会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明申请
    • MULTILAYER FILM AND BAG FORMED OF MULTILAYER FILM
    • 多层薄膜和多层薄膜制成的薄膜
    • US20130071587A1
    • 2013-03-21
    • US13700272
    • 2011-05-31
    • Koichi IgarashiTetsuya SaitoYasushi NagataYasuyuki Kajiwara
    • Koichi IgarashiTetsuya SaitoYasushi NagataYasuyuki Kajiwara
    • B32B27/08B32B1/02
    • B32B27/08A61J1/10B32B1/02B32B7/00B32B7/02B32B27/00B32B27/06B32B27/32B32B27/327B32B2250/242B32B2307/306B32B2307/412B32B2307/558B32B2307/734B32B2439/80Y10T428/1334Y10T428/1352Y10T428/31909Y10T428/31913Y10T428/31917
    • A multilayer film comprising an upper layer (A), at least one intermediate layer (B), and a lower layer (C) stacked in that order,wherein the intermediate layer (B) comprises a composition (b1) or a composition (b2) below, andthe upper layer (A) and the lower layer (C) each independently comprise an ethylene polymer and/or a propylene polymer:Composition (b1): a composition that comprisesa propylene polymer (p1) having a melting point in the range of 140 to 165° C. measured by differential scanning calorimetry and a melt flow rate (MFR; ASTM D 1238, 230° C., 2.16 kg load) in the range of 0.1 to 20 g/10 min,a propylene·α-olefin random copolymer (r1) having a molecular weight distribution in the range of 1.0 to 3.5 determined by gel permeation chromatography (GPC) and a melting point in the range of 90 to 125° C. measured by differential scanning calorimetry, and30% by weight to 60% by weight of an ethylene-based elastomer (where the sum of the contents of the propylene polymer (p1), the propylene·α-olefin random copolymer (r1), and the ethylene-based elastomer is 100% by weight)(when the intermediate layer (B) is composed of the composition (b1), the ratio of the content of the propylene polymer (p1) in the entire multilayer film to the sum of the contents of the propylene polymer (p1) and the propylene·α-olefin random copolymer (r1) in the entire multilayer film is 0.1 to 0.35).
    • 一种多层膜,其包括上层(A),至少一层中间层(B)和下层(C),其中中间层(B)包含组合物(b1)或组合物(b2 ),上层(A)和下层(C)各自独立地包含乙烯聚合物和/或丙烯聚合物:组合物(b1):包含丙烯聚合物(p1)的组合物,其具有熔点在 通过差示扫描量热法测定的范围为140〜165℃,熔体流动速率(MFR; ASTM D 1238,230℃,2.16kg负荷)为0.1〜20g / 10分钟,丙烯· 通过凝胶渗透色谱法(GPC)测定分子量分布范围为1.0〜3.5,通过差示扫描量热法测定的熔点为90〜125℃的α-烯烃无规共聚物(r1),30 重量%至60%的乙烯类弹性体(其中丙烯聚合物的含量之和) r(p1),丙烯·α-烯烃无规共聚物(r1)和乙烯系弹性体的重量比为100重量%(当中间层(B)由组合物(b1)构成时, 整个多层膜中的丙烯聚合物(p1)的含量相对于整个多层膜中丙烯聚合物(p1)和丙烯·α-烯烃无规共聚物(r1)的含量的总和为0.1〜0.35)。
    • 8. 发明申请
    • Manufacturing apparatus for oriented film, liquid crystal device and electronic device
    • 取向膜,液晶装置和电子装置的制造装置
    • US20070013845A1
    • 2007-01-18
    • US11484490
    • 2006-07-11
    • Yasushi NagataYuichi Shimizu
    • Yasushi NagataYuichi Shimizu
    • G02F1/1337
    • G02F1/133734C23C14/044C23C14/545G02F2001/1316
    • A manufacturing apparatus for manufacturing an oriented film of a liquid crystal device holding a liquid crystal between a pair of substrates facing each other, includes: a film formation chamber; an evaporation section evaporating an oriented film material on the substrate by a physical vapor deposition, and forming the oriented film in the film formation chamber; a shielding plate formed between the evaporation section and the substrate, having an elongated opening for selectively evaporating the oriented film material, and covering an area of the substrate on which the oriented film is not formed; and a cleaning section providing a cleaning medium for removing the oriented film material adhered on the shielding plate, toward the opening of the shielding plate, and on the side of the shielding plate that faces the evaporation section.
    • 一种用于制造在彼此面对的一对基板之间保持液晶的液晶装置的取向膜的制造装置包括:成膜室; 蒸发部通过物理气相沉积在基板上蒸发定向膜材料,并在成膜室中形成取向膜; 形成在所述蒸发部和所述基板之间的遮蔽板,具有用于选择性地蒸发所述取向膜材料的细长开口,并覆盖未形成所述取向膜的所述基板的区域; 以及清洁部,其提供用于去除附着在所述屏蔽板上的取向膜材料,朝向所述屏蔽板的开口以及所述屏蔽板的面对所述蒸发部的一侧的清洁介质。
    • 9. 发明申请
    • Apparatus and method for detecting hole area
    • 孔面积检测装置及方法
    • US20050254700A1
    • 2005-11-17
    • US11102770
    • 2005-04-11
    • Yasushi NagataHiroshi SanoAtsushi ImamuraEiji Nishihara
    • Yasushi NagataHiroshi SanoAtsushi ImamuraEiji Nishihara
    • G01B11/00G01N21/956G06K9/00G06T1/00G06T7/00
    • G06T7/0004G06T2207/30141
    • A board (9) is placed on a stage part (20) so that the back surface of the board is opposed to the stage part (20). The stage part cuts off light entering a hole penetrating the board (9) from a side of its back surface which is a reverse surface with respect to its pattern formed surface and has a reflection property which is different from that of the pattern formed surface with respect to an illumination light, and the illumination light is emitted from a light source part (31) onto the pattern formed surface (9a). An image pickup part (33) receives light from the pattern formed surface to acquire an inspection image, and a hole-area specifying part implemented by a computer (4) specifies a hole area in the inspection image, which corresponds to a hole of the board (9), by using only the inspection image as image information, in accordance with criteria of pixel values affected by a reflection state of the illumination light entering a hole penetrating the board (9) and being reflected on the stage part (20). Thus, it is possible to detect an area of a hole on the board (9) by using only the inspection image acquired with a reflected light of the illumination light from the light source part (31).
    • 板(9)放置在平台部分(20)上,使得板的后表面与平台部分(20)相对。 舞台部分从其背面的相对于其图案形成表面的反面的一侧切断穿入基板(9)的孔,并具有与图案形成面不同的反射特性, 相对于照明光,照明光从光源部(31)发射到图案形成面(9a)上。 图像拾取部分(33)从图案形成表面接收光以获取检查图像,并且由计算机(4)实现的孔区域指定部分指定检查图像中的与孔的区域相对应的孔面积 (9)中,仅通过仅使用检查图像作为图像信息,根据影响入射穿过基板(9)的孔的照明光的反射状态并被反射在台面部(20)上的像素值的标准, 。 因此,可以通过仅使用由来自光源部分(31)的照明光的反射光获取的检查图像来检测板(9)上的孔的区域。