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    • 1. 发明授权
    • Method of manufacturing flat plate microlens and flat plate microlens
    • 制造平板微透镜和平板微透镜的方法
    • US06437918B1
    • 2002-08-20
    • US09600525
    • 2000-10-17
    • Kenjiro HamanakaAtsunori MatsudaSatoshi TaniguchiDaisuke AraiTakashi KishimotoNaoto Hirayama
    • Kenjiro HamanakaAtsunori MatsudaSatoshi TaniguchiDaisuke AraiTakashi KishimotoNaoto Hirayama
    • G02B2710
    • C08F20/38B29D11/00278B29D11/00365B29D11/0073C08F28/02G02B1/041G02B3/0012G02B3/0025G02B3/0031G02B3/0056G02B3/0068
    • A large number of microscopic recess portions are formed on a surface of a glass substrate in a single dimension or two dimensions by conducting a wet etching through a mask. The large number of microscopic recess portions are aligned densely by again conducting the wet etching but not through the mask. A separating agent is applied upon the surface of the glass substrate and a light-curable or heat-curable resin material of high refractive index is applied thereon. The high refractive index resin material is cured, after piling a first glass substrate upon the high refractive index resin material so as to extend the high refractive index resin material thereon. The high refractive index resin material which is cured and the first glass substrate are separated from the glass substrate, and a low refractive index resin material is applied on the high refractive index resin material which is cured on the first glass substrate. The low refractive index resin material is cured, after piling a second glass substrate on the low refractive index resin material so as to extend the low refractive index resin material thereon.
    • 通过通过掩模进行湿式蚀刻,在一维或二维的玻璃基板的表面上形成大量微观凹部。 通过再次进行湿蚀刻而不是通过掩模,大量微观凹陷部分密集地对准。 在玻璃基板的表面上涂布分离剂,在其上涂布高折射率的光固化型或热固化性树脂材料。 高折射率树脂材料在将第一玻璃基板堆叠在高折射率树脂材料上之后固化,以便在其上延伸高折射率树脂材料。 将固化的高折射率树脂材料和第一玻璃基板与玻璃基板分离,并将低折射率树脂材料施加到在第一玻璃基板上固化的高折射率树脂材料上。 在低折射率树脂材料上堆叠第二玻璃基板以便在其上延伸低折射率树脂材料之后,使低折射率树脂材料固化。
    • 2. 发明授权
    • Planar microlens array and method of making same
    • 平面微透镜阵列及其制作方法
    • US5867321A
    • 1999-02-02
    • US700397
    • 1996-12-13
    • Kenichi NakamaSatoshi TaniguchiKenjiro HamanakaHiroshi Hamada
    • Kenichi NakamaSatoshi TaniguchiKenjiro HamanakaHiroshi Hamada
    • G02B3/00G02B27/10G09F9/00
    • G02B3/0087G02B3/0012G02B3/0056Y10S359/90
    • A microlens array of high converging efficiency is provided, independently of the array and lens filling rate of microlens arrays, with a method of manufacturing microlens arrays using the diffusion process. A multitude of refractive-index distribution type microlenses formed by diffusing in a planar transparent substrate a substance contributing to increasing the refractive index of the substrate are two-dimensionally and regularly arranged on the surface of the substrate. The microlenses are densely arranged on the surface of the substrate, and diffusion fronts of the microlenses form regions where the diffusion fronts are fused with those of the adjoining microlenses. The length of a region where certain two adjoining microlenses are fused together, in the direction of a straight line connecting the centers of the two microlenses is less than 20% of the array pitch of the microlenses in the above-mentioned direction.
    • PCT No.PCT / JP95 / 02681 Sec。 371日期1996年12月13日第 102(e)日期1996年12月13日PCT 1995年12月26日PCT PCT。 公开号WO96 / 21169 日期1996年7月11日提供了一种高收敛效率的微透镜阵列,与微透镜阵列的阵列和透镜填充率无关,具有使用扩散过程制造微透镜阵列的方法。 通过在平面透明基板中漫射形成的多个折射率分布型微透镜,有助于提高基板的折射率的物质被二维规则地布置在基板的表面上。 微透镜密集地布置在衬底的表面上,并且微透镜的扩散前沿形成区域,其中扩散前沿与邻接的微透镜的那些熔融。 在连接两个微透镜的中心的直线的方向上将某些两个相邻的微透镜熔合在一起的区域的长度小于上述方向上的微透镜的阵列间距的20%。
    • 5. 发明授权
    • Method of designing collimator array device and collimator array device manufactured thereby
    • 设计准直仪阵列器件和准直器阵列器件的方法
    • US06912091B2
    • 2005-06-28
    • US09784483
    • 2001-02-15
    • Kenjiro HamanakaSatoshi Taniguchi
    • Kenjiro HamanakaSatoshi Taniguchi
    • G02B6/26G02B6/35G02B26/08G02B27/30G02B6/32G02B6/42G02B7/02
    • G02B6/3582G02B6/3512G02B6/3546
    • According to the present invention, there is provided a method of designing a collimator array device which enables reduction of the insertion loss because of the variation of the optical length. When the beam waist is positioned at the intermediate position between the emitting side planar microlens and the receiving side planar microlens (d1=L/2), the distance d0 between the emitting side fiber array and the emitting side planar microlens can be used as the distance between the receiving side fiber array and the receiving side planar microlens, and thereby the design of the collimator array device can be simplified. The distance d0 for satisfying d1=L/2 is calculated and two values d0-2 and d0-4 are obtained. By selecting the smaller value d0-2, it is possible to reduce the insertion loss because of the shift at the time of coupling.
    • 根据本发明,提供了一种设计准直仪阵列器件的方法,该器件能够由于光学长度的变化而降低插入损耗。 当束腰位于发射侧平面微透镜和接收侧平面微透镜之间的中间位置(d 1 = L / 2)时,发射侧光纤阵列和发射侧平面微透镜之间的距离d0可以用作 可以简化接收侧光纤阵列与接收侧平面微透镜之间的距离,从而简化准直器阵列器件的设计。 计算满足d 1 = L / 2的距离d0,并获得两个值d0-2和d0-4。 通过选择较小的值d0-2,由于耦合时的偏移,可以减小插入损耗。
    • 6. 发明授权
    • Planar microlens array having high converging efficiency
    • 具有高收敛效率的平面微透镜阵列
    • US5982552A
    • 1999-11-09
    • US141473
    • 1998-08-28
    • Kenichi NakamaSatoshi TaniguchiKenjiro HamanakaHiroshi Hamada
    • Kenichi NakamaSatoshi TaniguchiKenjiro HamanakaHiroshi Hamada
    • G02B3/00G02B27/10G09F9/00
    • G02B3/0087G02B3/0012G02B3/0056Y10S359/90
    • A microlens array of high converging efficiency is provided, independently of the array and lens filling rate of microlens arrays, with a method of manufacturing microlens arrays using the diffusion process. A multitude of refractive-index distribution type microlenses formed by diffusing in a planar transparent substrate a substance contributing to increasing the refractive index of the substrate are two-dimensionally and regularly arranged on the surface of the substrate. The microlenses are densely arranged on the surface of the substrate, and diffusion fronts of the microlenses form regions where the diffusion fronts are fused with those of the adjoining microlenses. The length of a region where certain two adjoining microlenses are fused together, in the direction of a straight line connecting the centers of the two microlenses is less than 20% of the array pitch of the microlenses in the above-mentioned direction.
    • 提供了与微透镜阵列的阵列和透镜填充速率无关的高收敛效率的微透镜阵列,其具有使用扩散过程制造微透镜阵列的方法。 通过在平面透明基板中漫射形成的多个折射率分布型微透镜,有助于提高基板的折射率的物质被二维规则地布置在基板的表面上。 微透镜密集地布置在衬底的表面上,并且微透镜的扩散前沿形成区域,其中扩散前沿与邻接的微透镜的那些熔融。 在连接两个微透镜的中心的直线的方向上将某些两个相邻的微透镜熔合在一起的区域的长度小于上述方向上的微透镜的阵列间距的20%。
    • 8. 发明授权
    • Thin film transistor, method of manufacturing the same, and display device
    • 薄膜晶体管及其制造方法以及显示装置
    • US08748878B2
    • 2014-06-10
    • US12709805
    • 2010-02-22
    • Norihiko YamaguchiSatoshi TaniguchiHiroko MiyashitaYasuhiro Terai
    • Norihiko YamaguchiSatoshi TaniguchiHiroko MiyashitaYasuhiro Terai
    • H01L29/786H01L21/34
    • H01L29/7869
    • The present application provides a thin film transistor and a method of manufacturing same capable of suppressing diffusion of aluminum to oxide semiconductor and selectively etching oxide semiconductor and aluminum oxide. The thin film transistor includes: a gate electrode; a channel layer whose main component is oxide semiconductor; a gate insulating film provided between the gate electrode and the channel layer; a sealing layer provided on the side opposite to the gate electrode, of the channel layer; and a pair of electrodes which are in contact with the channel layer and serve as a source and a drain. The sealing layer includes at least a first insulating film made of a first insulating material, and a second insulating film made of a second insulting material having etching selectivity to each of the oxide semiconductor and the first insulating material and provided between the first insulating film and the channel layer.
    • 本申请提供了能够抑制铝向氧化物半导体的扩散并选择性地蚀刻氧化物半导体和氧化铝的薄膜晶体管及其制造方法。 薄膜晶体管包括:栅电极; 主要成分是氧化物半导体的沟道层; 设置在所述栅极电极和所述沟道层之间的栅极绝缘膜; 设置在沟道层的与栅电极相对的一侧的密封层; 以及与沟道层接触并用作源极和漏极的一对电极。 所述密封层至少包括由第一绝缘材料制成的第一绝缘膜和由具有对所述氧化物半导体和所述第一绝缘材料中的每一个具有蚀刻选择性的第二绝缘材料制成的第二绝缘膜,并且设置在所述第一绝缘膜和 通道层。
    • 9. 发明授权
    • Thin film transistor, display device, and electronic device
    • 薄膜晶体管,显示器件和电子器件
    • US08384080B2
    • 2013-02-26
    • US12964852
    • 2010-12-10
    • Satoshi TaniguchiMikihiro YokozekiHiroko MiyashitaToshi-kazu Suzuki
    • Satoshi TaniguchiMikihiro YokozekiHiroko MiyashitaToshi-kazu Suzuki
    • H01L29/786
    • H01L29/7869H01L29/78693
    • A thin film transistor, which is capable of improving carrier mobility, and a display device and an electronic device, each of which uses the thin film transistor, are provided. The thin film transistor includes: a gate electrode; an oxide semiconductor layer including a multilayer film including a carrier travel layer configuring a channel and a carrier supply layer for supplying carriers to the carrier travel layer; a gate insulating film provided between the gate electrode and the oxide semiconductor layer; and a pair of electrodes as a source and a drain. A conduction band minimum level or a valence band maximum level corresponding to a carrier supply source of the carrier supply layer is higher in energy than a conduction band minimum level or a valence band maximum level corresponding to a carrier supply destination of the carrier travel layer.
    • 提供能够提高载流子迁移率的薄膜晶体管,以及各自使用薄膜晶体管的显示装置和电子装置。 薄膜晶体管包括:栅电极; 包括多层膜的氧化物半导体层,所述多层膜包括构成沟道的载流子行进层和用于向所述载体行进层供给载体的载体供给层; 设置在所述栅电极和所述氧化物半导体层之间的栅极绝缘膜; 以及一对电极作为源极和漏极。 与载波供电层的载波供给源对应的导带最小电平或价带最大电平的能量高于对应于载波行进层的载波供给目的地的导带最小电平或价带最大电平。