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1. 发明授权

US6004840A Method of fabricating a semiconductor device comprising a MOS portion and a bipolar portion 失效
标题翻译：制造包括MOS部分和双极部分的半导体器件的方法
公开(公告)号：US6004840A
公开(公告)日：1999-12-21
申请号：US744524
申请日：1996-11-06
申请人： Koji Kimura , Yuichi Nakashima , Hiroshi Kawamoto
发明人： Koji Kimura , Yuichi Nakashima , Hiroshi Kawamoto
IPC分类号： H01L21/768 , H01L21/8249
CPC分类号： H01L21/76895 , H01L21/8249
摘要： In a semiconductor device, a first conductive film made of, for example, polysilicon is formed on the element region of the semiconductor substrate. An insulation film is formed on the semiconductor substrate, for covering at least the first conductive film. A second conductive film covers at least the end portion of the insulation film. The first conductive film is used as a gate electrode of the MOS transistor, and the second conductive film is used as a protection film for covering and protecting the end portion of the insulation film and a lead-out electrode of the bipolar transistor. The end portion of the insulation film is covered and protected by the second conductive film obtained by patterning the conductive layer made of, for example, polysilicon. Further, the conductive layer is patterned so that stepped portions formed on the insulation film and the end portion of the insulation film are covered, and using this pattern, anisotropic etching is carried out. Thus, formation of residue on the side-wall of the second conductive film, on the stepped portions formed as covering the first conductive film, can be avoided. In a later step, the pattern of the second conductive film which covers the stepped portion is removed by etching.
摘要翻译：在半导体器件中，在半导体衬底的元件区域上形成由例如多晶硅制成的第一导电膜。绝缘膜形成在半导体衬底上，用于至少覆盖第一导电膜。第二导电膜至少覆盖绝缘膜的端部。第一导电膜用作MOS晶体管的栅电极，第二导电膜用作覆盖和保护绝缘膜的端部和双极晶体管的引出电极的保护膜。绝缘膜的端部由通过图案化例如由多晶硅制成的导电层获得的第二导电膜覆盖和保护。此外，导电层被图案化，使得形成在绝缘膜上的阶梯部分和绝缘膜的端部被覆盖，并且使用该图案进行各向异性蚀刻。因此，可以避免在形成为覆盖第一导电膜的阶梯部分上在第二导电膜的侧壁上形成残留物。在后续步骤中，通过蚀刻去除覆盖阶梯部分的第二导电膜的图案。

2. 发明授权

US5604371A Semiconductor device with an insulation film having an end covered by a conductive film 失效
标题翻译：具有绝缘膜的半导体器件，其端部被导电膜覆盖
公开(公告)号：US5604371A
公开(公告)日：1997-02-18
申请号：US421795
申请日：1995-04-14
申请人： Koji Kimura , Yuichi Nakashima , Hiroshi Kawamoto
发明人： Koji Kimura , Yuichi Nakashima , Hiroshi Kawamoto
IPC分类号： H01L21/768 , H01L21/8249 , H01L29/41
CPC分类号： H01L21/8249 , H01L21/76895
摘要： In a semiconductor device, a first conductive film made of, for example, polysilicon is formed on the element region of the semiconductor substrate. An insulation film is formed on the semiconductor substrate, for covering at least the first conductive film. A second conductive film covers at least the end portion of the insulation film. The first conductive film is used as a gate electrode of the MOS transistor, and the second conductive film is used as a protection film for covering and protecting the end portion of the insulation film and a lead-out electrode of the bipolar transistor. The end portion of the insulation film is covered and protected by the second conductive film obtained by patterning the conductive layer made of, for example, polysilicon. Further, the conductive layer is patterned so that stepped portions formed on the insulation film and the end portion of the insulation film are covered, and using this pattern, anisotropic etching is carried out. Thus, formation of residue on the side-wall of the second conductive film, on the stepped portions formed as covering the first conductive film, can be avoided. In a later step, the pattern of the second conductive film which covers the stepped portion is removed by etching.
摘要翻译：在半导体器件中，在半导体衬底的元件区域上形成由例如多晶硅制成的第一导电膜。绝缘膜形成在半导体衬底上，用于至少覆盖第一导电膜。第二导电膜至少覆盖绝缘膜的端部。第一导电膜用作MOS晶体管的栅电极，第二导电膜用作覆盖和保护绝缘膜的端部和双极晶体管的引出电极的保护膜。绝缘膜的端部由通过图案化例如由多晶硅制成的导电层获得的第二导电膜覆盖和保护。此外，导电层被图案化，使得形成在绝缘膜上的阶梯部分和绝缘膜的端部被覆盖，并且使用该图案进行各向异性蚀刻。因此，可以避免在形成为覆盖第一导电膜的阶梯部分上在第二导电膜的侧壁上形成残留物。在后续步骤中，通过蚀刻去除覆盖阶梯部分的第二导电膜的图案。

3. 发明申请

US20110275647A1 PYRIMIDIN-4-(3H)-ONE DERIVATIVES 审中-公开
标题翻译：吡咯烷-4-（3H） - 酮衍生物
公开(公告)号：US20110275647A1
公开(公告)日：2011-11-10
申请号：US13144316
申请日：2010-02-22
申请人： Keisuke Arakawa , Yoshiki Ito , Hiroshi Kawamoto , Junichi Sakaki , Tadashi Shimamura
发明人： Keisuke Arakawa , Yoshiki Ito , Hiroshi Kawamoto , Junichi Sakaki , Tadashi Shimamura
IPC分类号： A61K31/501 , A61K31/519 , A61P3/06 , A61P3/10 , A61P3/04 , A61K31/497 , C07D471/04
CPC分类号： C07D471/04
摘要： The present invention relates to a compound represented by a formula (I): or a pharmaceutically acceptable salt thereof, wherein R1 represents lower alkyl or the like; R2 represents phenyl or the like; R represents a halogen atom or the like; X represents an oxygen atom or the like; Y1, Y2, Y3 and Y4 represent CH or the like; l represents an integer of from 0 to 3; m and n each represent an integer of 1 or 2; p represents an integer of from 0 to 2; and q represents an integer of from 1 to 3.
摘要翻译：本发明涉及由式（I）表示的化合物或其药学上可接受的盐，其中R 1表示低级烷基等; R2表示苯基等; R表示卤素原子等; X表示氧原子等; Y1，Y2，Y3和Y4表示CH等; l表示0〜3的整数， m和n各自表示1或2的整数; p表示0〜2的整数， q表示1〜3的整数。

4. 发明授权

US07816313B2 Photoresist residue remover composition and semiconductor circuit element production process employing the same 失效
标题翻译：光致抗蚀剂残渣去除剂组合物和采用其的半导体电路元件生产方法
公开(公告)号：US07816313B2
公开(公告)日：2010-10-19
申请号：US12082173
申请日：2008-04-08
申请人： Hiroshi Kawamoto , Mikie Miyasato , Takuo Oowada , Norio Ishikawa
发明人： Hiroshi Kawamoto , Mikie Miyasato , Takuo Oowada , Norio Ishikawa
IPC分类号： H01L21/02
CPC分类号： G03F7/423 , H01L21/02063 , H01L21/02071
摘要： A photoresist residue remover composition is provided that removes a photoresist residue formed by a resist ashing treatment after dry etching in a step of forming, on a substrate surface, wiring of any metal of aluminum, copper, tungsten, and an alloy having any of these metals as a main component, the composition including one or two or more types of inorganic acid and one or two or more types of inorganic fluorine compound. There is also provided a process for producing a semiconductor circuit element wherein, in a step of forming wiring of any metal of aluminum, copper, tungsten, and an alloy having any of these metals as a main component, the photoresist residue remover composition is used for removing a photoresist residue formed by a resist ashing treatment after dry etching.
摘要翻译：提供了一种光致抗蚀剂残渣去除剂组合物，其在干法蚀刻之后除去由抗蚀剂灰化处理形成的光致抗蚀剂残渣，在基板表面上形成任何这些铝，铜，钨和任何这些的合金的任何金属的布线金属作为主要成分，该组合物包含一种或两种以上的无机酸和一种或两种以上的无机氟化合物。还提供了一种用于制造半导体电路元件的方法，其中在以任何这些金属为主要成分的铝，铜，钨和任何金属的任何金属的布线形成步骤中，使用光刻胶残渣去除剂组合物用于去除在干蚀刻之后由抗蚀剂灰化处理形成的光致抗蚀剂残渣。

5. 发明授权

US07729653B2 Image forming apparatus capable of cleaning a photoreceptor, method for cleaning a photoreceptor, and computer program for causing an image forming apparatus to clean a photoreceptor 有权
标题翻译：能够清洁感光体的图像形成装置，清洁感光体的方法，以及使图像形成装置清洁感光体的计算机程序
公开(公告)号：US07729653B2
公开(公告)日：2010-06-01
申请号：US11588228
申请日：2006-10-27
申请人： Hiroshi Kawamoto , Jitsuo Masuda , Masayasu Narimatsu , Naoki Fukudo
发明人： Hiroshi Kawamoto , Jitsuo Masuda , Masayasu Narimatsu , Naoki Fukudo
IPC分类号： G03G21/00
CPC分类号： G03G21/0005 , G03G2221/0026 , G03G2221/0089
摘要： An image forming apparatus and a method for cleaning a photoreceptor are realized that allow cleaning a surface of the photoreceptor to eliminate foreign substances adhering thereto, without using a special abrasive sheet. A recording sheet is fed and brought into contact with photoreceptors of all photoreceptor drums. The recording sheet is stopped by causing the vicinity of a rear end of the recording sheet to be sandwiched between a pair of registration rollers. Then, the photoreceptor drums are rotated. By this way, the cleaning is carried out to the photoreceptor.
摘要翻译：实现了一种用于清洁感光体的图像形成装置和方法，其可以清洁感光体的表面以消除附着在其上的异物，而不使用特殊的研磨片。记录纸被馈送并与所有感光鼓的感光体接触。通过使记录纸的后端附近夹在一对配准辊之间来停止记录纸。然后，感光鼓被旋转。通过这种方式，对感光体进行清洁。

6. 发明申请

US20090027599A1 Optical film, optical compensation sheet, polarizing plate, and liquid crystal display device 有权
标题翻译：光学膜，光学补偿片，偏振片和液晶显示装置
公开(公告)号：US20090027599A1
公开(公告)日：2009-01-29
申请号：US10588125
申请日：2005-02-25
申请人： Ikuko Ohgaru , Nobutaka Fukagawa , Terukazu Yanagi , Hiroshi Kawamoto
发明人： Ikuko Ohgaru , Nobutaka Fukagawa , Terukazu Yanagi , Hiroshi Kawamoto
IPC分类号： G02F1/1335 , G02B5/30 , B32B23/04
CPC分类号： C08K5/34922 , C08J5/18 , C08J2301/12 , C08J2301/14 , C08K3/36 , C08K5/0016 , C08K5/10 , G02B1/04 , G02B5/3083 , G02F1/1335 , G02F1/133528 , G02F1/13363 , Y10T428/1041 , Y10T428/105 , Y10T428/1077 , Y10T428/26 , Y10T428/31971 , C08L1/10 , C08L1/12 , C08L1/14
摘要： An optical film, which contains a cellulose acylate, at least one compound of formula (I) in an amount of 0.01 to 20 mass parts, and at least one cyclic compound having at least three substituents in an amount of 0.01 to 20 mass parts, to 100 mass parts of the cellulose acylate: wherein R1 to R7, R9 and R10 each independently is a hydrogen atom or a substituent; at least one of R1 to R5 is an electron-donating group; R8 is a hydrogen atom, an alkyl group, an alkenyl group, an alkinyl group, an aryl group, an alkoxy group, an aryloxy group, an alkoxycarbonyl group, an acylamino group, an alkylcarbonyloxy group, a cyano group, or a halogen atom; and an optical compensation sheet, a polarizing plate, and a liquid crystal display device, each of which uses the optical film.
摘要翻译：含有纤维素酰化物的光学膜，至少一种0.01至20质量份的式（I）化合物和至少一种具有至少三个取代基的环状化合物，其量为0.01至20质量份，至100质量份的纤维素酰化物：其中R 1至R 7，R 9和R 10各自独立地为氢原子或取代基; R 1至R 5中的至少一个是给电子基团; R8是氢原子，烷基，烯基，炔基，芳基，烷氧基，芳氧基，烷氧基羰基，酰氨基，烷基羰基氧基，氰基或卤素原子 ; 以及各自使用光学膜的光学补偿片，偏振片和液晶显示装置。

7. 发明申请

US20080318424A1 Photoresist residue remover composition and semiconductor circuit element production process employing the same 失效
标题翻译：光致抗蚀剂残渣去除剂组合物和采用其的半导体电路元件生产方法
公开(公告)号：US20080318424A1
公开(公告)日：2008-12-25
申请号：US12082173
申请日：2008-04-08
申请人： Hiroshi Kawamoto , Mikie Miyasato , Takuo Oowada , Norio Ishikawa
发明人： Hiroshi Kawamoto , Mikie Miyasato , Takuo Oowada , Norio Ishikawa
IPC分类号： H01L21/44
CPC分类号： G03F7/423 , H01L21/02063 , H01L21/02071
摘要： A photoresist residue remover composition is provided that removes a photoresist residue formed by a resist ashing treatment after dry etching in a step of forming, on a substrate surface, wiring of any metal of aluminum, copper, tungsten, and an alloy having any of these metals as a main component, the composition including one or two or more types of inorganic acid and one or two or more types of inorganic fluorine compound. There is also provided a process for producing a semiconductor circuit element wherein, in a step of forming wiring of any metal of aluminum, copper, tungsten, and an alloy having any of these metals as a main component, the photoresist residue remover composition is used for removing a photoresist residue formed by a resist ashing treatment after dry etching.
摘要翻译：提供了一种光致抗蚀剂残渣去除剂组合物，其在干法蚀刻之后除去由抗蚀剂灰化处理形成的光致抗蚀剂残渣，在基板表面上形成任何这些铝，铜，钨和任何这些的合金的任何金属的布线金属作为主要成分，该组合物包含一种或两种以上的无机酸和一种或两种以上的无机氟化合物。还提供了一种用于制造半导体电路元件的方法，其中在以任何这些金属为主要成分的铝，铜，钨和任何金属的任何金属的布线形成步骤中，使用光刻胶残渣去除剂组合物用于去除在干蚀刻之后由抗蚀剂灰化处理形成的光致抗蚀剂残渣。

8. 发明申请

US20080274920A1 LUBRICANT COMPOSITION, MECHANICAL ELEMENT, AND METHOD FOR PRODUCING TRIAZINE DERIVATIVES 失效
标题翻译：润滑剂组合物，机械元素和生产三嗪衍生物的方法
公开(公告)号：US20080274920A1
公开(公告)日：2008-11-06
申请号：US12057730
申请日：2008-03-28
申请人： Masayuki Negoro , Hiroshi Kawamoto , Ryo Nishio , Toshiki Taguchi
发明人： Masayuki Negoro , Hiroshi Kawamoto , Ryo Nishio , Toshiki Taguchi
IPC分类号： C10M105/70
CPC分类号： C09K19/3475 , C07D251/52 , C07D251/70 , C09K19/32 , C09K2019/0429 , C10M105/70 , C10M111/04 , C10M133/42 , C10M2207/285 , C10M2207/2855 , C10M2209/104 , C10M2209/1085 , C10M2209/109 , C10M2209/1095 , C10M2215/06 , C10M2215/061 , C10M2215/222 , C10M2215/2225 , C10M2215/223 , C10M2215/224 , C10M2215/225 , C10M2215/227 , C10M2215/305 , C10M2219/101 , C10M2219/102 , C10M2219/104 , C10M2219/108 , C10N2220/06 , C10N2230/02 , C10N2230/06 , C10N2230/08 , C10M2209/105 , C10M2209/108
摘要： A lubricant composition comprising following ingredients (a) and (b) is disclosed. (a) at least one compound represented by formula (1) (b) at least one compound represented by formula (2) (R—X-)m-D (1) (b) at least one compound represented by formula (2)
摘要翻译：公开了包含以下成分（a）和（b）的润滑剂组合物。（a）至少一种由式（1）（b）表示的化合物至少一种由式（2）表示的化合物<？in-line-formula description =“In-Line Formulas”end =“lead”→> （b）由式（2）表示的至少一种化合物，其中R 1，R 2，

9. 发明申请

US20070054814A1 Lubricant composition, bearing apparatus, sliding member and triazine-ring compound 审中-公开
标题翻译：润滑剂组合物，轴承装置，滑动构件和三嗪环化合物
公开(公告)号：US20070054814A1
公开(公告)日：2007-03-08
申请号：US11512084
申请日：2006-08-30
申请人： Masayuki Negoro , Ken Kawata , Hiroshi Kawamoto
发明人： Masayuki Negoro , Ken Kawata , Hiroshi Kawamoto
IPC分类号： C07D251/54
CPC分类号： C07D251/54
摘要： The novel lubricant composition is disclosed. The composition comprises at least one compound, exhibiting a minimum friction coefficient under a pressure equal to or greater than 10 MPa with the increase of a pressure and a viscosity-pressure coefficient equal to or less than 20 GPa−1 at 40° C., represented by a formula (1). In the formula, Y and Z respectively represent a single bond or a bivalent linking group selected from the group consisting of NRa where Ra is a hydrogen atom or a C1-30 alkyl group, oxygen, sulfur, carbonyl, sulfonyl and any combinations thereof; A and B respectively represent a substituted or non-substituted, alkyl group, alkenyl group, alkynyl group, aryl group or heterocyclic group; T is —S—R1, —O—R2 or —NR3R4; and R1, R2, R3 and R4 respectively represent a substituted or non-substituted, alkyl group, alkenyl group, alkynyl group, aryl group or heterocyclic group.
摘要翻译：公开了新的润滑剂组合物。该组合物包含至少一种化合物，在压力等于或大于10MPa的压力和粘度压力系数等于或小于20GPa -1的情况下表现出最小的摩擦系数。 > 40℃，由式（1）表示。在该式中，Y和Z分别表示单键或选自NR a的二价连接基团，其中R a是氢原子或C 1 -C 30烷基，氧，硫，羰基，磺酰基及其任何组合; A和B分别表示取代或未取代的烷基，烯基，炔基，芳基或杂环基; T是-S-R 1，-O-R 2或-NR 3 R 4; R 1，R 2，R 3和R 4分别表示取代或未取代的烷基烯基，炔基，芳基或杂环基。

10. 发明授权

US06681097B2 Sheet post-treatment device and image forming apparatus provided with the same 有权
标题翻译：片材后处理装置和具有该片材后处理装置的图像形成装置
公开(公告)号：US06681097B2
公开(公告)日：2004-01-20
申请号：US10265380
申请日：2002-10-07
申请人： Hideki Kimura , Hiroshi Kawamoto , Kazuhisa Mochizuki
发明人： Hideki Kimura , Hiroshi Kawamoto , Kazuhisa Mochizuki
IPC分类号： G03G1500
CPC分类号： G03G15/6538 , B42C1/12 , B65H2301/333 , G03G2215/00827
摘要： A sheet post-treatment device for receiving a sheet discharged from an image forming apparatus to accumulate and match it comprises: routes including a first conveying route for receiving the sheet discharged from the image forming apparatus; a switch-back route for inverting the received sheet; a second conveying route for conveying the inverted sheet; and a third conveying route for delivering the sheet conveyed onto a treating tray for accumulating and matching the sheet thereon, the switch-back route being arranged downward of the treating tray. The second conveying route is formed along the side wall of the sheet post-treatment device, and at least a part of the switch-back route is exposed.
摘要翻译：一种纸张后处理装置，用于接收从图像形成装置排出的纸张以便进行累积和匹配，其包括：包括用于接收从图像形成装置排出的纸张的第一输送路线的路线; 用于反转所接收的纸张的切换路线; 用于输送倒置片材的第二输送路径; 以及第三输送路径，用于输送传送到处理托盘上的纸张，用于在其上堆积和匹配纸张，该回切路线布置在处理托盘的下方。第二输送路径沿着片材后处理装置的侧壁形成，并且至少一部分折回路线被暴露。

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