专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09176379B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09176379B2
公开(公告)日：2015-11-03
申请号：US13441205
申请日：2012-04-06
申请人： Koji Ichikawa , Takahiro Yasue , Tatsuro Masuyama
发明人： Koji Ichikawa , Takahiro Yasue , Tatsuro Masuyama
IPC分类号： G03F7/004 , G03F7/027 , G03F7/20 , G03F7/039
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/027 , G03F7/0397 , G03F7/20 , G03F7/2041
摘要： A resist composition includes (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, and (C) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.
摘要翻译：抗蚀剂组合物包括（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸的作用可溶于碱性水溶液中，（B）具有要通过碱性显影剂，和（C）由式（I）表示的化合物，其中R1和R2各自独立地表示C1〜C12烃基，C1〜C6烷氧基，C2〜C7酰基，C2 C7酰氧基，C2〜C7烷氧基羰基，硝基或卤素原子; m和n独立地表示0〜4的整数。

2. 发明授权

US09063414B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US09063414B2
公开(公告)日：2015-06-23
申请号：US13190173
申请日：2011-07-25
申请人： Koji Ichikawa , Mitsuhiro Hata , Takahiro Yasue
发明人： Koji Ichikawa , Mitsuhiro Hata , Takahiro Yasue
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0397
摘要： The present invention provides a photoresist composition comprising a resin which comprises a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein R1 and R2 are independently in each occurrence a C1-C12 hydrocarbon group, a C1-C6 alkoxy group, a C2-C7 acyl group, a C2-C7 acyloxy group, a C2-C7 alkoxycarbonyl group, a nitro group or a halogen atom, and m and n independently each represent an integer of 0 to 4.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其包含树脂，其包含衍生自具有酸不稳定基团的化合物的结构单元，其在碱性水溶液中不溶或难溶于碱性水溶液，但通过酸，酸产生剂和由式（I）表示的化合物：其中R1和R2在每次出现时独立地为C1-C12烃基，C1-C6烷氧基，C2-C7酰基，C2-C7 酰氧基，C 2 -C 7烷氧基羰基，硝基或卤素原子，m和n分别表示0〜4的整数。

3. 发明授权

US08563218B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08563218B2
公开(公告)日：2013-10-22
申请号：US13404123
申请日：2012-02-24
申请人： Koji Ichikawa , Takahiro Yasue
发明人： Koji Ichikawa , Takahiro Yasue
IPC分类号： G03F7/004 , G03F7/30 , G03F7/38 , G03F7/039
CPC分类号： G03F7/38 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/30 , Y10S430/108 , Y10S430/111
摘要： A resist composition of the present invention has (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator and (D) a compound represented by the formula (II). wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom, R3 and R4 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m′ and n′ independently represent an integer of 0 to 4.
摘要翻译：本发明的抗蚀剂组合物具有（A1）具有由式（I）表示的结构单元的树脂，（A2）树脂在碱性水溶液中不溶或难溶，但在碱性水溶液中溶解，酸的作用，（B）酸产生剂和（D）由式（II）表示的化合物。其中R1表示氢原子或甲基; A1表示C1〜C6烷二基; R2表示具有氟原子的C1〜C10烃基，R3和R4各自独立地表示C1〜C12烃基，C1〜C6烷氧基，C2〜C7酰基，C2〜C7酰氧基， C2至C7烷氧基羰基，硝基或卤素原子; m'和n'独立地表示0〜4的整数。

4. 发明授权

US08859182B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08859182B2
公开(公告)日：2014-10-14
申请号：US13404064
申请日：2012-02-24
申请人： Koji Ichikawa , Takahiro Yasue , Akira Kamabuchi
发明人： Koji Ichikawa , Takahiro Yasue , Akira Kamabuchi
IPC分类号： G03F7/004 , G03F7/027 , C08F26/06 , G03F7/20 , G03F7/039
CPC分类号： G03F7/027 , G03F7/0045 , G03F7/0397 , G03F7/20 , G03F7/2041
摘要： A resist composition contains (A) a resin having a structural unit represented by the formula (I), (B) an acid generator and (D) a compound represented by the formula (II), wherein R1, ring X1, R3, R4, m, and n are defined in the specification.
摘要翻译：抗蚀剂组合物含有（A）具有由式（I）表示的结构单元，（B）酸产生剂和（D）由式（II）表示的化合物的树脂，其中R1，X1，R3，R4 ，m和n在说明书中定义。

5. 发明授权

US09791776B2 Resist composition and method for producing resist pattern 有权
公开(公告)号：US09791776B2
公开(公告)日：2017-10-17
申请号：US13441032
申请日：2012-04-06
申请人： Koji Ichikawa , Takahiro Yasue , Yuichi Mukai
发明人： Koji Ichikawa , Takahiro Yasue , Yuichi Mukai
IPC分类号： G03F7/039 , G03F7/004 , G03F7/09 , G03F7/029 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/029 , G03F7/0392 , G03F7/0397 , G03F7/092 , G03F7/2041
摘要： A resist composition contains (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), wherein R1 and R2, m and n, R3 and R4, X1, R5 and Z1+ are defined in the specification.

6. 发明授权

US09176378B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09176378B2
公开(公告)日：2015-11-03
申请号：US13441185
申请日：2012-04-06
申请人： Koji Ichikawa , Takahiro Yasue , Satoshi Yamaguchi
发明人： Koji Ichikawa , Takahiro Yasue , Satoshi Yamaguchi
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition of the invention includes: (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), wherein R1, R2, m, n, Q1, Q2, L1, ring W1 and Z+ are defined in the specification.
摘要翻译：本发明的抗蚀剂组合物包括：（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸作用而溶于碱性水溶液中的树脂，（B）由式（II）表示的酸发生剂）和（D）由式（I）表示的化合物，其中R1，R2，m，n，Q1，Q2，L1，环W1和Z +在说明书中定义。

7. 发明授权

US09128373B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09128373B2
公开(公告)日：2015-09-08
申请号：US13441035
申请日：2012-04-06
申请人： Koji Ichikawa , Takahiro Yasue , Satoshi Yamaguchi
发明人： Koji Ichikawa , Takahiro Yasue , Satoshi Yamaguchi
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition includes; (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having an acid-labile group; and (D) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.
摘要翻译：抗蚀剂组合物包括：（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸的作用变得可溶于碱性水溶液，（B）具有酸不稳定基团的酸发生剂; 和（D）式（I）表示的化合物，其中R 1和R 2各自独立地表示C1〜C12烃基，C1〜C6烷氧基，C2〜C7酰基，C2〜C7酰氧基 C2-C7烷氧基羰基，硝基或卤素原子; m和n独立地表示0〜4的整数。

8. 发明授权

US09052591B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09052591B2
公开(公告)日：2015-06-09
申请号：US13552281
申请日：2012-07-18
申请人： Koji Ichikawa , Takahiro Yasue
发明人： Koji Ichikawa , Takahiro Yasue
IPC分类号： G03F7/039 , G03F7/004 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R1, A1, A13, A14, X12, R3, R4, m′ and n′ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂，其中R1，A1，A13，A14，X12，R3，R4，m'和n'在说明书中定义。

9. 发明授权

US08557500B2 Salt and photoresist composition comprising the same 有权
标题翻译：包含其的盐和光致抗蚀剂组合物
公开(公告)号：US08557500B2
公开(公告)日：2013-10-15
申请号：US13406634
申请日：2012-02-28
申请人： Koji Ichikawa , Hiromu Sakamoto , Takahiro Yasue
发明人： Koji Ichikawa , Hiromu Sakamoto , Takahiro Yasue
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： C07C309/17 , C07C25/18 , C07C309/12 , C07C381/12 , C07C2603/74 , C07D303/16 , C07D305/06 , C07D307/33 , C07D307/77 , C07D327/04 , C07D333/46 , C07D497/18 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, L2 represents a single bond or a C1-C6 alkanediyl group in which one or more —CH2— can be replaced by —O— or —CO—, Y represents a C3-C18 alicyclic hydrocarbon group which can have one or more substituents, and one or more —CH2— in the alicyclic hydrocarbon group can be replaced by —O—, —CO— or —SO2—, and Z+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，L 2表示单键或C 1 -C 6烷二基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，Y代表C3-C18 可以具有一个或多个取代基的脂环族烃基，脂环族烃基中的一个或多个-CH 2 - 可以被-O - ， - CO-或-SO 2 - 代替，Z +代表有机抗衡离子。

10. 发明申请

US20110275020A1 Methods Of Forming Photoresist Patterns 有权
标题翻译：形成光刻胶图案的方法
公开(公告)号：US20110275020A1
公开(公告)日：2011-11-10
申请号：US13099910
申请日：2011-05-03
申请人： Subramanya Mayya , Takahiro Yasue , Seok-hwan Oh , Yool Kang
发明人： Subramanya Mayya , Takahiro Yasue , Seok-hwan Oh , Yool Kang
IPC分类号： G03F7/20 , G03F7/32
CPC分类号： G03F7/40 , G03F7/322
摘要： Methods of forming photoresist patterns may include forming a photoresist layer on a substrate, exposing the photoresist layer using an exposure mask, forming a preliminary pattern by developing the exposed photoresist layer and treating a surface of the preliminary pattern using a treatment agent that includes a coating polymer.
摘要翻译：形成光致抗蚀剂图案的方法可以包括在基板上形成光致抗蚀剂层，使用曝光掩模曝光光致抗蚀剂层，通过显影曝光的光致抗蚀剂层和使用包括涂层的处理剂处理初步图案的表面来形成初步图案聚合物。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式