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1. 发明授权

US07135432B2 Direct thermographic materials with phenolic reducing agents 失效
标题翻译：直接热成像材料与酚类还原剂
公开(公告)号：US07135432B2
公开(公告)日：2006-11-14
申请号：US11012788
申请日：2004-12-15
申请人： David R. Whitcomb , Leif P. Olson , Peter J. Cowdery-Corvan , Kumars Sakizadeh , Takuzo Ishida
发明人： David R. Whitcomb , Leif P. Olson , Peter J. Cowdery-Corvan , Kumars Sakizadeh , Takuzo Ishida
IPC分类号： B41M5/30
CPC分类号： G03C1/49827 , G03C1/49872 , G03C1/4989 , G03C2001/7635
摘要： Non-photosensitive direct thermographic materials comprise a reducing agent that is a specific ortho-amino-phenol, para-amino-phenol, or hydroquinone compound. These compounds can reduce silver(I) ion to metallic silver to produce a dense black silver image under the short time and high temperature conditions that occur when using thermal print-heads during direct thermal printing. The materials are characterized by their calculated aqueous deprotonation and their calculated anion HOMO energies.
摘要翻译：非光敏直接热敏成像材料包括作为特定邻氨基苯酚，对氨基苯酚或氢醌化合物的还原剂。这些化合物可以将银（I）离子还原成金属银，以便在直接热敏打印期间使用热打印头时发生的短时间和高温条件下产生致密的黑色银图像。这些材料的特征在于它们的计算的水去离子和其计算的阴离子HOMO能量。

2. 发明授权

US07163786B1 Thermographic materials containing ionic liquids 失效
标题翻译：含离子液体的热成像材料
公开(公告)号：US07163786B1
公开(公告)日：2007-01-16
申请号：US11234691
申请日：2005-09-23
申请人： Kumars Sakizadeh , Leif P. Olson , Peter J. Cowdery-Corvan , Takuzo Ishida , David R. Whitcomb
发明人： Kumars Sakizadeh , Leif P. Olson , Peter J. Cowdery-Corvan , Takuzo Ishida , David R. Whitcomb
IPC分类号： G03C1/00
CPC分类号： G03C1/49845 , G03C1/32 , G03C1/49827 , G03C1/49872 , G03C1/4989 , G03C1/85 , G03C2001/7425 , G03C2001/7628 , G03C2001/7635
摘要： Ionic liquids are added to black-and-white direct thermographic materials to provide increased image density or to allow for reduced silver coverage (that is, improved silver efficiency). Useful ionic liquids include imidazolium, pyrazolium, pyridinium, pyrimidinium, pyrazinium, tetra-alkylammonium, or tetra-alkylphosphonium cations.
摘要翻译：将离子液体添加到黑白直接热成像材料中以提供增加的图像密度或允许减少的银覆盖（即，提高的银效率）。有用的离子液体包括咪唑鎓，吡唑鎓，吡啶鎓，嘧啶鎓，吡嗪鎓，四烷基铵或四烷基鏻阳离子。

3. 发明授权

US07282468B2 Direct thermographic materials with catechol borate reducing agents 失效
标题翻译：直接热成像材料与儿茶酚硼酸盐还原剂
公开(公告)号：US07282468B2
公开(公告)日：2007-10-16
申请号：US11183609
申请日：2005-07-18
申请人： Kumars Sakizadeh , Peter J. Cowdery-Corvan , Leif P. Olson , David R. Whitcomb
发明人： Kumars Sakizadeh , Peter J. Cowdery-Corvan , Leif P. Olson , David R. Whitcomb
IPC分类号： B41M5/20 , B41M5/24
CPC分类号： G03C1/49872 , G03C1/32 , G03C1/49827 , G03C1/4989 , G03C1/85 , G03C2001/7628
摘要： Non-photosensitive direct thermographic materials comprise a reducing agent that is a catechol borate compound. These compounds can reduce silver(I) ion to metallic silver to produce a dense black silver image under the short time and high temperature conditions that occur when using thermal print-heads during direct thermal printing.
摘要翻译：非光敏直接热成像材料包括作为儿茶酚硼酸盐化合物的还原剂。这些化合物可以将银（I）离子还原成金属银，以便在直接热敏打印期间使用热打印头时发生的短时间和高温条件下产生致密的黑色银图像。

4. 发明授权

US5981156A Thermally processable imaging element 失效
标题翻译：热处理成像元件
公开(公告)号：US5981156A
公开(公告)日：1999-11-09
申请号：US915209
申请日：1997-08-20
申请人： Sharon M. Melpolder , Peter J. Cowdery-Corvan , Alfred J. Alton
发明人： Sharon M. Melpolder , Peter J. Cowdery-Corvan , Alfred J. Alton
IPC分类号： G03C1/498 , G03C1/76
CPC分类号： G03C1/49872 , G03C1/32 , G03C2200/33 , G03C2200/50
摘要： A method of making a thermally processable imaging element which comprises:i) forming a solution of poly(vinyl alcohol) in water;ii) adding matte particles to the resulting aqueous medium;iii) adding a compound of the formula I or formula II to the aqueous medium in an amount sufficient to inhibit agglomeration of the matte particles: ##STR1## wherein: the substituents are as described in the specification; iv) coating an image recording layer onto one side of a support;v) coating the aqueous medium containing the matte particles as an overcoat layer over the image recording layer or as backing layer on the side of the support opposite the image recording layer.
摘要翻译：一种制造可热加工成像元件的方法，包括：i）在水中形成聚（乙烯醇）溶液; ii）将哑光颗粒加入到所得水介质中; iii）将式I或式II化合物以足以抑制锍颗粒附聚的量向水性介质中加入：其中：取代基如说明书中所述; iv）将图像记录层涂覆到支撑体的一侧上; v）将包含无光泽颗粒的水性介质作为覆盖层涂覆在图像记录层上，或者作为背衬层在与图像记录层相对的支撑体侧上。

5. 发明授权

US08129098B2 Colored mask combined with selective area deposition 有权
标题翻译：彩色面罩与选择性区域沉积相结合
公开(公告)号：US08129098B2
公开(公告)日：2012-03-06
申请号：US11986169
申请日：2007-11-20
申请人： Lyn M. Irving , Diane C. Freeman , Peter J. Cowdery-Corvan , Cheng Yang , David H. Levy
发明人： Lyn M. Irving , Diane C. Freeman , Peter J. Cowdery-Corvan , Cheng Yang , David H. Levy
IPC分类号： G03F7/20
CPC分类号： H01L27/1288 , G03F7/0005 , G03F7/2022 , H01L27/1214 , H01L27/1225 , H01L27/1292 , H01L29/66765 , H01L29/7869
摘要： The invention relates to a process for forming a structure comprising (a) providing a transparent support; (b) forming a color mask on a first side of the transparent support; (c) applying a first layer comprising a deposition inhibitor material that is sensitive to visible light; (d) patterning the first layer by exposing the first layer through the color mask with visible light to form a first pattern and developing the deposition inhibitor material to provide selected areas of the first layer effectively not having the deposition inhibitor material; and (e) depositing a second layer of functional material over the transparent support; wherein the second layer of functional material is substantially deposited only in selected areas over the transparent support not having the deposition inhibitor material.
摘要翻译：本发明涉及一种用于形成结构的方法，包括（a）提供透明支撑体; （b）在所述透明支撑体的第一面上形成彩色掩模; （c）施加包含对可见光敏感的沉积抑制剂材料的第一层; （d）通过用可见光将所述第一层暴露于所述彩色掩模以形成第一图案并使所述沉积抑制剂材料显影以提供所述第一层的选定区域，而不具有所述沉积抑制剂材料; 和（e）在所述透明支撑体上沉积第二层功能材料; 其中第二层功能材料仅在不具有沉积抑制剂材料的透明支撑体上基本上沉积在选定的区域中。

6. 发明授权

US08030212B2 Process for selective area deposition of inorganic materials 有权
标题翻译：无机材料的选择性区域沉积工艺
公开(公告)号：US08030212B2
公开(公告)日：2011-10-04
申请号：US11861658
申请日：2007-09-26
申请人： Cheng Yang , Lyn M. Irving , David H. Levy , Peter J. Cowdery-Corvan , Diane C. Freeman
发明人： Cheng Yang , Lyn M. Irving , David H. Levy , Peter J. Cowdery-Corvan , Diane C. Freeman
IPC分类号： H01L21/44
CPC分类号： C23C16/45551 , C23C16/042 , H01L21/02175 , H01L21/02178 , H01L21/0228 , H01L21/02304 , H01L21/3141 , H01L21/31616 , H01L51/0004
摘要： An atomic-layer-deposition process for forming a patterned thin film comprising providing a substrate, applying a deposition inhibitor material to the substrate, wherein the deposition inhibitor material is an organic compound or polymer; and patterning the deposition inhibitor material either after step (b) or simultaneously with applying the deposition inhibitor material to provide selected areas of the substrate effectively not having the deposition inhibitor material. An inorganic thin film material is substantially deposited only in the selected areas of the substrate not having the deposition inhibitor material.
摘要翻译：一种用于形成图案化薄膜的原子层沉积工艺，包括提供衬底，向衬底施加沉积抑制剂材料，其中所述沉积抑制剂材料是有机化合物或聚合物; 以及在步骤（b）之后图案化沉积抑制剂材料或同时施加沉积抑制剂材料以提供有效地不具有沉积抑制剂材料的基底的选定区域。无机薄膜材料仅基本上沉积在不具有沉积抑制剂材料的基板的选定区域中。

7. 发明申请

US20090130608A1 PHOTOPATTERNABLE DEPOSITION INHIBITOR CONTAINING SILOXANE 有权
标题翻译：含有硅氧烷的光致抗蚀剂沉积抑制剂
公开(公告)号：US20090130608A1
公开(公告)日：2009-05-21
申请号：US11942780
申请日：2007-11-20
申请人： Lyn M. Irving , David H. Levy , Diane C. Freeman , Cheng Yang , Peter J. Cowdery-Corvan
发明人： Lyn M. Irving , David H. Levy , Diane C. Freeman , Cheng Yang , Peter J. Cowdery-Corvan
IPC分类号： G03F7/26
CPC分类号： G03F7/0757 , G03F7/0754 , G03F7/40
摘要： An atomic-layer-deposition process for forming a patterned thin film comprising providing a substrate, applying a photopatternable deposition inhibitor material to the substrate, wherein the deposition inhibitor material comprises an organosiloxane compound; and patterning the deposition inhibitor material. The thin film is substantially deposited only in the selected areas of the substrate not having the deposition inhibitor material.
摘要翻译：一种用于形成图案化薄膜的原子层沉积工艺，包括提供衬底，将光可图案化沉积抑制剂材料施加到衬底上，其中所述沉积抑制剂材料包括有机硅氧烷化合物; 并图案化沉积抑制剂材料。薄膜仅基本上沉积在不具有沉积抑制剂材料的基底的选定区域中。

8. 发明申请

US20090081883A1 PROCESS FOR DEPOSITING ORGANIC MATERIALS 有权
标题翻译：沉积有机材料的工艺
公开(公告)号：US20090081883A1
公开(公告)日：2009-03-26
申请号：US11861618
申请日：2007-09-26
申请人： Diane C. Freeman , David H. Levy , Peter J. Cowdery-Corvan
发明人： Diane C. Freeman , David H. Levy , Peter J. Cowdery-Corvan
IPC分类号： H01L21/469
CPC分类号： C23C16/30 , B05D1/60 , B05D2252/02 , C23C16/45551 , C23C16/45553 , C23C16/545
摘要： A process of making an organic thin film on a substrate by atomic layer deposition is disclosed, the process comprising simultaneously directing a series of gas flows along substantially parallel elongated channels, and wherein the series of gas flows comprises, in order, at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, optionally repeated a plurality of times, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material wherein the first reactive gaseous material, the second reactive gaseous material or both is a volatile organic compound. The process is carried out substantially at or above atmospheric pressure and at a temperature under 250° C., during deposition of the organic thin film.
摘要翻译：公开了通过原子层沉积在衬底上制造有机薄膜的方法，该方法包括同时引导一系列沿着大致平行的细长通道的气流，并且其中一系列气流依次包括至少第一反应性气态材料，惰性吹扫气体和第二反应性气体材料，任选地重复多次，其中第一反应性气体材料能够与用第二反应性气态材料处理的基底表面反应，其中第一反应性气态材料，第二反应性气体物质或两者都是挥发性有机化合物。在有机薄膜的沉积期间，该过程基本上在大气压以上且在250℃以下的温度下进行。

9. 发明申请

US20090081842A1 PROCESS FOR ATOMIC LAYER DEPOSITION 有权
标题翻译：原子层沉积过程
公开(公告)号：US20090081842A1
公开(公告)日：2009-03-26
申请号：US11861491
申请日：2007-09-26
申请人： Shelby F. Nelson , David H. Levy , Lyn M. Irving , Peter J. Cowdery-Corvan , Diane C. Freeman , Carolyn R. Ellinger
发明人： Shelby F. Nelson , David H. Levy , Lyn M. Irving , Peter J. Cowdery-Corvan , Diane C. Freeman , Carolyn R. Ellinger
IPC分类号： H01L21/336
CPC分类号： H01L27/1259 , B33Y80/00 , C23C16/407 , C23C16/45551 , C23C16/45595 , C23C16/545 , H01L27/1214 , H01L27/1225
摘要： The present invention relates to a process of making thin film electronic components and devices, such as thin film transistors, environmental barrier layers, capacitors, insulators and bus lines, where most or all of the layers are made by an atmospheric atomic layer deposition process.
摘要翻译：本发明涉及薄膜电子元件和薄膜晶体管，环境屏障层，电容器，绝缘子和总线线路的制造方法，其中大部分或全部层通过大气原子层沉积工艺制成。

10. 发明授权

US6037115A Photothermographic and thermographic films containing low levels of formate to prevent fog 失效
标题翻译：光热成像和热成像薄膜含有低水平的甲酸盐以防止雾
公开(公告)号：US6037115A
公开(公告)日：2000-03-14
申请号：US890892
申请日：1997-07-10
申请人： Alfred J. Alton , James P. Besse , Peter J. Cowdery-Corvan , Leo J. Magee, Jr. , Michael W. Martin
发明人： Alfred J. Alton , James P. Besse , Peter J. Cowdery-Corvan , Leo J. Magee, Jr. , Michael W. Martin
IPC分类号： G03C1/498
CPC分类号： G03C1/49881 , G03C1/49818 , G03C1/49845 , G03C1/4989
摘要： A method of obtaining a photothermographic or thermographic film with reduced fog, such as pepper fog, comprises preparing a dispersion of: an oxidation-reduction image-forming combination comprising: a silver salt oxidizing agent and an organic reducing agent with: a synthetic polymer-peptized photosensitive silver halide, and a cyclic imide toner in a non-gelatin polymeric binder and mixing with said dispersion a sensitizing concentration of non-silver iodide salt formed from an ionic formate the improvement wherein said non-silver iodide salt contains less than about 100 micrograms of ionic formate per gram of iodide salt or the film contains less than about 0.5 micrograms of ionic formate per gram of emulsion in the film.
摘要翻译：一种获得具有减少灰雾的光热照相或热成像薄膜（例如胡椒雾）的方法包括制备分散体：一种氧化还原成像组合，其包含：银盐氧化剂和有机还原剂，其具有：合成聚合物 - 胶状感光卤化银和环状酰亚胺调色剂在非明胶聚合物粘合剂中并与所述分散体混合，其由离子甲酸盐形成的敏化浓度的非碘化银盐的改进，其中所述非碘化银盐含有小于约100 每克碘盐的微克离子型甲酸盐或薄膜中每克乳液含有小于约0.5微克的离子型甲酸盐。

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