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1. 发明专利

JP2008181086A Aberration evaluation pattern, aberration evaluation method, aberration correction method, electron beam drawing apparatus, electron microscope, master, stamper, recording medium and structure 有权
标题翻译： ABERRATION评估模式，ABERRATION评估方法，ABERRATION校正方法，电子束绘图设备，电子显微镜，MASTER，STAMPER，记录介质和结构
公开(公告)号：JP2008181086A
公开(公告)日：2008-08-07
申请号：JP2007306627
申请日：2007-11-27
申请人： Kuresutetsuku:Kk , Ricoh Co Ltd , 株式会社クレステック , 株式会社リコー
发明人： MIYATA HIROYUKI , MIYAZAKI TAKESHI , KOBAYASHI KAZUHIKO , HAYASHI KUNIHITO
IPC分类号： G03F7/20 , G11B5/65 , G11B5/82 , G11B5/84 , G11B5/855 , G11B5/86 , G11B7/26 , H01J37/153 , H01L21/027
CPC分类号： H01J37/153 , H01J37/28 , H01J2237/1532 , H01J2237/282 , Y10T428/24479
摘要： PROBLEM TO BE SOLVED: To evaluate astigmatism in an irradiation system emitting an electron beam. SOLUTION: A figure pattern consisting of a plurality of (e.g. four) concentric circles is formed on a reference sample WP and an image (scanned image) is formed based on an electron signal obtained by scanning the reference sample WP with an electron beam. In the scanned image, the image has a blur in a region with its longitudinal direction parallel to the generating direction of the astigmatism and the size of the blur depends on magnitude of the astigmatism. Therefore, the direction and the magnitude of the astigmatism of the irradiation system of an irradiation apparatus 10 can be detected based on the obtained scanned image. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：评估发射电子束的照射系统中的像散。解决方案：在参考样品WP上形成由多个（例如四个）同心圆组成的图形图形，并且基于通过用电子扫描参考样品WP获得的电子信号形成图像（扫描图像）光束。在扫描图像中，图像在其纵向方向平行于像散的产生方向的区域中具有模糊，并且模糊的大小取决于像散的大小。因此，可以基于获得的扫描图像来检测照射装置10的照射系统的散光的方向和大小。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2008096580A Charged particle beam drawing device and drawing method 审中-公开
标题翻译：充电颗粒光束绘图装置和绘图方法
公开(公告)号：JP2008096580A
公开(公告)日：2008-04-24
申请号：JP2006276484
申请日：2006-10-10
申请人： Kuresutetsuku:Kk , 株式会社クレステック
发明人： HAYASHI KUNIHITO , MORITA HISAYUKI
IPC分类号： G03F7/20 , H01J37/305 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam drawing device and a drawing method by which a pattern can be accurately and easily drawn even when the drawing region of the drawing pattern to be formed on the surface of a sample is large.
SOLUTION: The charged particle beam drawing device carries out steps of: setting (S10, S12) a start address and a scanning start point by using pattern data assigning radiation and non-radiation of a charged particle beam according to the drawing pattern to each division pixel prepared by dividing the drawing region; forming (S14) a pattern in a scanning line portion in the drawing pattern by controlling radiation or non-radiation of the charged particle beam while allowing the charged particle beam to scan each division pixel in a first scanning direction; and repeating (S16) these steps. The division pixel is compared with a reference division pixel; and if the division pixel is found larger, the charged particle beam is made to repeatedly scan a plurality of times in the first scanning direction by using the data corresponding to the pattern in the scanning line portion of the pattern data without aligning the scanning start positions of the charged particle beam in the same division pixel.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种带电粒子束描绘装置和一种绘图方法，即使在样品表面上形成的绘图图形的绘制区域大的情况下，也能够准确且容易地绘制图案。
解决方案：带电粒子束描绘装置执行以下步骤：通过使用根据绘图模式通过分配带电粒子束的辐射和非辐射的图案数据来设定（S10，S12）起始地址和扫描起始点通过划分绘制区域而制备的每个划分像素; 通过控制带电粒子束的辐射或非辐射，同时允许带电粒子束沿第一扫描方向扫描每个分割像素，从而形成（S14）图形中的扫描线部分中的图案; 并重复（S16）这些步骤。将分割像素与参考分割像素进行比较; 并且如果分割像素被发现较大，则通过使用与图案数据的扫描线部分中的图案相对应的数据，使带电粒子束在第一扫描方向上重复扫描多次，而不对准扫描开始位置的相同分割像素中的带电粒子束。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2007157748A Charged particle beam lithography system 审中-公开
标题翻译：充电颗粒光束光刻系统
公开(公告)号：JP2007157748A
公开(公告)日：2007-06-21
申请号：JP2005346582
申请日：2005-11-30
申请人： Kuresutetsuku:Kk , 株式会社クレステック
发明人： MORITA HISAYUKI , HAYASHI KUNIHITO
IPC分类号： H01L21/027 , H01J37/305
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam lithography system in which even a complex drawing pattern to be formed on the surface of a sample can be formed easily on the surface of the sample without dividing the drawing pattern.
SOLUTION: The charged particle beam lithography system forms a predetermined drawing pattern by controlling irradiation and nonirradiation of a charged particle beam with a signal for controlling irradiation and nonirradiation of the surface of a sample with the charged particle beam depending on a predetermined drawing pattern while scanning the surface of the sample two-dimensionally with the charged particle beam. The charged particle beam lithography system comprises a section for analyzing the drawing pattern and creating a predetermined pattern constituting the pattern part of the drawing pattern and a mask pattern defining the outer edge of the drawing pattern, and a pattern generating section for generating a blanking signal depending on a predetermined pattern and creating a control signal by performing masking of the blanking signal based on the mask pattern.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种带电粒子光刻系统，其中即使在样品表面上形成的复杂绘图图案也可以容易地形成在样品的表面上而不划分绘图图案。
解决方案：带电粒子束光刻系统通过控制带电粒子束的照射和非照射来形成预定的绘图图案，其具有用于根据预定的图形来控制具有带电粒子束的样品表面的照射和非照射的信号同时用带电粒子束二维地扫描样品的表面。带电粒子束光刻系统包括用于分析绘图图案并产生构成绘图图案的图案部分的预定图案的区段和限定绘图图案的外边缘的掩模图案，以及用于产生消隐信号的图案生成部分取决于预定的图案，并且通过基于掩模图案对消隐信号进行掩蔽来创建控制信号。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2005055889A Electron-beam drawing apparatus and electron-beam drawing method 审中-公开
标题翻译：电子束绘图装置和电子束绘图方法
公开(公告)号：JP2005055889A
公开(公告)日：2005-03-03
申请号：JP2004214814
申请日：2004-07-22
申请人： Konica Minolta Holdings Inc , Kuresutetsuku:Kk , コニカミノルタホールディングス株式会社 , 株式会社クレステック
发明人： MASUDA OSAMU , FURUTA KAZUMI , HAYASHI KUNIHITO , KOBAYASHI KAZUHIKO
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a drawing apparatus for drawing a line at high speed with high accuracy. SOLUTION: A distance calculating means 311 calculates the start-to-end point distance L of a drawing pattern, and a number-of-scan-clocks calculating means 312 calculates the number of scan clocks required to write the drawing pattern based on the distance L and a unit distance corresponding to the minimum resolution of a high-speed D/A converter 306. A count conversion means 313 decomposes the distance L into X and Y components to convert them into a formula using the number of scanning clocks. A controlling rate calculating means 315 calculates the controlling rate to control the error between the converted formula and the start-to-end distance, and a variable rate calculating means 314 calculates an extinction ratio to determine the extinction ratio at a variable attenuator 307 based on the above formula and the controlling rate. An ATT D/A converter 303 specifies the extinction ratio at the variable attenuator 307 based on the above calculation so as to reduce the unit distance corresponding to the resolution of the high-speed D/A converter 306 and to emit an electron beam to write. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种以高精度高速绘制线的绘图装置。解决方案：距离计算装置311计算绘图模式的起点到终点距离L，并且扫描时数计算装置312计算以绘图方式写入所需的扫描时钟数距离L和对应于高速D / A转换器306的最小分辨率的单位距离。计数转换装置313将距离L分解为X和Y分量，以使用扫描时钟数将其转换为公式。控制率计算装置315计算控制速率以控制转换公式与起始距离之间的误差，并且可变速率计算装置314计算消光比以确定可变衰减器307处的消光比，基于上述公式和控制率。 ATT D / A转换器303基于上述计算指定可变衰减器307处的消光比，以减小对应于高速D / A转换器306的分辨率的单位距离并发射电子束写入。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2000077320A Method and apparatus for plotting rotating symmetric diagram 有权
标题翻译：旋转对称图的方法和装置
公开(公告)号：JP2000077320A
公开(公告)日：2000-03-14
申请号：JP25921698
申请日：1998-08-31
申请人： Kuresutetsuku:Kk , 株式会社クレステック
发明人： MIYAZAKI TAKESHI , HAYASHI KUNIHITO , KOBAYASHI KAZUHIKO , OI HIDEYUKI
IPC分类号： H01J37/305 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To simplify pattern data and improve accuracy in plotting, when a rotating symmetric diagram (radius L) made up of the same pattern repeated M times is plotted.
SOLUTION: A method for plotting a symmetric diagram includes a step for forming pattern data of each diagram, a step for calculating an M-times filed shifting position on a sample stage on the basis of pattern data L and M, moving the sample stage sequentially in an x-y rectangular coordinate system, and moving the field sequentially to this position, a step for plotting the base field by using the data pattern, and a step for plotting an N-th field (N=1 to M) from the base filed by causing the base field at an angle of (360/M)×N to be rotated, where second field, third field,... to M-th field are sequentially plotted from the base field.
COPYRIGHT: (C)2000,JPO
摘要翻译：要解决的问题：绘制由重复M次的相同图案构成的旋转对称图（半径L）时，为了简化图案数据并提高绘图精度。解决方案：用于绘制对称图的方法包括用于形成每个图的图案数据的步骤，基于图案数据L和M在样本台上计算M次归位移位位置的步骤，顺序地移动样本台在xy直角坐标系中，并且将场依次移动到该位置，通过使用数据模式来绘制基场的步骤，以及从基本场地绘制第N个场（N = 1到M）的步骤通过使基场以（360 / M）×N的角度旋转，其中从基场顺序绘制第二场，第三场，...至第M场。

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