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1. 发明授权

US08358675B2 Nitride semiconductor laser device and wafer 有权
标题翻译：氮化物半导体激光器件和晶圆
公开(公告)号：US08358675B2
公开(公告)日：2013-01-22
申请号：US12801800
申请日：2010-06-25
申请人： Kentaro Tani , Yoshihiko Tani , Toshiyuki Kawakami
发明人： Kentaro Tani , Yoshihiko Tani , Toshiyuki Kawakami
IPC分类号： H01S3/097
CPC分类号： H01S5/06226 , G11B7/127 , G11B7/22 , H01S5/0202 , H01S5/0425 , H01S5/22 , H01S5/2214 , H01S5/2222 , H01S5/32341
摘要： Provided is a nitride semiconductor laser device that is reduced in capacitance to have a better response. The nitride semiconductor laser device includes: an active layer; an upper cladding layer which is stacked above the active layer; a low dielectric constant insulating film which is stacked above the upper cladding layer; and a pad electrode which is stacked above the low dielectric constant insulating film.
摘要翻译：提供了一种减小电容以获得更好响应的氮化物半导体激光器件。氮化物半导体激光器件包括：有源层; 层叠在有源层上的上包层; 层叠在上包层上方的低介电常数绝缘膜; 以及堆叠在低介电常数绝缘膜之上的焊盘电极。

2. 发明申请

US20110317733A1 Nitride semiconductor laser chip and method of fabrication thereof 有权
标题翻译：氮化物半导体激光芯片及其制造方法
公开(公告)号：US20110317733A1
公开(公告)日：2011-12-29
申请号：US13067747
申请日：2011-06-23
申请人： Kentaro Tani , Toshiyuki Kawakami , Yoshihiko Tani
发明人： Kentaro Tani , Toshiyuki Kawakami , Yoshihiko Tani
IPC分类号： H01S5/22 , H01L33/32 , H01S5/323
CPC分类号： H01S5/34333 , B82Y20/00 , H01S5/0014 , H01S5/0655 , H01S5/22 , H01S5/3063 , H01S5/3211 , H01S2301/176
摘要： A nitride semiconductor laser chip that operates with reduced electric power consumption and helps achieve cost reduction has: an active layer formed of a nitride semiconductor; a nitride semiconductor layer formed above the active layer; a ridge portion formed in a part of the nitride semiconductor layer; and an electrically conductive film having a light-absorbing property and formed at least in a region outside the ridge portion above the nitride semiconductor layer. The ridge portion has a ridge width of 2 μm or more but 6 μm or less.
摘要翻译：以降低的电力消耗并且有助于实现成本降低的氮化物半导体激光器芯片具有：由氮化物半导体形成的有源层; 形成在所述有源层上方的氮化物半导体层; 形成在所述氮化物半导体层的一部分中的脊部; 以及至少形成在氮化物半导体层上方的脊部外侧的区域中具有光吸收性的导电膜。脊部的脊宽度为2μm以上且6μm以下。

3. 发明授权

US08379682B2 Nitride semiconductor laser chip and method of fabrication thereof 有权
标题翻译：氮化物半导体激光芯片及其制造方法
公开(公告)号：US08379682B2
公开(公告)日：2013-02-19
申请号：US13067747
申请日：2011-06-23
申请人： Kentaro Tani , Toshiyuki Kawakami , Yoshihiko Tani
发明人： Kentaro Tani , Toshiyuki Kawakami , Yoshihiko Tani
IPC分类号： H01S3/04
CPC分类号： H01S5/34333 , B82Y20/00 , H01S5/0014 , H01S5/0655 , H01S5/22 , H01S5/3063 , H01S5/3211 , H01S2301/176
摘要： A nitride semiconductor laser chip that operates with reduced electric power consumption and helps achieve cost reduction has: an active layer formed of a nitride semiconductor; a nitride semiconductor layer formed above the active layer; a ridge portion formed in a part of the nitride semiconductor layer; and an electrically conductive film having a light-absorbing property and formed at least in a region outside the ridge portion above the nitride semiconductor layer. The ridge portion has a ridge width of 2 μm or more but 6 μm or less.
摘要翻译：以降低的电力消耗并且有助于实现成本降低的氮化物半导体激光器芯片具有：由氮化物半导体形成的有源层; 形成在所述有源层上方的氮化物半导体层; 形成在所述氮化物半导体层的一部分中的脊部; 以及至少形成在氮化物半导体层上方的脊部外侧的区域中具有光吸收性的导电膜。脊部的脊宽度为2μm以上且6μm以下。

4. 发明申请

US20130022071A1 NITRIDE SEMICONDUCTOR LASER DEVICE AND WAFER 有权
标题翻译：氮化物半导体激光器件和波形
公开(公告)号：US20130022071A1
公开(公告)日：2013-01-24
申请号：US13629998
申请日：2012-09-28
申请人： Kentaro Tani , Yoshihiko Tani , Toshiyuki Kawakami
发明人： Kentaro Tani , Yoshihiko Tani , Toshiyuki Kawakami
IPC分类号： H01S5/02
CPC分类号： H01S5/06226 , G11B7/127 , G11B7/22 , H01S5/0202 , H01S5/0425 , H01S5/22 , H01S5/2214 , H01S5/2222 , H01S5/32341
摘要： A nitride semiconductor laser device is provided herein that is reduced in capacitance to have a better response. The nitride semiconductor laser device includes: an active layer; an upper cladding layer which is stacked above the active layer; a low dielectric constant insulating film which is stacked above the upper cladding layer; and a pad electrode which is stacked above the low dielectric constant insulating film.
摘要翻译：本文提供了一种降低电容以获得更好响应的氮化物半导体激光器件。氮化物半导体激光器件包括：有源层; 层叠在有源层上的上包层; 层叠在上包层上方的低介电常数绝缘膜; 以及堆叠在低介电常数绝缘膜之上的焊盘电极。

5. 发明申请

US20100329294A1 Nitride semiconductor laser device and wafer 有权
标题翻译：氮化物半导体激光器件和晶圆
公开(公告)号：US20100329294A1
公开(公告)日：2010-12-30
申请号：US12801800
申请日：2010-06-25
申请人： Kentaro Tani , Yoshihiko Tani , Toshiyuki Kawakami
发明人： Kentaro Tani , Yoshihiko Tani , Toshiyuki Kawakami
IPC分类号： H01S5/323
CPC分类号： H01S5/06226 , G11B7/127 , G11B7/22 , H01S5/0202 , H01S5/0425 , H01S5/22 , H01S5/2214 , H01S5/2222 , H01S5/32341
摘要： Provided is a nitride semiconductor laser device that is reduced in capacitance to have a better response. The nitride semiconductor laser device includes: an active layer; an upper cladding layer which is stacked above the active layer; a low dielectric constant insulating film which is stacked above the upper cladding layer; and a pad electrode which is stacked above the low dielectric constant insulating film.
摘要翻译：提供了一种减小电容以获得更好响应的氮化物半导体激光器件。氮化物半导体激光器件包括：有源层; 层叠在有源层上的上包层; 层叠在上包层上方的低介电常数绝缘膜; 以及堆叠在低介电常数绝缘膜之上的焊盘电极。

6. 发明授权

US07199398B2 Nitride semiconductor light emitting device having electrode electrically separated into at least two regions 有权
标题翻译：氮化物半导体发光器件具有电分离成至少两个区域的电极
公开(公告)号：US07199398B2
公开(公告)日：2007-04-03
申请号：US10719739
申请日：2003-11-20
申请人： Tomoki Ono , Shigetoshi Ito , Toshiyuki Okumura , Hirokazu Mouri , Kyoko Matsuda , Toshiyuki Kawakami , Takeshi Kamikawa , Yoshihiko Tani
发明人： Tomoki Ono , Shigetoshi Ito , Toshiyuki Okumura , Hirokazu Mouri , Kyoko Matsuda , Toshiyuki Kawakami , Takeshi Kamikawa , Yoshihiko Tani
IPC分类号： H01L29/10 , H01L29/22 , H01L21/00 , H01S3/097
CPC分类号： H01L33/38 , H01L33/32 , H01S5/0425 , H01S5/0602 , H01S5/0658 , H01S5/32341
摘要： A nitride semiconductor light emitting device includes at least a substrate, an active layer formed of a nitride semiconductor containing mainly In and Ga, a p-electrode and an n-electrode. At least one of the p-electrode and n-electrode is electrically separated into at least two regions.
摘要翻译：氮化物半导体发光器件至少包括衬底，由主要包含In和Ga的氮化物半导体形成的有源层，p电极和n电极。 p电极和n电极中的至少一个电分离成至少两个区域。

7. 发明申请

US20050045979A1 Light receiving device circuit-built-in type light receiving unit and optical disk unit 审中-公开
标题翻译：光接收装置电路内置型光接收单元和光盘单元
公开(公告)号：US20050045979A1
公开(公告)日：2005-03-03
申请号：US10497242
申请日：2002-11-29
申请人： Tatsuya Morioka , Shigeki Hayashida , Yoshihiko Tani , Isamu Ohkubo , Hideo Wada
发明人： Tatsuya Morioka , Shigeki Hayashida , Yoshihiko Tani , Isamu Ohkubo , Hideo Wada
IPC分类号： H01L31/0216 , H01L31/103 , H01L27/14
CPC分类号： H01L31/02161 , H01L31/103 , H01L31/1035
摘要： A first P-type diffusion layer and a P-type semiconductor layer are provided on a silicon substrate, and two N-type diffusion layers are provided on a front surface of this P-type semiconductor layer to form two light receiving units. Three-layer translucent films, a first silicon oxide film, a silicon nitride film, and a second silicon oxide film are disposed on the N-type diffusion layers and on the P-type semiconductor layer between the two diffusion layers. Holes produced during a production process and distributed and captured in two interfaces between the three-layer translucent films can reduce a field intensity in the vicinity of the surface of the P-type semiconductor layer to below a conventional level and an inversion of a conductive type to reduce a leak current between the light receiving units accordingly.
摘要翻译：在硅衬底上设置第一P型扩散层和P型半导体层，在该P型半导体层的前表面上设置两个N型扩散层，以形成两个光接收单元。三层半透膜，第一氧化硅膜，氮化硅膜和第二氧化硅膜设置在两个扩散层之间的N型扩散层和P型半导体层上。在生产过程中产生的并且在三层半透明膜之间的两个界面中分布和捕获的孔可以将P型半导体层的表面附近的场强降低到传统水平以下并导致导通型以相应地减小光接收单元之间的泄漏电流。

8. 发明授权

US07307326B2 Light receiving element and light receiving device incorporating circuit and optical disk drive 有权
标题翻译：光接收元件和光接收装置并入电路和光盘驱动器
公开(公告)号：US07307326B2
公开(公告)日：2007-12-11
申请号：US10499357
申请日：2002-12-10
申请人： Shigeki Hayashida , Tatsuya Morioka , Yoshihiko Tani , Isamu Ohkubo , Hideo Wada
发明人： Shigeki Hayashida , Tatsuya Morioka , Yoshihiko Tani , Isamu Ohkubo , Hideo Wada
IPC分类号： H01L31/00 , H01L31/0232
CPC分类号： H01L31/103 , H01L31/02161
摘要： A light receiving device includes a silicon substrate, a first P type diffusion layer on the silicon substrate, and a P type semiconductor layer on the P type diffusion layer. On a surface part of the P type semiconductor layer, two N type diffusion layers as light receiving parts, and a second P type diffusion layer between the two N type diffusion layers are provided. On the P type semiconductor layer, an antireflection film structure composed of a first silicon oxide formed by thermal oxidation and a second silicon oxide formed by CVD is provided. A film thickness of the first silicon oxide is set at about 15 nm, thus a defect in a interface between the first silicon oxide and the P type semiconductor layer is prevented. A film thickness of the second silicon oxide is set at about 100 nm, thus a leak current between cathodes is prevented when a power supply voltage is applied for long period of time.
摘要翻译：光接收装置包括硅衬底，硅衬底上的第一P型扩散层和P型扩散层上的P型半导体层。在P型半导体层的表面部分设置有作为光接收部的两个N型扩散层和在两个N型扩散层之间的第二P型扩散层。在P型半导体层上，提供了由通过热氧化形成的第一氧化硅和通过CVD形成的第二氧化硅构成的抗反射膜结构。第一氧化硅的膜厚设定为约15nm，因此防止了第一氧化硅与P型半导体层之间的界面的缺陷。第二氧化硅的膜厚设定为约100nm，因此长时间施加电源电压时，能够防止阴极之间的漏电流。

9. 发明申请

US20050116320A1 Light receiving element and light receiving device incorporating circuit and optical disk drive 有权
标题翻译：光接收元件和光接收装置并入电路和光盘驱动器
公开(公告)号：US20050116320A1
公开(公告)日：2005-06-02
申请号：US10499357
申请日：2002-12-10
申请人： Shigeki Hayashida , Tatsuya Morioka , Yoshihiko Tani , Isamu Ohkubo , Hideo Wada
发明人： Shigeki Hayashida , Tatsuya Morioka , Yoshihiko Tani , Isamu Ohkubo , Hideo Wada
IPC分类号： H01L31/0216 , H01L31/103 , H01L23/58
CPC分类号： H01L31/103 , H01L31/02161
摘要： A light receiving device includes a silicon substrate, a first P type diffusion layer on the silicon substrate, and a P type semiconductor layer on the P type diffusion layer. On a surface part of the P type semiconductor layer, two N type diffusion layers as light receiving parts, and a second P type diffusion layer between the two N type diffusion layers are provided. On the P type semiconductor layer, an antireflection film structure composed of a first silicon oxide formed by thermal oxidation and a second silicon oxide formed by CVD is provided. A film thickness of the first silicon oxide is set at about 15 nm, thus a defect in a interface between the first silicon oxide and the P type semiconductor layer is prevented. A film thickness of the second silicon oxide is set at about 100 nm, thus a leak current between cathodes is prevented when a power supply voltage is applied for long period of time.
摘要翻译：光接收装置包括硅衬底，硅衬底上的第一P型扩散层和P型扩散层上的P型半导体层。在P型半导体层的表面部分设置有作为光接收部的两个N型扩散层和在两个N型扩散层之间的第二P型扩散层。在P型半导体层上，提供了由通过热氧化形成的第一氧化硅和通过CVD形成的第二氧化硅构成的抗反射膜结构。第一氧化硅的膜厚设定为约15nm，因此防止了第一氧化硅与P型半导体层之间的界面的缺陷。第二氧化硅的膜厚设定为约100nm，因此长时间施加电源电压时，能够防止阴极之间的漏电流。

10. 发明申请

US20130037779A1 NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE AND METHOD FOR PRODUCING THE SAME 有权
标题翻译：氮化物半导体发光器件及其制造方法
公开(公告)号：US20130037779A1
公开(公告)日：2013-02-14
申请号：US13584353
申请日：2012-08-13
申请人： Tadashi Takeoka , Yoshihiko Tani , Kazuya Araki , Yoshihiro Ueta
发明人： Tadashi Takeoka , Yoshihiko Tani , Kazuya Araki , Yoshihiro Ueta
IPC分类号： H01L33/06
CPC分类号： H01L33/025 , H01L33/06 , H01L33/32
摘要： A nitride semiconductor light-emitting device includes an n-type nitride semiconductor layer, a V pit generation layer, an intermediate layer, a multiple quantum well light-emitting layer, and a p-type nitride semiconductor layer provided in this order. The multiple quantum well light-emitting layer is a layer formed by alternately stacking a barrier layer and a well layer having a bandgap energy smaller than that of the barrier layer. A V pit is partly formed in the multiple quantum well light-emitting layer, and an average position of starting point of the V pit is located in the intermediate layer.
摘要翻译：氮化物半导体发光器件包括依次提供的n型氮化物半导体层，V坑生成层，中间层，多量子阱发光层和p型氮化物半导体层。多量子阱发光层是通过交替层叠阻挡层和具有比阻挡层的能隙小的带隙能量的阱层而形成的层。在多量子阱发光层中部分地形成V凹坑，并且V凹坑的起始点的平均位置位于中间层中。

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