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1. 发明授权

US07927497B2 Integrated thin-film solar cells and method of manufacturing thereof and processing method of transparent electrode for integrated thin-film solar cells and structure thereof, and transparent substrate having processed transparent electrode 有权
标题翻译：集成薄膜太阳能电池及其制造方法以及用于集成薄膜太阳能电池的透明电极的处理方法及其结构，以及具有加工透明电极的透明基板
公开(公告)号：US07927497B2
公开(公告)日：2011-04-19
申请号：US11908826
申请日：2006-03-16
申请人： Koeng Su Lim , Seong Won Kwon , Jeong Hwan Kwak , Sang Il Park , Jun-Bo Yoon , Gun-Woo Moon
发明人： Koeng Su Lim , Seong Won Kwon , Jeong Hwan Kwak , Sang Il Park , Jun-Bo Yoon , Gun-Woo Moon
IPC分类号： H01L31/04 , H01L31/18
CPC分类号： H01L31/1884 , H01L31/022466 , H01L31/046 , H01L31/0463 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： The present invention relates to integrated thin film solar cells, and more particularly, to integrated thin film solar cells, which minimize the loss of integrated solar cells caused at the time of a manufacturing process and become available at a low cost process, and a method of manufacturing thereof, a processing method of a transparent electrode for integrated thin film solar cells, which widens an effective area and reduces manufacturing costs by minimizing a (insulating) gap between unit cells of the integrated thin film solar cells, and a structure thereof, and a transparent substrate having the transparent electrode. The method of manufacturing integrated thin film solar cells, comprising the steps of: (a) forming a transparent electrode pattern separately over a transparent substrate; (b) forming a solar cell (semiconductor) layer over the substrate of the step (a); (c) forming a first back electrode by obliquely depositing a conductive material over the solar cell (semiconductor) layer; (d) etching the solar cell (semiconductor) layer by using the first back electrode as a mask; and (e) forming a second back electrode so that the transparent electrode and the first back electrode are electrically connected by obliquely depositing a metal over the substrate of the step (d).
摘要翻译：本发明涉及集成薄膜太阳能电池，更具体地说，涉及一体化薄膜太阳能电池，其使得在制造过程中引起的集成太阳能电池的损耗最小化并且以低成本的方法可用，以及一种方法制造该集成薄膜太阳能电池的透明电极的处理方法及其结构，其通过使集成薄膜太阳能电池的单元电池之间的（绝缘）间隙最小化来扩大有效面积并降低制造成本，以及具有透明电极的透明基板。一种制造集成薄膜太阳能电池的方法，包括以下步骤：（a）在透明基板上分开形成透明电极图案; （b）在步骤（a）的衬底上形成太阳能电池（半导体）层; （c）通过在太阳能电池（半导体）层上倾斜地沉积导电材料来形成第一背电极; （d）通过使用第一背面电极作为掩模蚀刻太阳能电池（半导体）层; 和（e）形成第二背电极，使得透明电极和第一背电极通过在步骤（d）的衬底上倾斜沉积金属而电连接。

2. 发明申请

US20090167963A1 PROJECTION DISPLAY APPARATUS USING MICROLENS ARRAY AND MICROMIRROR ARRAY 审中-公开
标题翻译：投影显示设备使用微阵列和微镜阵列
公开(公告)号：US20090167963A1
公开(公告)日：2009-07-02
申请号：US11994816
申请日：2006-06-26
申请人： O-Deuk Kwon , Koeng Su Lim , Joon-Yong Choi , Dae-Hyun Kim , Jun-Bo Yoon , Jin-Wan Jeon
发明人： O-Deuk Kwon , Koeng Su Lim , Joon-Yong Choi , Dae-Hyun Kim , Jun-Bo Yoon , Jin-Wan Jeon
IPC分类号： H04N9/31
CPC分类号： H04N5/7458
摘要： A projection display apparatus using a microlens array and a micromirror array comprises a substrate, multiple micromirror arrays and multiple microlens arrays. The substrate is disposed apart with a predetermined distance from a light source. The multiple micromirror arrays are disposed over the substrate to be assembled together to have a predetermined incidence angle with respect to the incident rays. The multiple microlens arrays are configured to correspond to the micromirror arrays. More specifically, a first microlens array is disposed in a predetermined region between the light source and the substrate and comprises multiple microlenses. A second microlens array is disposed in a light path of reflection rays reflected from the micromirrors.
摘要翻译：使用微透镜阵列和微镜阵列的投影显示装置包括基板，多个微镜阵列和多个微透镜阵列。基板与光源隔开预定的距离。多个微镜阵列设置在基板上以组装在一起以具有相对于入射光线的预定入射角。多个微透镜阵列被配置为对应于微镜阵列。更具体地，第一微透镜阵列设置在光源和衬底之间的预定区域中，并且包括多个微透镜。第二微透镜阵列设置在从微反射镜反射的反射光线的光路中。

3. 发明授权

US08278028B2 Material pattern, and mold, metal thin-film pattern, metal pattern using thereof, and methods of forming the same 有权
标题翻译：材料图案和模具，金属薄膜图案，使用其的金属图案及其形成方法
公开(公告)号：US08278028B2
公开(公告)日：2012-10-02
申请号：US12098180
申请日：2008-04-04
申请人： Jin-Wan Jeon , Jun-Bo Yoon , Koeng Su Lim
发明人： Jin-Wan Jeon , Jun-Bo Yoon , Koeng Su Lim
IPC分类号： G03F7/20
CPC分类号： C09K19/544 , Y10T428/24802
摘要： The present invention relates to a material pattern, and mold using thereof, metal thin-film pattern, metal pattern, and method of forming the sames. A method of forming the material pattern according to the present invention comprises the steps of; (a) forming a photo-sensitive material film by coating a photo-sensitive material on a substrate; (b) deciding an exposure section on the photo-sensitive material film; (c) disposing a light refraction film and a light diffusion film at a route of light exposed on the photo-sensitive material film; and (d) forming a pattern on the photo-sensitive material film, by projecting a light on the exposure section of the photo-sensitive material film, wherein the light transmits the light refraction film and the light diffusion film.A method of forming the material pattern according to the present invention can form the material pattern of three-dimensional asymmetric structure having various inclinations and shapes and can form simply mold, metal thin-film and metal pattern using thereof.
摘要翻译：本发明涉及一种材料图案及其使用的模具，金属薄膜图案，金属图案以及形成游丝的方法。根据本发明的形成材料图案的方法包括以下步骤：（a）通过在基板上涂布感光材料来形成感光材料膜; （b）决定感光材料薄膜的曝光部分; （c）在曝光在感光材料膜上的光线路上设置光折射膜和光漫射膜; 以及（d）通过将光投射到感光材料膜的曝光部分上，在光敏材料膜上形成图案，其中光透射光折射膜和光漫射膜。根据本发明的形成材料图案的方法可以形成具有各种倾斜和形状的三维不对称结构的材料图案，并且可以使用它们简单地形成模具，金属薄膜和金属图案。

4. 发明申请

US20080248264A1 MATERIAL PATTERN, AND MOLD, METAL THIN-FILM PATTERN, METAL PATTERN USING THEREOF, AND METHODS OF FORMING THE SAME 有权
标题翻译：材料图案和模具，金属薄膜图案，使用其的金属图案及其形成方法
公开(公告)号：US20080248264A1
公开(公告)日：2008-10-09
申请号：US12098180
申请日：2008-04-04
申请人： Jin-Wan Jeon , Jun-Bo Yoon , Koeng Su Lim
发明人： Jin-Wan Jeon , Jun-Bo Yoon , Koeng Su Lim
IPC分类号： G03F7/00 , C09K19/00 , B32B5/00
CPC分类号： C09K19/544 , Y10T428/24802
摘要： The present invention relates to a material pattern, and mold using thereof, metal thin-film pattern, metal pattern, and method of forming the sames. A method of forming the material pattern according to the present invention comprises the steps of; (a) forming a photo-sensitive material film by coating a photo-sensitive material on a substrate; (b) deciding an exposure section on the photo-sensitive material film; (c) disposing a light refraction film and a light diffusion film at a route of light exposed on the photo-sensitive material film; and (d) forming a pattern on the photo-sensitive material film, by projecting a light on the exposure section of the photo-sensitive material film, wherein the light transmits the light refraction film and the light diffusion film.A method of forming the material pattern according to the present invention can form the material pattern of three-dimensional asymmetric structure having various inclinations and shapes and can form simply mold, metal thin-film and metal pattern using thereof.
摘要翻译：本发明涉及一种材料图案及其使用的模具，金属薄膜图案，金属图案以及形成游丝的方法。根据本发明的形成材料图案的方法包括以下步骤：（a）通过在基板上涂布感光材料来形成感光材料膜; （b）决定感光材料薄膜的曝光部分; （c）在曝光在感光材料膜上的光线路上设置光折射膜和光漫射膜; 以及（d）通过将光投射到感光材料膜的曝光部分上，在光敏材料膜上形成图案，其中光透射光折射膜和光漫射膜。根据本发明的形成材料图案的方法可以形成具有各种倾斜和形状的三维不对称结构的材料图案，并且可以使用它们形成简单的模具，金属薄膜和金属图案。

5. 发明授权

US07989154B2 Polymer or resist pattern, and metal film pattern, metal pattern and plastic mold using the same, and fabrication methods thereof 有权
标题翻译：聚合物或抗蚀剂图案，金属膜图案，金属图案和使用其的塑料模具及其制造方法
公开(公告)号：US07989154B2
公开(公告)日：2011-08-02
申请号：US11911897
申请日：2006-11-06
申请人： Jin-Wan Jeon , Jun-Bo Yoon , Koeng Su Lim
发明人： Jin-Wan Jeon , Jun-Bo Yoon , Koeng Su Lim
IPC分类号： G03F7/26
CPC分类号： G03F7/201 , G03F7/70291 , G03F7/70308 , G03F7/7035 , G03F7/70383 , Y10T428/24802
摘要： A method of fabricating a polymer or resist pattern over a substrate includes coating a photosensitive polymer or resist over the substrate to form a polymer or resist layer, determining a portion of the polymer or resist layer to be exposed to light, placing a light adjusting layer in an optical path of light shone on the polymer or resist layer, and adjusting the light adjusting layer to adjust a direction or intensity of the light shone on the polymer or resist layer. Based on the method, it is easy to fabricate a polymer or resist pattern, a metal film pattern, metal pattern structure, and a polymer mold, each having three-dimensional structures with various slopes or shapes by adjusting a direction or intensity of incident light when performing a lithography process.
摘要翻译：在衬底上制造聚合物或抗蚀剂图案的方法包括在衬底上涂覆光敏聚合物或抗蚀剂以形成聚合物或抗蚀剂层，确定要暴露于光的聚合物或抗蚀剂层的一部分，将光调节层在光聚合物或抗蚀剂层上照射的光路中，并且调整光调节层以调节聚合物或抗蚀剂层上的光照的方向或强度。基于该方法，通过调节入射光的方向或强度，容易制造聚合物或抗蚀剂图案，金属膜图案，金属图案结构和聚合物模具，每个具有各种斜率或形状的三维结构当进行光刻工艺时。

6. 发明申请

US20080182081A1 Polymer or Resist Pattern, and Metal Film Pattern, Metal Pattern and Plastic Mold Using the Same, and Fabrication Methods Thereof 有权
标题翻译：聚合物或抗蚀剂图案，金属膜图案，金属图案和使用其的塑料模具及其制造方法
公开(公告)号：US20080182081A1
公开(公告)日：2008-07-31
申请号：US11911897
申请日：2006-11-06
申请人： Jin-Wan Jeon , Jun-Bo Yoon , Koeng Su Lim
发明人： Jin-Wan Jeon , Jun-Bo Yoon , Koeng Su Lim
IPC分类号： G03F7/30 , G03F7/40 , B32B3/00
CPC分类号： G03F7/201 , G03F7/70291 , G03F7/70308 , G03F7/7035 , G03F7/70383 , Y10T428/24802
摘要： A method of fabricating a polymer or resist pattern over a substrate includes coating a photosensitive polymer or resist over the substrate to form a polymer or resist layer, determining a portion of the polymer or resist layer to be exposed to light, placing a light adjusting layer in an optical path of light shone on the polymer or resist layer, and adjusting the light adjusting layer to adjust a direction or intensity of the light shone on the polymer or resist layer. Based on the method, it is easy to fabricate a polymer or resist pattern, a metal film pattern, metal pattern structure, and a polymer mold, each having three-dimensional structures with various slopes or shapes by adjusting a direction or intensity of incident light when performing a lithography process.
摘要翻译：在衬底上制造聚合物或抗蚀剂图案的方法包括在衬底上涂覆光敏聚合物或抗蚀剂以形成聚合物或抗蚀剂层，确定要暴露于光的聚合物或抗蚀剂层的一部分，将光调节层在光聚合物或抗蚀剂层上照射的光路中，并且调整光调节层以调节聚合物或抗蚀剂层上的光照的方向或强度。基于该方法，通过调节入射光的方向或强度，容易制造聚合物或抗蚀剂图案，金属膜图案，金属图案结构和聚合物模具，每个具有各种斜率或形状的三维结构当进行光刻工艺时。

7. 发明授权

US07081872B2 Micromirror device using interdigitated cantilevers and applications thereof 失效
公开(公告)号：US07081872B2
公开(公告)日：2006-07-25
申请号：US10105281
申请日：2002-03-26
申请人： Koeng Su Lim , Jun-Bo Yoon , Jin-Wan Jeon
发明人： Koeng Su Lim , Jun-Bo Yoon , Jin-Wan Jeon
IPC分类号： G09G3/34 , G02B26/00
CPC分类号： G02B26/0841 , B81B3/0051 , B81B2201/042 , B81B2203/058 , Y10S359/904
摘要： Disclosed are a micromirror device made in a simple structure using interdigitated cantilevers and having two stable rotational states, and applications thereof. The micromirror device comprises: (a) a substrate; (b) at least two protruded support posts arranged protrudedly in two columns of left and right sides on the substrate and apart by a predetermined interval from each other; (c) multiple cantilevers formed in parallel with the substrate, each having one end attached at the upper end portion of the respective protruded support posts and made in a thin strip having an elastic restoring force, wherein the cantilevers adjacent to each other are arranged to be parallel and interdigitated; (d) mirror support posts coupled to upper portions of the other ends of the cantilevers; (e) a mirror attached on upper portions of the whole mirror support posts and supported by the mirror support posts; and (f) two electrodes formed at left and right sides on the substrate, for providing an electrostatic force to the mirror, wherein the micromirror device reflects light incident into the mirror in different directions from each other by using an electrostatic force due to a voltage applied between the electrodes and the mirror, and the elastic restoring force of the cantilevers. The micromirror device can drive the mirror in two directions and adjust a rotational angle of the mirror using the electrostatic force due to a potential difference between the electrodes and the mirror for reflecting incident light, and the elastic restoring force of the cantilevers.

8. 发明申请

US20130188392A1 LIGHT GUIDE PLATE AND BACKLIGHT UNIT 有权
标题翻译：光导板和背光单元
公开(公告)号：US20130188392A1
公开(公告)日：2013-07-25
申请号：US13512750
申请日：2010-11-30
申请人： Jun-Bo Yoon , Joo-Hyung Lee , Jeong-Ho Yeon
发明人： Jun-Bo Yoon , Joo-Hyung Lee , Jeong-Ho Yeon
IPC分类号： F21V8/00
CPC分类号： G02B6/0011 , G02B6/0036 , G02B6/0038
摘要： Disclosed are a light guide plate and a backlight unit. The backlight unit according to the present invention includes: a light guide plate; a light source disposed on one side of the light guide plate; and a reflective plate disposed under the light guide plate, wherein, in the cross section of one side of the light guide plate, the light guide plate includes a plurality of unit slits including a first slit and a second slit, wherein the first slit and the second slit are inclined from a top surface toward the inside of the light guide plate with respect to a vertical direction of the top surface, and wherein the first slit and the second slit are symmetrical to each other with respect to the middle portion of the unit slit.
摘要翻译：公开了导光板和背光单元。根据本发明的背光单元包括：导光板; 设置在所述导光板一侧的光源; 以及反射板，其设置在所述导光板的下方，其中，在所述导光板的一侧的截面中，所述导光板包括包括第一狭缝和第二狭缝的多个单位狭缝，其中，所述第一狭缝和第二狭缝相对于顶表面的垂直方向从导光板的顶表面向内侧倾斜，并且其中第一狭缝和第二狭缝相对于第二狭缝的中间部分彼此对称单位狭缝

9. 发明授权

US08422115B2 Display device 有权
标题翻译：显示设备
公开(公告)号：US08422115B2
公开(公告)日：2013-04-16
申请号：US12197433
申请日：2008-08-25
申请人： Jae-Hyuk Chang , Seong-Sik Shin , Nam-Seok Roh , Kyung-Ho Lee , Jun-Bo Yoon
发明人： Jae-Hyuk Chang , Seong-Sik Shin , Nam-Seok Roh , Kyung-Ho Lee , Jun-Bo Yoon
IPC分类号： G02B26/00
CPC分类号： G09G3/3433 , G02B26/02 , G09G3/2011 , G09G3/2074 , G09G3/2077
摘要： A display device is provided. The display device includes: a substrate including a unit display area, a fixing member that is formed on the substrate and that is electrically isolated, an insulating layer that is formed on the fixing member, a fixing electrode that is formed on the insulating layer and that is electrically connected to a power source, and a plurality of moving members with one end fixed to the insulating layer and positioned apart by a distance from the fixing electrode. The plurality of moving members and the fixing electrode are positioned within the unit display area.
摘要翻译：提供显示装置。显示装置包括：基板，包括单元显示区域，形成在基板上并且被电隔离的固定部件，形成在固定部件上的绝缘层，形成在绝缘层上的固定电极和电连接到电源，以及多个移动构件，其一端固定到绝缘层并且与固定电极分开一定距离。多个移动构件和固定电极位于单元显示区域内。

10. 发明申请

US20090243063A1 PACKAGING METHOD OF MICRO ELECTRO MECHANICAL SYSTEM DEVICE AND PACKAGE THEREOF 审中-公开
标题翻译：微电子机械系统装置的包装方法及其包装
公开(公告)号：US20090243063A1
公开(公告)日：2009-10-01
申请号：US12404743
申请日：2009-03-16
申请人： Jun-Bo Yoon , Byung-Kee Lee , Weon-Wi Jang
发明人： Jun-Bo Yoon , Byung-Kee Lee , Weon-Wi Jang
IPC分类号： H01L23/02 , H01L21/50
CPC分类号： B81C1/00333 , B81C2201/0149 , B81C2203/0136 , B81C2203/0145 , B82Y30/00
摘要： Disclosed are a micro electro mechanical system (MEMS) device and a package thereof. The packaging method of a MEMS device comprises: sequentially forming a sacrificial layer, a support layer, and a block copolymer layer on a substrate on which the MEMS device is formed; self-assembling the block copolymer layer formed on the support layer; selectively etching a part of the self-assembled block copolymer layer to form a plurality of nano-pores; forming a plurality of etching holes in the support layer corresponding to the plurality of nano-pores using the block copolymer layer in which the plurality of nano-pores are formed as a mask; removing the sacrificial layer using the etching holes formed in the support layer; and forming a shielding layer on the support layer.
摘要翻译：公开了一种微机电系统（MEMS）装置及其封装。 MEMS器件的封装方法包括：在其上形成MEMS器件的衬底上顺序形成牺牲层，支撑层和嵌段共聚物层; 自组装形成在支撑层上的嵌段共聚物层; 选择性地蚀刻部分自组装嵌段共聚物层以形成多个纳米孔; 使用其中形成有多个纳米孔作为掩模的嵌段共聚物层，在与多个纳米孔相对应的支撑层中形成多个蚀刻孔; 使用形成在支撑层中的蚀刻孔去除牺牲层; 并在支撑层上形成屏蔽层。

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