专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20100008564A1 INSPECTION APPARATUS FOR INSPECTING PATTERNS OF A SUBSTRATE 失效
标题翻译：检查基板图案的检查装置
公开(公告)号：US20100008564A1
公开(公告)日：2010-01-14
申请号：US12564567
申请日：2009-09-22
申请人： Koichi HAYAKAWA , Hiroshi Miyai , Masaaki Nojiri , Michio Nakano , Takako Fujisawa , Dai Fujii
发明人： Koichi HAYAKAWA , Hiroshi Miyai , Masaaki Nojiri , Michio Nakano , Takako Fujisawa , Dai Fujii
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： A pattern inspection apparatus has a setting unit of a plurality of cell areas A and B of different cell comparison pitches and inspects the plurality of cell areas of the different cell comparison pitches in accordance with settings of the setting unit. As information to read out image data for an inspection image and a reference image from an image memory, in addition to position information of a defective image, identification information showing either a cell comparison or a die comparison and relative position information of the reference image can be set. The apparatus also has a unit for setting a plurality of inspection threshold values every inspection area and inspects a plurality of inspection areas by the plurality of inspection threshold values.
摘要翻译：图案检查装置具有不同的单元比较间距的多个单元区域A和B的设置单元，并且根据设置单元的设置检查不同单元比较间距的多个单元区域。作为用于从图像存储器读出检查图像和参考图像的图像数据的信息，除了缺陷图像的位置信息之外，还可以显示小区比较或者模具比较的标识信息以及参考图像的相对位置信息被设置。该设备还具有用于在每个检查区域设置多个检查阈值的单元，并且通过多个检查阈值检查多个检查区域。

2. 发明授权

US08036447B2 Inspection apparatus for inspecting patterns of a substrate 失效
标题翻译：用于检查基板图案的检查装置
公开(公告)号：US08036447B2
公开(公告)日：2011-10-11
申请号：US12564567
申请日：2009-09-22
申请人： Koichi Hayakawa , Hiroshi Miyai , Masaaki Nojiri , Michio Nakano , Takako Fujisawa , Dai Fujii
发明人： Koichi Hayakawa , Hiroshi Miyai , Masaaki Nojiri , Michio Nakano , Takako Fujisawa , Dai Fujii
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： A pattern inspection apparatus has a setting unit of a plurality of cell areas A and B of different cell comparison pitches and inspects the plurality of cell areas of the different cell comparison pitches in accordance with settings of the setting unit. As information to read out image data for an inspection image and a reference image from an image memory, in addition to position information of a defective image, identification information showing either a cell comparison or a die comparison and relative position information of the reference image can be set. The apparatus also has a unit for setting a plurality of inspection threshold values every inspection area and inspects a plurality of inspection areas by the plurality of inspection threshold values.
摘要翻译：图案检查装置具有不同的单元比较间距的多个单元区域A和B的设置单元，并且根据设置单元的设置来检查不同单元比较间距的多个单元区域。作为用于从图像存储器读出检查图像和参考图像的图像数据的信息，除了缺陷图像的位置信息之外，还可以显示小区比较或者模具比较的标识信息以及参考图像的相对位置信息被设置。该设备还具有用于在每个检查区域设置多个检查阈值的单元，并且通过多个检查阈值检查多个检查区域。

3. 发明申请

US20060171593A1 Inspection apparatus for inspecting patterns of a substrate 审中-公开
标题翻译：用于检查基板图案的检查装置
公开(公告)号：US20060171593A1
公开(公告)日：2006-08-03
申请号：US11344101
申请日：2006-02-01
申请人： Koichi Hayakawa , Hiroshi Miyai , Masaaki Nojiri , Michio Nakano , Takako Fujisawa , Dai Fujii
发明人： Koichi Hayakawa , Hiroshi Miyai , Masaaki Nojiri , Michio Nakano , Takako Fujisawa , Dai Fujii
IPC分类号： G06K9/62 , G06K9/64 , G06K9/68
CPC分类号： G06T7/001 , G06T2207/30148
摘要： A pattern inspection apparatus has a setting unit of a plurality of cell areas A and B of different cell comparison pitches and inspects the plurality of cell areas of the different cell comparison pitches in accordance with settings of the setting unit. As information to read out image data for an inspection image and a reference image from an image memory, in addition to position information of a defective image, identification information showing either a cell comparison or a die comparison and relative position information of the reference image can be set. The apparatus also has a unit for setting a plurality of inspection threshold values every inspection area and inspects a plurality of inspection areas by the plurality of inspection threshold values.
摘要翻译：图案检查装置具有不同的单元比较间距的多个单元区域A和B的设置单元，并且根据设置单元的设置检查不同单元比较间距的多个单元区域。作为用于从图像存储器读出检查图像和参考图像的图像数据的信息，除了缺陷图像的位置信息之外，还可以显示小区比较或者模具比较的标识信息以及参考图像的相对位置信息被设置。该设备还具有用于在每个检查区域设置多个检查阈值的单元，并且通过多个检查阈值检查多个检查区域。

4. 发明授权

US08421010B2 Charged particle beam device for scanning a sample using a charged particle beam to inspect the sample 有权
标题翻译：带电粒子束装置，用于使用带电粒子束扫描样品以检查样品
公开(公告)号：US08421010B2
公开(公告)日：2013-04-16
申请号：US13061031
申请日：2009-08-28
申请人： Takashi Hiroi , Yasuhiro Gunji , Hiroshi Miyai , Masaaki Nojiri
发明人： Takashi Hiroi , Yasuhiro Gunji , Hiroshi Miyai , Masaaki Nojiri
IPC分类号： A61N5/00 , G21K5/04
CPC分类号： H01J37/28 , H01J37/20 , H01J37/265 , H01J2237/20285 , H01J2237/2817
摘要： There is provided a substrate inspection device which uses a charged particle beam and is capable of more quickly extracting a defect candidate than ever before. The configuration of the substrate inspection device is such that a substrate having a circuit pattern is irradiated with a primary charged particle beam, the substrate is moved at a constant speed or at an increasing or a decreasing speed, a position resulting from the movement is monitored, the position of irradiation with the primary charged particle beam is controlled according to the coordinates of the substrate, an image in a partial region on the substrate is captured at a speed lower than the velocity of the movement, a defect candidate is detected based on the captured image, and the detected defect candidate is displayed in a map format.
摘要翻译：提供了一种使用带电粒子束的衬底检查装置，并且能够比以前更快地提取缺陷候选物。基板检查装置的结构使得具有电路图案的基板被初级带电粒子束照射，基板以恒定速度或增加或降低的速度移动，监视由运动产生的位置，根据基板的坐标来控制与初级带电粒子束的照射位置，以低于移动速度的速度捕获基板上的部分区域中的图像，基于捕获的图像和检测到的缺陷候选以地图格式显示。

5. 发明申请

US20110163230A1 CHARGED PARTICLE BEAM DEVICE 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20110163230A1
公开(公告)日：2011-07-07
申请号：US13061031
申请日：2009-08-28
申请人： Takashi Hiroi , Yasuhiro Gunji , Hiroshi Miyai , Masaaki Nojiri
发明人： Takashi Hiroi , Yasuhiro Gunji , Hiroshi Miyai , Masaaki Nojiri
IPC分类号： G01N23/04
CPC分类号： H01J37/28 , H01J37/20 , H01J37/265 , H01J2237/20285 , H01J2237/2817
摘要： There is provided a substrate inspection device which uses a charged particle beam and is capable of more quickly extracting a defect candidate than ever before. The configuration of the substrate inspection device is such that a substrate having a circuit pattern is irradiated with a primary charged particle beam, the substrate is moved at a constant speed or at an increasing or a decreasing speed, a position resulting from the movement is monitored, the position of irradiation with the primary charged particle beam is controlled according to the coordinates of the substrate, an image in a partial region on the substrate is captured at a speed lower than the velocity of the movement, a defect candidate is detected based on the captured image, and the detected defect candidate is displayed in a map format.
摘要翻译：提供了一种使用带电粒子束的衬底检查装置，并且能够比以前更快地提取缺陷候选物。基板检查装置的结构使得具有电路图案的基板被初级带电粒子束照射，基板以恒定速度或增加或降低的速度移动，监视由运动产生的位置，根据基板的坐标来控制与初级带电粒子束的照射位置，以低于移动速度的速度捕获基板上的部分区域中的图像，基于捕获的图像和检测到的缺陷候选以地图格式显示。

6. 发明申请

US20090208091A1 INSPECTION APPARATUS FOR INSPECTING PATTERNS OF SUBSTRATE 失效
标题翻译：检查基板图案检查装置
公开(公告)号：US20090208091A1
公开(公告)日：2009-08-20
申请号：US12366217
申请日：2009-02-05
申请人： Koichi Hayakawa , Masaaki Nojiri
发明人： Koichi Hayakawa , Masaaki Nojiri
IPC分类号： G06K9/00 , G01N23/00
CPC分类号： G01N21/956 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A degradation in throughput is prevented even in cases where it is necessary to reduce a pixel size during inspection according to a finer circuit pattern. In an inspection method and an inspection apparatus in which an inspected sample having a circuit pattern is irradiated with a charged particle beam to generate a signal, an image is obtained from the signal, and in which a defect of the circuit pattern is detected from the image, the inspection is performed while an inspected pixel size in a direction in which the charged particle beam is scanned relative to the inspected sample and an inspected pixel size in a stage moving direction are separately set. The stage is moved while the inspected sample is placed thereon.
摘要翻译：即使在根据更细的电路图案需要在检查期间减小像素尺寸的情况下也能够防止吞吐量的劣化。在检查方法和检查装置中，利用带电粒子束照射具有电路图案的检查样本以产生信号，从信号中获得图像，并且从该信号中检测出电路图案的缺陷图像中，分别设置检测被检查的像素大小，其中相对于被检查样本扫描带电粒子束的方向和阶段移动方向上的检查像素尺寸。当检查样品放置在其上时，移动台。

7. 发明授权

US08134697B2 Inspection apparatus for inspecting patterns of substrate 失效
标题翻译：用于检查基板图案的检查装置
公开(公告)号：US08134697B2
公开(公告)日：2012-03-13
申请号：US12366217
申请日：2009-02-05
申请人： Koichi Hayakawa , Masaaki Nojiri
发明人： Koichi Hayakawa , Masaaki Nojiri
IPC分类号： G01B11/26 , G01C1/00
CPC分类号： G01N21/956 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A degradation in throughput is prevented even in cases where it is necessary to reduce a pixel size during inspection according to a finer circuit pattern. In an inspection method and an inspection apparatus in which an inspected sample having a circuit pattern is irradiated with a charged particle beam to generate a signal, an image is obtained from the signal, and in which a defect of the circuit pattern is detected from the image, the inspection is performed while an inspected pixel size in a direction in which the charged particle beam is scanned relative to the inspected sample and an inspected pixel size in a stage moving direction are separately set. The stage is moved while the inspected sample is placed thereon.
摘要翻译：即使在根据更细的电路图案需要在检查期间减小像素尺寸的情况下也能够防止吞吐量的劣化。在检查方法和检查装置中，利用带电粒子束照射具有电路图案的检查样本以产生信号，从信号中获得图像，并且从该信号中检测出电路图案的缺陷图像中，分别设置检测被检查的像素大小，其中相对于被检查样本扫描带电粒子束的方向和阶段移动方向上的检查像素尺寸。当检查样品放置在其上时，移动台。

8. 发明授权

US07696487B2 Circuit pattern inspection apparatus 失效
标题翻译：电路图形检查装置
公开(公告)号：US07696487B2
公开(公告)日：2010-04-13
申请号：US11594985
申请日：2006-11-09
申请人： Koichi Hayakawa , Jiro Inoue , Masaaki Nojiri
发明人： Koichi Hayakawa , Jiro Inoue , Masaaki Nojiri
IPC分类号： G01K1/08 , H01J3/14
CPC分类号： G01N23/2251
摘要： The via chain conduction failure due to non-conduction caused by insufficient etching in a contact plug/via plug forming process can be detected precisely in a short time. For its achievement, a defect is detected at high speed by taking advantage of characteristics of a potential contrast method using a via chain defect inspection structure and an electron beam defect detection apparatus which can perform continuous inspection while changing an inspection direction without rotating a wafer. Accordingly, the capturing efficiency of a critical electric defect and search efficiency of a defect point can be improved.
摘要翻译：可以在短时间内精确地检测由于在接触插塞/通孔插塞形成过程中不足蚀刻而导致的非导通的通路链导通故障。为了实现这一点，通过利用使用通孔链缺陷检查结构和电子束缺陷检测装置的电位对比方法的特性，可以高速检测缺陷，该电子束缺陷检测装置可以在不转动晶片的同时改变检查方向的同时进行连续检查。因此，可以提高关键电气缺陷的捕获效率和缺陷点的搜索效率。

9. 发明申请

US20070114397A1 Circuit pattern inspection apparatus 失效
标题翻译：电路图形检查装置
公开(公告)号：US20070114397A1
公开(公告)日：2007-05-24
申请号：US11594985
申请日：2006-11-09
申请人： Koichi Hayakawa , Jiro Inoue , Masaaki Nojiri
发明人： Koichi Hayakawa , Jiro Inoue , Masaaki Nojiri
IPC分类号： G01N23/00
CPC分类号： G01N23/2251
摘要： The via chain conduction failure due to non-conduction caused by insufficient etching in a contact plug/via plug forming process can be detected precisely in a short time. For its achievement, a defect is detected at high speed by taxing advantage of characteristics of a potential contrast method using a via chain defect inspection structure and an electron beam defect detection apparatus which can perform continuous inspection while changing an inspection direction without rotating a wafer. Accordingly, the capturing efficiency of a critical electric defect and search efficiency of a defect point can be improved.
摘要翻译：可以在短时间内精确地检测由于在接触插塞/通孔插塞形成过程中不足蚀刻而导致的非导通的通路链导通故障。为了实现，通过使用通孔链缺陷检查结构和电子束缺陷检测装置，通过利用可以在不转动晶片的同时改变检查方向的同时进行连续检查的潜在对比度方法的特征的优点来高速检测缺陷。因此，可以提高关键电气缺陷的捕获效率和缺陷点的搜索效率。

10. 发明授权

US07532328B2 Circuit-pattern inspection apparatus 失效
标题翻译：电路图形检查装置
公开(公告)号：US07532328B2
公开(公告)日：2009-05-12
申请号：US11907562
申请日：2007-10-15
申请人： Yasuhiko Nara , Masaaki Nojiri , Kouichi Hayakawa , Takashi Hiroi
发明人： Yasuhiko Nara , Masaaki Nojiri , Kouichi Hayakawa , Takashi Hiroi
IPC分类号： G01B11/00
CPC分类号： G06T7/001 , G01N2021/95615 , G06T2207/30148
摘要： The disclosed subject matter is related to a circuit pattern inspection apparatus for detecting a gradual changing of defect expanding over a large area of the semiconductor wafer. In order to detect a gradual changing of a defect related condition expanding over a large area of the semiconductor wafer, comparison is made between dies on a wafer that are separated from each other by a distance of at least one die width. For example, when a value according to a difference between such dies exceeds a pre-determined value, an existence of the gradual changing can be confirmed.
摘要翻译：所公开的主题涉及用于检测在半导体晶片的大面积上扩展的缺陷的逐渐变化的电路图案检查装置。为了检测在半导体晶片的大面积上扩展的缺陷相关状态的逐渐变化，在晶片上相互间隔至少一个管芯宽度的距离的晶片之间进行比较。例如，当根据这种模具之间的差异的值超过预定值时，可以确认逐渐变化的存在。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式