专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08802969B2 Photovoltaic device and method for manufacturing thereof 有权
标题翻译：光伏器件及其制造方法
公开(公告)号：US08802969B2
公开(公告)日：2014-08-12
申请号：US12851823
申请日：2010-08-06
申请人： Koeng Su Lim , Jin-Wan Jeon
发明人： Koeng Su Lim , Jin-Wan Jeon
IPC分类号： H01L31/00 , H01L27/142
CPC分类号： H01L31/03923 , H01L31/022425 , H01L31/0392 , H01L31/03925 , H01L31/0463 , H01L31/0465 , H01L31/076 , Y02E10/541 , Y02E10/548 , Y02P70/521
摘要： Disclosed is a method for manufacturing a photovoltaic device. The method for manufacturing a photovoltaic device includes providing substrates having trenches formed therein, forming a first electrode layer, and forming an auxiliary electrode layer in areas between the trenches such that the auxiliary electrode layer is located on or under the first electrode layer, the auxiliary electrode layer having electrical resistance less than that of the first electrode layer, and contacting with a portion of an area of the first electrode layer, forming a photovoltaic layer on the first electrode layer or the auxiliary electrode layer, forming a second electrode layer by obliquely depositing a second conductive material on the photovoltaic layer, etching the photovoltaic layer formed in the trenches such that the first electrode layer or the auxiliary electrode layer are exposed and forming a conductive layer by obliquely depositing a third conductive material on the second electrode layer such that the second electrode layer and either the first electrode layer or the auxiliary electrode layer are electrically connected to each other within the trench, the first electrode layer or the auxiliary electrode layer formed in one area generating electricity from light, and the second electrode layer formed in another area generating electricity from light.
摘要翻译：公开了一种用于制造光伏器件的方法。制造光伏器件的方法包括提供其中形成有沟槽的衬底，形成第一电极层，以及在沟槽之间的区域中形成辅助电极层，使得辅助电极层位于第一电极层上或下面，辅助电极层电极层，其电阻小于第一电极层的电阻，并与第一电极层的一部分区域接触，在第一电极层或辅助电极层上形成光电转换层，通过倾斜形成第二电极层在所述光伏层上沉积第二导电材料，蚀刻形成在所述沟槽中的所述光电层，使得所述第一电极层或所述辅助电极层被暴露并通过在所述第二电极层上倾斜地沉积第三导电材料形成导电层，使得第二电极层和第一电极层所述第一电极层或所述辅助电极层在所述沟槽中彼此电连接，所述第一电极层或辅助电极层形成在从光产生电的一个区域中，所述第二电极层形成在从光产生电力的另一区域中。

2. 发明授权

US07989154B2 Polymer or resist pattern, and metal film pattern, metal pattern and plastic mold using the same, and fabrication methods thereof 有权
标题翻译：聚合物或抗蚀剂图案，金属膜图案，金属图案和使用其的塑料模具及其制造方法
公开(公告)号：US07989154B2
公开(公告)日：2011-08-02
申请号：US11911897
申请日：2006-11-06
申请人： Jin-Wan Jeon , Jun-Bo Yoon , Koeng Su Lim
发明人： Jin-Wan Jeon , Jun-Bo Yoon , Koeng Su Lim
IPC分类号： G03F7/26
CPC分类号： G03F7/201 , G03F7/70291 , G03F7/70308 , G03F7/7035 , G03F7/70383 , Y10T428/24802
摘要： A method of fabricating a polymer or resist pattern over a substrate includes coating a photosensitive polymer or resist over the substrate to form a polymer or resist layer, determining a portion of the polymer or resist layer to be exposed to light, placing a light adjusting layer in an optical path of light shone on the polymer or resist layer, and adjusting the light adjusting layer to adjust a direction or intensity of the light shone on the polymer or resist layer. Based on the method, it is easy to fabricate a polymer or resist pattern, a metal film pattern, metal pattern structure, and a polymer mold, each having three-dimensional structures with various slopes or shapes by adjusting a direction or intensity of incident light when performing a lithography process.
摘要翻译：在衬底上制造聚合物或抗蚀剂图案的方法包括在衬底上涂覆光敏聚合物或抗蚀剂以形成聚合物或抗蚀剂层，确定要暴露于光的聚合物或抗蚀剂层的一部分，将光调节层在光聚合物或抗蚀剂层上照射的光路中，并且调整光调节层以调节聚合物或抗蚀剂层上的光照的方向或强度。基于该方法，通过调节入射光的方向或强度，容易制造聚合物或抗蚀剂图案，金属膜图案，金属图案结构和聚合物模具，每个具有各种斜率或形状的三维结构当进行光刻工艺时。

3. 发明申请

US20110030777A1 PHOTOVOLTAIC DEVICE AND METHOD FOR MANUFACTURING THEREOF 有权
标题翻译：光伏器件及其制造方法
公开(公告)号：US20110030777A1
公开(公告)日：2011-02-10
申请号：US12851823
申请日：2010-08-06
申请人： Koeng Su Lim , Jin-Wan Jeon
发明人： Koeng Su Lim , Jin-Wan Jeon
IPC分类号： H01L31/0224 , H01L31/18
CPC分类号： H01L31/03923 , H01L31/022425 , H01L31/0392 , H01L31/03925 , H01L31/0463 , H01L31/0465 , H01L31/076 , Y02E10/541 , Y02E10/548 , Y02P70/521
摘要： Disclosed is a method for manufacturing a photovoltaic device. The method for manufacturing a photovoltaic device includes providing substrates having trenches formed therein, forming a first electrode layer, and forming an auxiliary electrode layer in areas between the trenches such that the auxiliary electrode layer is located on or under the first electrode layer, the auxiliary electrode layer having electrical resistance less than that of the first electrode layer, and contacting with a portion of an area of the first electrode layer, forming a photovoltaic layer on the first electrode layer or the auxiliary electrode layer, forming a second electrode layer by obliquely depositing a second conductive material on the photovoltaic layer, etching the photovoltaic layer formed in the trenches such that the first electrode layer or the auxiliary electrode layer are exposed and forming a conductive layer by obliquely depositing a third conductive material on the second electrode layer such that the second electrode layer and either the first electrode layer or the auxiliary electrode layer are electrically connected to each other within the trench, the first electrode layer or the auxiliary electrode layer formed in one area generating electricity from light, and the second electrode layer formed in another area generating electricity from light.
摘要翻译：公开了一种用于制造光伏器件的方法。制造光伏器件的方法包括提供其中形成有沟槽的衬底，形成第一电极层，并且在沟槽之间的区域中形成辅助电极层，使得辅助电极层位于第一电极层上或下面，辅助电极层电极层，其电阻小于第一电极层的电阻，并与第一电极层的一部分区域接触，在第一电极层或辅助电极层上形成光电转换层，通过倾斜形成第二电极层在所述光伏层上沉积第二导电材料，蚀刻形成在所述沟槽中的所述光电层，使得所述第一电极层或所述辅助电极层被暴露并通过在所述第二电极层上倾斜地沉积第三导电材料形成导电层，使得第二电极层和第一电极层所述第一电极层或所述辅助电极层在所述沟槽中彼此电连接，所述第一电极层或辅助电极层形成在从光产生电的一个区域中，所述第二电极层形成在从光产生电力的另一区域中。

4. 发明申请

US20090097099A1 MICRO MIRROR AND MICRO MIRROR ARRAY USING THE SAME 有权
标题翻译： MICRO镜子和使用它的微镜阵列
公开(公告)号：US20090097099A1
公开(公告)日：2009-04-16
申请号：US12251912
申请日：2008-10-15
申请人： Jun-Bo Yoon , Dae-Hyun Kim , Min-Woo Kim , Jin-Wan Jeon
发明人： Jun-Bo Yoon , Dae-Hyun Kim , Min-Woo Kim , Jin-Wan Jeon
IPC分类号： G02B26/00
CPC分类号： G02B26/0841
摘要： Disclosed are a micro mirror and a micro mirror array using the same. The micro mirror includes: an insulation substrate; an address electrode formed on the insulation substrate; a charging unit electrically insulated from the address electrode; and a reflecting body rotatably provided on the insulation to reflect incident light and spaced apart from the address electrode and the charging unit
摘要翻译：公开了使用其的微反射镜和微镜阵列。微镜包括：绝缘基板; 形成在所述绝缘基板上的寻址电极; 与寻址电极电绝缘的充电单元; 以及可旋转地设置在所述绝缘体上以反射入射光并与所述寻址电极和所述充电单元间隔开的反射体

5. 发明授权

US08278028B2 Material pattern, and mold, metal thin-film pattern, metal pattern using thereof, and methods of forming the same 有权
标题翻译：材料图案和模具，金属薄膜图案，使用其的金属图案及其形成方法
公开(公告)号：US08278028B2
公开(公告)日：2012-10-02
申请号：US12098180
申请日：2008-04-04
申请人： Jin-Wan Jeon , Jun-Bo Yoon , Koeng Su Lim
发明人： Jin-Wan Jeon , Jun-Bo Yoon , Koeng Su Lim
IPC分类号： G03F7/20
CPC分类号： C09K19/544 , Y10T428/24802
摘要： The present invention relates to a material pattern, and mold using thereof, metal thin-film pattern, metal pattern, and method of forming the sames. A method of forming the material pattern according to the present invention comprises the steps of; (a) forming a photo-sensitive material film by coating a photo-sensitive material on a substrate; (b) deciding an exposure section on the photo-sensitive material film; (c) disposing a light refraction film and a light diffusion film at a route of light exposed on the photo-sensitive material film; and (d) forming a pattern on the photo-sensitive material film, by projecting a light on the exposure section of the photo-sensitive material film, wherein the light transmits the light refraction film and the light diffusion film.A method of forming the material pattern according to the present invention can form the material pattern of three-dimensional asymmetric structure having various inclinations and shapes and can form simply mold, metal thin-film and metal pattern using thereof.
摘要翻译：本发明涉及一种材料图案及其使用的模具，金属薄膜图案，金属图案以及形成游丝的方法。根据本发明的形成材料图案的方法包括以下步骤：（a）通过在基板上涂布感光材料来形成感光材料膜; （b）决定感光材料薄膜的曝光部分; （c）在曝光在感光材料膜上的光线路上设置光折射膜和光漫射膜; 以及（d）通过将光投射到感光材料膜的曝光部分上，在光敏材料膜上形成图案，其中光透射光折射膜和光漫射膜。根据本发明的形成材料图案的方法可以形成具有各种倾斜和形状的三维不对称结构的材料图案，并且可以使用它们简单地形成模具，金属薄膜和金属图案。

6. 发明申请

US20080248264A1 MATERIAL PATTERN, AND MOLD, METAL THIN-FILM PATTERN, METAL PATTERN USING THEREOF, AND METHODS OF FORMING THE SAME 有权
标题翻译：材料图案和模具，金属薄膜图案，使用其的金属图案及其形成方法
公开(公告)号：US20080248264A1
公开(公告)日：2008-10-09
申请号：US12098180
申请日：2008-04-04
申请人： Jin-Wan Jeon , Jun-Bo Yoon , Koeng Su Lim
发明人： Jin-Wan Jeon , Jun-Bo Yoon , Koeng Su Lim
IPC分类号： G03F7/00 , C09K19/00 , B32B5/00
CPC分类号： C09K19/544 , Y10T428/24802
摘要： The present invention relates to a material pattern, and mold using thereof, metal thin-film pattern, metal pattern, and method of forming the sames. A method of forming the material pattern according to the present invention comprises the steps of; (a) forming a photo-sensitive material film by coating a photo-sensitive material on a substrate; (b) deciding an exposure section on the photo-sensitive material film; (c) disposing a light refraction film and a light diffusion film at a route of light exposed on the photo-sensitive material film; and (d) forming a pattern on the photo-sensitive material film, by projecting a light on the exposure section of the photo-sensitive material film, wherein the light transmits the light refraction film and the light diffusion film.A method of forming the material pattern according to the present invention can form the material pattern of three-dimensional asymmetric structure having various inclinations and shapes and can form simply mold, metal thin-film and metal pattern using thereof.
摘要翻译：本发明涉及一种材料图案及其使用的模具，金属薄膜图案，金属图案以及形成游丝的方法。根据本发明的形成材料图案的方法包括以下步骤：（a）通过在基板上涂布感光材料来形成感光材料膜; （b）决定感光材料薄膜的曝光部分; （c）在曝光在感光材料膜上的光线路上设置光折射膜和光漫射膜; 以及（d）通过将光投射到感光材料膜的曝光部分上，在光敏材料膜上形成图案，其中光透射光折射膜和光漫射膜。根据本发明的形成材料图案的方法可以形成具有各种倾斜和形状的三维不对称结构的材料图案，并且可以使用它们形成简单的模具，金属薄膜和金属图案。

7. 发明申请

US20070199823A1 Method of manufacturing mirror support post of micromirror device using electro-plating process 审中-公开
标题翻译：使用电镀工艺制造微镜器件的镜支撑柱的方法
公开(公告)号：US20070199823A1
公开(公告)日：2007-08-30
申请号：US11363846
申请日：2006-02-28
申请人： Jin-Wan Jeon , Dae-Hyun Kim , Jun-Bo Yoon , Koeng Lim
发明人： Jin-Wan Jeon , Dae-Hyun Kim , Jun-Bo Yoon , Koeng Lim
IPC分类号： C25D1/10
CPC分类号： C25D5/022 , C25D5/48 , C25D7/08
摘要： An embodiment of the present invention relates to a digital micromirror device. More particularly, an embodiment of the present invention relates to a method of manufacturing a digital micromirror device having a perfectly flat mirror surface, wherein a hole of a mirror surface from which light is reflected is obviated by forming a mirror support post portion using an electro-plating process, unlike the related art digital micromirror device in which the hole is formed at the center of the mirror surface, thereby degrading the reflection efficiency of light.
摘要翻译：本发明的实施例涉及一种数字微镜装置。更具体地说，本发明的一个实施例涉及一种制造具有完全平坦的镜面的数字微镜器件的方法，其中通过使用电子反射镜形成反射镜支撑柱部分来消除反射光的反射镜表面的孔与现有技术的数字微镜装置不同，其中孔形成在镜面的中心，从而降低了光的反射效率。

8. 发明申请

US20090167963A1 PROJECTION DISPLAY APPARATUS USING MICROLENS ARRAY AND MICROMIRROR ARRAY 审中-公开
标题翻译：投影显示设备使用微阵列和微镜阵列
公开(公告)号：US20090167963A1
公开(公告)日：2009-07-02
申请号：US11994816
申请日：2006-06-26
申请人： O-Deuk Kwon , Koeng Su Lim , Joon-Yong Choi , Dae-Hyun Kim , Jun-Bo Yoon , Jin-Wan Jeon
发明人： O-Deuk Kwon , Koeng Su Lim , Joon-Yong Choi , Dae-Hyun Kim , Jun-Bo Yoon , Jin-Wan Jeon
IPC分类号： H04N9/31
CPC分类号： H04N5/7458
摘要： A projection display apparatus using a microlens array and a micromirror array comprises a substrate, multiple micromirror arrays and multiple microlens arrays. The substrate is disposed apart with a predetermined distance from a light source. The multiple micromirror arrays are disposed over the substrate to be assembled together to have a predetermined incidence angle with respect to the incident rays. The multiple microlens arrays are configured to correspond to the micromirror arrays. More specifically, a first microlens array is disposed in a predetermined region between the light source and the substrate and comprises multiple microlenses. A second microlens array is disposed in a light path of reflection rays reflected from the micromirrors.
摘要翻译：使用微透镜阵列和微镜阵列的投影显示装置包括基板，多个微镜阵列和多个微透镜阵列。基板与光源隔开预定的距离。多个微镜阵列设置在基板上以组装在一起以具有相对于入射光线的预定入射角。多个微透镜阵列被配置为对应于微镜阵列。更具体地，第一微透镜阵列设置在光源和衬底之间的预定区域中，并且包括多个微透镜。第二微透镜阵列设置在从微反射镜反射的反射光线的光路中。

9. 发明申请

US20080211995A1 Display Apparatus Using Microlens 审中-公开
标题翻译：使用微透镜的显示装置
公开(公告)号：US20080211995A1
公开(公告)日：2008-09-04
申请号：US12090229
申请日：2007-03-20
申请人： Jin-Wan Jeon , Joo-Hyung Lee , Dae-Hyun Kim , Koeng Su Lim , Jun-Eo Yoon
发明人： Jin-Wan Jeon , Joo-Hyung Lee , Dae-Hyun Kim , Koeng Su Lim , Jun-Eo Yoon
IPC分类号： G02B27/18 , G02F1/1335
CPC分类号： H04N3/08 , H04N5/7458 , H04N9/3152
摘要： Provided is a display apparatus using a micromirror or an image display device. The display apparatus is designed to eliminate dark regions, usually formed by pixel partitions or black matrixes, display a high-quality image by increasing light usage efficiency, and improve the power consumption. A display apparatus using a microlens includes a micromirror array, a substrate, and a microlens array. The micromirror array includes a plurality of micromirrors arranged to reflect incident light rays from a light source. The substrate supports the micromirror array. The microlens array includes a plurality of microlenses disposed between the light source and the micromirror array to condense the incident light rays from the light source upon the micromirror array and correct a traveling path of reflected light rays from the micromirror array.
摘要翻译：提供了使用微镜或图像显示装置的显示装置。显示装置被设计为消除通常由像素分区或黑矩阵形成的暗区，通过增加光使用效率来显示高质量图像，并且提高功耗。使用微透镜的显示装置包括微镜阵列，基板和微透镜阵列。微镜阵列包括多个微反射镜，其布置成反射来自光源的入射光线。基板支撑微镜阵列。微透镜阵列包括设置在光源和微镜阵列之间的多个微透镜，以将来自光源的入射光束聚集在微镜阵列上并校正来自微镜阵列的反射光线的行进路径。

10. 发明申请

US20120048342A1 INTEGRATED THIN-FILM PHOTOVOLTAIC DEVICE AND MANUFACTURING METHOD THEREOF 审中-公开
标题翻译：集成薄膜光伏器件及其制造方法
公开(公告)号：US20120048342A1
公开(公告)日：2012-03-01
申请号：US13217707
申请日：2011-08-25
申请人： Koeng Su Lim , Jin-Wan Jeon
发明人： Koeng Su Lim , Jin-Wan Jeon
IPC分类号： H01L31/05 , H01L31/18
CPC分类号： H01L31/1872 , H01L31/046 , H01L31/0465 , H01L31/072 , Y02E10/50 , Y02P70/521
摘要： Disclosed is an integrated thin film photovoltaic device. The integrated thin film photovoltaic device includes: a substrate including trenches formed therein; a first semiconductor material layer formed on the substrate from a first basic line within each of the trenches through one side of each of the trenches to the projected surface of the substrate, which is adjacent to the one side; a second semiconductor material layer formed on a resultant substrate from a second basic line on the first semiconductor material layer within each of the trenches through the other side of each of the trenches to the projected surface of the resultant substrate, which is adjacent to the other side, so that a portion of the first semiconductor material layer and a portion of the second semiconductor material layer are overlapped with each other within each of the trenches.
摘要翻译：公开了一种集成薄膜光伏器件。集成薄膜光伏器件包括：衬底，其包括形成在其中的沟槽; 第一半导体材料层，其从每个沟槽中的每个沟槽中的第一基本线通过每个沟槽的一侧到与所述一侧相邻的衬底的突出表面形成; 形成在所得基板上的第二半导体材料层，该第二基线从每个沟槽中的每个沟槽中的第一半导体材料层上的第二基线通过每个沟槽的另一侧延伸到所得衬底的与另一个相邻的投影表面使得第一半导体材料层的一部分和第二半导体材料层的一部分在每个沟槽内彼此重叠。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式