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    • 7. 发明授权
    • Programmable via structure and method of fabricating same
    • 可编程通孔结构及其制造方法
    • US07652278B2
    • 2010-01-26
    • US11612631
    • 2006-12-19
    • Kuan-Neng ChenLia Krusin-ElbaumChung H. LamAlbert M. Young
    • Kuan-Neng ChenLia Krusin-ElbaumChung H. LamAlbert M. Young
    • H01L29/02H01L21/06
    • H01L45/122H01L45/06H01L45/1206H01L45/1286H01L45/144H01L45/148H01L45/1683
    • A programmable via structure is provided as well as a method of fabricating the same. The inventive programmable via a semiconductor substrate. An oxide layer such as a thermal oxide is located on a surface of the semiconductor substrate. A patterned heating material is located on a surface of the oxide layer. The inventive structure also includes a patterned dielectric material having a least one via filled with a phase change material (PCM). The patterned dielectric material including the PCM filled via is located on a surface of the patterned heating material. A patterned diffusion barrier is located on an exposed surface of said at least one via filled with the phase change material. The inventive structure also includes contact vias that extend through the patterned dielectric material. The contact vias are filled with a conductive material which also extends onto the upper surface of the patterned dielectric material. A conductive material which serves as the input of the device is located atop the patterned diffusion barrier that is located directly above the via that is filled with the phase change material.
    • 提供了可编程通孔结构以及其制造方法。 本发明可编程通过半导体衬底。 诸如热氧化物的氧化物层位于半导体衬底的表面上。 图案化的加热材料位于氧化物层的表面上。 本发明的结构还包括具有填充有相变材料(PCM)的至少一个通孔的图案化电介质材料。 包括PCM填充通孔的图案化电介质材料位于图案化加热材料的表面上。 图案化扩散阻挡层位于所述至少一个充满相变材料的通孔的暴露表面上。 本发明的结构还包括延伸通过图案化电介质材料的接触孔。 接触通孔填充有也延伸到图案化电介质材料的上表面上的导电材料。 用作器件输入的导电材料位于图案化的扩散阻挡层的顶部,其位于通过相变材料填充的正上方。