.
摘要翻译：一种用于防止家庭中的犯罪的监视系统包括多个终端，用于监视预定监视点是处于静止状态还是非稳态状态。此外，监视系统包括用于控制终端的报警操作的设置/取消的中央处理装置。中央处理装置具有从终端接收静止/不稳定信息的通信单元，并向终端发送包括命令的预定信息。每个终端具有通信单元，其向中央处理设备发送静止/不稳定信息，并从中央处理设备接收预定信息。因此，可以在中央处理装置和终端之间实现双向通信。终端可以包括具有在紧急情况下呼叫或通知另一个的紧急呼叫单元的终端，以及具有指示非稳定状态已经被预定接触点接受的通知单元的终端。

10. 发明授权

US07061163B2 Ultrasonic transducer and ultrasonic flowmeter 有权
标题翻译：超声波换能器和超声波流量计
公开(公告)号：US07061163B2
公开(公告)日：2006-06-13
申请号：US10473752
申请日：2003-01-27
申请人： Hidetomo Nagahara , Masahiko Hashimoto , Masaaki Suzuki , Kazuhiko Hashimoto , Takashi Hashida , Seigo Shiraishi , Norihisa Takahara
发明人： Hidetomo Nagahara , Masahiko Hashimoto , Masaaki Suzuki , Kazuhiko Hashimoto , Takashi Hashida , Seigo Shiraishi , Norihisa Takahara
IPC分类号： H01L41/08
CPC分类号： G10K11/02 , G01F1/662
摘要： An ultrasonic transducer according to the present invention includes: a piezoelectric body 4 to set up ultrasonic vibrations; an acoustic matching layer 3 made of a material with a density of 50 kg/m3 to 1,000 kg/m3 and an acoustic impedance of 2.5×103 kg/m2/s to 1.0×106 kg/m2/s; a lower acoustic matching layer 9 provided between the piezoelectric body 4 and the acoustic matching layer 3; and a structure supporting member 6 that supports the lower acoustic matching layer 9 and the piezoelectric body 4 thereon and shields the piezoelectric body 4 from a fluid that propagates the ultrasonic vibrations. The ultrasonic transducer includes a protective portion, which contacts with at least a portion of a side surface of the acoustic matching layer 4. This protective portion is defined by a portion of the lower acoustic matching layer 9 and forms an integral part of the lower acoustic matching layer 9.
摘要翻译：根据本发明的超声波换能器包括：压电体4，用于设置超声波振动; 由密度为50kg / m 3至1,000kg / m 3的材料制成的声匹配层3和2.5×10 3的声阻抗， / SUP> kg / m 2 / s至1.0×10 6 kg / m 2 / s; 设置在压电体4和声匹配层3之间的下声匹配层9; 以及在其上支撑下声匹配层9和压电体4的结构支撑构件6，其将压电体4与传播超声波振动的流体进行屏蔽。超声波换能器包括与声匹配层4的侧表面的至少一部分接触的保护部分。该保护部分由下声匹配层9的一部分限定，并形成下声匹配层9的整体部分。

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