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1. 发明专利

JP2015052555A 炉内耐火物損耗状態の測定方法有权
标题翻译：火炬炉内部测量方法
公开(公告)号：JP2015052555A
公开(公告)日：2015-03-19
申请号：JP2013186264
申请日：2013-09-09
申请人：株式会社神戸製鋼所 , Kobe Steel Ltd
发明人： YAMAGUCHI AKASHI , SAKOTA HISAKAZU , MARUYAMA MASAKATSU , MORIMOTO TSUTOMU
IPC分类号： G01B11/24 , F27D21/00 , G01S17/88
摘要：【課題】サイズの大きい炉や、U字型炉のように内部が湾曲した形状の炉体であっても、炉内の耐火物の形状を確実に測定する方法を提供する。【解決手段】炉体の内部に内張された耐火物の表面形状を測定することによって、耐火物の損耗状態を検出する炉内耐火物損耗状態の測定方法であって、耐火物に対して測定光を照射することにより炉内の2次元形状を測定する測定手段10を、移動手段によって炉内で移動させつつ複数回測定することにより炉内の3次元形状を求め、求めた前記3次元形状に基づいて耐火物の損耗状態を測定する。【選択図】図2
摘要翻译：要解决的问题：为了提供一种即使是炉子也可以确定地测量炉内存在的耐火材料的形状的尺寸大的方法，或者炉内部如U型炉的弯曲方式。解决方案：测量方法用于通过测量设置在炉体内部的耐火材料的表面形状来测量耐火材料的磨损状态的炉耐火材料磨损状态的内部包括：测量装置10，用于通过将测量光辐射到炉中来测量二维形状耐火。测量装置10通过炉中的移动装置移动，多次进行测量，从而确定炉中的三维形状，并且基于三维形状测量耐火材料的磨损状态。

2. 发明专利

JP2012047673A Inspection device and inspection method 有权
标题翻译：检查装置和检查方法
公开(公告)号：JP2012047673A
公开(公告)日：2012-03-08
申请号：JP2010191995
申请日：2010-08-30
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： KATAYAMA AKIRA , MORIMOTO TSUTOMU
IPC分类号： G01N21/892
摘要： PROBLEM TO BE SOLVED: To detect a flaw of an inspection object with accuracy.SOLUTION: A feature amount calculation part 43 calculates a standard deviation V(i, j) of a luminance value P(n, i, j) of each pixel G(i, j) from image data of the inspection object H, uses the calculated standard deviation V(i, j) to normalize luminance the P(n, i, j), and calculates a normalized luminance value P'(n, i, j). The feature amount calculation part 43 sets a normal area in which flaws are estimated not to appear in the whole image data, and calculates a covariance matrix C of the normal area of the inspection object H from the normalized luminance value P'(n, i, j) within the set area. A flaw information generation part 44 calculates Mahalanobis distance d(i, j) between the normalized luminance value P'(n, i, j) and the covariance matrix C, and generates a flaw image showing a flaw place.
摘要翻译：要解决的问题：准确地检测检查对象的缺陷。解决方案：特征量计算部43根据检查对象H的图像数据，计算各像素G（i，j）的亮度值P（n，i，j）的标准偏差V（i，j）使用计算的标准偏差V（i，j）来将亮度归一化为P（n，i，j），并计算归一化亮度值P'（n，i，j）。特征量计算部分43设置在整个图像数据中不出现缺陷的正常区域，并且从归一化亮度值P'（n，i）计算检查对象H的法线区域的协方差矩阵C ，j）在设定区域内。缺陷信息生成部44计算归一化亮度值P'（n，i，j）与协方差矩阵C之间的马氏距离d（i，j），并生成表示缺陷的缺陷图像。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2009008421A Shape measuring device 有权
标题翻译：形状测量装置
公开(公告)号：JP2009008421A
公开(公告)日：2009-01-15
申请号：JP2007167437
申请日：2007-06-26
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： AMANAKA MASAHITO , MORIMOTO TSUTOMU
IPC分类号： G01B11/06
CPC分类号： G01B9/02027 , G01B9/02021
摘要： PROBLEM TO BE SOLVED: To measure the thickness of a measuring object simply and highly accurately without being influenced by vibration of the measuring object, and also without generating disturbance or fluctuation of interference light. SOLUTION: An injection current into a semiconductor laser 2 is linearly changed (changed to be serrate) in a prescribed current value range with a fixed cycle by a current modulation power source 10; each measuring light P1, P2 acquired by branching measuring light emitted from the semiconductor laser 2 is guided to opposite measuring portions 1a, 1b on the front and rear sides of the measuring object 1; each measuring light P1, P2 is branched into object light to be irradiated to each measuring portion 1a, 1b, and reference light to be irradiated to each reference plate; allowed to interfere with each other by each interferometer a20, b20 on the front and rear sides; a phase difference between beat signals of each interferometer a20, b20 is detected; and the detected signal is outputted as a measured value equivalent to the thickness of the measuring object 1. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了简单高精度地测量测量对象的厚度，不受测量对象的振动的影响，也不会产生干扰光的干扰或波动。解决方案：通过电流调制电源10，以固定的周期，在半导体激光器2中的注入电流在规定的电流值范围内线性地变化（变为锯齿形）; 通过将从半导体激光器2发出的测量光分支而获得的每个测量光P1，P2被引导到测量对象1的前侧和后侧的相对的测量部分1a，1b; 每个测量光P1，P2被分支成要照射到每个测量部分1a，1b的物体光和照射到每个参考板的参考光; 允许通过前侧和后侧上的每个干涉仪a20，b20彼此干扰; 检测每个干涉仪a20，b20的拍子信号之间的相位差; 输出检测信号作为与测量对象1的厚度相当的测量值。版权所有：（C）2009，JPO＆INPIT

4. 发明专利

JP2008180708A Shape measuring device 有权
标题翻译：形状测量装置
公开(公告)号：JP2008180708A
公开(公告)日：2008-08-07
申请号：JP2007339091
申请日：2007-12-28
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： AMANAKA MASAHITO , TAKAHASHI EIJI , MORIMOTO TSUTOMU
IPC分类号： G01B11/06 , G01B9/02 , G01B11/245
CPC分类号： G01B9/02021 , G01B9/02027
摘要： PROBLEM TO BE SOLVED: To easily measure the thickness of an object to be measured with high accuracy without generating any disturbance or fluctuation in an interference light and without being affected by a vibration of the object. SOLUTION: An apparatus includes a surface-side heterodyne interferometer a20 that branches a first beam light P1 and second beam light P2 of slightly different frequencies, guides them to a measuring part 1a of the surface and a measuring part 1b of the backside, and uses the first beam light P1 as object light, and uses the second beam light P2 as reference light, a backside heterodyne interferometer b20 that uses the second beam light P2 as object light, and uses the first beam light P1 as reference light (object light and reference light establish the opposite relation to that on the surface), and a first phase detector 4 for detecting the phase difference ϕs between intensity signals Sig1 and Sig2 output from respective heterodyne interferometers a20 and b20, and outputting the detection signal as a measured value corresponding to the thickness of the object 1 to be measured. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了容易地以高精度测量被测量物体的厚度，而不会产生干涉光的干扰或波动，并且不受物体的振动的影响。解决方案：一种装置包括：表面侧外差干涉仪a20，其分支具有稍微不同频率的第一光束P1和第二光束P2，将它们引导到表面的测量部分1a;以及背面的测量部分1b 使用第一光束光P1作为对象光，使用第二光束P2作为基准光，使用第二光束光P2作为对象光的背面外差干涉仪b20，并使用第一光束光P1作为基准光（物体光和参考光建立与表面相反的关系）以及用于检测从各个外差干涉仪a20和b20输出的强度信号Sig1和Sig2之间的相位差φs的第一相位检测器4，并将该检测信号作为对应于被测量物体1的厚度的测量值。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2007315966A Diameter measuring device 有权
标题翻译：直径测量装置
公开(公告)号：JP2007315966A
公开(公告)日：2007-12-06
申请号：JP2006147239
申请日：2006-05-26
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： SAKOTA HISAKAZU , MORIMOTO TSUTOMU
IPC分类号： G01B11/08
摘要： PROBLEM TO BE SOLVED: To provide a diameter measuring device for maintaining high measurement precision even when warp or distortion of a disk-like body such as a wafer being an object to be measured or inclination thereof during measurement exists by providing the diameter measuring device for shortening a measurement time in diameter measurement of the disk-like body.
SOLUTION: The diameter measuring device comprises two or more irradiation optical systems for irradiating two or more outer peripheral parts of the disk-like body with measurement light at the outer peripheral positions of the disk-like body corresponding to the disk-like body diameter being the object to be measured, and a receiving optical system for receiving the measurement light intercepting a part on the outer peripheral part of the disk-like body by being irradiated from the irradiation optical system in opposition thereto. The diameter measuring device calculates the disk-like body based on optical images by the receiving optical system.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种用于维持高测量精度的直径测量装置，即使当测量中的诸如作为被测量物体的晶片的盘状体或其倾斜在存在时，通过提供直径用于缩短盘状体的直径测量的测量时间的测量装置。
解决方案：直径测量装置包括两个或更多个照射光学系统，用于照射盘状体的两个或更多个外围部分，其中测量光在圆盘状体的对应于盘状体的外周位置处身体直径是被测量物体，以及接收光学系统，用于通过从相机的照射光学系统照射而接收测量光，该测量光通过照射光学系统照射盘状体的外周部分的一部分。直径测量装置基于接收光学系统的光学图像计算盘状体。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2007147299A Apparatus and method for measuring displacement 审中-公开
标题翻译：测量位移的装置和方法
公开(公告)号：JP2007147299A
公开(公告)日：2007-06-14
申请号：JP2005338272
申请日：2005-11-24
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： MORIMOTO TSUTOMU , SAKOTA HISAKAZU , TAKAMATSU HIROYUKI
IPC分类号： G01B11/02 , G01B11/00
摘要： PROBLEM TO BE SOLVED: To provide a displacement measuring apparatus and a displacement measuring method, capable of combining an optical triangulation ranging system and a confocal system, and simultaneously solving the problem of speckle noise of the optical triangulation ranging system, the problem the constitution becoming complex for the confocal system, etc. SOLUTION: An irradiation-system optical apparatus A, having a lens 4 that has chromatic aberrations, irradiates light to a sample 5 at an angle. A light-receiving system optical apparatus B, having a photodetector 14 receives reflected light from the sample 5. By measuring the position of incidence of the reflected light receive by the light receptor 14, it is possible to measure the height displacements of the sample 5 (height of the sample) according to the position of incidence. Since that any wavelength light irradiated to the sample 5 is focused on the sample 5 can be decided by the fact that the quantity of receive light at the position of incidence takes on a prescribed value or a higher value, height displacements of the sample 5 (height of the sample) can be measured, by determining the focus in this case. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供能够组合光学三角测距系统和共焦系统的位移测量装置和位移测量方法，同时解决光学三角测距系统的斑点噪声问题，问题共聚焦系统的结构变得复杂等。解决方案：具有透镜4的具有色差的照射系统光学装置A以一定角度向样品5照射光。具有光电检测器14的光接收系统光学装置B接收来自样品5的反射光。通过测量由光接收器14接收的反射光的入射位置，可以测量样品5的高度位移（样品的高度）根据入射位置。由于照射到样品5的任何波长的光聚焦在样品5上，所以可以通过以下事实来确定：入射位置处的接收光的量为规定值或更高的值，样品5的高度位移（可以通过确定这种情况下的焦点来测量样品的高度）。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2007017285A Apparatus and method for measuring displacement 审中-公开
标题翻译：测量位移的装置和方法
公开(公告)号：JP2007017285A
公开(公告)日：2007-01-25
申请号：JP2005199084
申请日：2005-07-07
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： SAKOTA HISAKAZU , MORIMOTO TSUTOMU , TAKAMATSU HIROYUKI , TAKAHASHI EIJI
IPC分类号： G01B11/00
摘要： PROBLEM TO BE SOLVED: To provide an apparatus and a method for measuring a displacement, which can measure the displacement of a sample with a wide measuring range, without lowering its measuring resolution.
SOLUTION: A radiation position Ta of a light beam emitted from a light source 10a is set, and a radiation position Tb of a light beam emitted from a light source 10b is set so as to be shifted toward the side of a lens 4 in comparison with the radiation position Ta, and the sample is irradiated with the light beams emitted from the respective light sources 10a, 10b by using the lens 4 having a chromatic aberration, and reflected light from the sample is received, and then the displacement of the sample in the optical axis direction of the lens 4 is measured from light intensities of a plurality of wavelength light portions (wavelength bandwidth λ1-λ2) contained in the received reflected light. Since the radiation positions of light sources are shifted respectively, the measuring range of the apparatus is expanded by utilizing different positions of imaging points (i.e., dispersed area of imaging point).
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于测量位移的装置和方法，其可以测量具有宽测量范围的样品的位移，而不降低其测量分辨率。解决方案：设置从光源10a发射的光束的辐射位置Ta，并且将从光源10b发射的光束的辐射位置Tb设定为朝向透镜侧移动 4，并且通过使用具有色差的透镜4照射从各个光源10a，10b发射的光束的样品，并且接收来自样品的反射光，然后移位根据包含在所接收的反射光中的多个波长光部分（波长带宽λ1-λ2）的光强度来测量透镜4的光轴方向上的样品。由于光源的辐射位置分别移动，所以通过利用成像点的不同位置（即成像点的分散区域）来扩大装置的测量范围。版权所有（C）2007，JPO＆INPIT

8. 发明专利

JP2003329429A Shape measuring instrument 有权
标题翻译：形状测量仪器
公开(公告)号：JP2003329429A
公开(公告)日：2003-11-19
申请号：JP2002137058
申请日：2002-05-13
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： MORIMOTO TSUTOMU , TAKAMATSU HIROYUKI
IPC分类号： G01B11/30 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a shape measuring instrument for measuring a surface shape and an edge of a work in a non-contact manner with high accuracy.
SOLUTION: This shape measuring instrument comprises an interferometer 10 to measure the reflected light of a light irradiated on a main surface 1a of a wafer 1, a background light irradiating means 21 which irradiates the light parallel to the reflected light from a back surface 1b side of the wafer 1 so as to be incident in an acceptor 16 of the interferometer 10 on the main surface 1b side as the background light of the wafer 1, and an edge detector 31 to detect a boundary between an area of the background light and other area as an edge of the wafer 1 based on the image start information obtained by the interferometer 10. In addition, if the interferometer 10 is an oblique- incident type, the reflected light and the background light measured by the interferometer 10 and the side formed by the edge of the water 1 to be detected are set to be substantially parallel to each other when viewed from a direction perpendicular to the surface of the wafer 1.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种用于以非常接触的方式高精度地测量工件的表面形状和边缘的形状测量仪器。解决方案：该形状测量仪器包括用于测量照射在晶片1的主表面1a上的光的反射光的干涉仪10，背景光照射装置21，其将来自背面的反射光平行的光照射晶片1的表面1b侧，作为晶片1的背景光入射到主表面1b侧的干涉仪10的受主16中，以及用于检测背景区域之间的边界的边缘检测器31 光和其他区域作为晶片1的边缘，基于由干涉仪10获得的图像开始信息。此外，如果干涉仪10是倾斜入射型，则由干涉仪10测量的反射光和背景光当从垂直于晶片1的表面的方向观察时，由被检测的水1的边缘形成的侧面被设定为彼此大致平行。（C）2004，JPO

9. 发明专利

JP2013096859A Height measuring apparatus and height measuring method 有权
标题翻译：高度测量装置和高度测量方法
公开(公告)号：JP2013096859A
公开(公告)日：2013-05-20
申请号：JP2011240344
申请日：2011-11-01
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： MORIMOTO TSUTOMU , KATAYAMA AKIRA
IPC分类号： G01B11/24 , B21C51/00
摘要： PROBLEM TO BE SOLVED: To provide a technology with which the height of each position of a sample having a mirror surface property can be determined accurately.SOLUTION: An imaging section 2 captures a sample image that is an image of a sample S, for example, at a predetermined frame rate. A spectrum extraction section extracts spectrums from sample images captured sequentially by the imaging section 2 and determines deviation w(x) of the spectrums with respect to a reference spectrum indicating predetermined reference height and reference inclination. A height calculation section sequentially calculates a height d(x) of the sample S from the reference height by substituting the deviation w(x) of the spectrums extracted by the spectrum extraction section to w(x)=2L×(d/dx)×d(x)+2sinθ×d(x).
摘要翻译：要解决的问题：提供可以精确地确定具有镜面性质的样品的每个位置的高度的技术。解决方案：成像部分2例如以预定的帧速率捕获作为样本S的图像的样本图像。频谱提取部分从由成像部分2依次捕获的样本图像中提取频谱，并确定频谱相对于表示预定参考高度和参考倾斜度的参考频谱的偏差w（x）。高度计算部分通过将频谱提取部分提取的频谱的偏差w（x）代入w（x）= 2L×（d / dx）），从参考高度顺序地计算样本S的高度d（x） ×d（x）+2sinθ×d（x）。版权所有（C）2013，JPO＆INPIT

10. 发明专利

JP2013028516A Method for removing boron from metal silicon 审中-公开
标题翻译：从金属硅中去除硼的方法
公开(公告)号：JP2013028516A
公开(公告)日：2013-02-07
申请号：JP2011167242
申请日：2011-07-29
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： HAYASHI KAZUSHI , MORIMOTO TSUTOMU
IPC分类号： C01B33/037
CPC分类号： C01B33/037
摘要： PROBLEM TO BE SOLVED: To provide a method for removing boron from metal silicon at fast speed.SOLUTION: In this method for removing boron from metal silicon, a jet stream is formed in advance by changing a mixed gas of an inert gas and at least one kind selected from hydrogen, water vapor, carbon dioxide and oxygen, into plasma, and then metal silicon powder containing boron is supplied into the jet stream. It is also preferable that at least one kind selected from water vapor, carbon dioxide and oxygen is supplied into a middle stream of the jet stream formed by changing a mixed gas of hydrogen and an inert gas into plasma.
摘要翻译：待解决的问题：提供一种以快速的方式从金属硅中除去硼的方法。解决方案：在从金属硅中除去硼的方法中，通过将惰性气体和选自氢，水蒸汽，二氧化碳和氧中的至少一种的混合气体改变成等离子体，预先形成喷射流，然后将含有硼的金属硅粉供应到喷射流中。还优选将从水蒸汽，二氧化碳和氧气中选出的至少一种供给到通过将氢气和惰性气体的混合气体改变为等离子体而形成的射流的中间流。版权所有（C）2013，JPO＆INPIT

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