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    • 8. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20080149972A1
    • 2008-06-26
    • US11954110
    • 2007-12-11
    • Katuo IshizakaTetsuo Iijima
    • Katuo IshizakaTetsuo Iijima
    • H01L29/94
    • H01L29/7802H01L29/0696H01L29/0869H01L2224/0603H01L2224/48247H01L2924/13062H01L2924/13091H01L2924/00
    • ON resistance and leakage current of a vertical power MOSFET are to be diminished. In a vertical high breakdown voltage MOSFET with unit MOSFETs (cells) arranged longitudinally and transversely over a main surface of a semiconductor substrate, the cells are made quadrangular in shape, and in each of the cells, source regions whose inner end portions are exposed to the interior of a quadrangular source contact hole are arranged separately and correspondingly to each side of the quadrangle. Each source region is trapezoidal in shape, and a lower side of the trapezoid is positioned below a gate electrode (gate insulating film), while an upper side portion of the trapezoid is exposed to the interior of the source contact hole. The four source regions are separated from one another by diagonal regions of the quadrangle.
    • 垂直功率MOSFET的导通电阻和漏电流将被减小。 在具有纵向和横向地布置在半导体衬底的主表面上的单元MOSFET(单元)的垂直高击穿电压MOSFET中,单元被制成四边形形状,并且在每个单元中,其内端部暴露于 四边形源接触孔的内部分别布置并对应于四边形的每一侧。 每个源极区域是梯形的,并且梯形的下侧位于栅电极(栅极绝缘膜)的下方,而梯形的上侧部分暴露于源极接触孔的内部。 四个源区域由四边形的对角区域彼此分开。
    • 9. 发明授权
    • Semiconductor device
    • 半导体器件
    • US07312501B2
    • 2007-12-25
    • US11030094
    • 2005-01-07
    • Katuo IshizakaTetsuo Iijima
    • Katuo IshizakaTetsuo Iijima
    • H01L29/76H01L29/94H01L31/00
    • H01L29/7802H01L29/0696H01L29/0869H01L2224/0603H01L2224/48247H01L2924/13062H01L2924/13091H01L2924/00
    • ON resistance and leakage current of a vertical power MOSFET are to be diminished. In a vertical high breakdown voltage MOSFET with unit MOSFETs (cells) arranged longitudinally and transversely over a main surface of a semiconductor substrate, the cells are made quadrangular in shape, and in each of the cells, source regions whose inner end portions are exposed to the interior of a quadrangular source contact hole are arranged separately and correspondingly to each side of the quadrangle. Each source region is trapezoidal in shape, and a lower side of the trapezoid is positioned below a gate electrode (gate insulating film), while an upper side portion of the trapezoid is exposed to the interior of the source contact hole. The four source regions are separated from one another by diagonal regions of the quadrangle.
    • 垂直功率MOSFET的导通电阻和漏电流将被减小。 在具有纵向和横向地布置在半导体衬底的主表面上的单元MOSFET(单元)的垂直高击穿电压MOSFET中,单元被制成四边形形状,并且在每个单元中,其内端部暴露于 四边形源接触孔的内部分别布置并对应于四边形的每一侧。 每个源极区域是梯形的,并且梯形的下侧位于栅电极(栅极绝缘膜)的下方,而梯形的上侧部分暴露于源极接触孔的内部。 四个源区域由四边形的对角区域彼此分开。